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[0001] 1. Field of the Invention
[0002] The present invention relates to a baking system for use in a process of manufacturing semiconductor devices. More particularly, the present invention relates to a baking system having a heat pipe as a cooling unit.
[0003] 2. Description of the Related Art
[0004] A photolithographic process, which is one type of process performed during the manufacture of a semiconductor device, includes a coating process of coating a photoresist layer on a wafer, a pre-baking process of baking the coated photoresist layer before exposure, and a post-exposure baking process of baking the photoresist layer after exposure, to form a predetermined pattern in the photoresist layer.
[0005] In a photolithographic process, a baking temperature varies according to a type of photoresist layer and a type of baking process. For example, the baking process may be performed at a temperature of 150° C. or 90° C. depending on particular circumstances. Accordingly, a widely used baking apparatus includes a heating system and a cooling system to adjust the baking temperature according to the particular circumstances.
[0006]
[0007] In a first conventional cooling system, as shown in
[0008] In a second conventional cooling system, as shown in
[0009] A third conventional cooling system
[0010] In the above-described conventional cooling systems a temperature deviation between different regions of a baking plate is very large. More specifically, the entire baking plate cannot be uniformly cooled. In addition, a significant amount of time is required until a temperature is uniformly distributed after a cooling process starts. These disadvantages degrade semiconductor device manufacturing productivity.
[0011] As these problems of the conventional cooling systems have been highlighted, various alternatives have been proposed. One such alternative requires a plurality of baking plates, set to different temperatures, to be installed in a cooling system. In this case, however, although a cooling time may be reduced, a single spinner is required to include the plurality of baking plates and thus becomes undesirably large.
[0012] In an effort to overcome at least some of the above-described disadvantages, the present invention provides a baking system that is able to uniformly cool an entire top surface of a hot plate and effectively reduce a cooling time.
[0013] In accordance with a feature of an embodiment of the present invention, there is provided a baking system including a heat pipe including a top surface for receiving a wafer to be baked, the heat pipe to be filled with a predetermined amount of working fluid and having wicks formed on sides and a ceiling thereof for supplying the working fluid, a heater for heating the top surface by heating the working fluid, a subsidiary cooling system, which contains a liquid coolant that is to be exchanged with the working fluid from the heat pipe through circulation, a connection pipe for providing fluid communication between the heat pipe and the subsidiary cooling system to circulate the working fluid and the liquid coolant, and a control unit, which is installed in the connection pipe, for controlling a flow of the working fluid and the liquid coolant through the connection pipe.
[0014] The connection pipe may include an inlet flow path and an outlet flow path for providing fluid communication between the heat pipe and the subsidiary cooling system. The connection pipe may include an outlet connection pipe for providing fluid communication from the heat pipe to the subsidiary cooling system and an inlet connection pipe for providing fluid communication from the subsidiary cooling system to the heat pipe.
[0015] The control unit may include an outlet fluid control unit installed in the outlet connection pipe and an inlet fluid control unit installed in the inlet connection pipe. The outlet fluid control unit may be an automated pump or a valve and the inlet fluid control unit may be a valve, an automatic pump, or a manual pump.
[0016] The control unit may include a first outlet fluid control unit and a second outlet fluid control unit sequentially installed in the outlet connection pipe and an inlet fluid control unit installed in the inlet connection pipe. The first outlet fluid control unit may be an automatic valve or a manual valve, the inlet fluid control unit may be an automatic valve, a manual valve, or a pump, and the second outlet fluid control unit may be a pump.
[0017] The subsidiary cooling system may include a coolant storage tank for storing the liquid coolant, the coolant storage tank having a wick formed therein, a cooling unit installed at the coolant storage tank for cooling the working fluid supplied from the heat pipe, and a pressurizing unit for pressurizing the liquid coolant during a process of cooling the top surface.
[0018] The subsidiary cooling system may include a first coolant storage tank for storing the liquid coolant and a first cooling system installed at the first coolant storage tank for cooling the working fluid supplied from the heat pipe. Further, there may be included a second coolant storage tank in fluid communication with the first coolant storage tank, wherein the first cooling system extends to the second coolant storage tank. Alternatively, there may be included a second coolant storage tank in fluid communication with the first coolant storage tank and a second cooling system installed at the second coolant storage tank. Further, there may be included an intermediate connection pipe for providing fluid communication between the first coolant storage tank and the second coolant storage tank and an intermediate fluid control unit installed in the intermediate connection pipe. The control unit may be a pump or a valve.
[0019] The baking system may further include a subsidiary heater installed in the connection pipe between an inlet of the heat pipe and the subsidiary cooling system to heat a fluid flowing through the connection pipe.
[0020] Alternatively, the baking system may further include a subsidiary heater installed at the first coolant storage tank to heat a fluid supplied into the heat pipe.
[0021] The working fluid may be water, deionized water, acetone, or methyl.
[0022] In accordance with a feature of another embodiment of the present invention, there is provided a baking system including a heat pipe including a top surface for receiving a wafer to be baked and an inlet side and an outlet side, the heat pipe to be filled with a predetermined amount of working fluid and having wicks formed on sides and a ceiling thereof for supplying the working fluid, a heater for heating the top surface of the heat pipe by heating the working fluid, a connection pipe, a first end of which is connected to the outlet side of the heat pipe, and a second end of which is connected to the inlet side of the heat pipe, a cooling unit installed in the connection pipe for cooling the working fluid flowing through the connection pipe, and a control unit for controlling the working fluid.
[0023] The cooling unit may be installed to wrap around a portion of the connection pipe. The control unit may include an outlet fluid control unit installed in the connection pipe between the outlet side of the heat pipe and the cooling unit and an inlet fluid control unit installed in the connection pipe between the inlet side of the heat pipe and the cooling unit. The outlet fluid control unit and the inlet fluid control unit may be an automatic valve, a manual valve, or a pump.
[0024] A baking system according to an embodiment of the present invention is able to uniformly cool an entire region of a hot plate in a relatively short amount of time to stabilize the temperature of the hot plate. Further, a time required to heat the hot plate may be decreased using a subsidiary heater, thus improving semiconductor device manufacturing productivity.
[0025] The above and other features and advantages of the present invention will become more apparent to those of ordinary skill in the art by describing in detail illustrative embodiments thereof with reference to the attached drawings in which:
[0026]
[0027]
[0028]
[0029]
[0030]
[0031]
[0032]
[0033]
[0034] Korean Patent Application No. 2003-21920, filed on Apr. 8, 2003, and entitled: “Baking System,” is incorporated by reference herein in its entirety.
[0035] The present invention will now be described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. The invention may, however, be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In the figures, the dimensions of layers and regions are exaggerated for clarity of illustration. Like reference numerals refer to like elements throughout. In the context of the present invention, a term “working fluid” describes a fluid in a heat pipe that operates either to heat or to cool a top surface of the heat pipe. A term “liquid coolant” describes a fluid in a coolant storage tank that circulates to replace the working fluid in the heat pipe and operates to cool the top surface of the heat pipe.
[0036] First Embodiment
[0037] As shown in
[0038] Wicks W
[0039] When a baking process is performed, as shown in
[0040] In order to cool the top surface S
[0041] During a baking process, the working fluid
[0042] During a cooling process, the working fluid
[0043] The working fluid
[0044] While the top surface of the heat pipe
[0045] While the top surface S
[0046] Specifically, an outlet flow path L
[0047] When the cooling process of the top surface S
[0048] Second Embodiment
[0049] Referring to
[0050] The fluid circulation between the heat pipe
[0051] In operation, while fluids, i.e., the working fluid and the liquid coolant, are circulating between the heat pipe
[0052] In addition, the working fluid
[0053] In a case where the cooling unit
[0054] Third Embodiment
[0055] Referring to
[0056] Fourth Embodiment
[0057] Referring to
[0058] When a cooling process of the hot plate begins, the working fluid
[0059] The first cooling unit
[0060] The outlet of the heat pipe
[0061] In operation, a cooling process of the hot plate occurs as follows. When cooling of the hot plate starts, all of the fluid control units
[0062] Fluid circulation may be continuously conducted until cooling of the hot plate is completed or may be repeated several times for a predetermined time duration, e.g., 15 seconds, each time. The liquid coolant flowing from the second coolant storage tank
[0063] As described above, while passing through the first and second coolant storage tanks
[0064] Fifth Embodiment
[0065] As shown in
[0066] In
[0067] Sixth Embodiment
[0068] Referring to
[0069] The subsidiary heater
[0070] Hereinafter, simulation results showing a cooling efficiency of baking systems of the present invention will be described.
[0071] In the simulation, the baking system shown in
[0072]
[0073] In
[0074]
[0075]
[0076] Specifically,
[0077] Reference characters G
[0078] Referring to the first and second curves G
[0079] Referring to the third curve, G
[0080] As a result, in Example 2, as shown in the fifth and sixth curves G
[0081] Next, referring to the seventh and eighth curves, G
[0082] Referring to the ninth and tenth curves, G
[0083] Meanwhile,
[0084] In
[0085] In
[0086] Referring to the eleventh and twelfth curves G
[0087] Further, referring to the thirteenth and fourteenth curves G
[0088] In addition, referring to the fifteenth and sixteenth curves G
[0089] The following Table summarizes the foregoing simulation results on cooling of the hot plates of the contrastive baking system and the baking system of the present invention. In the Table, System TABLE The greatest Temperature temperature stabilizing Cooling time deviation time Content (150° C. -> 100° C.) (ΔT) (° C.) (ΔT < 1° C.) System 1 90 seconds 0.2 1.5 minutes System Example 1 50 minutes 0.2 50 minutes 2 Example 2 10 minutes 78 5 minutes Example 3 Long 1.4 — Example 4 95 seconds 8 4 and ⅓ minutes The other 10 seconds 80 —
[0090] As shown in the Table, in the contrastive baking system (System
[0091] More specifically, in the baking system of the present invention (System
[0092] Meanwhile, in Example 1 using the natural cooling method, the cooling time and the stabilizing time were much longer than in the baking system of the present invention. Therefore, despite the small temperature deviation, Example 1 is not suitable for practical use.
[0093] As a result, by analyzing the simulation results, it may be seen that the baking system of the present invention performed better than any contrastive baking system in consideration of overall productivity, cooling effect, and temperature uniformity.
[0094] As described above, the baking system of the present invention includes a heat pipe, a top surface of which is used as a hot plate where a wafer to be baked is loaded, and on sides and a ceiling of which wicks for supplying a working fluid are installed. Thus, when the top surface is cooled, the working fluid is uniformly and rapidly supplied to the entire ceiling of the heat pipe, thus uniformly cooling the entire top surface. The top surface is cooled by evaporating the working fluid supplied to the ceiling of the heat pipe. Therefore, a time required for stabilizing the temperature of the hot plate surface may be significantly reduced as compared with conventional systems using circulation of cooling water.
[0095] Further, the heat pipe is connected to a subsidiary cooling system, which is used to circulate a working fluid through the heat pipe to cool the top surface. The subsidiary cooling system includes a coolant storage tank, which is filled with a predetermined amount of liquid coolant to be exchanged with the working fluid to cool the top surface, and a cooling unit, which prevents an increase in temperature of the liquid coolant due to inflow of the working fluid. In addition, the coolant storage tank may further include a pressurizing unit, a second cooling system, or a subsidiary heater, if necessary. The subsidiary cooling system is able to maintain the working fluid in the heat pipe at a low temperature during cooling of the top surface of the heat pipe, thus improving the cooling efficiency of the heat pipe. Also, if the coolant storage tank includes a subsidiary heater, a time required for heating the top surface of the heat pipe, i.e., a hot plate surface, may be reduced to improve semiconductor device manufacturing productivity.
[0096] Illustrative embodiments of the present invention have been disclosed herein and, although specific terms are employed, they are used and are to be interpreted in a generic and descriptive sense only and not for purpose of limitation. For example, a coolant storage unit with a subsidiary heater for heating a liquid coolant can be further used if necessary, in addition to a coolant storage unit with a cooling unit. Accordingly, it will be understood by those of ordinary skill in the art that various changes in form and details may be made without departing from the spirit and scope of the present invention as set forth in the following claims.