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9256122 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device  
A mask blank for use in the manufacture of a binary mask adapted to be applied with ArF excimer laser exposure light has, on a transparent substrate, a light-shielding film for forming a transfer...
9134616 Generalization of shot definitions for mask and wafer writing tools  
Techniques for reducing the number of shots required by a radiation beam writing tool to write a pattern, such as fractured layout design, onto a substrate. One or more apertures are employed by a...
9040211 Mask and method of manufacturing a substrate using the mask  
A mask includes a substantially transparent portion. The mask further includes a halftone portion abutting the substantially transparent portion, a light transmittance of the halftone portion...
9040212 Endpoint detection for photolithography mask repair  
A method includes scanning a lithography mask with a repair process, and measuring back-scattered electron signals of back-scattered electrons generated from the scanning. An endpoint is...
9040228 Method for forming patterns of semiconductor device by using mixed assist feature system  
A method for forming patterns of a semiconductor device includes providing a photomask that includes an array of contact holes in an active region, a plurality of first dummy contact holes for...
9034560 Negative resist composition and pattern forming method using the same  
A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with...
9034542 Method and system for forming patterns with charged particle beam lithography  
In a method for fracturing or mask data preparation or mask process correction for charged particle beam lithography, a plurality of shots are determined that will form a pattern on a surface,...
9034539 Controllable transmission and phase compensation of transparent material  
A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the...
9034569 Extreme ultraviolet lithography process and mask  
An extreme ultraviolet lithography (EUVL) process is performed on a target, such as a semiconductor wafer, having a photosensitive layer. The method includes providing a one-dimensional patterned...
9029049 Method for processing a carrier, a carrier, an electronic device and a lithographic mask  
Various embodiments provide a method for processing a carrier, the method including changing the three-dimensional structure of a mask layer arranged over the carrier so that at least two mask...
9030646 Exposure apparatus and photomask used therein  
In an exposure apparatus, a photomask 3 is provided with a plurality of mask pattern columns 15 formed by arranging a plurality of mask patterns 13 at a predetermined pitch in a direction...
9029048 Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device  
The present invention is a mask blank used to fabricate a transfer mask, which has a laminated structure of a light shielding film and an etching mask film in this order on a transparent...
9029050 Method for repairing a mask  
The present disclosure provides a method of repairing a mask. The method includes inspecting the mask using a mask inspection tool to identify a defect on a circuit pattern of the mask; repairing...
9029047 Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method  
A near-field exposure mask according to an embodiment includes: a silicon substrate; and a near-field light generating unit that is formed on the silicon substrate, the near-field light generating...
9032340 Layout decomposition method and method for manufacturing semiconductor device applying the same  
A layout decomposition method and a method for manufacturing a semiconductor device applying the same are provided. According to the layout decomposition method, a design layout is received by the...
9032342 Method and apparatus for alignment optimization with respect to plurality of layers  
A method of patterning a plurality of layers of a work piece in a series of writing cycles in one or a plurality of write machines, the workpiece being deviced to have a number of N layers and...
9026957 Method of defining an intensity selective exposure photomask  
An embodiment of a feed-forward method of determining a photomask pattern is provided. The method includes providing design data associated with an integrated circuit device. A thickness of a...
9023982 Method for purifying resin for photolithography  
A method is provided for purifying a resin for photolithography wherein, from an insufficiently purified resin (also referred to as “crude resin”), low molecular weight impurities such as an...
9021405 Layout method and method of manufacturing semiconductor device  
A plurality of gate electrode patterns to be laid out in parallel are alternately set as first patterns to be formed in a first exposure step of double patterning and as second patterns to be...
9017904 Methods of providing photolithography patterns using feature parameters  
A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a...
9021407 Signal path of a multiple-patterned semiconductor device  
A multiple-patterned semiconductor device is provided. The semiconductor device includes one or more layers with signal tracks defined by masks and a structure for transferring a signal between...
9017903 Mask overlay control  
Some embodiments of the present disclosure relate to a method of patterning a workpiece with a mask, wherein a scale factor between a geometry of the mask and a corresponding target shape of the...
9017902 Mask blank, transfer mask, and method of manufacturing a transfer mask  
Provided is a mask blank which enables EB defect correction to be suitably applied and which further enables a reduction in the thickness of a light-shielding film. A mask blank 10 is used for...
9005850 Mask for exposure and method of fabricating substrate using said mask  
Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially...
9005849 Photomask having a reduced field size and method of using the same  
A photomask used for manufacturing a semiconductor device includes a substrate; and one or more layers disposed over the substrate, the one or more layers defining a full field area and a reduced...
9005852 Technique for repairing a reflective photo-mask  
During a calculation technique, a modification to a reflective photo-mask is calculated. In particular, using information specifying a defect associated with a location on a top surface of the...
9005848 Photomask having a reduced field size and method of using the same  
A photomask used for manufacturing a semiconductor device includes a substrate; and one or more layers disposed over the substrate, the one or more layers defining a full field area and a reduced...
9005851 Phase shift mask blank and phase shift mask  
The present invention provides a photomask blank used for producing a photomask to which an ArF excimer laser light is applied, wherein: a light-shielding film is provided on a light transmissive...
9003338 Common template for electronic article  
One or more techniques or systems for incorporating a common template into a system on chip (SOC) design are provided herein. For example, a common template mask set is generated based on a first...
8999611 Mask blank for scattering effect reduction  
Some embodiments relate a method of forming a photomask for a deep ultraviolet photolithography process (e.g., having an exposing radiation with a wavelength of 193 nm). The method provides a mask...
8999610 Lithography mask repairing process  
A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The...
8999613 Mask  
Provided are a mask, a method of manufacturing the same, a light irradiation device, a method of radiating light, and a method of manufacturing an orientationally ordered photo-alignment layer. By...
8999609 Phase shift mask blank, method of manufacturing the same, and phase shift mask  
Provided are a phase shift mask blank that is improved in the irradiation durability of a light-semitransmissive film (phase shift film), made of a material containing mainly a transition metal,...
8999612 Method for manufacturing reflective mask and apparatus for manufacturing reflective mask  
According to one embodiment, a method for manufacturing a reflective mask includes: forming a reflection layer on a major surface of a substrate; forming a capping layer containing ruthenium on...
8993224 Multiple patterning process for forming trenches or holes using stitched assist features  
One illustrative method disclosed herein involves identifying an overall target pattern comprised of at least one hole-type feature, decomposing the overall target pattern into at least a first...
8993217 Double exposure technique for high resolution disk imaging  
Innovative techniques are disclosed for fabricating microelectronic devices using an alternating phase shift mask. Some embodiments of the invention encompass a double exposure technique that...
8993201 Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate  
Provided are an EUV mask blank in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, a reflective layer-equipped substrate to be used for producing the EUV...
8992788 Evaluation of etching conditions for pattern-forming film  
In conjunction with a photomask blank comprising a transparent substrate, a pattern-forming film, and an etch mask film, a set of etching conditions for the pattern-forming film is evaluated by...
8997027 Methods for modifying an integrated circuit layout design  
Methods for modifying a layout design of an integrated circuit using model-based retargeting are provided. In one embodiment, a method for modifying an integrated circuit layout design includes...
8988732 Image processing apparatus and image processing method  
In the image processing apparatus, image data is divided into large blocks of a prescribed size and the large blocks are subdivided into small blocks by the dividing unit. The number of isolated...
8986909 Imprinting device, method of fabricating the same, and method of patterning thin film using the same  
An imprinting device includes a first substrate, a light blocking layer formed on the first substrate corresponding to a light blocking area, and a patterned layer formed on the first substrate....
8986912 Method for generating mask pattern  
A method for generating, via a computer, a mask pattern to be used for an exposure apparatus that exposes an image of the mask pattern on a substrate by irradiating a mask includes obtaining data...
8986911 Multiple-patterning photolithographic mask and method  
A composite mask suitable for multiple-patterning lithographic processes and a multiple-patterning photolithographic process utilizing the mask are disclosed. An exemplary embodiment includes...
8986913 Method and apparatus for inspecting a mask substrate for defects, method of manufacturing a photomask, and method of manufacturing a semiconductor device  
According to one embodiment, a method of inspecting a mask substrate for defects, includes acquiring a defocus image of a partial region of a mask substrate using a dark-field optical system,...
8986910 Optical member for EUV lithography  
There are provided an EUV optical member, in which deterioration in the reflectivity due to oxidation of the Ru protective layer is prevented, a functional film-equipped substrate to be employed...
8984452 Long-range lithographic dose correction  
A method of quantifying a lithographic proximity effect and determining a lithographic exposure dosage is disclosed. In an exemplary embodiment, the method for determining an exposure dosage...
8980108 Method for integrated circuit fabrication  
Provided is an integrated circuit (IC) fabrication method. The method includes receiving a mask, the mask having a plurality of dies and receiving a wafer, the wafer having a resist layer. The...
8982326 Exposure system, method of forming pattern using the same and method of manufacturing display substrate using the same  
An exposure system includes an exposure apparatus and a phase shift mask. The exposure apparatus emits a multi-wavelength light including a plurality of wavelengths different from each other. The...
8984449 Dynamically generating jog patches for jog violations  
Systems, methods, and other embodiments associated with dynamically generating jog patches are described. In one embodiment, a method includes determining a virtual edge within metal of a design...
8984453 Method and system for creation of binary spatial filters  
Methods and systems for designing a binary spatial filter based on data indicative of a desired exposure condition to be emulated by an inspection system, and for implementing the binary spatial...