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9007497 |
Three-mirror anastigmat with at least one non-rotationally symmetric mirror
A three-mirror anastigmatic with at least one non-rotationally symmetric mirror is disclosed. The at least one non-rotationally symmetric mirror may be an electroformed mirror shell having a... |
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8908268 |
Infrared optical lens system
An infrared optical lens system including: a first lens which comprises a crystalline material; and a second lens which comprises an amorphous material and is formed by using molding processing,... |
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8873137 |
Catadioptric projection objective
Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first... |
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8848286 |
Lens plate for wafer-level camera and method of manufacturing same
A lens plate includes a transparent substrate wafer, and a plurality of lenses and spacers that are formed of a single portion of material on the transparent substrate wafer. An assembly includes... |
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8816306 |
Infrared light device
An infrared (IR) light device is provided comprising: a main casing filled with a gas to prevent condensation from forming on an interior surface of the visible light filter; and a plurality of IR... |
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8698116 |
Extreme ultra violet light source apparatus
An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for... |
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8608988 |
Curable photochromic compositions and optical articles prepared therefrom
The present invention provides a curable, organic polymeric photochromic composition comprising: a photochromic amount of at least one photochromic material; a polymeric polyol having carbonate... |
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8592787 |
Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device
An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the... |
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8536551 |
Extreme ultra violet light source apparatus
An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for... |
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8507885 |
Semiconductor exposure device using extreme ultra violet radiation
The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided... |
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8446665 |
Catadioptric projection objective
Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first... |
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8369008 |
Compact dual-field IR2-IR3 imaging system
The invention relates to a dual-field (NF and WF) imaging system comprising an optronic detector (1) and an optical combination of narrow-field focal length FNF having, an optical axis a front... |
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8369009 |
Near infra-red imaging lens assembly
This invention provides an NIR imaging lens assembly comprising a lens element with refractive power made of a visible-light-absorbable material, and a filter or a filter film formed on one lens... |
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8345350 |
Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation... |
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8339925 |
Optical information recording/reproducing optical system and optical information recording/reproducing apparatus
An optical information recording/reproducing optical system, comprising a light source; an optical element converting a laser beam into a substantially collimated beam; and an objective lens,... |
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8330131 |
Source-collector module with GIC mirror and LPP EUV light source
A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector... |
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8279520 |
Wide field of view LWIR high speed imager
Various embodiments provide an optical system including a first lens group having a plurality of lenses, the first lens group being configured to correct for an axial chromatic aberration; a... |
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8227778 |
Semiconductor exposure device using extreme ultra violet radiation
The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided... |
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8213079 |
Polarization-modulating optical element and method for manufacturing thereof
A method of manufacturing a polarization-modulating optical element is provided. The element causes, for light passing through the element and due to stress-induced birefringence, a distribution... |
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8198613 |
Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device
The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of... |
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8178206 |
Solar control laminates
Provided is a solar control composition comprising an infrared absorbing phthalocyanine compound or naphthalocyanine compound and a resin having a modulus from 20,000 psi (138 MPa) to 1000 psi (7... |
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8164759 |
Imaging microoptics for measuring the position of an aerial image
An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |β′| of >800 by magnitude.... |
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8154794 |
Imaging lens and method of manufacturing the same
There is provided an imaging lens including: a transparent substrate; an upper lens disposed on a top of the transparent substrate; and a lower lens disposed on a bottom of the transparent... |
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8133414 |
Light filters using yellow melanin and melanin-like oligomers and photochromic dyes
Selective fractionation and separation of melanin and use of fractionated or separated melanin in connection with light filters is disclosed. Further, light filters that use yellow melanin or... |
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8048343 |
Light filters using yellow melanin and melanin-like oligomers and photochromic dyes
Light filters that use yellow melanin or melanin like materials prepared to have a yellow color and a melanin transmission spectrum in combination with a photochromic dye are disclosed. The yellow... |
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8018649 |
IR camera
An IR camera comprising an optical system further comprises an additional optical element arranged in the form of a disk that is transparent to the infrared radiation in the beam path and at least... |
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8004760 |
Rear-projection display
Various embodiments related to rear-projection image display are disclosed. For example, one disclosed embodiment provides a projector for projecting an image and a screen configured to display... |
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7999983 |
Lens material, optical electronic component and optical electronic device
An optical material includes lithium tantalate, and a molar composition ratio of lithium oxide and tantalum oxide (Li2O/Ta2O5) in the lithium tantalate is in the range of 0.975 to 0.982. Since an... |
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7948674 |
Electro-optic windows
An electro-optic window is made of a material substantially transparent to infra-red radiation and is treated to have reduced RF transmission characteristics by the provision of carbon nanotubes... |
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7905407 |
Electro-optical lens mounting assembly and method in electro-optical readers
A lensholder holds at least one fixed optical lens and a variable focusing element in a spaced relation along an optical path through which light passes in an electro-optical reader. The variable... |
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7901787 |
Resin composite-type optical element and process for producing the resin composite-type optical element
An object of the present invention is to provide a resin composite-type optical element capable of cutting off ultraviolet light even though it uses a photocurable resin. A resin composite-type... |
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7888663 |
Plasmonic structure lens and its application for online inspection
A surface plasmonic polariton lens is disclosed that has an optical plate having incident thereupon waves of electromagnetic radiation. The plate also has a thin metal film of a metal having a... |
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7858957 |
Illumination optics for projection microlithography
Illumination optics that can be used, for example, for EUV projection microlithography are disclosed. Also disclosed are illumination systems provided with such illumination optics, projection... |
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7835070 |
Synthetic quartz member, exposure apparatus, and method of manufacturing exposure apparatus
An exposure apparatus includes an illumination optical system configured to illuminate a mask with a laser beam having a wavelength shorter than 250 nm, and a projection optical system configured... |
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7803455 |
Optical element and optical pickup apparatus
The present invention provides an optical element including: a substrate; and an antireflection film formed on a surface of the substrate. The antireflection film includes a plurality of lower... |
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7781029 |
Side seal for wet lens elements
A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens... |
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7773296 |
Ultra-broadband UV microscope imaging system with wide range zoom capability
An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which includes a catadioptric lens group and a zooming tube lens... |
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7755839 |
Microlithography projection objective with crystal lens
Very high aperture microlithography projection objectives operating at the wavelengths of 248 nm, 193 nm and also 157 nm, suitable for optical immersion or near-field operation with aperture... |
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7745788 |
Optical trapping with a semiconductor
A method and apparatus are disclosed for forming an optical trap with light directed through or above a semiconductor material. A preferred embodiment selected light-trapping wavelengths that have... |
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7747127 |
Optical member and method of producing the same
A plurality of optical members (lenses) for use in ultraviolet region are mutually stuck. A fluorine-based organic compound (for example, fluorine-based oil) is provided between them. The... |
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7738187 |
Optical element, projection lens and associated projection exposure apparatus
An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free... |
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7710640 |
Projection objective of a microlithographic projection exposure apparatus
A projection objective for a microlithographic projection exposure apparatus. The projection objective can project an image of a mask that can be set in position in an object plane onto a... |
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7706075 |
Projection optical system, exposure apparatus, and device fabrication method
The present invention provides a projection optical system which projects an image on a first object plane onto a second object plane, comprising at least four optical members which are arrayed in... |
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7687777 |
Aperture assembly for use with a photosensor system and a securing mechanism for the aperture assembly
A cost-effective photosensor system for rotor position detection includes securing an aperture assembly to an off-the-shelf infrared radiation-emitting component and/or an off-the-shelf infrared... |
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7682676 |
Optical element and optical pickup device
An optical element irradiated with a light flux having a wavelength of 350 nm to 450 nm, is provided with a synthetic resin base material; and an antireflection film provided on the synthetic... |
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7672044 |
Lens made of a crystalline material
As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal... |
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7639419 |
Inspection system using small catadioptric objective
A system for use with a reduced size catadioptric objective is disclosed. The system including the reduced size objective includes various subsystems to allow enhanced imaging, the subsystems... |
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7633675 |
Catadioptric imaging system employing immersion liquid for use in broad band microscopy
A reduced size catadioptric inspection system employing a catadioptric objective and immersion substance is disclosed. The objective may be employed with light energy having a wavelength in the... |
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7626769 |
Extended depth of field imaging system using chromatic aberration
An imaging system (FIG. 3) is disclosed that has a wavelength dependent focal shift caused by longitudinal chromatic aberration in a lens assembly (203) that provides extended depth of field... |
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7619227 |
Method of reducing radiation-induced damage in fused silica and articles having such reduction
A method of repairing radiation-induced damage and reducing accumulated laser-induced wavefront distortion and polarization-induced birefringence in a fused silica article, such as a lens in a DUV... |