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9007497 Three-mirror anastigmat with at least one non-rotationally symmetric mirror  
A three-mirror anastigmatic with at least one non-rotationally symmetric mirror is disclosed. The at least one non-rotationally symmetric mirror may be an electroformed mirror shell having a...
8908268 Infrared optical lens system  
An infrared optical lens system including: a first lens which comprises a crystalline material; and a second lens which comprises an amorphous material and is formed by using molding processing,...
8873137 Catadioptric projection objective  
Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first...
8848286 Lens plate for wafer-level camera and method of manufacturing same  
A lens plate includes a transparent substrate wafer, and a plurality of lenses and spacers that are formed of a single portion of material on the transparent substrate wafer. An assembly includes...
8816306 Infrared light device  
An infrared (IR) light device is provided comprising: a main casing filled with a gas to prevent condensation from forming on an interior surface of the visible light filter; and a plurality of IR...
8698116 Extreme ultra violet light source apparatus  
An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for...
8608988 Curable photochromic compositions and optical articles prepared therefrom  
The present invention provides a curable, organic polymeric photochromic composition comprising: a photochromic amount of at least one photochromic material; a polymeric polyol having carbonate...
8592787 Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device  
An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the...
8536551 Extreme ultra violet light source apparatus  
An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for...
8507885 Semiconductor exposure device using extreme ultra violet radiation  
The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided...
8446665 Catadioptric projection objective  
Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first...
8369008 Compact dual-field IR2-IR3 imaging system  
The invention relates to a dual-field (NF and WF) imaging system comprising an optronic detector (1) and an optical combination of narrow-field focal length FNF having, an optical axis a front...
8369009 Near infra-red imaging lens assembly  
This invention provides an NIR imaging lens assembly comprising a lens element with refractive power made of a visible-light-absorbable material, and a filter or a filter film formed on one lens...
8345350 Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same  
An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation...
8339925 Optical information recording/reproducing optical system and optical information recording/reproducing apparatus  
An optical information recording/reproducing optical system, comprising a light source; an optical element converting a laser beam into a substantially collimated beam; and an objective lens,...
8330131 Source-collector module with GIC mirror and LPP EUV light source  
A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector...
8279520 Wide field of view LWIR high speed imager  
Various embodiments provide an optical system including a first lens group having a plurality of lenses, the first lens group being configured to correct for an axial chromatic aberration; a...
8227778 Semiconductor exposure device using extreme ultra violet radiation  
The exposure device is able to supply only EUV radiation to a mask, while eliminating radiation other than the EUV radiation. A multi layer made from a plurality of Mo/Si pair layers is provided...
8213079 Polarization-modulating optical element and method for manufacturing thereof  
A method of manufacturing a polarization-modulating optical element is provided. The element causes, for light passing through the element and due to stress-induced birefringence, a distribution...
8198613 Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device  
The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of...
8178206 Solar control laminates  
Provided is a solar control composition comprising an infrared absorbing phthalocyanine compound or naphthalocyanine compound and a resin having a modulus from 20,000 psi (138 MPa) to 1000 psi (7...
8164759 Imaging microoptics for measuring the position of an aerial image  
An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |β′| of >800 by magnitude....
8154794 Imaging lens and method of manufacturing the same  
There is provided an imaging lens including: a transparent substrate; an upper lens disposed on a top of the transparent substrate; and a lower lens disposed on a bottom of the transparent...
8133414 Light filters using yellow melanin and melanin-like oligomers and photochromic dyes  
Selective fractionation and separation of melanin and use of fractionated or separated melanin in connection with light filters is disclosed. Further, light filters that use yellow melanin or...
8048343 Light filters using yellow melanin and melanin-like oligomers and photochromic dyes  
Light filters that use yellow melanin or melanin like materials prepared to have a yellow color and a melanin transmission spectrum in combination with a photochromic dye are disclosed. The yellow...
8018649 IR camera  
An IR camera comprising an optical system further comprises an additional optical element arranged in the form of a disk that is transparent to the infrared radiation in the beam path and at least...
8004760 Rear-projection display  
Various embodiments related to rear-projection image display are disclosed. For example, one disclosed embodiment provides a projector for projecting an image and a screen configured to display...
7999983 Lens material, optical electronic component and optical electronic device  
An optical material includes lithium tantalate, and a molar composition ratio of lithium oxide and tantalum oxide (Li2O/Ta2O5) in the lithium tantalate is in the range of 0.975 to 0.982. Since an...
7948674 Electro-optic windows  
An electro-optic window is made of a material substantially transparent to infra-red radiation and is treated to have reduced RF transmission characteristics by the provision of carbon nanotubes...
7905407 Electro-optical lens mounting assembly and method in electro-optical readers  
A lensholder holds at least one fixed optical lens and a variable focusing element in a spaced relation along an optical path through which light passes in an electro-optical reader. The variable...
7901787 Resin composite-type optical element and process for producing the resin composite-type optical element  
An object of the present invention is to provide a resin composite-type optical element capable of cutting off ultraviolet light even though it uses a photocurable resin. A resin composite-type...
7888663 Plasmonic structure lens and its application for online inspection  
A surface plasmonic polariton lens is disclosed that has an optical plate having incident thereupon waves of electromagnetic radiation. The plate also has a thin metal film of a metal having a...
7858957 Illumination optics for projection microlithography  
Illumination optics that can be used, for example, for EUV projection microlithography are disclosed. Also disclosed are illumination systems provided with such illumination optics, projection...
7835070 Synthetic quartz member, exposure apparatus, and method of manufacturing exposure apparatus  
An exposure apparatus includes an illumination optical system configured to illuminate a mask with a laser beam having a wavelength shorter than 250 nm, and a projection optical system configured...
7803455 Optical element and optical pickup apparatus  
The present invention provides an optical element including: a substrate; and an antireflection film formed on a surface of the substrate. The antireflection film includes a plurality of lower...
7781029 Side seal for wet lens elements  
A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens...
7773296 Ultra-broadband UV microscope imaging system with wide range zoom capability  
An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which includes a catadioptric lens group and a zooming tube lens...
7755839 Microlithography projection objective with crystal lens  
Very high aperture microlithography projection objectives operating at the wavelengths of 248 nm, 193 nm and also 157 nm, suitable for optical immersion or near-field operation with aperture...
7745788 Optical trapping with a semiconductor  
A method and apparatus are disclosed for forming an optical trap with light directed through or above a semiconductor material. A preferred embodiment selected light-trapping wavelengths that have...
7747127 Optical member and method of producing the same  
A plurality of optical members (lenses) for use in ultraviolet region are mutually stuck. A fluorine-based organic compound (for example, fluorine-based oil) is provided between them. The...
7738187 Optical element, projection lens and associated projection exposure apparatus  
An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free...
7710640 Projection objective of a microlithographic projection exposure apparatus  
A projection objective for a microlithographic projection exposure apparatus. The projection objective can project an image of a mask that can be set in position in an object plane onto a...
7706075 Projection optical system, exposure apparatus, and device fabrication method  
The present invention provides a projection optical system which projects an image on a first object plane onto a second object plane, comprising at least four optical members which are arrayed in...
7687777 Aperture assembly for use with a photosensor system and a securing mechanism for the aperture assembly  
A cost-effective photosensor system for rotor position detection includes securing an aperture assembly to an off-the-shelf infrared radiation-emitting component and/or an off-the-shelf infrared...
7682676 Optical element and optical pickup device  
An optical element irradiated with a light flux having a wavelength of 350 nm to 450 nm, is provided with a synthetic resin base material; and an antireflection film provided on the synthetic...
7672044 Lens made of a crystalline material  
As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal...
7639419 Inspection system using small catadioptric objective  
A system for use with a reduced size catadioptric objective is disclosed. The system including the reduced size objective includes various subsystems to allow enhanced imaging, the subsystems...
7633675 Catadioptric imaging system employing immersion liquid for use in broad band microscopy  
A reduced size catadioptric inspection system employing a catadioptric objective and immersion substance is disclosed. The objective may be employed with light energy having a wavelength in the...
7626769 Extended depth of field imaging system using chromatic aberration  
An imaging system (FIG. 3) is disclosed that has a wavelength dependent focal shift caused by longitudinal chromatic aberration in a lens assembly (203) that provides extended depth of field...
7619227 Method of reducing radiation-induced damage in fused silica and articles having such reduction  
A method of repairing radiation-induced damage and reducing accumulated laser-induced wavefront distortion and polarization-induced birefringence in a fused silica article, such as a lens in a DUV...

Matches 1 - 50 out of 291 1 2 3 4 5 6 >