Match
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Document |
Document Title |
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9041121 |
Integrated voltage divider
A semiconductor structure including a high-voltage transistor; voltage dropping circuitry, at least part of which is overlapping the high-voltage transistor; at least one intermediate contact... |
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9041120 |
Power MOS transistor with integrated gate-resistor
A transistor device comprises: at least one individual transistor cell arranged in a transistor cell field on a semiconductor body, each individual transistor cell comprising a gate electrode; a... |
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9006838 |
High sheet resistor in CMOS flow
An integrated circuit containing CMOS gates and a counterdoped polysilicon gate material resistor which has a body region that is implanted concurrently with the NSD layers of the NMOS transistors... |
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9000534 |
Method for forming and integrating metal gate transistors having self-aligned contacts and related structure
According to one exemplary embodiment, a method for forming at least one metal gate transistor with a self-aligned source/drain contact includes forming a metal gate over a substrate. The method... |
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9000564 |
Precision polysilicon resistors
Use of a replacement metal gate (RMG) process provides an opportunity to create precision polysilicon resistors alongside metal gate transistors. During formation of a sacrificial polysilicon... |
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8980703 |
Method of forming semiconductor structure
A method of forming a semiconductor structure is provided. A substrate having a cell area and a periphery area is provided. A stacked structure including a gate oxide layer, a floating gate and a... |
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8981489 |
Semiconductor devices including a resistor structure and methods of forming the same
Semiconductor devices including a resistor structure is provided. The semiconductor device may include a gate structure on an active region, a resistor structure on a field region and a first... |
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8981484 |
Ballast resistor for super-high-voltage devices
An integrated circuit (IC) including a well region of the IC having a first doping level and a plurality of semiconductor regions implanted in the well region. Each of the plurality of... |
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8940612 |
Poly resistor for metal gate integrated circuits
An integrated circuit containing a metal gate transistor and a thin polysilicon resistor may be formed by forming a first layer of polysilicon and removed it in an area for the thin polysilicon... |
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8921946 |
Integrated circuit resistor
A semiconductor device includes a substrate including an isolation region, and a resistor disposed over the isolation region, wherein the resistor includes an implant with an inverse box-like... |
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8901712 |
Semiconductor memory device
The technical problem to be solved is to achieve high density with simple manufacturing process to decrease bit costs of memory. A semiconductor memory device according to a first aspect of the... |
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8891581 |
Multi-wavelength semiconductor laser device
A multi-wavelength semiconductor laser device includes a block having a V-shaped groove with two side faces extending in a predetermined direction; and laser diodes with different light emission... |
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8872273 |
Integrated gate controlled high voltage divider
An integrated circuit containing a gate controlled voltage divider having an upper resistor on field oxide in series with a transistor switch in series with a lower resistor. A resistor drift... |
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8847320 |
Decoupling capacitor and layout for the capacitor
A device comprises a semiconductor substrate having first and second implant regions of a first dopant type. A gate insulating layer and a gate electrode are provided above a resistor region... |
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8835251 |
Formation of high sheet resistance resistors and high capacitance capacitors by a single polysilicon process
A semiconductor device includes a transistor, a capacitor and a resistor wherein the capacitor includes a doped polysilicon layer to function as a bottom conductive layer with a salicide block... |
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8835246 |
Integrated circuits with resistors and methods of forming the same
A method of forming an integrated circuit includes forming at least one transistor over a substrate. The at least one transistor includes a first gate dielectric structure disposed over a... |
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8823112 |
Semiconductor device having mixedly mounted components with common film layers and method of manufacturing the same
A metal gate electrode and a poly-silicon resistance element are mixedly mounted in the same semiconductor substrate. The metal gate electrode is formed on a first gate insulating film and... |
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8796772 |
Precision resistor for non-planar semiconductor device architecture
Precision resistors for non-planar semiconductor device architectures are described. In a first example, a semiconductor structure includes first and second semiconductor fins disposed above a... |
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8796782 |
Semiconductor device and method of manufacturing the same
A polysilicon film that serves as a resistance element is formed. The polysilicon film is patterned to a predetermined shape. CVD oxide films covering the patterned polysilicon film are etched... |
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8786025 |
Semiconductor device and method for forming same
A system and method for forming a resistor system is provided. An embodiment comprises a resistor formed in a U-shape. The resistor may comprise multiple layers of conductive materials, with a... |
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8753968 |
Metal gate process
A metal gate process includes the following steps. An isolating layer on a substrate is provided, where the isolating layer has a first recess and a second recess. A first metal layer covering the... |
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8748988 |
Semiconductor device having resistor formed of a polycrystalline silicon film
A semiconductor device has a semiconductor substrate, a field insulating film disposed on a surface of the semiconductor substrate, a base insulating film disposed on a surface of the field... |
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8748256 |
Integrated circuit having silicide block resistor
A method for forming an integrated circuit (IC) including a silicide block poly resistor (SIBLK poly resistor) includes forming a dielectric isolation region in a top semiconductor surface of a... |
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8748990 |
High voltage switching device the method for forming thereof
A high voltage switching device and associated method of manufacturing, the high voltage switching device having a substrate, an epitaxial layer, a source region, a drain region, a drift region, a... |
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8742513 |
Semiconductor device comprising metal gates and a silicon containing resistor formed on an isolation structure
In a semiconductor device comprising sophisticated high-k metal gate structures formed in accordance with a replacement gate approach, semiconductor-based resistors may be formed above isolation... |
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8723294 |
Resistance element and inverting buffer circuit
It is possible to suppress a change in a resistance value caused by a potential of a semiconductor substrate 10 near a resistance element layer 13, a power line passing on or above the resistance... |
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8716802 |
Semiconductor device structure and fabricating method thereof
A semiconductor device structure including a substrate, a resistor, and a first gate structure is provided. The substrate includes a resistor region and a metal-oxide-semiconductor (MOS)... |
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8716831 |
One time programmable structure using a gate last high-K metal gate process
An eFuse structure having a first metal layer serving as a fuse with a gate including an undoped polysilicon (poly), a second metal layer and a high-K dielectric layer all formed on a silicon... |
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8692334 |
Resistor integrated with transistor having metal gate
A method of manufacturing a resistor integrated with a transistor having metal gate includes providing a substrate having a transistor region and a resistor region defined thereon, a transistor is... |
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8687668 |
Multi-wavelength semiconductor laser device
A multi-wavelength semiconductor laser device includes a block having a rectangular groove with a bottom face and two side faces extending in a predetermined direction; and laser diodes with... |
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8664741 |
High voltage resistor with pin diode isolation
Provided is a high voltage semiconductor device that includes a PIN diode structure formed in a substrate. The PIN diode includes an intrinsic region located between a first doped well and a... |
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8637936 |
Metal gate transistor with resistor
A resistor is disclosed. The resistor is disposed on a substrate, in which the resistor includes: a dielectric layer disposed on the substrate; a polysilicon structure disposed on the dielectric... |
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8610215 |
Allotropic or morphologic change in silicon induced by electromagnetic radiation for resistance turning of integrated circuits
An electronic device includes a semiconductor substrate and a dielectric layer over the substrate. A resistive link located over the substrate includes a first resistive region and a second... |
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8604589 |
Semiconductor device of polycrystalline silicon resistors
Provided is a method capable of forming a polycrystalline silicon resistor with preferable ratio accuracy so as to design a resistor circuit with high accuracy. In the method, a length of a low... |
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8569142 |
Multi-level thin film capacitor on a ceramic substrate and method of manufacturing the same
In accordance with the teachings described herein, a multi-level thin film capacitor on a ceramic substrate and method of manufacturing the same are provided. The multi-level thin film capacitor... |
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8558608 |
Poly silicon resistor, reference voltage circuit comprising the same, and manufacturing method of poly silicon resistor
The present invention relates to a polysilicon resistor, a reference voltage circuit including the same, and a method for manufacturing the polysilicon resistor. The polysilicon resistor according... |
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8558321 |
Semiconductor device having gate insulating film including high dielectric material
A semiconductor device includes: a first MIS transistor of a first conductivity type having a first active region as a region of a semiconductor substrate surrounded by an element isolation region... |
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8536072 |
Semiconductor process
A semiconductor process is provided, including following steps. A polysilicon layer is formed on a substrate. An asymmetric dual-side heating treatment is performed to the polysilicon layer,... |
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8524556 |
Resistor and manufacturing method thereof
A method of manufacturing a resistor integrated with a transistor having metal gate includes providing a substrate having a transistor region and a resistor region defined thereon, a transistor is... |
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8519467 |
Semiconductor device
According to one embodiment, a semiconductor device includes a first resistance element including a first conductive material, an inter-gate insulation film formed on both ends of the first... |
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8507995 |
Semiconductor memory device
In a static memory cell configured using four MOS transistors and two load resistance elements, the MOS transistors are formed on diffusion layers formed on a substrate. The diffusion layers serve... |
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8486796 |
Thin film resistors and methods of manufacture
A method of forming a semiconductor structure includes: forming a resistor over a substrate; forming at least one first contact in contact with the resistor; and forming at least one second... |
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8482100 |
Resistor array and semiconductor device including the same
A resistor array includes a semiconductor substrate, a plurality of isolation regions, a plurality of dummy active regions and a plurality of unit resistors. The plurality of isolation regions are... |
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8482099 |
Poly-resistor, and linear amplifier
The present invention provides a poly-resistor with an improved linearity. Majority charge carrier wells are provided under the poly-strips and are biased in such way that the non-linearity of the... |
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8445323 |
Semiconductor package with semiconductor core structure and method of forming same
A semiconductor device includes an IPD structure, a first semiconductor die mounted to the IPD structure with a flipchip interconnect, and a plurality of first conductive posts that are disposed... |
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8441076 |
SRAM
An exemplary aspect of the present invention is an SRAM including: a first gate electrode that constitutes a first load transistor; a second gate electrode that extends in a longitudinal direction... |
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8354727 |
Semiconductor device and process for producing the same
A semiconductor device of high reliability and element-integrating performance, has a substrate (silicon substrate), a first trench made in the silicon substrate, a passive element layer buried in... |
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8294216 |
Integrating the formation of I/O and core MOS devices with MOS capacitors and resistors
An integrated circuit structure includes a semiconductor substrate, and a first and a second MOS device. The first MOS device includes a first gate dielectric over the semiconductor substrate,... |
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8242580 |
Semiconductor device
Provided is a method which is capable of producing polycrystalline silicon resistors with a high ratio accuracy so that a precision resistor circuit may be designed. A semiconductor device has a... |
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8227870 |
Method and structure for gate height scaling with high-k/metal gate technology
A method and structure to scale metal gate height in high-k/metal gate transistors. A method includes forming a dummy gate and at least one polysilicon feature, all of which are formed from a same... |