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9039872 Method for producing a transparent and conductive metal oxide layer by highly ionized pulsed magnetron sputtering  
A method for producing a transparent and conductive metal oxide layer on a substrate, includes atomizing at least one component of the metal oxide layer by highly ionized, high power pulsed...
9039944 Sputtering target  
A sputtering target including a sintered body including In, Ga and Mg, the sintered body including one or more compounds selected from a compound represented by In2O3, a compound represented by...
9034152 Reactive sputtering apparatus  
A reactive sputtering apparatus includes a chamber, a substrate holder provided in the chamber, a target holder which is provided in the chamber and configured to hold a target, a deposition...
9034151 Alignment film forming apparatus and method  
An alignment film forming apparatus and a method are provided to form an alignment film for a liquid crystal in a single process of simultaneously executing a film deposition process of ion beam...
9017525 Methods for forming metal fluoride film and for manufacturing optical device  
In a method for forming a metal fluoride film, a metal fluoride film is formed on a substrate by sputtering using a metal target and a mixed gas containing O2 gas and a reactive gas being a...
9017524 Vacuum film formation method for inorganic layer, barrier laminate, device, and optical component  
A vacuum film formation method for forming at least one inorganic layer on a support, which comprise transporting a support of which the area of the surface to be coated with an inorganic layer...
9011649 Thin film deposition method  
The subject of the invention is a process for obtaining a substrate coated on at least part of its surface with at least one film of oxide of a metal M the physical thickness of which is 30 nm or...
9005487 Tablet for ion plating, production method therefor and transparent conductive film  
A tablet for ion plating enables to attain high rate film-formation of a transparent conductive film suitable for a blue LED or a solar cell, and a noduleless film-formation not generating splash,...
9005489 Sputtering target of oxide semiconductors and the manufacturing methods of oxide semiconductor layers  
A technique capable of forming an oxide semiconductor target with a high quality in a low cost is provided. In a step of manufacturing zinc tin oxide (ZTO target) used in manufacturing an oxide...
9005407 Method of fabricating composite field emission source  
A method of fabricating a composite field emission source is provided. A first stage of film-forming process is performed by using RF magnetron sputtering, so as to form a nano structure film on a...
9005491 Photosensitive resin composition for color filter and color filter using the same  
A photosensitive resin composition for a color filter includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1, wherein the...
8992744 Lanthanoid aluminate film fabrication method  
A method of fabricating by co-sputtering deposition a lanthanoid aluminate film with enhanced electrical insulativity owing to suppression of deviation in composition of the film is disclosed....
8992743 Sputtering method and sputtering apparatus  
This invention provides a sputtering method which can generate an electric discharge under practical conditions and maintain the pressure in a plasma space uniform, and a sputtering apparatus used...
8980066 Thin film metal oxynitride semiconductors  
The present invention generally relates to a semiconductor film and a method of depositing the semiconductor film. The semiconductor film comprises oxygen, nitrogen, and one or more elements...
8980446 PVD hybrid method for depositing mixed crystal layers  
The present invention concerns a method for depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods. To provide a method of depositing mixed...
8980065 Method of making coated articles  
A method of making a coated article includes providing a substrate; forming a nickel layer on the substrate by magnetron sputtering; forming a titanium layer on the nickel layer by magnetron...
8968527 Micro-fluid ejection devices, methods for making micro-fluid ejection heads, and micro-fluid ejection head having high resistance thin film heaters  
Micro-fluid ejection devices, methods for making micro-fluid ejection heads, and micro-fluid ejection heads, including a micro-fluid ejection head. One such micro-fluid ejection head has...
8968528 Platinum-modified cathodic arc coating  
A process for coating a part comprises the steps of providing a chamber which is electrically connected as an anode, placing the part to be coated in the chamber, providing a cathode formed from a...
8956512 Magnetron sputtering apparatus and film forming method  
A target is provided opposite to a wafer mounted on in a vacuum chamber, and a magnet array body is disposed above the target. In the magnet array body, ring-shaped magnet arrays are arranged to...
8956510 Coated metallic products and methods for making the same  
The present invention relates generally to methods for producing metallic products comprising a substrate and a metallic, external coating. In preferred embodiments, the metallic products are...
8956513 Substrate processing method  
There is provided a substrate processing method, in which a throughput can be improved even in case the time for recovery processing for restoring the state of a processing chamber is longer than...
8956511 Method for producing a multilayer coating and device for carrying out said method  
A method for reducing the optical loss of the multilayer coating below a predetermined value in a zone by producing coating on a displaceable substrate in a vacuum chamber with the aid of a...
8936703 Methods to fabricate non-metal films on semiconductor substrates using physical vapor deposition  
Embodiments of the invention relate generally to semiconductor device fabrication and processes, and more particularly, to methods for implementing arrangements of magnetic field generators...
8932437 Multi-coated metallic products and methods of making the same  
The present invention relates generally to methods for producing a coated jewelry article or a coated component of a jewelry article, comprising a jewelry article or a component of a jewelry...
8932436 Non-stoichiometric NiOx ceramic target  
The subject of the invention is an essentially ceramic target for a sputtering device, especially for magnetically enhanced sputtering, said target comprising predominantly nickel oxide, the...
8920612 Process for fabrication of a sputter deposited fully dense electrolyte layer embedded in a high performance membrane electrolyte assembly of solid oxide fuel cell  
The innovation process describes the process and results for fabrication of a magnetron sputter deposited fully dense electrolyte layer (8YSZ/GDC/LSGM) embedded in a high performance membrane...
8920684 Al-Sb-Te phase change material used for phase change memory and fabrication method thereof  
The present invention discloses an Al—Sb—Te phase change material used for PCM and fabrication method thereof. Said phase change material, which can be prepared by PVD, CVD, ALD, PLD, EBE, and ED,...
8911867 Protective coating, a coated member having a protective coating as well as method for producing a protective coating  
The invention relates to a protective coating, having the chemical composition CaSibBdNeOgHlMem, wherein Me is at least one metal of the group consisting of {Al, Ti, V, Cr, Zr, Nb, Mo, Hf, Ta, W,...
8911600 Method of storing lanthanum oxide target, and vacuum-sealed lanthanum oxide target  
A method of storing a sputtering target made of lanthanum oxide, wherein a lanthanum oxide target to which a lanthanum fluoride film was formed and lanthanum oxide powder are charged in a vacuum...
8911597 Method of preparing double-layer antimicrobial coating  
A method of a preparing double-layer antimicrobial coating comprises: placing a plastic substrate into a PVD vacuum equipment for a vacuum process; rinsing and activating the substrate when the...
8906206 Vertical-offset coater and methods of use  
The invention provides a coater, and methods of using the coater, for depositing thin films onto generally-opposed major surfaces of a sheet-like substrate. The coater has a substrate transport...
8900420 Catalyst production process  
A process for producing gold-based, heterogeneous catalyst systems comprises depositing fine-nanoscale gold onto a nanoparticulate support medium by physical vapor deposition in an oxidizing...
8900471 In situ plasma clean for removal of residue from pedestal surface without breaking vacuum  
Methods and apparatus for in-situ plasma cleaning of a deposition chamber are provided. In one embodiment a method for plasma cleaning a deposition chamber without breaking vacuum is provided. The...
8900421 Method of fabricating resistance memory  
A method of fabricating a variable resistance layer of a resistance memory is disclosed. The method includes placing a substrate in a sputtering chamber that has a copper target and a silicon...
8894827 Electrochromic tungsten oxide film deposition  
A deposition method for electrochromic WOx films involves cyclic deposition of very thin poisoned and metallic tungsten oxide layers to build up a film with a desired general stoichiometry with x...
8895150 Coated glass surfaces and method for coating a glass substrate  
A substrate having a coating is disclosed. The coating is formed of a plurality of layers. At least one of the layers includes a super alloy and at least two additional layers including silver. A...
8894824 Porous coatings for biomedical implants  
A medical implant has a microscopically rough outer coating that serves to bond the implant to animal tissue. The coating is applied to the implant by physical vapor deposition. The coating...
8888965 Non-stoichiometric titanium nitride films  
The present application relates to a process for the manufacture of transparent, large band gap, high refractive index and high temperature stable, non-stoichiometric titanium nitride thin film...
8882971 Sputtering apparatus and manufacturing method of semiconductor light-emitting element  
A sputtering apparatus (1) includes: a chamber (10) having an inside maintained in a depressurized state to generate plasma discharge (20); a cathode (22) placed in the chamber (10) and holding a...
8871362 Tool with multi-layered metal oxide coating  
The present invention relates to a cutting tool having a base body and a multilayered coating applied thereto, wherein at least two layers of the multilayered coating arranged one on top of the...
8871143 Amalgam method for forming a sputter target useful in the manufacture of thin-film solar photovoltaic cells  
Hardened amalgams formed from copper mixed with liquid gallium or liquid gallium-indium alloys are used to fabricate sputter targets comprised of copper, gallium and indium (CIG) and targets of...
8864954 Sputtering lithium-containing material with multiple targets  
A method of depositing lithium-containing films on a battery substrate in a sputtering chamber is provided. At least one pair of sputtering targets that each comprise a lithium-containing...
8864957 Vanadium oxide thin films  
Thin films of vanadium oxide having exceptionally high metal-insulator transition properties are synthesized by RF sputtering. An Al2O3 substrate is placed in a sputtering chamber and heated to a...
8864956 Multi-component deposition  
Ion-enhanced physical vapor deposition is augmented by sputtering to deposit multi-component materials. The process may be used to deposit coatings and repair material on Ti alloy turbine engine...
8859116 Multi-layer coating  
A multi-layer coating for protection of metals and alloys against oxidation at high temperatures is provided. The invention utilizes a multi-layer ceramic coating on metals or alloys for increased...
8859114 Coating for improved wear resistance  
In one aspect, coated cutting tools are described herein which, in some embodiments, can demonstrate improved wear resistance in one or more cutting applications. In some embodiments, a coated...
8859052 Methods for making environmental barrier coatings and ceramic components having CMAS mitigation capability  
Methods of making components having calcium magnesium aluminosilicate (CMAS) mitigation capability include providing a component, applying an environmental barrier coating to the component, where...
8858666 Tool coating  
A coating for a cutting tool, which includes a plurality of mutually superposed layers, characterized in that the coating has an outer cover layer with a first layer portion of metallic aluminium...
8852682 Process for incremental coating of proppants for hydraulic fracturing and proppants produced therefrom  
A high strength composite particle comprised of a series of incrementally applied resin microlayer coatings such that each of the microlayer partial coatings are interleaved with each other is...
8840763 Methods for stable process in a reactive sputtering process using zinc or doped zinc target  
Embodiments disclosed herein generally relate to a method for seasoning a sputtering target in-situ with a substrate to be processed. New semiconductor compounds containing oxygen, nitrogen, and...