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9040473 Low foam media cleaning detergent with nonionic surfactants  
A detergent for cleaning media is provided. The detergent comprises deionized water, between about 1% and about 5% by weight of a nonionic surfactant having an hydrophile/lipophile balance (HLB)...
9028615 Domestic appliance having a surface which comprises a photocatalyst  
A domestic appliance includes at least one component having a surface that can become laden with organic dirt. The surface includes a photocatalyst and is made from a primary-formed first material...
9028709 Surface treatment composition and surface treatment method using same  
A surface treatment composition of the present invention contains a first surfactant, a second surfactant, a basic compound, and water. The surface treatment composition has a pH of 8 or more. The...
9029267 Controlling temperature of a faraday shield  
A method for controlling thermal cycling of a faraday shield in a plasma process chamber is provided. The method includes: performing a first plasma processing operation on a first wafer in the...
9024233 Side edge cleaning methods and apparatus for thin film photovoltaic devices  
Methods for cleaning a side edge of a thin film photovoltaic substrate utilizing a laser are provided. The method can include transporting the substrate in a machine direction to move the...
9017486 Deposition chamber cleaning method including stressed cleaning layer  
A method for cleaning a deposition chamber includes forming a deposited layer over an interior surface of the deposition chamber, wherein the deposited layer has a deposited layer stress and a...
9017487 Deposition chamber cleaning method including stressed cleaning layer  
A method for cleaning a deposition chamber includes forming a deposited layer over an interior surface of the deposition chamber, wherein the deposited layer has a deposited layer stress and a...
9013046 Protecting integrated circuits from excessive charge accumulation during plasma cleaning of multichip modules  
Internal nodes of a constituent integrated circuit (IC) package of a multichip module (MCM) are protected from excessive charge during plasma cleaning of the MCM. The protected nodes are coupled...
9005367 Resist stripping compositions and methods for manufacturing electrical devices  
A liquid composition comprising (A) at least one polar organic solvent, selected from the group consisting of solvents exhibiting in the presence of from 0.06 to 4% by weight of dissolved...
9006690 Extraction electrode assembly voltage modulation in an ion implantation system  
A method is disclosed for reducing particle contamination in an ion implantation system, wherein an ion beam is created via the ion source operating in conjunction with an extraction electrode...
9005366 In-situ reactor cleaning in high productivity combinatorial system  
The present invention discloses a cleaning process, utilizing a gas flow to an interior of a hollow object in a fluid ambient. After capping the object to seal off the interior volume, gas is...
8999069 Method for producing cleaning water for an electronic material  
A method for producing cleaning water for an electronic material, includes obtaining oxygen gas and argon gas from air with a PSA oxygen concentration apparatus, dissolving the oxygen gas and...
8999068 Chamber cleaning method  
Provided is a chamber cleaning method capable of efficiently removing a CF-based shoulder deposit containing Si and Al deposited on an outer periphery of an ESC. A mixed gas of an O2 gas and a F...
8992689 Method for removing halogen-containing residues from substrate  
Methods for removing halogen-containing residues from a substrate are provided. By combining the heat-up and plasma abatement steps, the manufacturing throughput can be improved. Further, by...
8986460 Apparatus and method for indirect surface cleaning  
Methods for cleaning a surface of a photomask and for increasing the useable lifetime of the photomask are disclosed. One method includes, a first wafer print processing using a photomask and a...
8980010 Dust removing device and dust removing method  
In a piezoelectric device, a first electrode and a second electrode are disposed to be opposed to each other on plate surfaces of the piezoelectric device, a first electrode plane of the...
8981251 Plasma source with integral blade and method for removing materials from substrates  
An atmospheric pressure plasma source includes a body including a distal end, a blade extending from the distal end and terminating at a blade edge, a plasma-generating unit, and a plasma outlet...
8980009 Method for removing a contamination layer from an optical surface and arrangement therefor  
The invention is directed to a method for at least partially removing a contamination layer (15) from an optical surface (14a) of an EUV-reflective optical element (14) by bringing a cleaning gas...
8980812 Treatment liquid for inhibiting pattern collapse in microstructures, and microstructure manufacturing method using said treatment liquid  
There are provided a processing liquid for suppressing pattern collapse of a microstructure which includes at least one compound selected from the group consisting of an imidazolium halide...
8974602 Method of reducing contamination in CVD chamber  
The present invention discloses a method of reducing contamination in a CVD chamber. The method comprises cleaning the CVD chamber with first cleaning gases containing NF3; removing the particles...
8969209 Method for removing oxide  
A method for removing oxide is described. A substrate is provided, including an exposed portion whereon a native oxide layer has been formed. A removing oxide process is performed to the substrate...
8969285 Phosphate functionalized alkyl polyglucosides used for enhanced food soil removal  
A method of removing food soil using a cleaning composition including a C12 phosphate functionalized alkyl polyglucoside, a water conditioning agent and water. In one embodiment, the cleaning...
8961694 Plasma generator and method for cleaning an object  
The invention relates to a plasma generator (1) for cleaning an object. The plasma generator (1) comprises a plasma chamber (2) and a support structure (6) arranged in the plasma chamber for...
8960208 Ultrasonic cleaning device  
An ultrasonic cleaning device includes an ultrasonic transducer (13) for providing ultrasonic energy to a propagation liquid (15), an ultrasonic propagation tube (12) for flowing the propagation...
8956884 Process for reconditioning semiconductor surface to facilitate bonding  
A non-abrading method to facilitate bonding of semiconductor components, such as silicon wafers, that have micro structural defects in a bonding interface surface. In a preferred method, micro...
8957006 Cleaning solution comprising an ether acetate for preventing pattern collapse  
A chemical solution for use in cleaning a patterned substrate includes water, from approximate 0.01 to 99.98 percent by weight; hydrogen peroxide, from 0 to 30 percent by weight; a pH buffering...
8957564 Microelectromechanical system megasonic transducer  
Megasonic cleaning systems and methods of fabricating and using the same are provided. In one embodiment, the system comprises a plurality of Micro-Electromechanical System (MEMS) transducers,...
8956461 Apparatuses, systems and methods for rapid cleaning of plasma confinement rings with minimal erosion of other chamber parts  
An apparatus used for rapid removal of polymer films from plasma confinement rings while minimizing erosion of other plasma etch chamber components is disclosed. The apparatus includes a center...
8957005 Silicon wafer cleaning agent  
A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed...
8951354 Megasonic cleaning with controlled boundary layer thickness and associated systems and methods  
Megasonic cleaning systems and methods of using megasonic pressure waves to impart cavitation energy proximate a surface of a microelectronic substrate are disclosed herein. In one embodiment, a...
8951950 Aluminum post-etch residue removal with simultaneous surface passivation  
Al post-etch residue removal composition doped with an alkanoic acid of the formula R—COOH, where R can be a linear or branched alkyl group in the form of CnH2n+1, where n is from 4 to 19,...
8945412 Substrate cleaning apparatus, substrate cleaning method, and substrate processing apparatus  
A substrate cleaning apparatus is capable of cleaning an entire periphery of a substrate end portion at a time by simple control without polishing the end portion and without generating plasma....
8945311 Method for cleansing glass substrate of TFT-LCD  
The present invention provides a method for cleansing a glass substrate of a TFT-LCD, includes the following steps: providing an ultrasonic cleansing machine, a glass substrate in-feeding...
8945310 Method and device for cleaning at least one optical component  
A method of cleaning at least one optical component of at least one irradiation device having at least one radiation source in a vacuum chamber. The source generates in particular extreme...
8940098 Method for distributing gas for a bevel etcher  
A plasma etch processing chamber configured to clean a bevel edge of a substrate is provided. The chamber includes a bottom edge electrode and a top edge electrode defined over the bottom edge...
8932406 In-situ generation of the molecular etcher carbonyl fluoride or any of its variants and its use  
The molecular etcher carbonyl fluoride (COF2) or any of its variants, are provided for, according to the present invention, to increase the efficiency of etching and/or cleaning and/or removal of...
8926757 Plasma process and reactor for treating metallic pieces  
The plasma reactor defines a reaction chamber provided with a support for the metallic pieces and an anode-cathode system, and a heating means is mounted externally to said plasma reactor. The...
8926758 Composition and method for removing photoresist and bottom anti-reflective coating for a semiconductor substrate  
A composition for removing photoresist and bottom anti-reflective coating from a semiconductor substrate is disclosed. The composition may comprise a nontoxic solvent, the nontoxic solvent having...
8926762 Apparatus and methods for movable megasonic wafer probe  
Methods and apparatus for a movable megasonic wafer probe. A method is disclosed including positioning a movable probe on a wafer surface, the movable probe having an open bottom portion that...
8927476 Aqueous alkaline cleaning compositions and methods of their use  
Aqueous alkaline composition free from organic solvents and metal ion-free silicates, the said compositions comprising (A) a thioamino acid having at least one primary amino group and at least one...
8921807 In situ cleaning device for lithographic apparatus  
A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to...
8921296 Post deposition wafer cleaning formulation  
Methods and systems for cleaning corrosion product of a metallic capping layer from the surface of a substrate are provided. According to one embodiment, a treatment solution includes a...
8920567 Post metal chemical-mechanical planarization cleaning process  
A post metal chemical-mechanical planarization (CMP) cleaning process for advanced interconnect technology is provided. The process, which follows CMP, combines an acidic clean and a basic clean...
8916056 Biasing system for a plasma processing apparatus  
A plasma processing apparatus includes a process chamber housing defining a process chamber, a platen positioned in the process chamber for supporting a workpiece, a source configured to generate...
8911559 Method to pre-heat and stabilize etching chamber condition and improve mean time between cleaning  
A method for cleaning an etching chamber is disclosed. The method comprises providing an etching chamber; introducing a first gas comprising an inert gas into the etching chamber for a first...
8911558 Post-tungsten CMP cleaning solution and method of using the same  
A post-W CMP cleaning solution consists of carboxylic acid and deionized water. The carboxylic acid may be selected from the group consisting of (1) monocarboxylic acids; (2) dicarboxylic acids;...
8912134 Method of cleaning copper material surfaces in ultra large scale integrated circuits after polishing the same  
A method of cleaning copper material surfaces in ultra large scale integrated circuits after polishing, the method including: a) mixing and stirring between 1 and 4 wt. % of a surfactant, between...
8906164 Methods for stabilizing contact surfaces of electrostatic chucks  
Methods for stabilizing a ceramic contact surface of an electrostatic chuck, wherein the electrostatic chuck can be disposed within a reaction chamber of a semiconductor wafer processing assembly...
8906838 Microelectronic cleaning and arc remover compositions  
Cleaning compositions suitable for cleaning microelectronic structures having silicon dioxide, low-k or high-k di-electrics and copper or aluminum metallizations contain a polar organic solvent...
8906163 Methods and apparatus for integrating and controlling a plasma processing system  
A method of operating one or more back end circuits of a plasma processing system, comprising: prior to a front end module receiving one or more wafers to be processed, receiving preliminary data...