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9032906 |
Apparatus and process for plasma-enhanced atomic layer deposition
Embodiments of the invention provide an apparatus configured to form a material during an atomic layer deposition (ALD) process, such as a plasma-enhanced ALD (PE-ALD) process. In one embodiment,... |
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9032905 |
Apparatus and method for coating glass substrate
An apparatus and method for coating a substrate using one or more liquid raw materials, includes: at least one atomizer for atomizing the one or more liquid raw materials into droplets, charging... |
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9029728 |
Methods of and apparatuses for measuring electrical parameters of a plasma process
A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one... |
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9021984 |
Plasma processing apparatus and semiconductor device manufacturing method
A plasma processing apparatus includes a processing chamber; a lower electrode provided in the processing chamber and having a base made of a conductive metal to which a high frequency power is... |
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8997687 |
Apparatus and method for plasma arc coating
A system for coating a side surface of a moving substrate. The system includes an array of plasma sources, a first plurality of orifices located upstream of the array and a second plurality of... |
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8997688 |
Ion implant system having grid assembly
An ion implantation system having a grid assembly. The system includes a plasma source configured to provide plasma in a plasma region; a first grid plate having a plurality of apertures... |
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8991331 |
Integrated steerability array arrangement for minimizing non-uniformity and methods thereof
A method for providing steerability in a plasma processing environment during substrate processing is provided. The method includes managing, power distribution by controlling power being... |
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8986495 |
Plasma processing apparatus
A plasma processing apparatus includes an upper electrode that is installed within a processing chamber so as to face a lower electrode, supplies a gas through a plurality of gas supply holes... |
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8986794 |
Vapor deposition apparatus and method of manufacturing organic light-emitting display apparatus
A vapor deposition apparatus efficiently performs a deposition process to form a thin film with improved characteristics on a substrate, and a method manufactures an organic light-emitting display... |
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8986564 |
Apparatus and methods for handling workpieces in a processing system
Apparatus and methods for handling workpieces in a processing system. The workpiece vertical lift mechanism (200), which is disposed inside a process chamber (40) of the processing system, is... |
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8980046 |
Semiconductor processing system with source for decoupled ion and radical control
A top plate assembly is positioned above and spaced apart from the substrate support, such that a processing region exists between the top plate assembly and the substrate support. The top plate... |
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8973527 |
Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatus
A plasma processing apparatus is provided with a first exhaust path which extends downward from an exhaust hole; a second exhaust path which is connected to a downstream end portion of the first... |
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8967076 |
Hydrothermal synthesis of active materials and in situ spraying deposition for lithium ion battery
A method and apparatus for forming an electrochemical layer of a lithium ion battery is provided. A precursor mixture in a carrying medium is activated in a reactor chamber by application of... |
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8968514 |
Gas distributing device and substrate processing apparatus including the same
A gas distribution device for a substrate treating apparatus includes a plurality of plasma source electrodes having a first side surface; a plurality of plasma ground electrodes having a second... |
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8963052 |
Method for controlling spatial temperature distribution across a semiconductor wafer
A chuck for a plasma processor comprises a temperature-controlled base, a thermal insulator, a flat support, and a heater. The temperature-controlled base is controlled in operation a temperature... |
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8961711 |
Method and apparatus for nitriding metal articles
A method and apparatus for nitriding of highly-alloyed metal article is disclosed herein. In one embodiment, the method and apparatus uses at least one nitrogen source gas such as nitrogen and/or... |
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8961688 |
Method and device for plasma treating workpieces
Disclosed are a method and a device for plasma treating workpieces (5). Said workpiece is inserted into a chamber (7) of a treatment station (3), which can be at least partly evacuated, and is... |
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8960124 |
Plasma processing apparatus and plasma processing method
Provided are a plasma processing apparatus and a plasma processing method wherein particles generated due to the inner potential of an inner cylinder disposed inside of a vacuum container are... |
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8940646 |
Sequential precursor dosing in an ALD multi-station/batch reactor
Disclosed herein are methods of depositing layers of material on multiple semiconductor substrates at multiple processing stations within one or more reaction chambers. The methods may include... |
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8940128 |
Plasma processing apparatus
The invention aims at suppressing the self bias generated at the surface of the inner wall of the vacuum processing chamber, to thereby suppress the chipping of the inner wall surface of the... |
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8935990 |
Low contamination components for semiconductor processing apparatus and methods for making components
Components of semiconductor processing apparatus axe formed at least partially of erosion, corrosion and/or corrosion-erosion resistant ceramic materials. Exemplary ceramic materials can include... |
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8932430 |
RF coupled plasma abatement system comprising an integrated power oscillator
The present disclosure is directed towards a method and apparatus for generating an abatement plasma downstream of a processing chamber using an RF plasma ignited and sustained with an integrated... |
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8932896 |
Solar cell manufacturing apparatus and solar cell manufacturing method
The solar cell manufacturing apparatus includes: a load lock chamber configured to allow loading and unloading of a substrate by switching between atmospheric ambient and vacuum ambient; a... |
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8919279 |
Processing system having magnet keeper
A processing system for and a method of producing ions inside a process chamber and shielding the ions from a magnetic field by directing the magnetic field through a magnet keeper is described. |
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8915999 |
Shower plate sintered integrally with gas release hole member and method for manufacturing the same
A shower plate is disposed in a processing chamber in a plasma processing apparatus, and plasma excitation gas is released into the processing chamber so as to generate plasma. A ceramic member... |
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8910590 |
Plasma deposition
An apparatus for depositing a group III metal nitride film on a substrate, the apparatus comprising a plasma generator to generate a nitrogen plasma from a nitrogen source, a reaction chamber in... |
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8911588 |
Methods and apparatus for selectively modifying RF current paths in a plasma processing system
Methods and apparatus for modifying RF current path lengths are disclosed. Apparatus includes a plasma processing system having an RF power supply and a lower electrode having a conductive... |
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8904956 |
Plasma stamp, plasma treatment device, method for plasma treatment and method for producing a plasma stamp
The invention relates to a plasma stamp, with which surfaces can be subjected to a plasma treatment. In addition, the invention relates to a plasma treatment device, with which surfaces can be... |
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8896210 |
Plasma processing apparatus and method
A plasma processing apparatus includes a processing chamber; a lower electrode serving as a mounting table for mounting thereon a target object; and an upper electrode or an antenna electrode... |
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8889534 |
Solid state source introduction of dopants and additives for a plasma doping process
A method of doping a non-planar surface or a surface of a substrate subject to poor view factors is provided. The processing chamber comprises a window, walls, and a bottom of the processing... |
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8884526 |
Coherent multiple side electromagnets
In some embodiments, the present disclosure relates to a plasma processing system that generates a magnetic field having a maximum strength that is independent of workpiece size. The plasma... |
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8875656 |
Substrate processing apparatus
A substrate processing apparatus includes a processing chamber in which a substrate is mounted, a gas supply unit that supplies processing gas into the processing chamber, a gas exhaust unit that... |
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8877301 |
Plasma processing including asymmetrically grounding a susceptor
An asymmetrically grounded susceptor used in a plasma processing chamber for chemical vapor deposition onto large rectangular panels supported on and grounded by the susceptor. A plurality of... |
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8877004 |
Plasma processing apparatus and plasma processing method
A dielectric plate 20 is provided at a ceiling surface facing a susceptor 3 of a processing chamber 2, and a slot antenna 30 having a multiple number of microwave transmissive slots 33 is provided... |
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8869742 |
Plasma processing chamber with dual axial gas injection and exhaust
An electrode is exposed to a plasma generation volume and is defined to transmit radiofrequency power to the plasma generation volume, and includes an upper surface for holding a substrate in... |
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8869741 |
Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber
A plasma processing system having a plasma processing chamber configured for processing a substrate is provided. The plasma processing system includes at least an upper electrode and a lower... |
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8857372 |
Method of fabricating optical fiber using an isothermal, low pressure plasma deposition technique
An isothermal, low pressure-based process of depositing material within a substrate has been developed and results in creating an extremely narrow reaction zone within which a more uniform and... |
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8858753 |
Focus ring heating method, plasma etching apparatus, and plasma etching method
There are provided a method of heating a focus ring and a plasma etching apparatus, capable of simplifying a structure of a heating mechanism without a dummy substrate. The plasma etching... |
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8857371 |
Apparatus for generating dielectric barrier discharge gas
An apparatus for generating a dielectric-barrier discharge gas including a high-energy radical gas, at a high density and with high efficiency. A flat-plate-like first electrode and a... |
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8845806 |
Shower plate having different aperture dimensions and/or distributions
A shower plate is adapted to be attached to the showerhead and includes a front surface adapted to face the susceptor; and a rear surface opposite to the front surface. The shower plate has... |
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8840725 |
Chamber with uniform flow and plasma distribution
Embodiments of the present invention provide a recursive liner system that facilitates providing more uniform flow of gases proximate the surface of a substrate disposed within an apparatus for... |
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8833299 |
Divided annular rib type plasma processing apparatus
A plasma stream-derived deposited matter formed on an annular rib for droplet capture in a plasma processing apparatus is prevented from falling into a plasma generation portion and causing a... |
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8826856 |
Optical thin-film vapor deposition apparatus and optical thin-film production method
An optical thin-film vapor deposition apparatus and method are capable of producing an optical thin-film by vapor depositing a vapor deposition substance onto substrates (14) within a vacuum... |
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8828498 |
Method of coating a surface with a water and oil repellant polymer layer
The invention provides a method of coating a surface with a water and oil repellant polymer layer. The method comprises the steps of providing a substrate with a surface, exposing the surface to a... |
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8826854 |
Direct-current plasma CVD apparatus and method for producing diamond using the same
The present invention is a direct-current plasma CVD apparatus comprising at least a fixed electrode and a substrate stage having a top flat face and combined with an electrode for placing a... |
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8826853 |
Apparatus for PECVD deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device
An apparatus (1) for PECVD deposition of a thin layer of a barrier-effect material in a receptacle (3), the apparatus comprising: a structure (5) receiving the receptacle (3), said structure (5)... |
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8829770 |
Electrode cooling system in a multi-electrode microwave plasma excitation source
The excitation source consists of at least three identical electrodes arranged symmetrically in relation to the axis of the central tube, which supplies an analytical sample, and electrode cooling... |
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8826857 |
Plasma processing assemblies including hinge assemblies
In one embodiment, a plasma processing assembly may include an upper process body coupled to a hinge body and a lower process body coupled to a base hinge member. The hinge body can be pivotally... |
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8821683 |
Substrate processing apparatus and method, and program and storage medium
A substrate processing apparatus includes a plasma source facing a substrate, and a shielding member placed between the substrate and the plasma source. The plasma source diffuses a plasma... |
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8822913 |
Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions
An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species... |