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US20150000209 ABRASIVE ARTICLE INCLUDING SHAPED ABRASIVE PARTICLES  
A shaped abrasive particle having a major surface-to-side surface grinding orientation percent difference (MSGPD) of not greater than about 35%.
US20120094579 Coated Abrasive Products Containing Aggregates  
A coated abrasive product includes a particulate material containing green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition...
US20150291867 ABRASIVE ARTICLE INCLUDING SHAPED ABRASIVE PARTICLES  
A shaped abrasive particle including a body comprising a first major surface, a second major surface, and a side surface extending between the first major surface and the second major surface, the...
US20150072601 Superabrasive tools having substantially leveled particle tips and associated methods  
Superabrasive tools and methods for making and using the same are provided. In one aspect, for example, a CMP pad dresser includes a first monolayer of superabrasive particles disposed on and...
US20120144754 DISH-SHAPED ABRASIVE PARTICLES WITH A RECESSED SURFACE  
Abrasive particles comprising dish-shaped abrasive particles each having a sidewall; each of the shaped abrasive particles comprising alpha alumina and having a first face and a second face...
US20120060426 Conditioning Tools and Techniques for Chemical Mechanical Planarization  
Tools for conditioning chemical mechanical planarization (CMP) pads comprise a substrate with abrasive particles coupled to at least one surface. The tools can have various particle and bond...
US20070175104 Polishing slurry for silicon oxide, additive liquid and polishing method  
The polishing slurry of the invention is a polishing slurry for polishing a silicon oxide film on polysilicon, which contains an abrasive, polysilicon polishing inhibitor, and water. As the...
US20050279030 CMP formulations  
CMP formulations for use on nickel/phosphorus alloys comprising abrasive particles and an oxidant, a modifier for the action of the oxidant and first and second accelerants to sequester removed...
US20080271384 CONDITIONING TOOLS AND TECHNIQUES FOR CHEMICAL MECHANICAL PLANARIZATION  
Tools for conditioning chemical mechanical planarization (CMP) pads comprise a substrate with abrasive particles coupled to at least one surface. The tools can have various particle and bond...
US20060118524 CERIUM OXIDE ABRASIVE AND METHOD OF POLISHING SUBSTRATES  
A cerium oxide abrasive slurry having, dispersed in a medium, cerium oxide particles whose primary particles have a median diameter of from 30 nm to 250 nm, a maximum particle diameter of 600 nm...
US20150068130 ABRASIVE ARTICLE INCLUDING SHAPED ABRASIVE PARTICLES  
A shaped abrasive particle having a major surface-to-side surface grinding orientation percent difference (MSGPD) of at least about 40%.
US20150021101 POLYCRYSTALLINE DIAMOND MATERIALS HAVING IMPROVED ABRASION RESISTANCE, THERMAL STABILITY AND IMPACT RESISTANCE  
PCD materials comprise a diamond body having bonded diamond crystals and interstitial regions disposed among the crystals. The diamond body is formed from diamond grains and a catalyst material at...
US20130316629 CMP PAD DRESSER WITH ORIENTED PARTICLES AND ASSOCIATED METHODS  
CMP pad dressers with superabrasive particles oriented into an attitude that controls CMP pad performance, and methods associated therewith are disclosed and described. The controlled CMP pad...
US20120192499 Brazed Diamond Tools and Methods for Making the Same  
Superabrasive tools and methods for the making thereof are disclosed and described. In one aspect, superabrasive particles are chemically bonded to a matrix support material according to a...
US20050208883 Polishing composition  
The present invention relates to a polishing composition containing an aqueous medium and silica particles, wherein the silica particles in the polishing composition has a zeta potential of from...
US20160263726 ABRASIVE ARTICLE AND METHOD OF FORMING  
An abrasive article including a substrate made of a wire, abrasive particles affixed to the substrate, the abrasive particles having a first coating layer overlying the abrasive particles, and a...
US20150052821 ABRASIVE SLICING TOOL FOR ELECTRONICS INDUSTRY  
A bond matrix for metal bonded abrasive tools includes a metal bond system, porosity and an optional filler. Tools according to embodiments of the invention exhibit long tool life, produce an...
US20110042149 METHODS OF FORMING POLYCRYSTALLINE DIAMOND ELEMENTS, POLYCRYSTALLINE DIAMOND ELEMENTS, AND EARTH-BORING TOOLS CARRYING SUCH POLYCRYSTALLINE DIAMOND ELEMENTS  
Methods of forming polycrystalline diamond elements include forming a polycrystalline diamond element. A Group VIII metal or alloy catalyst is employed to form the polycrystalline diamond compact...
US20090224370 NON-PLANAR CVD DIAMOND-COATED CMP PAD CONDITIONER AND METHOD FOR MANUFACTURING  
The present invention relates to a composite material having non-planar geometries and edge-shaving surfaces comprising a CVD diamond coating applied to a composite substrate made from a ceramic...
US20050097824 Backing and abrasive product made with the backing and method of making and using the backing and abrasive product  
The invention provides a backing for an abrasive article comprising a sheet-like polymeric substrate having a first major surface including a pattern of non-abrasive raised areas and depressed...
US20050076577 Abrasive tools made with a self-avoiding abrasive grain array  
Abrasive tools contain abrasive grains oriented in an array according to a non-uniform pattern having an exclusionary zone around each abrasive grain, and the exclusionary zone has a minimum...
US20050060941 Abrasive article and methods of making the same  
An abrasive article and methods of making the same are disclosed. The abrasive article includes a backing and an array of features on the backing. Each feature includes a base and a body. The body...
US20110223840 Polishing Composition and Polishing Method Using The Same  
A polishing composition contains at least abrasive grains and water and is used in polishing an object to be polished formed of a substrate material for optical devices, a substrate material for...
US20070218811 CMP POLISHING SLURRY AND METHOD OF POLISHING SUBSTRATE  
A CMP polishing slurry of the present invention, contains cerium oxide particles, a dispersant, a polycarboxylic acid, a strong acid having a pKa of its first dissociable acidic group at 3.2 or...
US20070017160 Composite materials and method for making same  
Certain non-limiting embodiments of the present disclosure comprise a family of composite materials targeting specific applications through a materials design approach involving; 1) a hard...
US20060049143 Polishing composition and polishing method using the same  
A polishing composition includes an abrasive, at least one compound of azoles and derivatives thereof, and water. The polishing composition is used in applications for polishing surfaces of...
US20050284029 Aluminum and zirconium oxynitride abrasive grains  
Corundum-zirconia abrasive grains containing more than 50 wt % of an alumina-zirconia eutectic mixture. The grains contain 0.3 to 3% nitrogen, and more than 75% of the zirconia crystals are cubic...
US20050022456 Polishing slurry and method for chemical-mechanical polishing of copper  
The claimed invention involves a novel aqueous polishing slurry for chemical-mechanical polishing that is effective for polishing copper at high polish rates. The aqueous slurry according to the...
US20120097456 EARTH-BORING TOOLS AND COMPONENTS THEREOF INCLUDING MATERIAL HAVING PRECIPITATE PHASE  
The present invention relates to compositions for forming at least a portion of an earth-boring rotary drill bit. The rotary drill bit may comprise a cemented transition metal carbide composition...
US20060030243 Polishing composition  
A polishing composition containing an abrasive and water, wherein the polishing composition has a pH of from 0.1 to 7, and satisfies the following conditions: (1) that the number of polishing...
US20140250798 THERMALLY STABLE POLYCRYSTALLINE ULTRA-HARD CONSTRUCTIONS  
Thermally stable polycrystalline constructions include a body having a polycrystalline ultra-hard phase and a plurality of empty voids. The construction includes a backside support member over at...
US20130125475 TUNGSTEN RHENIUM COMPOUNDS AND COMPOSITES AND METHODS FOR FORMING THE SAME  
The present invention relates to tungsten rhenium compounds and composites and to methods of forming the same. Tungsten and rhenium powders are mixed together and sintered at high temperature and...
US20080028686 Polycrystalline grits and associated methods  
Polycrystalline grits and methods of making grits which allow for a high degree of shape and size distribution control, as well as improved abrasive performance are described and disclosed. In one...
US20070020457 Composite particle comprising an abrasive grit  
Composite particle having an abrasive grit with a ceramic material thereon. Composite particles can be incorporated, for example, into a variety of abrasive articles.
US20060252355 Polishing tape and method  
An edge part of a disk-shaped workpiece is polished by pressing a polishing tape and causing a pad or a contact roller to undergo a reciprocating motion intermittently or continuously along the...
US20140069022 METHODS OF FABRICATING POLYCRYSTALLINE DIAMOND COMPACTS  
Embodiments relate to methods of manufacturing polycrystalline diamond compacts (“PDCs”). In an embodiment, a method of fabricating a PDC includes positioning a plurality of diamond particles...
US20120042576 CUBIC BORON NITRIDE COMPACT  
A CBN compact which contains CBN and a matrix phase, wherein the CBN grain size volume frequency distribution has a distribution spread expressed as d90-d10 of 1 micron or greater, and the d90...
US20050132660 Polishing composition  
A polishing composition containing an α-alumina, an intermediate alumina, an oxidizing agent and water; a method for reducing waviness of a substrate to be polished, including the step of applying...
US20050003746 Polishing composition  
A polishing composition containing an α-alumina, an intermediate alumina, an oxidizing agent and water; a method for reducing waviness of a substrate to be polished, including the step of applying...
US20140283457 METHOD OF FORMING A THERMALLY STABLE DIAMOND CUTTING ELEMENT  
A method for forming a diamond body includes placing a thermally stable polycrystalline diamond body and a first substrate into an enclosure, the thermally stable polycrystalline diamond body...
US20110061944 POLYCRYSTALLINE DIAMOND COMPOSITE COMPACT  
A polycrystalline diamond (PCD) composite compact element comprising a PCD structure bonded to a cemented carbide substrate, in which at least a peripheral region of the substrate comprises...
US20070021040 Polishing composition and polishing method  
A first polishing composition includes abrasive grains and an iodine compound and has a pH of 6 or more. The first polishing composition can suitably polish the Si [0001] plane of a single crystal...
US20060242910 Abrasive article having reaction activated chromophore  
An abrasive article has a layer including an epoxy constituent, a cationic photointiator within the epoxy constituent, and a latent colorant configured to change color in response to activation of...
US20050119398 Plasma synthesis of metal oxide nanoparticles  
A process for minimizing and even eliminating over-sized particles in a vapor phase synthesis of metal oxide-containing particles comprising reacting oxygen with one of more vapor streams...
US20050050803 Polishing fluid and polishing method  
The present invention relates to polishing slurry and polishing method used for polishing in a process for forming wirings of a semiconductor device, and the like. There are provided polishing...
US20170066069 ABRASIVE ARTICLE AND METHOD OF FORMING  
An abrasive article including a substrate having an elongated body, a tacking layer overlying the substrate, a first type of abrasive particle overlying the tacking layer, a second type of...
US20140291037 DIAMOND BONDED CONSTRUCTION WITH IMPROVED BRAZE JOINT  
Diamond bonded constructions comprise a body comprising a plurality of bonded together diamond grains with interstitial regions disposed between the grains that are substantially free of the...
US20100248593 POLISHING SLURRY, PROCESS FOR PRODUCING THE SAME, POLISHING METHOD AND PROCESS FOR PRODUCING GLASS SUBSTRATE FOR MAGNETIC DISK  
The present invention provides a process for producing a polishing slurry, which achieves high-speed polishing of a principal plane of a glass substrate even when ceria crystal fine particles or...
US20100012389 METHODS OF FORMING POLYCRYSTALLINE DIAMOND CUTTERS  
A method for forming a cutting element that includes forming at least one cavity in at least one surface of a polycrystalline abrasive body; placing the polycrystalline abrasive body adjacent a...
US20090120009 Polycrystalline Grits and Associated Methods  
A method for forming polycrystalline grits can include forming an abrasive dough, including a plurality of abrasive particles, into a sheet. The sheet can be divided into a plurality of abrasive...
Matches 1 - 50 out of 361 1 2 3 4 5 6 7 8 >