Matches 1 - 50 out of 254 1 2 3 4 5 6 >


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US20120233929 METHOD OF INHIBITING WATER ADSORPTION OF POWDER BY ADDITION OF HYDROPHOBIC NANAOPARTICLES  
Presently described are methods of inhibiting water vapor adsorption of a powder and methods of storing a powder at increased humidity level. The methods comprise providing adding discrete...
US20140335762 POLISHING COMPOSITION, AND POLISHING METHOD AND SUBSTRATE PRODUCTION METHOD USING SAME  
A polishing composition of the present invention contains abrasive grains each having a surface with protrusions. Parts of the abrasive grains have larger particle diameters than the volume-based...
US20110053478 FUSED AND COATED SILICA GRAINS  
The present invention provides a coated grain comprising a fused base grain at least partially covered with a coating comprising silica, the base grain comprising more than 40% of alumina as a...
US20120042575 CMP SLURRY RECYCLING SYSTEM AND METHODS  
The present invention provides a system and method for recycling an abrasive chemical mechanical polishing (CMP) slurry after polishing substrates therewith. The method comprises circulating the...
US20150068817 THERMALLY STABLE POLYCRYSTALLINE DIAMOND AND METHODS OF MAKING THE SAME  
A method of making a cutting element includes subjecting a mixture of diamond particles and a carbonate material to high-pressure high-temperature sintering conditions to form a sintered...
US20120252321 METHOD OF ELECTROSTATIC DEPOSITION OF PARTICLES, ABRASIVE GRAIN AND ARTICLES  
Presently described are methods of making an article via electrostatic deposition of particles, abrasive grains and articles, as well as a method of repairing a painted surface. The abrasive grain...
US20130283704 METHOD FOR PRODUCING POLISHING LIQUID COMPOSITION  
Provided is a method for producing a polishing composition capable of reducing scratches and particles of an object to be polished, after polishing. It is a method for producing a polishing...
US20130219800 Methods for Producing a Coated Abrasive Article for Polishing or Lapping Applications  
Methods are provided for forming an abrasive coating on a surface of a backing. An abrasive slurry includes a continuous phase, a first discontinuous phase of abrasive particles dispersed in the...
US20110209412 METHOD OF MAKING POLISHING PAD ASSEMBLY WITH GLASS OR CRYSTALLINE WINDOW  
Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first...
US20130205682 POLISHING COMPOSITION  
A polishing composition contains colloidal silica. The colloidal silica satisfies the expression A×D×E×F≧350,000 where “A” denotes the average aspect ratio (dimensionless) of the colloidal silica,...
US20130333299 ABRASIVE RECOVERY METHOD AND ABRASIVE RECOVERY DEVICE  
There is provided an abrasive recovery device and an abrasive recovery method capable of recovering a slurry which is condensed until a concentration of its abrasive becomes high while suppressing...
US20150052824 AGGLOMERATE ABRASIVE GRAIN COMPRISING INCORPORATED HOLLOW MICROSPHERES  
An agglomerate abrasive grain includes a mixture of individual abrasive grains and hollow bodies, wherein the abrasive grains and the hollow bodies are held together via a binding matrix of...
US20150225248 METHOD FOR PRODUCING PURIFIED ALKALI SILICATE AQUEOUS SOLUTION AND SILICA SOL  
To provide a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol...
US20130055646 Method for producing purified alkali silicate aqueous solution and silica sol  
To provide a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol...
US20110232198 BACKINGLESS ABRASIVE ARTICLE  
An abrasive article includes an abrasive layer having an array of protrusions. The abrasive layer has a thickness not greater than about 500 mils. The abrasive article is free of a backing layer.
US20150101257 ABRASIVE MATERIAL FOR SHOT BLASTING, AND METHOD FOR PRODUCING SAME  
The abrasive material contains Fe, Si, Ca, Al, Mg and Mn and has an amorphous continuous phase, wherein the total amount of Fe, Si and Ca is 50.0% or more by mass in terms of the total content of...
US20150078985 TiO2 BASED SCRUBBING GRANULES, AND METHODS OF MAKING AND USING SUCH TiO2 BASED SCRUBBING GRANULES  
TiO2 based scrubbing granules, and methods of making and using such TiO2 based scrubbing granules are described. TiO2-based scrubbing granules include granulated TiO2 and about 0.5% to about 20%...
US20130283703 TiO2 BASED SCRUBBING GRANULES, AND METHODS OF MAKING AND USING SUCH TiO2 BASED SCRUBBING GRANULES  
TiO2 based scrubbing granules, and methods of making and using such TiO2 based scrubbing granules are described. TiO2-based scrubbing granules include granulated TiO2 and about 0.5% to about 20%...
US20140302753 POLISHING COMPOSITION  
A polishing composition containing at least water and silica and satisfying all of the following conditions (a) through (d) is provided. Condition (a) The specific surface area of the silica...
US20080206576 Superabrasive compact including diamond-silicon carbide composite, methods of fabrication thereof, and applications therefor  
Embodiments of the present invention relate to diamond-silicon carbide composites, superabrasive compacts including such diamond-silicon carbide composites, and methods of fabricating such...
US20120322351 SANDPAPER WITH FIBROUS NON-SLIP LAYER  
A sheet of sandpaper includes a backing layer having opposed first and second major sides, an adhesive make coat on the second major side, abrasive particles at least partially embedded in the...
US20120186161 MOLTEN GRAINS OF ALUMINA-ZIRCONIA  
The invention relates to a fused grit having the following chemical analysis, in wt %: ZrO2+HfO2: 38.0-46.0%; Al2O3: the remainder up to 100%; SiO2: 0.20-0.60%; Y2O3: 0.45 to 0.70%; TiO2: 1.00 to...
US20120028544 FUSED ALUMINA/ZIRCONIA GRAIN MIXTURE  
A molten alumina/zirconia grain mixture having the following chemical composition, in wt %: ZrO2+HfO2: 35 to 45.5%; Al2O3: 43.7 to 65%; other oxides: <10%; SiO2: <0.8%, which simultaneously...
US20120108064 POLISHING COMPOSITION FOR SILICON WAFERS  
A polishing composition for a silicon wafer includes a macromolecular compound, an abrasive, and an aqueous medium. The macromolecular compound includes a constitutional unit (a1) represented by...
US20130305615 METHOD FOR PRODUCING ALUMINA SINTERED BODY, ALUMINA SINTERED BODY, ABRASIVE GRAINS, AND GRINDSTONE  
Provided are a method for producing an alumina sintered compact satisfying the following (1) and (2), which comprises mixing and sintering an ilmenite powder and an alumina powder; the alumina...
US20110314745 Nodular silica sol and method of producing the same  
A nodular silica sol has a ratio of an average particle diameter (r) measured by the dynamic light scattering method versus a particle diameter (r′) converted to that of an equivalent sphere...
US20090313907 Ultrahard Composites  
The present invention concerns an ultrahard composite material comprising ultrahard particles dispersed in a nano-grain sized matrix material, wherein the average grain size of the matrix...
US20100294256 DIAMOND TOOL AND METHOD FOR MANUFACTURING SEGMENT THEREOF  
The present invention relates to a diamond tool for cutting a workpiece. An object of the present invention is to provide a diamond tool, wherein a wear-resistant region is formed in a connection...
US20120192500 COATED ABRASIVE AGGREGATES AND PRODUCTS CONTAING SAME  
A coated abrasive product includes a particulate material containing green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition...
US20140259962 CARBONATE PCD WITH A DISTRIBUTION OF Si AND/OR Al  
A method for making a carbonate polycrystalline diamond body includes combining a first quantity of diamond with a first quantity of magnesium carbonate to form a first layer for forming a working...
US20080120917 Blast material  
A blast media for removal of thick coatings from heavy steel and lighter aluminum substrates where a profile is desired for new paint adhesion. The blast media is applied as a free flowing...
US20130167448 Bonded Abrasive Article and Method of Forming  
A method of forming an abrasive article includes providing a green body having abrasive particles including microcrystalline alumina, and heating the green body via microwave radiation to form a...
US20110183142 ABRASIVE GRAIN AGGLOMERATES, PROCESS FOR THE PRODUCTION THEREOF AND THE USE THEREOF FOR PRODUCING ABRASIVES  
The present invention relates to abrasive grain agglomerates composed of fine-particle primary abrasive grains which are held together by means of a binder based on an aluminosilicate having a...
US20140069021 Bonded Abrasive Article and Method of Forming  
An abrasive article having an abrasive body including abrasive grains contained within a bond material, wherein the abrasive grains comprise microcrystalline alumina, and wherein the bond material...
US20110083374 BONDED ABRASIVE ARTICLE AND METHOD OF FORMING  
An abrasive article having an abrasive body including abrasive grains contained within a bond material, wherein the abrasive grains comprise microcrystalline alumina, and wherein the bond material...
US20120142258 Polishing Composition and Polishing Method Using The Same  
A polishing composition contains at least abrasive grains and water and is used in polishing an object to be polished. The abrasive grains are selected so as to satisfy the relationship X1×Y1≦0...
US20110131888 BONDED ABRASIVE ARTICLE AND METHOD OF FORMING  
An abrasive article includes an abrasive body having abrasive grains within a bond material, the abrasive body further including a spinel material disposed at an interface between the abrasive...
US20130333298 ABRASIVE AGENT, METHOD FOR PRODUCING ABRASIVE AGENTS, AND ELECTRONIC DEVICE  
A method for producing abrasive agents includes: adding a silica to a manganese compound; heat-treating the manganese compound to which the silica has been added; forming abrasive grains by...
US20130288574 HIGH PERFORMANCE CERAMIC ABRASIVE GRITS OF UNIFORM THICKNESS AND METHODS OF PRODUCING AND USING THE SAME  
A ceramic abrasive grain product of a ceramic material composition, said ceramic abrasive grain product comprising at least fifty percent of abrasive grains having a uniform grain thickness of...
US20120180401 POLYCRYSTALLINE ABRASIVE COMPACTS  
A method of manufacturing polycrystalline abrasive elements consisting of micron, sub-micron or nano-sized ultrahard abrasives dispersed in micron, sub-micron or nano-sized matrix materials. A...
US20120094578 HETEROCOAGULATE, AND COMPOSITIONS AND METHOD FOR POLISHING AND SURFACE TREATMENT  
A heterocoagulate comprises first particles, having a particle size of at most 999 nm, on a second particle, having a particle size of at least 3 microns. The first particles comprise cerium...
US20140335763 POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE  
The present invention provides a polishing composition for a magnetic disk substrate that can reduce scratches and surface roughness of a polished substrate without impairing the productivity, and...
US20110203186 POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE  
The present invention provides a polishing composition for a magnetic disk substrate that can reduce scratches and surface roughness of a polished substrate without impairing the productivity, and...
US20110131889 BONDED ABRASIVE ARTICLE AND METHOD OF FORMING  
An abrasive article including an abrasive body having abrasive grains made of microcrystalline alumina contained within a bond material, wherein the bond material comprises a total content of...
US20110209413 Non-Spherical Silica Sol, Process for Producing the Same, and Composition for Polishing  
Provided is a non-spherical silica sol containing non-spherical silica fine particles dispersed in a dispersion medium, the non-spherical silica fine particles having an average particle diameter...
US20130263523 FUSED CERAMIC PARTICLE  
The present invention relates to a fused ceramic particle having the following chemical composition, as weight percentages based on the oxides, and for a total of 100%: ZrO2+HfO2: balance to...
US20050215412 High-concentration particle concentrate, powder, preparing method of high-concentration particle concentrate, and preparing method of powder  
A powder preparing device has a filtering device which processes CMP waste water and a vacuum dry-freezing device which dries a slurry which is concentrated to a high concentration by the...
US20070232068 Slurry for touch-up CMP and method of manufacturing semiconductor device  
A slurry for touch-up CMP is provided, which includes water, colloidal silica having an average primary particle diameter of 5 to 60 nm, unsintered cerium oxide having an average primary particle...
US20140295738 COLLOIDAL SILICA POLISHING COMPOSITION AND METHOD FOR MANUFACTURING SYNTHETIC QUARTZ GLASS SUBSTRATES USING THE SAME  
A polishing composition comprising a colloidal dispersion of spherical silica particles and associated silica particles as abrasive is provided. When used in the step of polishing synthetic quartz...
US20060252355 Polishing tape and method  
An edge part of a disk-shaped workpiece is polished by pressing a polishing tape and causing a pad or a contact roller to undergo a reciprocating motion intermittently or continuously along the...

Matches 1 - 50 out of 254 1 2 3 4 5 6 >