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US20120322348 PAD FOR CHEMICAL MECHANICAL POLISHING AND METHOD OF CHEMICAL MECHANICAL POLISHING USING SAME  
A chemical mechanical polishing pad includes a polishing layer formed using a composition that includes a thermoplastic polyurethane, the polishing layer having a specific gravity of 1.15 to 1.30,...
US20150017454 CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A PROTEIN  
Chemical mechanical polishing composition is provided. The composition comprises (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a protein, and (C) an aqueous...
US20130084702 ACRYLATE POLYURETHANE CHEMICAL MECHANICAL POLISHING LAYER  
A chemical mechanical polishing pad comprising an acrylate polyurethane polishing layer, wherein the polishing layer exhibits a tensile modulus of 65 to 500 MPa; an elongation to break of 50 to...
US20130137350 POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER  
Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is...
US20120122377 Abrasive Tool with Flat and Consistent Surface Topography for Conditioning a CMP Pad and Method for Making  
An abrasive tool with flat and consistent surface topography for conditioning a CMP pad and method for making are disclosed. The abrasive tool includes abrasive grains coupled to a low coefficient...
US20130344777 POLISHING COMPOSITION, METHOD FOR FABRICATING THEREOF AND METHOD OF CHEMICAL MECHANICAL POLISHING USING THE SAME  
Provided are a polishing composition for chemical mechanical polishing, a method of preparing the polishing composition, and a chemical mechanical polishing method using the polishing composition....
US20150093979 COMPOSITE POLISHING PAD AND METHOD FOR MAKING THE SAME  
The present invention relates to a composite polishing pad and a method for making the same. The composite polishing pad includes a cushion layer and a polishing layer. The cushion layer includes...
US20110011007 POLISHING MATERIAL HAVING POLISHING PARTICLES AND METHOD FOR MAKING THE SAME  
The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a...
US20130203328 Bonded Abrasive Wheel  
A bonded abrasive wheel comprises ceramic shaped abrasive particles retained in a binder. The ceramic shaped abrasive particles are bounded by a respective base, top and plurality of sides...
US20140251952 SURFACE MODIFIED POLISHING PAD  
In one embodiment, a polishing pad includes a hydrophilic polymer base having a polishing surface, and a metal oxide coating. The metal oxide coating has nanoparticles of metal oxide disposed on...
US20130247477 Method Of Manufacturing Chemical Mechanical Polishing Layers Having a Window  
A method of manufacturing polishing layers having a window for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers having an integral window are derived...
US20140083018 Method of manufacturing grooved chemical mechanical polishing layers  
A method of manufacturing grooved polishing layers for use in chemical mechanical polishing pads is provided, wherein the formation of defects in the polishing layers are minimized.
US20130324020 POLISHING PAD WITH POLISHING SURFACE LAYER HAVING AN APERTURE OR OPENING ABOVE A TRANSPARENT FOUNDATION LAYER  
Polishing pads with a polishing surface layer having an aperture or opening above a transparent foundation layer are described. In an example, a polishing pad for polishing a substrate includes a...
US20130137349 POLISHING PAD WITH GROOVED FOUNDATION LAYER AND POLISHING SURFACE LAYER  
Polishing pads with grooved foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a pattern of...
US20110252711 METHOD OF PREPARING POLYCRYSTALLINE DIAMOND FROM DERIVATIZED NANODIAMOND  
A method of forming a polycrystalline diamond comprises derivatizing a nanodiamond to form functional groups, and combining the derivatized nanodiamond with a microdiamond having an average...
US20150000202 METHOD FOR FORMING AN ABRASIVE LAPPING PLATE  
A method of forming a lapping plate. The method includes providing a lapping plate having a surface, spraying an adhesive onto the surface, spraying a slurry of abrasive particles and solvent onto...
US20130042536 Method of manufacturing chemical mechanical polishing layers  
A method of manufacturing polishing layers for use in chemical mechanical polishing pads is provided, wherein the formation of density defects in the polishing layers is minimized.
US20130244553 REPLACEABLE FINE MACHINING MEMBRANE, STATIONARY FINE MACHINING TOOL, AND METHOD FOR PRODUCING A REPLACEABLE FINE MACHINING MEMBRANE  
The invention relates to a replaceable fine machining membrane (19) for fixing on a tool head (1), to which pressure can be applied, of a stationary fine machining tool for fine machining a...
US20130247476 Method Of Manufacturing Chemical Mechanical Polishing Layers  
A method of manufacturing polishing layers for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers are derived from a cake, wherein the formation of...
US20150101255 METHOD OF MANUFACTURING ALUMINA-BASED ABRASIVE GRAIN AND ALUMINA-BASED ABRASIVE GRAIN MANUFACTURED THEREBY  
Provided are a method of manufacturing an alumina-based abrasive grain, which includes preparing boehmite powder and activated alumina powder as starting materials, forming a sol by wet-blending...
US20130298471 ABRASIVE PRODUCTS AND METHODS FOR FINISHING SURFACES  
An engineered coated abrasive product having a three dimensional pattern of abrasive structures formed by embossing an abrasive slurry formulation that was first surface coated with a functional...
US20090031636 Polymeric barrier removal polishing slurry  
The aqueous slurry is useful for chemical mechanical polishing a semiconductor substrate having copper interconnects. The slurry contains by weight percent, 0 to 25 oxidizing agent, 0.1 to 50...
US20150093969 METHOD AND DEVICE FOR MANUFACTURING ELASTIC ABRASIVE METHOD FOR BLASTING THE ELASTIC ABRASIVE INCLUDING METHOD FOR RECYCLING THE ELASTIC ABRASIVE AND DEVICE FOR BLASTING THE ELASTIC ABRASIVE INCLUDING DEVICE FOR RECYCLING THE ELASTIC ABRASIVE  
To obtain a circulation-type blasting device which enables stable processing for a long period of time even in a case that an elastic abrasive of which abrasive grains are attached to a surface of...
US20130040539 POLISHING PAD, POLISHING METHOD AND METHOD OF FORMING POLISHING PAD  
A polishing pad, a polishing method and a method of forming a polishing pad are provided. The polishing pad includes a polishing layer and a plurality of arc grooves. The arc grooves are disposed...
US20120055096 NON-ABRASIVE BACK COAT FOR COATED ABRASIVES  
An abrasive article includes a backing including first and second major surfaces, an abrasive layer disposed over the first major surface, and a back coat layer disposed over the second major...
US20140120809 Soft And Conditionable Chemical Mechanical Polishing Pad  
A chemical mechanical polishing pad for polishing a substrate selected from at least one of a magnetic substrate, an optical substrate and a semiconductor substrate is provided containing a...
US20130095731 ABRASIVE PRODUCTS AND METHODS FOR FINISHING HARD SURFACES  
A coated abrasive product includes green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition comprising abrasive grit particles...
US20120329370 SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND SUBSTRATE  
The polishing liquid according to the embodiment comprises abrasive grains, an additive and water, wherein the abrasive grains satisfy either or both of the following conditions (a) and (b). (a)...
US20130244542 ABRASIVE WHEELS AND METHODS FOR MAKING AND USING SAME  
Abrasive articles including a body having a first abrasive layer, a second abrasive layer and one or more reinforcing layers for use with cordless tools have a reduced thickness with respect to...
US20130040537 CERAMIC SHAPED ABRASIVE PARTICLES, METHODS OF MAKING THE SAME, AND ABRASIVE ARTICLES CONTAINING THE SAME  
Ceramic shaped abrasive particles have four major sides joined by six common edges. Each one of the four major sides contacts three other of the four major sides. The six common edges have...
US20130219800 Methods for Producing a Coated Abrasive Article for Polishing or Lapping Applications  
Methods are provided for forming an abrasive coating on a surface of a backing. An abrasive slurry includes a continuous phase, a first discontinuous phase of abrasive particles dispersed in the...
US20110209412 METHOD OF MAKING POLISHING PAD ASSEMBLY WITH GLASS OR CRYSTALLINE WINDOW  
Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first...
US20140345202 Microfiber Reinforcement for Abrasive Tools  
A composition that can be used for abrasive processing is disclosed. The composition includes an organic bond material, an abrasive material dispersed in the organic bond material, and a plurality...
US20130237136 POLISHING PAD COMPRISING TRANSMISSIVE REGION  
The invention provides a polishing pad comprising an optically transmissive region, wherein the polishing pad comprises a polishing pad body comprising an opaque first region and an optically...
US20110059683 POLISHING COMPOSITION  
A polishing composition includes a copolymer and an abrasive. The copolymer has a constitutional unit expressed as the following formula (I) and at least one of constitutional units expressed as...
US20150126099 PRINTED CHEMICAL MECHANICAL POLISHING PAD HAVING ABRASIVES THEREIN  
A method of fabricating a polishing layer of a polishing pad includes determining a desired distribution of particles to be embedded within a polymer matrix of the polishing layer. A plurality of...
US20150099440 METHOD FOR MANUFACTURING A POLISHING PAD AND POLISHING PAD  
A method for manufacturing a polishing pad for a hand tool having a working element performing an orbital, random orbital, and/or a rotational movement, the polishing pad having attached layers...
US20130189911 ABRASIVE PRODUCTS AND METHODS FOR FINISHING COATED SURFACES  
A coated abrasive product includes green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition comprising abrasive grit particles,...
US20130125474 Backingless Abrasive Article  
An abrasive article includes an abrasive layer having an array of protrusions. The abrasive layer has a thickness not greater than about 500 mils. The abrasive article is free of a backing layer.
US20130102231 ORGANIC PARTICULATE LOADED POLISHING PADS AND METHOD OF MAKING AND USING THE SAME  
Polishing pads including organic particulates in a continuous polymer phase, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads...
US20140182213 ABRASIVE ARTICLES INCLUDING A BLEND OF ABRASIVE GRAINS AND METHOD OF FORMING SAME  
An abrasive article comprising a backing material and an abrasive layer disposed on the backing material, wherein the abrasive layer comprises a blend of abrasive particles comprising a first...
US20140246250 METHODS OF FABRICATING POLYCRYSTALLINE DIAMOND BY FUNCTIONALIZING DIAMOND NANOPARTICLES, GREEN BODIES INCLUDING FUNCTIONALIZED DIAMOND NANOPARTICLES, AND METHODS OF FORMING POLYCRYSTALLINE DIAMOND CUTTING ELEMENTS  
Method of fabricating polycrystalline diamond include functionalizing surfaces of diamond nanoparticles with fluorine, combining the functionalized diamond nanoparticles with a polymer to form a...
US20150083502 POLYCRYSTALLINE DIAMOND COMPOSITE COMPACT ELEMENTS AND TOOLS INCORPORATING SAME  
A polycrystalline diamond (PCD) composite compact element 100 comprising a substrate 130, a PCD structure 120 bonded to the substrate 130, and a bond material in the form of a bond layer 140...
US20100037530 SYNTHETIC GRINDING STONE  
Disclosed is a synthetic grinding stone used for polishing of silicon wafer, which is composed of a structure comprising cerium oxide fine particles as abrasive grain, a resin as a binder, a salt...
US20120083187 POLYURETHANE, COMPOSITION FOR FORMATION OF POLISHING LAYERS THAT CONTAINS SAME, PAD FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHOD USING SAME  
A polyurethane is produced by reacting a mixture including at least (A) a diisocyanate, (B) a polyol, and (C) a chain extender, the polyol (B) having the number average molecular weight of 400 to...
US20140298728 CEMENTED CARBIDE COMPOSITE FOR A DOWNHOLE TOOL  
A carbide composite for a downhole tool may be formed by depositing a first layer on a substrate, and a second layer at least partially adjacent to the first layer. The first and second layers may...
US20120190281 POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON GROOVE PATTERN  
Polishing pads with concentric or approximately concentric polygon groove patterns are described. Methods of fabricating polishing pads with concentric or approximately concentric polygon groove...
US20120252324 Chemical Mechanical Polishing Pad and Methods of Making and Using Same  
A method of making shape memory chemical mechanical polishing pads is provided, wherein the shape memory chemical mechanical polishing pads comprise a polishing layer in a densified state. Also...
US20100269417 TREATMENT OF POLISHING PAD WINDOW  
A window of solid light-transmissive polymer is formed in a polishing pad, and at least one surface of the window is treated to increase the smoothness of the at least one surface.
US20130008092 Aggregate abrasives for abrading or cutting tools production  
Aggregate abrasive grains (10) for use in the production of abrading or cutting tools are formed. Each aggregate abrasive grain comprises an abrasive core particle and a plurality of abrasive...

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