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US20120322348 |
PAD FOR CHEMICAL MECHANICAL POLISHING AND METHOD OF CHEMICAL MECHANICAL POLISHING USING SAME
A chemical mechanical polishing pad includes a polishing layer formed using a composition that includes a thermoplastic polyurethane, the polishing layer having a specific gravity of 1.15 to 1.30,... |
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US20150017454 |
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A PROTEIN
Chemical mechanical polishing composition is provided. The composition comprises (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a protein, and (C) an aqueous... |
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US20130084702 |
ACRYLATE POLYURETHANE CHEMICAL MECHANICAL POLISHING LAYER
A chemical mechanical polishing pad comprising an acrylate polyurethane polishing layer, wherein the polishing layer exhibits a tensile modulus of 65 to 500 MPa; an elongation to break of 50 to... |
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US20130137350 |
POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is... |
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US20120122377 |
Abrasive Tool with Flat and Consistent Surface Topography for Conditioning a CMP Pad and Method for Making
An abrasive tool with flat and consistent surface topography for conditioning a CMP pad and method for making are disclosed. The abrasive tool includes abrasive grains coupled to a low coefficient... |
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US20130344777 |
POLISHING COMPOSITION, METHOD FOR FABRICATING THEREOF AND METHOD OF CHEMICAL MECHANICAL POLISHING USING THE SAME
Provided are a polishing composition for chemical mechanical polishing, a method of preparing the polishing composition, and a chemical mechanical polishing method using the polishing composition.... |
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US20150093979 |
COMPOSITE POLISHING PAD AND METHOD FOR MAKING THE SAME
The present invention relates to a composite polishing pad and a method for making the same. The composite polishing pad includes a cushion layer and a polishing layer. The cushion layer includes... |
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US20110011007 |
POLISHING MATERIAL HAVING POLISHING PARTICLES AND METHOD FOR MAKING THE SAME
The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a... |
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US20130203328 |
Bonded Abrasive Wheel
A bonded abrasive wheel comprises ceramic shaped abrasive particles retained in a binder. The ceramic shaped abrasive particles are bounded by a respective base, top and plurality of sides... |
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US20140251952 |
SURFACE MODIFIED POLISHING PAD
In one embodiment, a polishing pad includes a hydrophilic polymer base having a polishing surface, and a metal oxide coating. The metal oxide coating has nanoparticles of metal oxide disposed on... |
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US20130247477 |
Method Of Manufacturing Chemical Mechanical Polishing Layers Having a Window
A method of manufacturing polishing layers having a window for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers having an integral window are derived... |
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US20140083018 |
Method of manufacturing grooved chemical mechanical polishing layers
A method of manufacturing grooved polishing layers for use in chemical mechanical polishing pads is provided, wherein the formation of defects in the polishing layers are minimized. |
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US20130324020 |
POLISHING PAD WITH POLISHING SURFACE LAYER HAVING AN APERTURE OR OPENING ABOVE A TRANSPARENT FOUNDATION LAYER
Polishing pads with a polishing surface layer having an aperture or opening above a transparent foundation layer are described. In an example, a polishing pad for polishing a substrate includes a... |
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US20130137349 |
POLISHING PAD WITH GROOVED FOUNDATION LAYER AND POLISHING SURFACE LAYER
Polishing pads with grooved foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a pattern of... |
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US20110252711 |
METHOD OF PREPARING POLYCRYSTALLINE DIAMOND FROM DERIVATIZED NANODIAMOND
A method of forming a polycrystalline diamond comprises derivatizing a nanodiamond to form functional groups, and combining the derivatized nanodiamond with a microdiamond having an average... |
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US20150000202 |
METHOD FOR FORMING AN ABRASIVE LAPPING PLATE
A method of forming a lapping plate. The method includes providing a lapping plate having a surface, spraying an adhesive onto the surface, spraying a slurry of abrasive particles and solvent onto... |
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US20130042536 |
Method of manufacturing chemical mechanical polishing layers
A method of manufacturing polishing layers for use in chemical mechanical polishing pads is provided, wherein the formation of density defects in the polishing layers is minimized. |
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US20130244553 |
REPLACEABLE FINE MACHINING MEMBRANE, STATIONARY FINE MACHINING TOOL, AND METHOD FOR PRODUCING A REPLACEABLE FINE MACHINING MEMBRANE
The invention relates to a replaceable fine machining membrane (19) for fixing on a tool head (1), to which pressure can be applied, of a stationary fine machining tool for fine machining a... |
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US20130247476 |
Method Of Manufacturing Chemical Mechanical Polishing Layers
A method of manufacturing polishing layers for use in chemical mechanical polishing pads is provided, wherein a plurality of polishing layers are derived from a cake, wherein the formation of... |
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US20150101255 |
METHOD OF MANUFACTURING ALUMINA-BASED ABRASIVE GRAIN AND ALUMINA-BASED ABRASIVE GRAIN MANUFACTURED THEREBY
Provided are a method of manufacturing an alumina-based abrasive grain, which includes preparing boehmite powder and activated alumina powder as starting materials, forming a sol by wet-blending... |
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US20130298471 |
ABRASIVE PRODUCTS AND METHODS FOR FINISHING SURFACES
An engineered coated abrasive product having a three dimensional pattern of abrasive structures formed by embossing an abrasive slurry formulation that was first surface coated with a functional... |
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US20090031636 |
Polymeric barrier removal polishing slurry
The aqueous slurry is useful for chemical mechanical polishing a semiconductor substrate having copper interconnects. The slurry contains by weight percent, 0 to 25 oxidizing agent, 0.1 to 50... |
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US20150093969 |
METHOD AND DEVICE FOR MANUFACTURING ELASTIC ABRASIVE METHOD FOR BLASTING THE ELASTIC ABRASIVE INCLUDING METHOD FOR RECYCLING THE ELASTIC ABRASIVE AND DEVICE FOR BLASTING THE ELASTIC ABRASIVE INCLUDING DEVICE FOR RECYCLING THE ELASTIC ABRASIVE
To obtain a circulation-type blasting device which enables stable processing for a long period of time even in a case that an elastic abrasive of which abrasive grains are attached to a surface of... |
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US20130040539 |
POLISHING PAD, POLISHING METHOD AND METHOD OF FORMING POLISHING PAD
A polishing pad, a polishing method and a method of forming a polishing pad are provided. The polishing pad includes a polishing layer and a plurality of arc grooves. The arc grooves are disposed... |
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US20120055096 |
NON-ABRASIVE BACK COAT FOR COATED ABRASIVES
An abrasive article includes a backing including first and second major surfaces, an abrasive layer disposed over the first major surface, and a back coat layer disposed over the second major... |
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US20140120809 |
Soft And Conditionable Chemical Mechanical Polishing Pad
A chemical mechanical polishing pad for polishing a substrate selected from at least one of a magnetic substrate, an optical substrate and a semiconductor substrate is provided containing a... |
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US20130095731 |
ABRASIVE PRODUCTS AND METHODS FOR FINISHING HARD SURFACES
A coated abrasive product includes green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition comprising abrasive grit particles... |
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US20120329370 |
SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHING SUBSTRATE, AND SUBSTRATE
The polishing liquid according to the embodiment comprises abrasive grains, an additive and water, wherein the abrasive grains satisfy either or both of the following conditions (a) and (b). (a)... |
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US20130244542 |
ABRASIVE WHEELS AND METHODS FOR MAKING AND USING SAME
Abrasive articles including a body having a first abrasive layer, a second abrasive layer and one or more reinforcing layers for use with cordless tools have a reduced thickness with respect to... |
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US20130040537 |
CERAMIC SHAPED ABRASIVE PARTICLES, METHODS OF MAKING THE SAME, AND ABRASIVE ARTICLES CONTAINING THE SAME
Ceramic shaped abrasive particles have four major sides joined by six common edges. Each one of the four major sides contacts three other of the four major sides. The six common edges have... |
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US20130219800 |
Methods for Producing a Coated Abrasive Article for Polishing or Lapping Applications
Methods are provided for forming an abrasive coating on a surface of a backing. An abrasive slurry includes a continuous phase, a first discontinuous phase of abrasive particles dispersed in the... |
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US20110209412 |
METHOD OF MAKING POLISHING PAD ASSEMBLY WITH GLASS OR CRYSTALLINE WINDOW
Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first... |
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US20140345202 |
Microfiber Reinforcement for Abrasive Tools
A composition that can be used for abrasive processing is disclosed. The composition includes an organic bond material, an abrasive material dispersed in the organic bond material, and a plurality... |
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US20130237136 |
POLISHING PAD COMPRISING TRANSMISSIVE REGION
The invention provides a polishing pad comprising an optically transmissive region, wherein the polishing pad comprises a polishing pad body comprising an opaque first region and an optically... |
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US20110059683 |
POLISHING COMPOSITION
A polishing composition includes a copolymer and an abrasive. The copolymer has a constitutional unit expressed as the following formula (I) and at least one of constitutional units expressed as... |
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US20150126099 |
PRINTED CHEMICAL MECHANICAL POLISHING PAD HAVING ABRASIVES THEREIN
A method of fabricating a polishing layer of a polishing pad includes determining a desired distribution of particles to be embedded within a polymer matrix of the polishing layer. A plurality of... |
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US20150099440 |
METHOD FOR MANUFACTURING A POLISHING PAD AND POLISHING PAD
A method for manufacturing a polishing pad for a hand tool having a working element performing an orbital, random orbital, and/or a rotational movement, the polishing pad having attached layers... |
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US20130189911 |
ABRASIVE PRODUCTS AND METHODS FOR FINISHING COATED SURFACES
A coated abrasive product includes green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition comprising abrasive grit particles,... |
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US20130125474 |
Backingless Abrasive Article
An abrasive article includes an abrasive layer having an array of protrusions. The abrasive layer has a thickness not greater than about 500 mils. The abrasive article is free of a backing layer. |
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US20130102231 |
ORGANIC PARTICULATE LOADED POLISHING PADS AND METHOD OF MAKING AND USING THE SAME
Polishing pads including organic particulates in a continuous polymer phase, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads... |
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US20140182213 |
ABRASIVE ARTICLES INCLUDING A BLEND OF ABRASIVE GRAINS AND METHOD OF FORMING SAME
An abrasive article comprising a backing material and an abrasive layer disposed on the backing material, wherein the abrasive layer comprises a blend of abrasive particles comprising a first... |
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US20140246250 |
METHODS OF FABRICATING POLYCRYSTALLINE DIAMOND BY FUNCTIONALIZING DIAMOND NANOPARTICLES, GREEN BODIES INCLUDING FUNCTIONALIZED DIAMOND NANOPARTICLES, AND METHODS OF FORMING POLYCRYSTALLINE DIAMOND CUTTING ELEMENTS
Method of fabricating polycrystalline diamond include functionalizing surfaces of diamond nanoparticles with fluorine, combining the functionalized diamond nanoparticles with a polymer to form a... |
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US20150083502 |
POLYCRYSTALLINE DIAMOND COMPOSITE COMPACT ELEMENTS AND TOOLS INCORPORATING SAME
A polycrystalline diamond (PCD) composite compact element 100 comprising a substrate 130, a PCD structure 120 bonded to the substrate 130, and a bond material in the form of a bond layer 140... |
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US20100037530 |
SYNTHETIC GRINDING STONE
Disclosed is a synthetic grinding stone used for polishing of silicon wafer, which is composed of a structure comprising cerium oxide fine particles as abrasive grain, a resin as a binder, a salt... |
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US20120083187 |
POLYURETHANE, COMPOSITION FOR FORMATION OF POLISHING LAYERS THAT CONTAINS SAME, PAD FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHOD USING SAME
A polyurethane is produced by reacting a mixture including at least (A) a diisocyanate, (B) a polyol, and (C) a chain extender, the polyol (B) having the number average molecular weight of 400 to... |
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US20140298728 |
CEMENTED CARBIDE COMPOSITE FOR A DOWNHOLE TOOL
A carbide composite for a downhole tool may be formed by depositing a first layer on a substrate, and a second layer at least partially adjacent to the first layer. The first and second layers may... |
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US20120190281 |
POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON GROOVE PATTERN
Polishing pads with concentric or approximately concentric polygon groove patterns are described. Methods of fabricating polishing pads with concentric or approximately concentric polygon groove... |
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US20120252324 |
Chemical Mechanical Polishing Pad and Methods of Making and Using Same
A method of making shape memory chemical mechanical polishing pads is provided, wherein the shape memory chemical mechanical polishing pads comprise a polishing layer in a densified state. Also... |
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US20100269417 |
TREATMENT OF POLISHING PAD WINDOW
A window of solid light-transmissive polymer is formed in a polishing pad, and at least one surface of the window is treated to increase the smoothness of the at least one surface. |
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US20130008092 |
Aggregate abrasives for abrading or cutting tools production
Aggregate abrasive grains (10) for use in the production of abrading or cutting tools are formed. Each aggregate abrasive grain comprises an abrasive core particle and a plurality of abrasive... |