Matches 1 - 50 out of 192 1 2 3 4 >


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US20140179204 DRESSER  
A dresser includes an attachment secured to a dresser shaft for rotating the dresser, a disk holder removably attached to the attachment by a magnetic force, and a dresser disk removably attached...
US20140113532 CHEMICAL MECHANICAL PLANARIZATION CONDITIONER  
A pad conditioner for a CMP polishing pad is disclosed that includes a substrate that has a matrixical arrangement of protrusions that have a layer of poly crystalline diamond on at least their...
US20130316630 TOOL FOR USE WITH DUAL-SIDED CHEMICAL MECHANICAL PLANARIZATION PAD CONDITIONER  
A tool includes a holder configured to couple to a dual-sided chemical mechanical planarization (CMP) pad conditioner. The holder has a magnetic material, a first magnetic field strength (H1) at a...
US20120171935 CMP PAD Conditioning Tool  
The present disclosure provides a CMP pad conditioning tool with at least one integral abrasive protrusion. The present disclosure further provides a method for preparing this CMP pad conditioning...
US20140113533 DAMPER FOR POLISHING PAD CONDITIONER  
A conditioner apparatus for use in substrate polishing includes a conditioner head constructed to receive an end effector for conditioning a surface of a polishing pad, an arm that supports the...
US20100330886 Corrosion-Resistant CMP Conditioning Tools and Methods for Making and Using Same  
An abrasive tool for conditioning CMP pads includes abrasive grains coupled to a substrate through a metal bond and a coating, e.g., a fluorine-doped nanocomposite coating. The abrasive grains can...
US20150087212 CMP CONDITIONER PADS WITH SUPERABRASIVE GRIT ENHANCEMENT  
A pad conditioner for a CMP polishing pad. The pad conditioner includes a features having textured or roughened surfaces, with superabrasive grit seeds such as diamond interspersed on the...
US20150044950 PAD CONDITIONING TOOL HAVING SAPPHIRE DRESSING PARTICLES  
A pad conditioning tool includes a sapphire substrate with a specific orientation plane, wherein the specific orientation plane is selected from a group consisting of a-plane, c-plane, r-plane,...
US20140357167 DRESSING METHOD FOR DRUM-SHAPED GEAR-LIKE GRINDSTONE, AND DISK DRESSER  
A disk dresser and a dressing method enable high-precision dressing of a drum-shaped gear-like grindstone and shaping of the cutting teeth of the grindstone without changing the shape of the...
US20120071068 POLISHING PAD FOR CHEMICAL MECHANICAL POLISHING APPARATUS  
This disclosure relates to a polishing pad for chemical mechanical polishing, having a shape where 3 or more semi-oval or semicircular curves that connect 2 valleys neighboring on the plane are...
US20120220205 Chemical Mechanical Polishing Conditioner  
A chemical mechanical polishing (CMP) conditioner includes a ceramic substrate having a major surface, and an abrasive coating overlying the major surface. The major surface can include...
US20150004787 Sapphire Pad Conditioner  
A sapphire pad conditioner includes a sapphire substrate having multiple protrusions on a surface and a holder arranged to hold the sapphire substrate. The sapphire substrate is used for...
US20130078895 ABRASIVE TOOL FOR USE AS A CHEMICAL MECHANICAL PLANARIZATION PAD CONDITIONER  
An abrasive tool including a CMP pad conditioner having a substrate including a first major surface, a second major surface opposite the first major surface, and a side surface extending between...
US20150072601 Superabrasive tools having substantially leveled particle tips and associated methods  
Superabrasive tools and methods for making and using the same are provided. In one aspect, for example, a CMP pad dresser includes a first monolayer of superabrasive particles disposed on and...
US20120244790 Superabrasive Tools Having Substantially Leveled Particle Tips and Associated Methods  
Superabrasive tools and methods for making and using the same are provided. In one aspect, for example, a CMP pad dresser includes a first monolayer of superabrasive particles disposed on and...
US20110244764 CHEMICAL-MECHANICAL POLISHING PAD CONDITIONING SYSTEM  
Polishing pad conditioning system. The system includes a first rotatable platen supporting a polishing pad containing asperities having a radius of curvature. A second rotatable platen supports a...
US20140256236 PAD CONDITIONING TOOL AND METHOD OF MANUFACTURING THE SAME  
A pad conditioning tool includes a sapphire chip having a side surface defining a polishing surface and a plurality of sapphire grains formed on the polishing surface in an integral manner. Each...
US20130122783 PAD CONDITIONING FORCE MODELING TO ACHIEVE CONSTANT REMOVAL RATE  
A method and apparatus for conditioning a polishing pad in a CMP system is provided. In one embodiment, a method for conditioning a polishing pad includes applying a down force to the conditioning...
US20120270477 MEASUREMENT OF PAD THICKNESS AND CONTROL OF CONDITIONING  
A conditioning process includes rotating a polishing pad about an axis of rotation, conditioning the polishing pad by sweeping an abrasive disk in a path across a surface of the polishing pad...
US20140302756 CHEMICAL MECHANICAL POLISHING CONDITIONER  
The present invention (utility model application in Taiwan) relates to a chemical mechanical polishing pad dresser, comprising: a substrate; a bonding layer disposed on the substrate; an...
US20110275288 CMP PAD DRESSERS WITH HYBRIDIZED CONDITIONING AND RELATED METHODS  
The present invention provides CMP pad dressers and methods for dressing or conditioning CMP pads. In one aspect, for example, a CMP pad conditioner is provided. Such a conditioner can include a...
US20150202735 CHEMICAL MECHANICAL POLISHING CONDITIONER WITH OPTIMAL ABRASIVE EXPOSING RATE  
The present invention relates to a chemical mechanical polishing conditioner with optimal abrasive exposing rate, comprising a substrate; a bonding layer disposed on the substrate; and a plurality...
US20060183410 Diamond conditioning of soft chemical mechanical planarization/polishing (CMP) polishing pads  
Conditioning of chemical mechanical planarization (CMP) using conventional diamond-embedded abrasive strips are well suited to condition conventional “hard” polishing but not soft polishing pads...
US20150202736 CHEMICAL MECHANICAL POLISHING CONDITIONER WITH HIGH QUALITY ABRASIVE PARTICLES  
The present invention relates to a chemical mechanical polishing conditioner with high quality abrasive particles, comprising a substrate; a bonding layer disposed on the substrate; and a...
US20140120807 CMP PAD CONDITIONERS WITH MOSAIC ABRASIVE SEGMENTS AND ASSOCIATED METHODS  
A CMP pad conditioner comprises a plurality of abrasive segments. Each abrasive segment includes a segment blank and an abrasive layer attached to the segment blank, the abrasive layer including a...
US20150174730 Low Magnetic Chemical Mechanical Polishing Conditioner  
The present invention relates to a low magnetic chemical mechanical polishing conditioner, comprising a substrate; a bonding layer disposed on the substrate; and a plurality of abrasive particles...
US20110217906 POLISHING APPARATUS AND POLISHING METHOD  
A polishing apparatus can effectively prevent abrasive particles from falling off a polishing tape during polishing. The polishing apparatus includes: a polishing head for polishing a peripheral...
US20120315829 METHOD AND APPARATUS FOR CONDITIONING A POLISHING PAD  
A method of conditioning a surface of a polishing pad is used for conditioning a polishing pad on a polishing table for polishing a thin film formed on a surface of a substrate. The conditioning...
US20150072595 SYSTEM FOR EVALUATING AND/OR IMPROVING PERFORMANCE OF A CMP PAD DRESSER  
Methods and systems for evaluating and/or increasing CMP pad dresser performance are provided. In one aspect, for example, a method of identifying overly-aggressive superabrasive particles in a...
US20110076925 System for Evaluating and/or Improving Performance of a CMP Pad Dresser  
Methods and systems for evaluating and/or increasing CMP pad dresser performance are provided. In one aspect, for example, a method of identifying overly-aggressive superabrasive particles in a...
US20110312254 METHOD AND APPARATUS FOR DRESSING POLISHING PAD  
The method of the present invention are capable of stabilizing a polishing rate, reducing number of times of performing dressing operations, improving work efficiency and extending a span of life...
US20050079811 Defect reduction using pad conditioner cleaning  
A device for cleaning a pad conditioner that comprises a cleaning agent supply for providing a cleaning agent for cleaning a pad conditioner including a conditioning surface, a pad including an...
US20110117822 DRESSING JIG FOR GLASS SUBSTRATE POLISHING PAD  
Dressing treatment of a polishing pad, adjusting a polishing surface of the polishing pad to given flatness and surface roughness without deteriorating productivity, a method for polishing a glass...
US20110034112 POLISHING APPARATUS, POLISHING AUXILIARY APPARATUS AND POLISHING METHOD  
A polishing apparatus, a polishing method and a polishing auxiliary apparatus which are able to suppress clogging of the rotating grindstone and polish the work while suppressing the damage...
US20080041354 Rotary Diamond Dresser  
A rotary diamond dresser, with a V-groove circumferentially formed around a heavily abraded high load part of the circumference of a circular dressing body. A plurality of octahedral diamond...
US20150133036 CMP PAD DRESSERS HAVING LEVELED TIPS AND ASSOCIATED METHODS  
CMP pad dressers having leveled tips and associated methods are provided. In one aspect, for example, a CMP pad dresser can include a support substrate and a plurality of superabrasive particles...
US20150050871 Chemical Mechanical Polishing Conditioner Made From Woven Preform  
The present invention relates to a chemical mechanical polishing conditioner made from a woven preform, comprising: a substrate; a bonding layer disposed on the substrate; and a plurality of...
US20130273820 BRAZED DIAMOND TOOLS AND METHODS FOR MAKING THE SAME  
Superabrasive tools and methods for the making thereof are disclosed and described. In one aspect, superabrasive particles are chemically bonded to a matrix support material according to a...
US20130267154 DIAMOND TOOLS AND METHODS FOR MAKING THE SAME  
Superabrasive tools and methods for the making thereof are disclosed and described. In one aspect, superabrasive particles are chemically bonded to a matrix support material according to a...
US20150224624 ABRASIVE ARTICLE, CONDITIONING DISK AND METHOD FOR FORMING ABRASIVE ARTICLE  
In accordance with some embodiments, an abrasive article is provided. The abrasive article includes a carrier. The abrasive article further includes a matrix layer on the carrier. The matrix layer...
US20130303056 CMP PAD DRESSERS WITH HYBRIDIZED ABRASIVE SURFACE AND RELATED METHODS  
A CMP pad conditioner comprises a plurality of abrasive segments. Each abrasive segment includes a segment blank and an abrasive layer attached to the segment blank, the abrasive layer including a...
US20080020685 Truing tool for a grindstone  
A truing tool for a grindstone (1) is intended for attachment to a universal support (3) in the form of a cylindrical rod of a grinding machine in parallel with the rotation axis of the...
US20120149287 CHEMICAL MECHANICAL PLANARIZATION (CMP) PAD CONDITIONER AND METHOD OF MAKING  
A method of forming a chemical mechanical planarization (CMP) pad conditioner includes placing abrasive grains on a major surface of a substrate, forming a binding composition at an exterior...
US20140120724 COMPOSITE CONDITIONER AND ASSOCIATED METHODS  
CMP pad dressers having leveled tips and associated methods are provided. In one aspect, for example, a composite conditioner can include a base plate and a plurality of polishing units secured to...
US20120108153 ROTARY DRESSER  
A rotary dresser is provided with a roll having an outer circumferential surface which includes an arc portion or inclined portion differing in diameter in dependence on the axial position...
US20140154960 CMP PAD CONDITIONER  
The present invention relates to a CMP pad conditioner having a substrate and a cutting tip pattern formed on at least one surface of the substrate, and more particularly to a CMP pad conditioner...
US20140308883 CHEMICAL MECHANICAL POLISHING CONDITIONER  
The present invention relates to a chemical mechanical polishing conditioner which comprises: a substrate; a bonding layer, disposed on the substrate; and an abrasive layer, having a thin metal...
US20090036041 CMP PAD DRESSER AND CMP APPARATUS USING THE SAME  
A CMP pad dresser for dressing a polishing pad of a CMP apparatus is provided with a dressing pad having abrasive grains, a purified water supply unit provided to an external periphery of the...
US20120258035 POLYCRYSTALLINE DIAMOND AND METHOD OF MANUFACTURING THE SAME  
Polycrystalline diamond includes cubic diamond and hexagonal diamond, and a ratio of X-ray diffraction peak intensity of a (100) plane of the hexagonal diamond to X-ray diffraction peak intensity...
US20120302146 CMP PAD DRESSER HAVING LEVELED TIPS AND ASSOCIATED METHODS  
CMP pad dressers having leveled tips and associated methods are provided. In one aspect, for example, a CMP pad dresser can include a matrix layer and a monolayer of a plurality of superabrasive...

Matches 1 - 50 out of 192 1 2 3 4 >