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US20150065013 CHEMICAL MECHANICAL POLISHING PAD  
A chemical mechanical polishing pad is provided containing: a polishing layer; a rigid layer; and, a hot melt adhesive bonding the polishing layer to the rigid layer; wherein the polishing layer...
US20140158109 HOME APPLIANCE WITH TREATED WINDOW AND METHOD FOR TREATING THE WINDOW  
A home appliance and method including an appliance body having an oven access opening; an oven door for selectively covering the oven access opening; and a window in the oven door for viewing the...
US20150126095 CHEMICAL MECHANICAL POLISHING APPARATUS AND POLISHING METHOD USING THE SAME  
A chemical mechanical polishing apparatus includes a platen, a polishing head, a magnetizable polishing pad, and an electromagnetic component. The magnetizable polishing pad is disposed between...
US20140378032 POLISHING PAD  
The purpose of the present invention is to provide a laminated polishing pad that can be flatly bonded to a polishing platen even if it is large in size. This laminated polishing pad, comprising a...
US20110183583 Polishing Pad with Floating Elements and Method of Making and Using the Same  
The disclosure is directed to polishing pads with floating polishing elements bonded to a support layer, for example by thermal bonding, and to methods of making and using such pads in a polishing...
US20140220867 Concrete Cutting, Polishing and Coloring Treatment Solutions and Methods  
Systems and methods for treating concrete, which includes the steps of wetting a surface of concrete with a amorphous colloidal silica, allowing time for the colloidal silica to penetrate the...
US20150174725 LAMINATED POLISHING PAD AND METHOD FOR MANUFACTURING SAME  
The purpose of the present invention is to provide a method for manufacturing a laminated polishing pad in which a polishing layer and a support layer resist delamination even when heated to high...
US20130012107 LAMINATE POLISHING PAD  
An object of the invention is to provide a laminate polishing pad having a polishing layer and a cushion layer, which resist peeling. A laminate polishing pad including: a polishing layer with no...
US20150004879 METHOD FOR PRODUCING LAMINATED POLISHING PAD  
A method for producing a laminated polishing pad, which is free from warpage and does not cause peeling between a polishing layer and a cushion layer during polishing, includes the steps of:...
US20140256230 Multilayer Chemical Mechanical Polishing Pad  
A multilayer chemical mechanical polishing pad is provided, having: a polishing layer having a polishing surface, a counterbore opening, a polishing layer interfacial region parallel to the...
US20110081835 Method for making polished gemstones and an abrasive material for doing same  
A method for shaping a gemstone comprising the steps of 1) attaching a gemstone to a dop, 2) holding the gemstone against a rotating lap wheel, and 3) shaping the gemstone on the lap wheel. The...
US20140256231 Multilayer Chemical Mechanical Polishing Pad With Broad Spectrum, Endpoint Detection Window  
A multilayer chemical mechanical polishing pad is provided, having: a polishing layer having a polishing surface, a counterbore opening, a polishing layer interfacial region parallel to the...
US20150136263 SAWING OF HARD GRANITES  
The invention relates to the use of sodium bentonite as a fluid bed that supports the grit and debris resulting from sawing. The invention also relates to the use of vibrating tables for...
US20140256232 Broad Spectrum, Endpoint Detection Window Multilayer Chemical Mechanical Polishing Pad  
A multilayer chemical mechanical polishing pad is provided, having: a polishing layer having a polishing surface, a counterbore opening, a polishing layer interfacial region parallel to the...
US20130012106 POLISHING PAD  
An object of the present invention is to provide a polishing pad having high planarization property and capable of making it possible to suppress the occurrence of scratches. A polishing pad of...
US20100317261 Chemical mechanical polishing pad having a low defect integral window  
A chemical mechanical polishing pad having a polishing layer with an integral window and a polishing surface adapted for polishing a substrate selected from a magnetic substrate, an optical...
US20090260396 METHODS FOR PROCESSING ORNAMENTAL DIAMONDS AND CORRESPONDING ORNAMENTAL DIAMONDS  
A method for processing diamonds and corresponding ornamental diamond structures employ diamonds having visible cloud inclusions. The diamond is cut and polished to form crown and pavilion facets...
US20110123831 METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC DISK  
The present invention relates to a method for manufacturing a glass substrate for a magnetic disk, the method including: a polishing step of supplying a polishing slurry between a polishing cloth...
US20150065012 METHOD OF FINISHING A STONE SURFACE AND ABRASIVE ARTICLE  
A structured abrasive article comprises a structured abrasive layer adhered to a major surface of a backing, the structured abrasive layer comprising shaped abrasive composites adhered to the...
US20140057533 METHODS OF POLISHING SAPPHIRE SURFACES  
Described herein are methods for polishing sapphire surfaces using compositions comprising colloidal silica, wherein the colloidal silica has a broad particle size distribution.
US20140057532 METHODS OF POLISHING SAPPHIRE SURFACES  
Described herein are methods for polishing sapphire surfaces using compositions comprising colloidal silica, wherein the colloidal silica has a broad particle size distribution.
US20120289125 METHOD OF POLISHING TRANSPARENT ARMOR  
A method of polishing transparent armor, preferably to optical clarity. The method can be used on flat or contoured armor, manually or via robotic automation. The method includes using a step-wise...
US20140302752 COMPOSITION FOR POLISHING PURPOSES, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SUBSTRATE  
Provided is a polishing composition, which comprises abrasive grains, a water-soluble polymer, an aggregation inhibitor and water. The ratio R1/R2 is 1.3 or less, where R1 represents the average...
US20110086753 Method and System for Polishing Float Glass  
A system for polishing a float glass used for liquid crystal displays includes a lower unit configured to rotate a float glass to be polished, a head assembly configured to be rotatable in contact...
US20100304644 METHOD AND DEVICE FOR MECHANICALLY PROCESSING DIAMOND  
Method and device for processing a surface (5) of a diamond (1) with a mechanical part (3) which is moved in relation to the surface (5) of the diamond (1), whereby unbound diamond grains (2) are...
US20130109194 POLISHING LIQUID COMPOSITION  
A polishing liquid composition includes composite oxide particles containing cerium and zirconium, a dispersing agent, and an aqueous medium. A powder X-ray diffraction spectrum of the composite...
US20120058712 POLISHING PADS FOR CHEMICAL MECHANICAL PLANARIZATION AND/OR OTHER POLISHING METHODS  
Embodiments herein provide polishing pads that produce high post-polish planarity, such as on a wafer substrate or other substrates. Exemplary pads include a bulk matrix and embedded polymer...
US20130337722 POLISHING METHOD AND POLISHING APPARATUS  
A polishing method is used for polishing a film formed on a substrate by pressing the substrate against a polishing pad. The polishing method includes preparing, in advance, an algorithm for...
US20110117822 DRESSING JIG FOR GLASS SUBSTRATE POLISHING PAD  
Dressing treatment of a polishing pad, adjusting a polishing surface of the polishing pad to given flatness and surface roughness without deteriorating productivity, a method for polishing a glass...
US20100062687 CERIUM OXIDE POWDER FOR ABRASIVE AND CMP SLURRY COMPRISING THE SAME  
Disclosed are cerium oxide powder for an abrasive; CMP slurry including the same; and a shallow trench isolation (STI) process using the CMP slurry. At least two kinds of cerium oxides prepared by...
US20090247054 METHOD TO PREVENT SLURRY CAKING ON CMP CONDITIONER  
A method of planarizing a semiconductor structure comprises moving a conditioning element on a surface of a polishing member, rotating the semiconductor structure relative to the polishing member...
US20110097874 PROGRESSIVE TRIMMING METHOD  
The invention provides a method of trimming a structure that includes a first wafer bonded to a second wafer, with the first wafer having a chamfered edge. The method includes a first trimming...
US20110092138 Method of manufacturing ferrule assemblies  
A method of manufacturing a ferrule assembly. The method including first and second polishing operations. The first polishing operation including polishing only the end face of a ferrule of an...
US20110259053 Lithium Silicate Materials  
Lithium silicate materials are described which can be easily processed by machining to dental products without undue wear of the tools and which subsequently can be converted into lithium silicate...
US20110059683 POLISHING COMPOSITION  
A polishing composition includes a copolymer and an abrasive. The copolymer has a constitutional unit expressed as the following formula (I) and at least one of constitutional units expressed as...
US20100317262 ABRASIVE ARTICLE WITH UNIFORM HEIGHT ABRASIVE PARTICLES  
A method of making an abrasive article including the step of preparing a master plate with a surface having a shape. Depositing a spacer layer on the surface of the master plate. A slurry...
US20110256811 POLISHING METHOD  
A polishing method can obtain a good polishing profile which, for example, will not cause peeling of a semiconductor layer from a silicon substrate. The polishing method includes: positioning a...
US20150246425 POLISHING APPARATUS AND POLISHING METHOD  
Embodiments of a polishing apparatus are provided. The polishing apparatus includes a polishing pad having a polishing surface. The polishing apparatus also includes a dispensing device including...
US20120108149 METHOD FOR MANUFACTURING POLISHING PAD  
A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer...
US20120276819 Chemical Mechanical Polishing Composition and Method For Polishing Phase Change Alloys  
A method for chemical mechanical polishing of a substrate comprising a germanium-antimony-tellurium chalcogenide phase change alloy (GST) using a chemical mechanical polishing composition...
US20110281666 METHOD AND APPARATUS FOR GOLF CLUB PUTTER  
A golf putter head made of granite attached to a golf club shaft. The golf putter head may have a smooth polished front putter surface. The golf putter head may have center slot which is cut into...
US20150024661 MECHANISMS FOR REMOVING DEBRIS FROM POLISHING PAD  
Embodiments of mechanisms for performing a chemical mechanical polishing (CMP) process are provided. A method for performing a CMP process includes polishing a wafer by using a polishing pad. The...
US20120252324 Chemical Mechanical Polishing Pad and Methods of Making and Using Same  
A method of making shape memory chemical mechanical polishing pads is provided, wherein the shape memory chemical mechanical polishing pads comprise a polishing layer in a densified state. Also...
US20110045744 Polishing Pad, Use Thereof and Method for Making the Same  
The present invention relates to a polishing pad that comprises a polishing sheet for polishing a substrate, a buffer sheet comprising a plurality of holes, and adhesive for adhering the buffer...
US20130019636 MODIFIED PRINCESS CUT DIAMOND HAVING HEARTS AND ARROWS PATTERN AND METHOD  
A modified princess cut diamond and method of forming a modified princess cut diamond into a symmetrical shape possessing a hearts and arrows pattern characteristic of the true hearts and arrows...
US20070128985 Method of polishing work  
In the method of precisely polishing a work, torque of a sun gear and an internal gear are kept constant and a load applied to a carrier is reduced and maintained. The method comprises the steps...
US20140357161 CENTER FLEX SINGLE SIDE POLISHING HEAD  
A polishing head assembly for single side polishing of silicon wafers includes a polishing head and a cap. The polishing head includes a top surface and a bottom surface and defines a longitudinal...
US20110269380 Base layer, polishing pad including the same and polishing method  
A polishing pad including a polishing layer and a base layer is provided. Disposed under the polishing layer, the base layer includes a porous inner layer and at least one surface layer. The...
US20100064538 POLYCRYSTALLINE DIAMOND ELEMENTS HAVING CONVEX SURFACES  
A diamond element (10) having a convex surface is disclosed, the convex surface including a spherical segment for which the maximum peak to valley deviation from a perfect spherical surface is...
US20110266736 VAPOR DRYER HAVING HYDROPHILIC END EFFECTOR  
Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip...