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US20080290530 SEMICONDUCTOR DEVICE HAVING PHOTO ALIGNING KEY AND METHOD FOR MANUFACTURING THE SAME  
Embodiments consistent with the present invention provide a semiconductor device having a photo aligning key and a method for manufacturing the same. The semiconductor device includes a pattern...
US20070161261 Methods for fabricating carbon nano-tube powders and field emission display devices  
Methods for fabricating carbon nano-tube (CNT) powders and field emission display devices. Carbon nano-tube powders are deposited and gathered in a vacuum chamber. A physical surface treatment is...
US20130056886 Method and Apparatus of Providing Overlay  
Provided is an apparatus that includes an overlay mark. The overlay mark includes a first portion that includes a plurality of first features. Each of the first features have a first dimension...
US20110133347 METHOD AND APPARATUS OF PROVIDING OVERLAY  
Provided is an apparatus that includes an overlay mark. The overlay mark includes a first portion that includes a plurality of first features. Each of the first features have a first dimension...
US20050159019 Method for manufacturing large area stamp for nanoimprint lithography  
Provided is a method for manufacturing a large area stamp for nanoimprint lithography using a fabricated small area stamp. The method includes: fabricating a first small area stamp having a...
US20070074745 Exhaust system for use in processing a substrate  
Disclosed is an exhaust system for discharging a fluid which is supplied into a hermetically closed container 54 for containing a semiconductor wafer W, a substrate to be supplied in the container...
US20060189171 Seasoning process for a deposition chamber  
A seasoning process for a deposition chamber, the process comprising providing a silicon-containing seasoning gas inside the deposition chamber; and forming a silicon-based seasoning film on at...
US20070151620 LID OPENING/CLOSING SYSTEM OF AN AIRTIGHT CONTAINER  
A curtain nozzle is located above an opening portion (10) in a FIMS. A gas curtain formed of inert gas for closing the opening portion is formed. A cover is so provided as to cover a part of the...
US20070190811 Method of forming patterns and/or pattern data for controlling pattern density of semiconductor devices and pattern density controlled semiconductor devices  
A method of forming a pattern for a semiconductor device includes forming first pattern data, forming second pattern data, forming third pattern data, forming pattern density measurement data...
US20060276056 Nanotube articles with adjustable electrical conductivity and methods of making the same  
Nanotube articles having adjustable electrical conductivity, and methods of making the same. A patterned article includes conducting nanotubes that define a plurality of conductive pathways along...
US20060151297 Clean room guided conveyor  
A conveyor system and method that reduces extraneous forces in a manufacturing process is disclosed. The system and method of the invention are particularly directed to handling and processing...
US20060040514 Magnetic processing of electronic materials  
The electronic properties (such as electron mobility, resistivity, etc.) of an electronic material can be modified/enhanced when subjected to dynamic or stationary magnetic fields in conjunction...
US20120088374 HBT and Field Effect Transistor Integration  
Methods and systems for fabricating an integrated BiFET using two separate growth procedures are disclosed. Performance of the method fabricates the FET portion of the BiFET in a first fabrication...
US20140273539 METHODS FOR CONFORMAL TREATMENT OF DIELECTRIC FILMS WITH LOW THERMAL BUDGET  
Embodiments of methods for treating dielectric layers are provided herein. In some embodiments, a method of treating a dielectric layer disposed on a substrate supported in a process chamber...
US20050176264 Process of forming silicon-based nanowires  
A process of forming silicon-based nanowires heats high-surface-oxygen-content silicon powders to initiate vapor-solid reaction to form nanowires. The reaction gas is charged to react with the Si...
US20090023302 PROTECTIVE INSERTS TO LINE HOLES IN PARTS FOR SEMICONDUCTOR PROCESS EQUIPMENT  
Inserts are used to line openings in parts that form a semiconductor processing reactor. In some embodiments, the reactor parts delimit a reaction chamber. The reactor parts may be formed of...
US20070134822 Process system, process liquid supply method, and process liquid supply program  
A process system produces a process liquid of a predetermined concentration in a blending tank by blending solutions respectively supplied from a plurality of solution supply sources, supplies the...
US20070173076 Equipment for sensing malfunctioning roughing valves in an ion implantation apparatus  
A system for detecting a malfunction of a roughing valve in an ion implantation apparatus, including a valve driving controller, at least one roughing valve having an open-state and a...
US20060148275 Method of forming an alignment mark and manufacturing a semiconductor device using the same  
Embodiments of the present invention provide, among other things, a method of forming an alignment mark having a stepped structure without an additional process. The alignment mark may be used to...
US20060057861 Movable operating device and method of controlling the movable operating device  
The movable operating device includes a frame for fixedly supporting an object having a first surface, a plurality of movable members movably supported on the frame, and a movement control device...
US20080097641 Interconnect structure of semiconductor integrated circuit, and design method and device therefor  
A method for designing an interconnect structure of an interconnect layer in a semiconductor integrated circuit device includes the steps of: (a) inputting layout data of the semiconductor...
US20060223340 Manufacturing managing method of semiconductor devices and a semiconductor substrate  
A managing method of manufacturing semiconductor devices is disclosed. The method comprises the steps of: providing at least one tag region on a semiconductor substrate in which plural...
US20060240681 Three-dimensional nanoscale crossbars  
Various embodiments of the present invention include three-dimensional, at least partially nanoscale, electronic circuits and devices in which signals can be routed in three independent...
US20070093079 Imprinting method and imprinting apparatus  
An imprinting method of the present invention is to press a mold member (40) having thereon a mold pattern onto a film carried on a principal plane of a substrate (50) as an object to be...
US20140159040 AUTHENTICATION USING GRAPHENE BASED DEVICES AS PHYSICAL UNCLONABLE FUNCTIONS  
The present disclosure relates to secure devices having a physical unclonable function and methods of manufacturing such secure devices. One device includes at least one graphene layer...
US20070207629 SURFACE PROTECTIVE FILM PEELING METHOD AND SURFACE PROTECTIVE FILM PEELING APPARATUS  
A surface protective film peeling method for peeling off a surface protective film (11) attached on the surface of a wafer (20) is disclosed. The wafer is supported on a movable table (31) with...
US20100081295 PROCESS MODEL EVALUATION METHOD, PROCESS MODEL GENERATION METHOD AND PROCESS MODEL EVALUATION PROGRAM  
According to an aspect of the present invention, there is provided a method for evaluating a process model, the method including: acquiring, for each of given patterns, a dimensional difference...
US20060251971 Photo-Mask with variable transmission by ion implantation  
Some embodiments of the present invention include photo-masks with variable transmission by ion implantation.
US20070210405 Semiconductor integrated circuit device and power source wiring method therefor  
In a semiconductor integrated circuit device, from a first power source strap supplying a potential to a first standard cell receiving a supply of the potential, the potential is supplied via a...
US20140162464 AUTHENTICATION USING GRAPHENE BASED DEVICES AS PHYSICAL UNCLONABLE FUNCTIONS  
A method of manufacturing a secure device having a physical unclonable function includes providing a first graphene layer, providing a second graphene layer and applying a variability enhancement...
US20070100086 Method of fabricating a three-dimensional nanostructure  
There is provided a rapid and reliable method of fabricating a three-dimensional organic/inorganic nanostructure of a well-arranged shape wherein tubes or fibers of several nanometer to several...
US20080220622 Substrate processing pallet with cooling  
A substrate processing pallet can cool a substrate. A substrate processing pallet can include a base member; an interface pad attachable to the base member, the interface pad having substantially...
US20070269994 Methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an integrated circuit, methods of processing a semiconductor substrate, and semiconductor devices  
The invention includes methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an...
US20140162458 Methods of Forming A Pattern On A Substrate  
A method of forming a pattern on a substrate includes forming openings in material of a substrate. The openings are widened to join with immediately adjacent of the openings to form spaced pillars...
US20140134852 METHOD AND APPARATUS FOR FORMING DIELECTRIC FILM OF LOW-DIELECTRIC CONSTANT AND METHOD FOR DETACHING POROGEN  
A method for forming a porous low-k film having an Si—O structure includes irradiating infrared light upon a film including a material having an Si—O structure, and irradiating ultraviolet light...
US20070210298 Device and Method for Manipulating Direction of Motion of Current Carriers  
A device and method for manipulating a direction of motion of current carriers are presented. The device comprises a structure containing a two-dimensional gas of current carriers configured to...
US20150159125 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES  
This disclosure relates to a cleaning composition that contains 1) HF; 2) substituted or unsubstituted boric acid; 3) ammonium sulfate; 4) at least one metal corrosion inhibitor; 5) water; and 6)...
US20060240680 Substrate processing platform allowing processing in different ambients  
A semiconductor wafer processing system including a factory interface operating at atmospheric pressure and mounting plural wafer cassettes and plural wafer processing chambers connected to the...
US20130217152 SYSTEMS AND METHODS FOR FLEXIBLE COMPONENTS FOR POWERED CARDS AND DEVICES  
Die may be thinned using a thinning and/or a polishing process. Such thinned die may be flexible and may change operational characteristics when flexed. The flexible die may be applied to a...
US20100151697 Magnetic processing of operating electronic materials  
The electronic properties (such as electron mobility, resistivity, etc.) of an electronic material in operation in an electronic device or electronic circuit can be modified/enhanced when...
US20080105204 Substrate processing apparatus and manufacturing method for semiconductor devices  
A substrate processing apparatus comprises a processing chamber for processing a substrate, a substrate supporting tool for supporting and carrying the substrate into the processing chamber, a...
US20070207630 Surface treatment method of compound semiconductor substrate, fabrication method of compound semiconductor, compound semiconductor substrate, and semiconductor wafer  
A surface treatment method of a compound semiconductor substrate, a fabrication method of a compound semiconductor, a compound semiconductor substrate, and a semiconductor wafer are provided,...
US20050170670 Patterning of sacrificial materials  
Methods and compositions for patterning sacrificial materials are provided.
US20090149035 METHOD FOR MANUFACTURING OF A CRYSTAL OSCILLATOR  
A method of manufacturing a crystal oscillator, in which method semiconductor components and the crystal or another resonator (1) are joined to a bottom base (4), most suitably to the printed...
US20060166382 Method and apparatus for detecting backside particles during wafer processing  
A method and apparatus for detecting backside particles during wafer processing is provided. The method includes holding a wafer with vacuum pressure, detecting the presence of particles on a...
US20050255717 Method of operating substrate processing device  
A substrate processing device 10 has a substrate transfer chamber 12 for moving, by a horizontal movement mechanism, storage trays 301, 302 for respectively storing one and two of the substrate...
US20070184672 FLUIDIC DEVICE CONTAINING 3D STRUCTURES  
A micro fluidic device comprises a laminate structure, comprising a plurality of individual layers. At least one layer comprises a micro fluidic channel structure and at least on one side of said...
US20060134931 Method for forming quantum dots  
A method for forming quantum dots includes the following steps: (a) depositing a metal layer (4) on a substrate (2); (b) using an atomic force microscope (AFM) probe (6) to form a plurality of...
US20150228637 PATTERN ARRANGEMENT METHOD, SILICON WAFER AND SEMICONDUCTOR DEVICE USING A SILICON WAFER WITH A PATTERN ARRANGEMENT  
A silicon wafer includes a plurality of chip patterns arranged parallel to a first direction and a second direction intersecting the first direction, wherein the plurality of chip patterns include...
US20150179490 SUBSTRATE PROCESSING APPARATUS, PROGRAM AND SUBSTRATE PROCESSING METHOD  
A substrate processing apparatus includes a sealed container which interiorly has a space for housing substrates and is provided with an opening for introducing or discharging the substrates, an...

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