Matches 1 - 45 out of 45


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US20100297848 ETCHING OF TUNGSTEN SELECTIVE TO TITANIUM NITRIDE  
The present invention in one embodiment provides an etch method that includes providing a structure including a tungsten (W) portion and a titanium nitride (TiN) portion; applying a first etch...
US20070134927 METHOD FOR REMOVING RESIDUES FORMED DURING THE MANUFACTURE OF MEMS DEVICES  
A method of removing residues from an integrated device, in particular residues resulting from processing in HF vapor, is disclosed wherein the fabricated device is exposed to dry water vapor for...
US20090061640 Alternate gas delivery and evacuation system for plasma processing apparatuses  
A gas distribution system for supplying a gas mixture to a plasma process chamber is provided. A first valve arrangement is connected to upstream ends of a first gas line and a second gas line. A...
US20090053898 Formation of a slot in a silicon substrate  
A slot is formed that reaches through a first side of a silicon substrate to a second side of the silicon substrate. A trench is laser patterned. The trench has a mouth at the first side of the...
US20050274691 Etch method to minimize hard mask undercut  
A method of etching a semiconductor structure is described herein. The method includes providing a hard mask layer covering a substrate, the hard mask layer having a window to expose a portion of...
US20120196447 UNIFORM DRY ETCH IN TWO STAGES  
A method of etching silicon oxide from a multiple trenches is described which allows more homogeneous etch rates among trenches. The surfaces of the etched silicon oxide within the trench...
US20100068654 METHOD FOR CREATING GRAY-SCALE FEATURES FOR DUAL TONE DEVELOPMENT PROCESSES  
A method of patterning a substrate using a dual-tone development process is described. The patterning method comprises forming a layer of radiation-sensitive material on a substrate, wherein the...
US20060264054 Method for etching a trench in a semiconductor substrate  
The present invention relates to a method for etching a trench in a semiconductor substrate. More specifically, the present invention relates to a method for etching deep trenches such as those...
US20090075438 METHOD OF FABRICATING ORGANIC LIGHT EMITTING DIODE DISPLAY DEVICE  
In a method of fabricating organic light emitting diode display, a planarization layer is annealed, cured, provided with an ashing treatment, and surface-treated to reduce roughness of the...
US20060252267 Topology-selective oxide CMP  
A method of performing chemical mechanical polishing (CMP) is described herein. By way of example, substantially undiluted slurry is applied to a polishing pad. A first CMP process is performed...
US20140094037 Method and Apparatus for Preventing Native Oxide Regrowth  
A method for combinatorially processing a substrate is provided. The method includes introducing a first etchant into a reactor cell and introducing a fluid into the reactor cell while the first...
US20130137276 METHOD AND APPARATUS FOR PREVENTING NATIVE OXIDE REGROWTH  
A method for combinatorially processing a substrate is provided. The method includes introducing a first etchant into a reactor cell and introducing a fluid into the reactor cell while the first...
US20100278368 MICROMACHINED HORN  
An acoustic device includes a transducer formed on a first surface of a substrate and an acoustic horn formed in the substrate by a dry-etching process through an opposing second surface of the...
US20060219663 Metal CMP process on one or more polishing stations using slurries with oxidizers  
Polishing compositions and methods for removing conductive materials and barrier materials from a substrate surface are provided. In one aspect, a full sequence electrochemical mechanical...
US20070128875 Dry etch release method for micro-electro-mechanical systems (MEMS)  
The present invention provides a means for releasing semiconductor, micromachined and/or Micro-Electro-Mechanical Systems (MEMS) parts from a substrate. Semiconductor, micromachined or MEMS...
US20070141847 Notch stop pulsing process for plasma processing system  
A method for etching a substrate having a silicon layer in a plasma processing chamber having a bottom electrode on which the substrate is disposed on during etching. The method includes...
US20070161252 Method of manufacturing flash memory and flash memory manufactured from the method  
Method of manufacturing flash memories comprise forming a floating gate, a control gate, and a dielectric layer in the same etching apparatus. In some embodiments, Cl2, Ar, HBr, HeO2, He, CF4, and...
US20080045032 Method for producing semiconductor device  
There is provided a method for producing a semiconductor device which forms a deep hole contact ultra-finely without generating distortion of an opening and Twisting in a contact hole. The method...
US20080138997 TWO STEP ETCHING OF A BOTTOM ANTI-REFLECTIVE COATING LAYER IN DUAL DAMASCENE APPLICATION  
Methods for removing a BARC layer from a feature are provided in the present invention. In one embodiment, the method includes providing a substrate having a feature filled with a BARC layer in an...
US20100197143 DRY ETCHING METHOD FOR SILICON NITRIDE FILM  
A dry etching method for a silicon nitride film capable of improving throughput is provided. A dry etching method for dry-etching a silicon nitride film 103 includes dry-etching the silicon...
US20070131649 ETCHING METHOD  
The invention is directed to an etching method. The etching method comprises steps of providing a material layer having a patterned hard mask layer formed thereon and then performing a first dry...
US20090152110 Chip For Cell Electrophysiological Sensor, Cell Electrophysiological Sensor Using The Same, and Manufacturing Method of Chip for Cell Electrophysiological Sensor  
A chip for a cell electrophysiological sensor has a substrate. The substrate has a through-hole formed from the upside to the downside, and the opening of the through-hole is formed in a curved...
US20060130761 Thin film processing system and method  
A thin film processing system alternately introducing two types of material gases into a reaction vessel unit so as to process the surface of a substrate, provided with a reaction vessel (first...
US20100099264 ETCHING HIGH-K MATERIALS  
A dry etch method, apparatus, and system for etching a high-k material comprises sequentially contacting the high-k material with a vapor phase reducing agent, and a volatilizing etchant in a...
US20060141775 Method of forming electrical connections in a semiconductor structure  
A method of forming a semiconductor structure comprises providing a substrate comprising a layer of a material formed on a first surface of the substrate. At least one recess is formed in the...
US20120083131 METHOD AND APPARATUS FOR TREATING SILICON SUBSTRATE  
A method and an apparatus for treating a silicon substrate for effectively removing a silicon oxide film formed on a surface of a silicon film and improving surface uniformity of the silicon film....
US20090142931 Cleaning method following opening etch  
A cleaning method following an opening etching is provided. First, a semiconductor substrate having a dielectric layer is provided. The hard mask layer includes at least a metal layer. The opening...
US20100258873 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME  
A semiconductor device includes a first contact formed so as to be connected to the first impurity-diffused region, but not to the first gate electrode; and a second contact formed so as to be...
US20100109054 PATTERN FORMATION IN SEMICONDUCTOR FABRICATION  
Provided is a semiconductor device. The device includes a substrate having a photo acid generator (PAG) layer on the substrate. The PAG layer is exposed to radiation. A photoresist layer is formed...
US20090029538 PROCESS FOR MAKING A SEMICONDUCTOR DEVICE USING PARTIAL ETCHING  
A method including partially etching a first portion of a first layer, wherein the first layer is a conductive layer, is provided. The method further includes removing at least a portion of a...
US20080268648 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE  
Disclosed is a means for stabilizing quality of a semiconductor device by preventing projections from being formed in the bottom of a through hole. A method of manufacturing a semiconductor device...
US20080123176 PROCESS FOR CREATING OHMIC CONTACT  
The present invention provides a method for manufacturing a microelectronic device and a microelectronic device. The method for manufacturing the microelectronic device, without limitation, may...
US20170025282 METHOD AND APPARATUS FOR DRY GAS PHASE CHEMICALLY ETCHING A STRUCTURE  
According to the invention there is provided a method of dry gas phase chemically etching a structure comprising the steps of: positioning the structure in an etch chamber, the structure...
US20160307773 Method of Manufacturing Semiconductor Devices  
A substrate having an insulating layer including an oxide is loaded into a chamber, and at least a part of the insulating layer is removed by injecting a process gas including an etching source...
US20160225637 ETCHING METHOD AND STORAGE MEDIUM  
An etching method includes: disposing a target substrate including a silicon and a silicon-germanium within a chamber; and performing both of selectively etching the silicon-germanium with respect...
US20160079088 METHOD FOR ETCHING A HARDMASK LAYER FOR AN INTERCONNECTION STRUCTURE FOR SEMICONDUCTOR APPLICATIONS  
Embodiments of the present disclosure provide methods for patterning a hardmask layer disposed on a metal layer, such as a copper layer, to form an interconnection structure in semiconductor...
US20160071733 METHOD FOR PRODUCING SEMICONDUCTOR PIECE, CIRCUIT BOARD AND ELECTRONIC DEVICE INCLUDING SEMICONDUCTOR PIECE, AND METHOD FOR DESIGNING ETCHING CONDITION  
A method for producing a semiconductor piece includes forming a first groove portion of a front-surface-side groove by anisotropic dry etching from a front surface of a substrate, forming a second...
US20160005621 ETCHING METHOD, ETCHING APPARATUS AND STORAGE MEDIUM  
A method for etching a silicon oxide film on a target substrate where an etching area is partitioned by pattern layers and stopping the etching before a base layer of the silicon oxide layer is...
US20150214065 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE  
A method of manufacturing a semiconductor device, the method, comprising a first etching step of etching a substrate on which a silicon member and a compound member containing nitrogen and silicon...
US20150064927 SURFACE PLANARIZATION METHOD OF THIN FILM AND PREPARING METHOD OF ARRAY SUBSTRATE  
A surface planarization method of thin film and a preparing method of an array substrate relate to a display field, and can solve the technical problem that the conventional dry etching severely...
US20140319693 SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME  
A method of forming a semiconductor device is disclosed. Provided is a substrate having at least one MOS device, at least one metal interconnection and at least one MOS device formed on a first...
US20130017687 METHOD FOR FORMING OPENINGS IN SEMICONDUCTOR DEVICE  
A method for forming an opening in a semiconductor device is provided, including: providing a semiconductor substrate with a silicon oxide layer, a polysilicon layer and a silicon nitride layer...
US20120184102 Method for smoothing group lll nitride semiconductor substrate  
The invention discloses a smoothing method to decrease bowing of group III nitride semiconductor substrate. The certain face of group III nitride semiconductor substrates is etched under the...
US20110081784 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE  
A manufacturing method of a semiconductor device includes: forming step of forming an etching mask on a second main face of a substrate, the etching mask being made of Cu or Cu alloy and having an...
US20110045615 Manufacturing method of semiconductor device  
A manufacturing method of a semiconductor device using a semiconductor manufacturing unit comprising a reaction chamber, a substrate mounting stage, and a high frequency power supply coupled to...

Matches 1 - 45 out of 45