Matches 1 - 29 out of 29


Match Document Document Title
US20130244441 COMPOSITE SHOWERHEAD ELECTRODE ASSEMBLY FOR A PLASMA PROCESSING APPARATUS  
A method of forming an elastomeric sheet adhesive bond between mating surfaces of an electrode and a backing member to accommodate stresses generated during temperature cycling due to mismatch in...
US20130164941 PLASMA REACTOR WITH ADJUSTABLE PLASMA ELECTRODES AND ASSOCIATED METHODS  
Plasma reactors with adjustable plasma electrodes and associated methods of operation are disclosed herein. The plasma reactors can include a chamber, a workpiece support for holding a...
US20080318433 Plasma confinement rings assemblies having reduced polymer deposition characteristics  
Plasma confinement ring assemblies are provided that include confinement rings adapted to reach sufficiently high temperatures on plasma-exposed surfaces of the rings to avoid polymer deposition...
US20110165779 METHOD OF ORIENTING AN UPPER ELECTRODE RELATIVE TO A LOWER ELECTRODE FOR BEVEL EDGE PROCESSING  
Methods for orienting an upper electrode relative to a lower electrode are provided. The lower electrode is configured to have a desired existing orientation in a process chamber to define active...
US20070032090 Plasma rapid thermal process apparatus in which supply part of radical source is improved  
Disclosed is a plasma rapid thermal process apparatus having an improved plasma supply port for supplying atomic radicals to a rapid thermal process chamber. The supply port includes an inner tube...
US20120083130 APPARATUS AND METHODS FOR SHIELDING A PLASMA ETCHER ELECTRODE  
Apparatus and methods for plasma etching are disclosed. In one embodiment, a method of etching a plurality of features on a wafer includes positioning a wafer on a feature plate within a chamber...
US20130295775 PLASMA PROCESSING APPARATUS  
Disclosed is a plasma processing device that provides an object to be treated with plasma treatment. A wafer as an object to be treated, which is attached on the upper surface of adhesive sheet...
US20090004873 HYBRID ETCH CHAMBER WITH DECOUPLED PLASMA CONTROLS  
A dielectric etch chamber and method for improved control of plasma parameters. The plasma chamber comprises dual-frequency bias source that capacitively couples the RF energy to the plasma, and a...
US20140377960 PLASMA ETCHING METHOD  
In a plasma etching method of performing a plasma etching on an amorphous carbon layer of a substrate to be processed by using an inorganic film as a mask, the substrate being mounted in a...
US20150243487 COMPRESSION MEMBER FOR USE IN SHOWERHEAD ELECTRODE ASSEMBLY  
A compression member for use in a showerhead electrode assembly of a capacitively coupled plasma chamber. The member applies a compression force to a portion of a film heater adjacent a power...
US20100210114 PLASMA PROCESSING METHOD  
A plasma processing method performed in a plasma processing apparatus including a processing chamber accommodating a substrate in which a plasma is generated; a mounting table mounting the...
US20090242516 PLASMA ETCHING METHOD AND COMPUTER READABLE STORAGE MEDIUM  
A plasma etching method includes disposing a first electrode and a second electrode to face each other; preparing a part in the processing chamber; supporting a substrate; vacuum-evacuating the...
US20090081878 Temperature control modules for showerhead electrode assemblies for plasma processing apparatuses  
A temperature control module for a showerhead electrode assembly for a semiconductor material plasma processing chamber includes a heater plate adapted to be secured to a top surface of a top...
US20090163034 COMPOSITE SHOWERHEAD ELECTRODE ASSEMBLY FOR A PLASMA PROCESSING APPARATUS  
A showerhead electrode for a plasma processing apparatus includes an elastomeric sheet adhesive bond between mating surfaces of an electrode and a backing member to accommodate stresses generated...
US20110104884 HOT EDGE RING WITH SLOPED UPPER SURFACE  
A hot edge ring with extended lifetime comprises an annular body having a sloped upper surface. The hot edge ring includes a step underlying an outer edge of a semiconductor substrate supported in...
US20100216313 PLASMA PROCESSING APPARATUS  
Disclosed is a plasma processing device that provides an object to be treated with plasma treatment. A wafer as an object to be treated, which is attached on the upper surface of adhesive sheet...
US20090047795 PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE MEDIUM  
A plasma processing apparatus includes a first radio frequency (RF) power supply unit for applying a first RF power for generating a plasma from a processing gas to at least one of a first and a...
US20080045031 PLASMA ETCHING METHOD AND COMPUTER READABLE STORAGE MEDIUM  
A plasma etching method for plasma-etching an anti-reflective coating formed on a target object includes the step of placing the target object into a processing chamber having a first electrode...
US20090221151 Electrode for plasma processing apparatus, plasma processing apparatus, plasma processing method and storage medium  
The present invention provides an upper electrode used in an etching apparatus and the etching apparatus including the upper electrode, both of which can properly reduce intensity of electric...
US20070017446 Apparatus to treat a substrate  
An apparatus to treat a substrate includes a processing chamber including a reaction space where a substrate to be treated is placed and a plasma is formed, a ferrite core having a plurality of...
US20140273494 PARALLEL PLATE DRY ETCHING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME  
According to one embodiment, a parallel plate dry etching apparatus includes: a lower electrode; an upper electrode having a plurality of etching gas supply ports in the lower surface; a reaction...
US20080182417 PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY APPORTIONING GROUND RETURN PATH IMPEDANCES AMONG PLURAL VHF SOURCES  
In a plasma reactor chamber a ceiling electrode and a workpiece support electrode, respective RF power sources of respective VHF frequencies f1 and f2 are coupled to either respective ones of the...
US20080171444 Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor  
A plasma processing chamber includes a cantilever assembly configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed...
US20090275207 PLASMA PROCESSING METHOD AND COMPUTER READABLE STORAGE MEDIUM  
A plasma etching method includes disposing first electrode and second electrodes; preparing a part in a processing chamber; supporting a substrate by the second electrode to face the first...
US20100124822 APPARATUSES FOR ADJUSTING ELECTRODE GAP IN CAPACITIVELY-COUPLED RF PLASMA REACTOR  
A plasma processing chamber includes a cantilever assembly configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed...
US20090017635 APPARATUS AND METHOD FOR PROCESSING A SUBSTRATE EDGE REGION  
The present invention comprises an apparatus and method for etching at a substrate edge region. In one embodiment, the apparatus comprises a chamber having a process volume, a substrate support...
US20080182418 PLASMA PROCESS UNIFORMITY ACROSS A WAFER BY CONTROLLING A VARIABLE FREQUENCY COUPLED TO A HARMONIC RESONATOR  
A method of processing a workpiece in a plasma reactor chamber includes coupling RF power via an electrode to plasma in the chamber, the RF power being of a variable frequency in a frequency range...
US20170004956 PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS  
A plasma processing method according to an aspect includes: preparing a plasma processing apparatus including: a chamber; a lower electrode; an upper electrode; a focus ring surrounding a...
US20120258601 E-Beam Enhanced Decoupled Source for Semiconductor Processing  
A semiconductor substrate processing system includes a processing chamber and a substrate support defined to support a substrate in the processing chamber. The system also includes a plasma...

Matches 1 - 29 out of 29