Matches 1 - 10 out of 10


Match Document Document Title
US20050136364 Stable developer dispersions for color photothermographic systems  
Solid particle dispersions of blocked developers useful in imaging elements can be made with substantially improved stability to particle growth by dispersing the blocked developer of interest in...
US20050084790 Color developer composition and imaging element containing same  
This invention relates to an aqueous dispersion composition comprising particles of a polyvalent metal salt of salicylic acid/styrene copolymer developer wherein said particles comprise at least...
US20050084807 Reducing photoresist line edge roughness using chemically-assisted reflow  
Line edge roughness may be reduced by treating a patterned photoresist with a plasticizer. The plasticizer may be utilized in a way to surface treat the photoresist after development. Thereafter,...
US20050282094 Developer for a photopolymer protective layer  
This invention relates to a composition used as a developer that contains a surfactant to improve the developing of photoresist, which may contain at least 50 mol % of monomers containing...
US20070298336 Carrier coating  
A carrier coating that may be used to coat carrier particles, including a specific additive that imparts the coating with superior storage stability and wherein the carrier coating includes an...
US20050130082 Developing solution for photoresist  
A novel developing solution for photoresists which is suitable for use as a developing solution for a photoresist formed on an aluminum-containing base formed on a wafer. It comprises an alkali...
US20060068337 Substrate processing method  
In the present invention, a substrate processing method, in which a developing treatment is performed after exposure processing of a pattern, includes a shaping step of shaping the shape of a...
US20120028196 METHOD OF FORMING PATTERN AND ORGANIC PROCESSING LIQUID FOR USE IN THE METHOD  
An embodiment of the method of forming a pattern, comprises (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) processing the exposed film...
US20150160558 Semiconductor Device Process Filter and Method  
In accordance with an embodiment, a method of filtering a process fluid such as a negative tone developer is provided. The negative tone developer is introduced to a filter membrane that comprises...
US20110159437 METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE  
A plate-making method includes: exposing a lithographic printing plate precursor with laser; and rubbing a surface of the exposed lithographic printing plate precursor with a rubbing member in the...

Matches 1 - 10 out of 10