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US20050250052 Maskless lithography using UV absorbing nano particle  
Systems and methods are disclosed for a maskless lithography process by over coating a photo resist layer with water soluble thermoplastics; and imaging ultraviolet (UV) absorbing nano particles...
US20060110689 Immersion photolithography with megasonic rinse  
A method comprises forming a photoresist on a substrate, rinsing the photoresist using a rinse liquid agitated with at least one megasonic source, exposing the photoresist to radiation while...
US20090081589 THICK FILM RESISTS  
Thick film photoresist compositions are disclosed.
US20080299487 LITHOGRAPHY MATERIAL AND LITHOGRAPHY PROCESS  
An immersion lithography resist material comprising a matrix polymer having a first polarity and an additive having a second polarity that is substantially greater than the first polarity. The...
US20090075217 TAPERED EDGE BEAD REMOVAL PROCESS FOR IMMERSION LITHOGRAPHY  
A method and apparatus for forming a tapered photoresist edge. The method includes: forming a photoresist layer on a substrate; exposing a first annular region of the photoresist layer adjacent to...
US20090042133 Antireflective Coating Composition  
An antireflective coating composition which forms films with high n values is described.
US20090035665 PROCESS OF SEMICONDUCTOR FABRICATION WITH MASK OVERLAY ON PITCH MULTIPLIED FEATURES AND ASSOCIATED STRUCTURES  
Spacers are formed by pitch multiplication and a layer of negative photoresist is deposited on and over the spacers to form additional mask features. The deposited negative photoresist layer is...
US20090104559 Bottom Antireflective Coating Compositions  
Developable bottom antireflective coating compositions are provided.
US20140272728 TECHNIQUES FOR PROCESSING PHOTORESIST FEATURES USING IONS  
A method of treating a substrate includes directing first ions over a first range of angles to one or more photoresist features disposed on the substrate, the first ions effective to generate an...
US20070218412 Rinse Solution For Lithography  
A novel rinse solution for lithography to be used for suppressing contraction of a pattern and a method for forming a resist pattern using the rinse solution are provided, by reducing product...
US20080070159 Stereolithography resins and methods  
Radiation curable resin compositions are provided that are most useful in stereolithography. A radiation curable resin includes a base oligomer, a cross linking agent, a reactive solvent, and an...
US20050221236 Process for preventing development defect and composition for use in the same  
The composition for preventing development-defects containing (1) an ammonium salt, a tetraalkylammonium salt or a C1 to C4 alkanolamine salt of C4 to C15 perfluoroalkylcarboxylic acid, C4 to C10...
US20080129970 Immersion Exposure System, and Recycle Method and Supply Method of Liquid for Immersion Exposure  
An immersion exposure system 1 performs an exposure process through a liquid 301 provided between an optical element of a projection optical means 121 and a substrate 111. The immersion exposure...
US20090053652 PHOTORESIST COMPOSITIONS  
Photoresist compositions are disclosed.
US20080014534 MICROPHOTONIC MASKLESS LITHOGRAPHY  
A maskless lithography system and method to expose a pattern on a wafer by propagating a photon beam through a waveguide on a substrate in a plane parallel to a top surface of the wafer.
US20090098490 Radiation-Sensitive, Wet Developable Bottom Antireflective Coating Compositions and Their Applications in Semiconductor Manufacturing  
The present invention is directed to novel radiation-sensitive, wet developable bottom antireflective coating (DBARC) compositions and their use in semiconductor device manufacturing. The DBARC...
US20050178322 Liquid trap for a vacuum line  
According to one aspect of the invention, a system for processing semiconductor substrates is provided. A de-gas unit may be connected to a flowing first semiconductor processing fluid to separate...
US20080085457 Exposure mask and method of manufacturing a film pattern  
A method of manufacturing a film pattern includes forming a film over a substrate, applying a photoresist over the film, exposing the photoresist using a first mask pattern including a first mask...
US20080081290 RESIST COMPOSITION, RESIN FOR USE IN THE RESIST COMPOSITION, COMPOUND FOR USE IN THE SYNTHESIS OF THE RESIN, AND PATTERN-FORMING METHOD USING THE RESIST COMPOSITION  
A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with...
US20090130592 Compositions and processes for immersion lithography  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially...
US20080038678 Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor  
There is provided an anti-reflective coating forming composition comprising a polymer having a pyrimidinetrione structure, imidazolidinedione structure, imidazolidinetrione structure or...
US20080081264 Optical Components Made From An Inorganic/Organic Hybrid Material For The Production Of Refractive Index Gradient Layers With Rapid Kinetics And Method For The Production Thereof  
An organic-inorganic hybrid material comprising (a) at least one soluble organic polymer, (b) at least one mono- or polynuclear metal complex having at least one ligand which comprises at least...
US20080192253 METHOD AND TEST-STRUCTURE FOR DETERMINING AN OFFSET BETWEEN LITHOGRAPHIC MASKS  
A method and a test-structure for determining an offset between lithographic masks are described. In one embodiment, an image of a first mask is provided in a patterning layer on a substrate. The...
US20060292501 Lithography process with an enhanced depth-on-focus  
Provided is a method for lithography processing. The method comprises forming a photoresist layer on a substrate and forming a resolution enhancement material (REM) layer on the photoresist layer....
US20070154852 METHOD FOR PATTERNING A THIN FILM USING A PLASMA BY-PRODUCT  
Embodiments relate to a method of patterning a thin film using a by-product of plasma. According to embodiments, the method may include (a) forming a thin film serving as a target object to be...
US20050026084 Semiconductor device and method for elimination of resist linewidth slimming by fluorination  
A semiconductor device (10) includes a photoresist layer (20) for patterning features on the semiconductor device (10) during manufacturing. After the photoresist layer (20) is deposited, the...
US20080014535 Method for detecting defects which originate from chemical solution and method of manufacturing semiconductor device  
A method for detecting defects which originate from a chemical solution includes coating a chemical solution on a surface of a mask, and radiating an exposure beam to the mask on which the...
US20070264599 Method for manufacturing semiconductor device using immersion lithography process with filtered air  
A method for manufacturing a semiconductor device using an immersion lithography process is disclosed. The semiconductor device is manufactured by filtering an air by using an amine removing...
US20070224545 METHOD FOR IMMERSION LITHOGRAPHY  
The invention is directed towards a method for immersion lithography by locally pre-treating the surface of the wafer. The surface of the wafer is treated locally with a pre-treatment process, so...
US20070059849 Method and system for BARC optimization for high numerical aperture applications  
A method is described for setting up lithographic processing of a substrate. The lithographic processing uses a bottom anti-reflective coating for minimizing the substrate reflectivity. Such...
US20090042148 Photoresist Composition for Deep UV and Process Thereof  
The present invention refers to a photoresist composition comprising (i) a polymer A comprising at least one acid labile group; (ii) at least one photoacid generator; (iii) at least one base; (iv)...
US20090258322 METHODS FOR PLANARIZING UNEVENNESS ON SURFACE OF WAFER PHOTORESIST LAYER AND WAFERS PRODUCED BY THE METHODS  
A wafer has a substrate and a photoresist layer thereon with a surface that is planarized by positioning over a starting surface of the photoresist layer a gray-scale mask having a pattern that...
US20080166638 Photoresist Composition And Method For Forming Pattern Of A Semiconductor Device  
A photoresist composition includes a base resin, a copolymer of acrylic acid or methacrylic acid and 3,3-dimethoxypropene, a photoacid generator, an organic base, and an organic solvent, and is...
US20080050679 METHODS AND SYSTEMS FOR PERFORMING IMMERSION PROCESSING DURING LITHOGRAPHY  
A method of processing a substrate includes forming a coating layer over a front surface of the substrate and exposing the coating layer in an immersion scanner. The coating layer may include a...
US20060199111 Method for manufacturing semiconductor devices using a photo acid generator  
Provided is a method for manufacturing a semiconductor device. In one example, the method includes providing a substrate, forming a photo acid generator (PAG) layer over the substrate, where the...
US20050079451 Processes for treating a substrate and removing resist from a substrate  
The invention includes a process whereby a solvent is utilized to remove soluble portions of a resist, and subsequently the solvent can be removed with a gas-fortified liquid. In particular...
US20080187867 PHOTOSENSITIVE POLYIMIDE COMPOSITION, POLYIMIDE FILM AND SEMICONDUCTOR DEVICE USING THE SAME  
A photosensitive polyimide composition, a polyimide film, and a semiconductor device using the same are disclosed. The photosensitive polyimide composition can be cured by heating. A...
US20090035701 Photoresist and pattern-forming process using the same  
A photolithography process using a photoresist is as following. A substrate is provided for coating a photoresist thereon to form a photoresist layer and the photoresist is formed by mixing...
US20080063975 Polymer, Positive Resist Composition and Method for Forming Resist Pattern  
A polymer, a positive resist composition, and a method for forming a resist pattern that are able to form a resist pattern with a high level of resolution and excellent etching resistance. The...
US20090117360 SELF-ASSEMBLED MATERIAL PATTERN TRANSFER CONTRAST ENHANCEMENT  
A non-photosensitive polymeric resist containing at least two immiscible polymeric block components is deposited on the planar surface. The non-photosensitive polymeric resist is annealed to allow...
US20090023078 Lithography Masks and Methods of Manufacture Thereof  
Lithography masks and methods of manufacture thereof are disclosed. For example, a method of manufacturing a lithography mask includes forming a stack over a substrate. The stack includes bottom...
US20050255414 Pattern forming method  
A pattern forming method includes (a) a step of forming a resist film on a substrate, (b) a pre-wet step of spreading a pre-wet solution on the resist film and after a fixed time, removing the...
US20080118861 FILM FORMING METHOD, FILM FORMING APPARATUS AND PATTERN FORMING METHOD  
Such a film forming method is provided that can prevent peeling of surface films including a resist film from a substrate during immersion exposure. The film forming method includes the steps of...
US20080085479 PATTERN FORMING METHOD AND DEVICE PRODUCTION PROCESS USING THE METHOD  
A pattern forming method for forming a pattern comprising a plurality of fine particles disposed on a substrate includes a step of forming, on the substrate, a silane coupling agent-containing...
US20110091821 RESIST TREATMENT UNIT, RESIST COATING AND DEVELOPING APPARATUS, AND RESIST TREATMENT METHOD  
A resist treatment unit for performing treatment on a resist film which has been formed on a substrate is disclosed. This resist treatment unit includes: a treatment container capable of...
US20050069819 Method for forming resist pattern and method for manufacturing semiconductor device  
According to an aspect of the invention, there is provided a method for forming a resist pattern by using a liquid immersion type exposing apparatus which executes exposure in a state in which a...
US20090081591 METHOD FOR PATTERNING A PHOTOSENSITIVE LAYER  
The method of patterning a photosensitive layer includes providing a substrate including a first layer formed thereon, treating the substrate including the first layer with cations, forming a...
US20070224546 Method of forming resist pattern and method of maufacturing semiconductor device  
The present invention improves the OPE characteristic generated by the difference between sparse and dense mask patterns and promotes fidelity in the design of the pattern. Because of this, the...
US20090035708 LAYER PATTERNING USING DOUBLE EXPOSURE PROCESSES IN A SINGLE PHOTORESIST LAYER  
A structure and a method for forming the same. The method includes providing a structure which includes (a) a to-be-patterned layer, (b) a photoresist layer on top of the to-be-patterned layer...
US20080081281 MATERIALS FOR PHOTORESIST, PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN  
To overcome the problem that a device performance is degraded by the edge roughness of a photoresist pattern, a mixture of polynuclear phenol compounds having, in one molecule, 0 to 6 functional...

Matches 1 - 50 out of 61 1 2 >