Matches 1 - 50 out of 295 1 2 3 4 5 6 >


Match Document Document Title
US20080268382 Glass Paste, Method for Producing Display by Using Same, and Display  
Disclosed is a glass paste containing a glass powder and an organic component, wherein a black pigment is composed of a complex oxide having a spinel structure and containing Co element and one or...
US20110151190 SHADOW EDGE LITHOGRAPHY FOR NANOSCALE PATTERNING AND MANUFACTURING  
An advanced high-resolution and high-throughput shadow edge (116) lithography (SEL) method is disclosed for forming uniform zero- one- and two-dimensional nanostructures on a substrate. The method...
US20140234780 LITHOGRAPHY WITH REDUCED FEATURE PITCH USING ROTATING MASK TECHNIQUES  
Embodiments of the present invention are directed to techniques for obtaining patterns of features. One set of techniques uses multiple-pass rolling mask lithography to obtain the desired feature...
US20120135260 FABRICATION OF NANO-TWINNED NANOPILLARS  
Nanopillars with nanoscale diameters are provided where the nanopillar has uniformly aligned nano-twins either perpendicular or inclined by 1-90° to the pillar-axis with no grain-boundaries or any...
US20140242524 TWO MASK PROCESS FOR ELECTROPLATING METAL EMPLOYING A NEGATIVE ELECTROPHORETIC PHOTORESIST  
A negative electrophoretic photoresist is applied over a plurality of protruding disposable template portions on a substrate. A silo structure is placed on planar portions of the negative...
US20070231712 Alternating phase shift masking  
An alternating phase shift mask may be formed using a dry undercut etch. The dry undercut etch reduces problems associated with wet etching of quartz or glass masks. In addition, the use of the...
US20110229829 LITHOGRAPHY MATERIAL AND LITHOGRAPHY PROCESS  
An immersion lithography resist material comprising a matrix polymer having a first polarity and an additive having a second polarity that is substantially greater than the first polarity. The...
US20080248267 Building Up Diffractive Optics by Structured Glass Coating  
Ultrasonic pulser-receiver circuitry, for use with an ultrasonic transducer, the circuitry comprising a circuit board; ultrasonic pulser circuitry supported by the circuit board and configured to...
US20090208882 STAMP FOR PATTERNING, METHOD FOR MANUFACTURING SUCH STAMP AND METHOD FOR MANUFACTURING AN OBJECT USING THE STAMP  
A stamp for patterning onto a receiving surface of an object (101) according to a defined pattern (P) comprises a stamping surface (21) of a resilient diaphragm (20). The stamping surface is...
US20100028810 ETCHING METHOD FOR USE IN DEEP-ULTRAVIOLET LITHOGRAPHY  
In a lithography process using an ultraviolet process, the applied ultraviolet resist can be removed by intentionally condensing the ultraviolet resist before removing the ultraviolet resist.
US20050014075 Phase edge darkening binary masks  
A binary mask and method for improving the aerial image and mask error enhancement factor (MEEF) of binary masks. A phase edge darkening binary mask is provided which has quartz etched, preferably...
US20050158634 Photolithography mask comprising absorber/phase-shifter elements  
This invention relates to an insolation mask including a transparent substrate (100) and at least one absorber/phase shifter element (112) embedded in the substrate, so as to form a monolithic...
US20080193790 Drum For a Machine Producing a Patterned Nonwoven and Obtained Fabric  
The inventive nickel drum comprises a first part whose lateral surface is provided with perforations at the first level thereof and a second part whose lateral surface is provided with...
US20060246361 Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask  
A method of manufacturing a mask blank glass substrate includes a marking step of irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of...
US20110155855 METHOD FOR MAKING AN ACOUSTIC PANEL FOR THE AIR INTAKE LIP OF A NACELLE  
The invention relates to a method for making an acoustic panel (12) for an air intake lip (2) of a nacelle (1) that includes the steps of obtaining a perforated de-icing assembly (14) including at...
US20060154152 Flare reduction in photolithography  
Lithography masks that include sub-resolution features to reduce flare are disclosed and described herein.
US20070238032 Half-tone type phase-shifting mask and method for manufacturing the same  
A half-tone type phase-shifting mask is disclosed. The mask includes a half-tone film disposed on a part on which a light-shielding pattern and a part on which a semi-light shielding pattern, and...
US20060073394 REDUCED MASK COUNT GATE CONDUCTOR DEFINITION  
A combined wide-image and loop-cutter pattern is provided for both cutting and forming a wide-image section to a hard mask on a substrate formed by sidewall imaging techniques in a reduced number...
US20060257753 Photomask and method thereof  
A photomask and method thereof. In an example method, a photomask may be manufactured by forming an oxide layer on a surface, patterning the oxide layer to form an oxide pattern, the oxide pattern...
US20130029130 METHOD FOR FABRICATING A POROUS CARBON STRUCTURE USING OPTICAL INTERFERENCE LITHOGRAPHY, AND POROUS CARBON STRUCTURE FABRICATED BY SAME  
Provided are a method for fabricating a porous carbon structure using optical interference lithography, and a porous carbon structure fabricated by same, wherein the method for fabricating a...
US20110111345 SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE  
Coating compositions include a polymer including: wherein R1 is a silicon containing moiety, R2 is an acid stable lactone functionality, and R3 is an acid labile lactone functionality; X1, X2, X3...
US20060210887 Lithography mask and methods for producing a lithography mask  
Lithography mask for the lithographic patterning of a resist layer on a substrate having first regions, in which the lithography mask has a nontransparent layer, and second and third regions,...
US20140116980 METHOD FOR PROVIDING A TEMPLATE FOR A SELF-ASSEMBLABLE POLYMER FOR USE IN DEVICE LITHOGRAPHY  
Methods are disclosed for depositing a template for directed self-assembly of a self-assemblable block polymer on a surface of a substrate. The method involves providing a chemical epitaxy pattern...
US20110091811 DOUBLE-LAYERED PATTERNABLE ADHESIVE FILM, METHOD OF FORMING THE SAME, AND METHOD OF FORMING PATTERNABLE ADHESIVE LAYER USING THE SAME  
A patternable adhesive film is formed in a double-layered structure of an adhesive layer having patternability and an adhesive layer having both adhesion and developability. Thus, the...
US20140242525 PATTERNING OF TRANSPARENT CONDUCTIVE COATINGS  
A method of patterning a conductive polymer includes providing a conductive polymer layer coated over a first support followed by pattern-wise transferring a layer containing polyvinyl acetal from...
US20110236837 Switchable Antireflective Coatings  
An antireflective coating compositions comprising (I) a silsesquioxane resin (II) a compound selected from photo-acid generators and thermal acid generators; and (III) a solvent wherein in the...
US20060115742 Tri-tone trim mask for an alternating phase-shift exposure system  
A photolithographic trim mask includes a transparent region, an attenuated phase-shift region, and an opaque region. The transparent region substantially transmits received light. The attenuated...
US20050260503 Reticle film stabilizing method  
A reticle film stabilizing method which is suitable for stabilizing a reticle film on a reticle, is disclosed. The method includes subjecting the multilayer reticle film to VUV (vacuum...
US20120258387 METHOD AND MASK FOR ENHANCING THE RESOLUTION OF PATTERNING 2-ROW HOLES  
A photolithography mask including a plurality of mask features. Adjacent mask features are separated by a gap and are offset from each other such that individual mask features have one-side dense...
US20080286699 Reticles, and methods of treating reticles, configuring reticles and using reticles  
Some embodiments include methods of treating reticles to provide backside masking across regions of the reticle to compensate for problems occurring during photolithographic processing. The...
US20090246715 PLATING METHOD AND METHOD OF FORMING MAGNETIC POLE  
The plating method is capable of firmly adhering a resist pattern on a plating base in case that, for example, a main magnetic pole of a vertical recording magnetic head is formed by using the...
US20050158637 Template, method of forming the template and method of forming a pattern on a semiconductor device using the template  
A template, a method of forming the template and a method of forming a photoresist pattern using a lithographic template is disclosed. In the method, a photoresist film is formed on a substrate. A...
US20110086314 MELTS  
A light-attenuating composition and method of using it are described. The light-attenuating composition may be selectively applied to a radiant energy sensitive material on the substrate. Actinic...
US20060222961 Leaky absorber for extreme ultraviolet mask  
The present invention discloses a method of forming a mask including: providing a substrate; forming a multilayer mirror for EUV light over the substrate; forming a leaky absorber for the EUV...
US20060216615 Wavefront engineering with off-focus mask features  
An imaging part such as a mask or reticle includes a patterned layer in an on-axis plane of the imaging part. The imaging part further includes another layer including sub-resolution features,...
US20060154151 Method for quartz photomask plasma etching  
A method for etching quartz is provided herein. In one embodiment, a method of etching quartz includes providing a filmstack in an etching chamber, the filmstack having a quartz layer partially...
US20050260502 Method and mask for forming a photo-induced pattern  
A lithographic mask comprising a primary pattern having a substantially continuously changing critical dimension in at least a first portion thereof, and a resolution enhancement feature in...
US20120045721 METHOD FOR FORMING A SELF-ALIGNED DOUBLE PATTERN  
The invention can provide a method of processing a substrate using Double-Patterned-Shadow (D-P-S) processing sequences that can include (D-P-S) creation procedures, (D-P-S) evaluation procedures,...
US20100291385 FABRICATION OF VERTICALLY ALIGNED METALLIC NANOPILLARS  
Solid and hollow cylindrical nanopillars with nanoscale diameters are provided. Also provides is a method of making such nanopillars using electron beam lithography followed by the electroplating.
US20060115746 Focus monitoring masks having multiple phase shifter units and methods for fabricating the same  
A focus monitoring mask includes a transparent substrate, e.g., a quartz layer. A light blocking film, e.g., a chromium-containing film, is disposed on the transparent substrate and has an opening...
US20140057104 Process for Fabricating High-Precision Objects by High-Resolution Lithography and Dry Deposition and Objects thus Obtained  
The invention relates to a process for fabricating a high-precision object made of at least one inorganic material, comprising the following steps: using a high-resolution photolithography...
US20060019176 Chromeless phase shift mask and method of fabricating the same  
A chromeless phase shift mask (PSM) can be used in a single exposure process to produce a pattern whose features have different after development inspection critical dimensions (ADI CDs). The...
US20060134531 Mask for electromagnetic radiation and method of fabricating the same  
A mask for lithography and a method of manufacturing the same. The mask may include a substrate, a reflection layer formed of a material capable of reflecting electromagnetic rays on the substrate...
US20090130609 Colored mask combined with selective area deposition  
The invention relates to a process for forming a structure comprising (a) providing a transparent support; (b) forming a color mask on a first side of the transparent support; (c) applying a first...
US20150185614 ORGANIC BOTTOM ANTIREFLECTIVE COATING COMPOSITION FOR NANOLITHOGRAPHY  
An anti-reflective coating composition is provided. The anti-reflective coating composition of the present invention can be useful in preventing a pull-back phenomenon in which an anti-reflective...
US20100099045 METHODS FOR PERFORMING PHOTOLITHOGRAPHY USING BARCS HAVING GRADED OPTICAL PROPERTIES  
Photolithography methods using BARCs having graded optical properties are provided. In an exemplary embodiment, a photolithography method comprises the steps of depositing a BARC overlying a...
US20090130608 PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE  
An atomic-layer-deposition process for forming a patterned thin film comprising providing a substrate, applying a photopatternable deposition inhibitor material to the substrate, wherein the...
US20110159411 Phase-shift photomask and patterning method  
A phase shift photomask blank has a quartz substrate, a lower chrome layer, a light-absorbing MoSi layer, and an upper chrome layer. This mask can be patterned in various ways to form a patterned...
US20130193065 Fabrication of Enclosed Nanochannels Using Silica Nanoparticles  
In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using...
US20080090183 Aligned Carbon Nanotubes And Method For Construction Thereof  
Aligned carbon nanotubes and composites for electrical interconnect and thermal interface materials are provided. In one preferred embodiment, an aligned carbon nanotube device comprises a...

Matches 1 - 50 out of 295 1 2 3 4 5 6 >