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US20130078574 SELF-ASSEMBLABLE POLYMER AND METHOD FOR USE IN LITHOGRAPHY  
A self-assemblable polymer is disclosed, having first and second molecular configurations with the first molecular configuration has a higher Flory Huggins parameter for the self-assemblable...
US20110053085 LITHOGRAPHIC PRINTING PLATE PRECURSORS AND STACKS  
Lithographic printing plate precursors have been designed so that they can be stored, shipped, and used in stacks without interleaf paper between individual precursors. This is achieved by...
US20120288797 PHOTORESIST COMPOSITIONS AND METHODS OF USE IN HIGH INDEX IMMERSION LITHOGRAPHY  
The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected...
US20150132700 PHOTORESIST WITH RARE-EARTH SENSITIZERS  
A method of making a photoresist with rare-earth sensitizers is provided. The rare-earth sensitizer could be a salt or a rare-earth complex. According to the invention, photoresist composition is...
US20100239982 Photoresist composition with high etching resistance  
A resist composition includes a first polymer including a repeating unit having the following Chemical Formula 1 and a repeating unit having the following Chemical Formula 2, a second polymer...
US20090081589 THICK FILM RESISTS  
Thick film photoresist compositions are disclosed.
US20100196825 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS  
Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable...
US20100085518 PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX  
The present invention relates to a photosensitive resin composition for a black matrix, a black matrix produced by the composition and a liquid crystal display including the black matrix. The...
US20150064613 NEGATIVE-WORKING PHOTOSENSITIVE SILOXANE COMPOSITION  
[Object] To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that.[Means]The present...
US20150079506 AMINE TREATED MALEIC ANHYDRIDE POLYMERS, COMPOSITIONS AND APPLICATIONS THEREOF  
Disclosed herein are various amine treated maleic anhydride containing polymers and compositions thereof, which are useful for forming self-imageable films. In some embodiments, such polymers...
US20070269744 Resist Composition for Electron Beam or Euv (Extreme Ultraviolet) and Method for Forming Resist Pattern  
A resist composition for electron beam or extreme ultraviolet (EUV), comprising a resin component (A) which exhibits changed alkali solubility under action of acid, and a photoacid generator...
US20120064725 NAPHTHALENE DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, AND PATTERNING PROCESS  
A naphthalene derivative having formula (1) is provided wherein An and Art denote a benzene or naphthalene ring, and n is such a natural number as to provide a weight average molecular weight of...
US20090295041 PRINTING FORM PRECURSOR AND PROCESS FOR PREPARING A STAMP FROM THE PRECURSOR  
The invention pertains to a printing form precursor and a method for preparing a stamp from the precursor for use in soft lithographic applications. The printing form precursor includes a...
US20100196826 Photoinitiators for Energy Curing  
Photopolymerisable systems for coatings or photolithography comprising radically photopolimerisable oligomers and/or monomers having ethylenically unsaturated groups and, as photoinitiator, at...
US20110200921 Pigment Dispersion Composition, Color Resist Composition Including the Same, and Color Filter Using the Same  
The present invention related to a pigment dispersion composition, a color resist composition including the same, and a color filter fabricated by using the color resist composition. The pigment...
US20110212402 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION  
A photosensitive resin composition comprising: a photosensitive polyimide of formula (I); an acrylate monomer; anda photoinitiator, wherein A, B, D, J, m, and n are as defined in the specification.
US20100136484 PHOTOSENSITIVE PASTE AND SINTERED LAYER  
Disclosed is a photosensitive paste including glass frit; organic binder; polymerizable monomer; photopolymerization initiator; and organic solvent, wherein at least a part of the polymerizable...
US20100323295 ALKALI-DEVELOPABLE RESINS, METHOD FOR PREPARING THE SAME AND PHOTOSENSITIVE COMPOSITION COMPRISING THE ALKALI-DEVELOPABLE RESINS  
The present invention relates to a novel alkali-developable resin, a method of producing the alkali-developable resin, a photosensitive resin composition including the alkali-developable resin,...
US20090311494 RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE, AND PROCESS FOR PRODUCING RELIEF PRINTING PLATE  
A relief printing plate precursor for laser engraving, including a relief forming layer containing (A) a polymerizable compound having an ethylenic unsaturated bond, (B) a binder polymer, and (C)...
US20090117490 POSITIVE RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN  
A positive resist composition for immersion lithography of the present invention includes a resin component (A) which exhibits increased alkali solubility under the action of acid; and an acid...
US20090197203 Photosensitive conductive paste for transferring and photosensitive transfer sheet  
A photosensitive conductive paste for transferring including a metal powder, an inorganic material powder, a photosensitive resin and a polymerization initiator, and to be applied onto a surface...
US20120135352 Preparation of Norbornane-based PAC Ballasts  
Embodiments in accordance with the present invention provide for norbornane-type ballast materials, norbornane-type photoactive compounds derived from such ballast materials and alkali-soluble...
US20120028190 POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERNING PROCESS  
A polymer is provided comprising recurring units having a N,N′-bis(alkoxymethyl)tetrahydropyrimidinone or N,N′-bis(hydroxymethyl)tetrahydropyrimidinone structure on a side chain. When a chemically...
US20090042132 RESIST COMPOSITION FOR IMMERSION LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN  
A resist composition for immersion lithography of the present invention includes a resin component (A) which exhibits changed alkali solubility under the action of acid; and an acid generator...
US20100104981 COLORED DISPERSION, PHOTORESIST COMPOSITION AND BLACK MATRIX  
A colored dispersion according to the present invention comprises a resin including monomers of Formulas 1 to 4, as a binder resin. Accordingly, a photoresist composition for a black matrix of a...
US20080026302 BLACK MATRIX COMPOSITIONS AND METHODS OF FORMING THE SAME  
Black matrix compositions, methods for forming a black matrix, and apparatus for use in forming a color filter for a flat-panel display are disclosed. The compositions, methods and apparatus use...
US20090042133 Antireflective Coating Composition  
An antireflective coating composition which forms films with high n values is described.
US20100047715 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM, CHEMICALLY AMPLIFIED DRY FILM FOR THICK FILM, AND METHOD FOR PRODUCTION OF THICK FILM RESIST PATTERN  
Disclosed are a chemically amplified positive-type photoresist composition for a thick film, a chemically amplified dry film for a thick film, and a method for producing a thick film resist...
US20100028807 Imide Compound and Chemically Amplified Resist Composition Containing The Same  
An imide compound represented by the formula (I): wherein R1 represents a C1-C20 aliphatic hydrocarbon group etc., W1 represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom...
US20080081291 PHOTOPOLYMERIZATION TYPE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR  
A negative-working photopolymerization type photosensitive lithographic printing plate precursor for exposing with laser, includes: a hydrophilic support; at least one photopolymerizable...
US20120129106 POSITIVE LIFT-OFF RESIST COMPOSITION AND PATTERNING PROCESS  
A positive lift-off resist composition is provided comprising (A) an alkali-soluble novolac resin, (B) a quinonediazidosulfonate photosensitive agent, (C) an alkali-soluble cellulose resin, and...
US20090155721 FLEXOGRAPHIC PRINTING PLATE  
According to the present invention, a flexographic printing plate and a photosensitive resin composition used therein are provided. The flexographic printing plate comprises a photocured product...
US20100015554 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION  
An actinic-ray- or radiation-sensitive resin composition comprises (A) a resin that when acted on by an acid, exhibits an increased solubility in an alkali developer, (B) a compound that when...
US20090233014 Photoactive Film, Its Preparation And Use, And Preparation Of Surface Relief And Optically Anisotropic Structures By Irradiating Said Film  
The present invention relates to a homogeneous, photoactive film consisting of or comprising a polyelectrolyte carrying residues which may undergo a photoreaction, the polyelectrolyte mainly...
US20120262793 BLACK CURABLE COMPOSITION FOR WAFER - LEVEL LENS, AND WAFER - LEVEL LENS  
A black curable composition for a wafer-level lens including (A) a metal-containing inorganic pigment, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a cardo resin.
US20080299489 ULTRAVIOLET CURABLE COATING FLUID FOR PRINTING SYSTEMS  
An ultraviolet curable coating fluid includes a polymerizable olefin monomer or monomer blend that undergoes self-photoinitiating polymerization when exposed to a predetermined ultraviolet...
US20110070544 Novel Salt Having Fluorine-Containing Carbanion Structure, Derivative Thereof, Photoacid Generator, Resist Material Using the Photoacid Generator, and Pattern Forming Method  
There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By...
US20110039210 NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME  
Provided are new resins that comprise lactone units and photoresist compositions that comprise such resins.
US20080070159 Stereolithography resins and methods  
Radiation curable resin compositions are provided that are most useful in stereolithography. A radiation curable resin includes a base oligomer, a cross linking agent, a reactive solvent, and an...
US20150125791 LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION  
Disclosed is a method and apparatus for mitigation of photoresist line pattern collapse in a photolithography process by applying a gap-fill material treatment after the post-development line...
US20090269683 RADIATION-SENSITIVE RESIN COMPOSITION AND COLOR FILTERS  
A radiation sensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a radiation sensitive radical generator, wherein the...
US20090042105 Sensitizer dyes for photoacid generating systems  
Photosensitizing dyes are often used in conjunction with a photoacid generator in holographic recording media. Conventional photosensitizing dyes typically are limited by having an appreciable...
US20110165519 RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME  
The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated...
US20140141375 SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME  
Disclosed herein is a composition comprising a graft block copolymer comprising a copolymer comprising a backbone polymer; and a first graft polymer that comprises a surface energy reducing...
US20080261151 Thermally Reactive Infrared Absorption Polymers and Their Use in a Heat Sensitive Lithographic Printing Plate  
The invention provides a near infrared absorption polymer comprising at least two different pendent infra-red chromophoric moieties covalently bonded to the backbone of an alkali-soluble resin, at...
US20070298336 Carrier coating  
A carrier coating that may be used to coat carrier particles, including a specific additive that imparts the coating with superior storage stability and wherein the carrier coating includes an...
US20120129273 PHOTOLITHOGRAPHICALLY DEFINED CONTACTS TO CARBON NANOSTRUCTURES  
Methods for the fabrication of nanostructures, including nanostructures comprised of carbon nanotubes, and the nanostructures, devices, and assemblies prepared by these methods, are described.
US20090053652 PHOTORESIST COMPOSITIONS  
Photoresist compositions are disclosed.
US20120129102 PHOTOSENSITIVE COMPOSITION INCLUDING PHOTOPOLYMERIZABLE POLYMER HAVING FLUORENE SKELETON  
A material for a planarization film, a spacer, and a microlens that satisfies heat resistance and transparency requirements without impairing a refractive index. A negative photosensitive...
US20090297983 PRINTING MEMBERS HAVING PERMEABILITY-TRANSITION LAYERS AND RELATED METHODS  
Affinity transitions from hydrophobic to hydrophilic states, rather than ablation mechanisms, facilitate the creation of an imagewise lithographic pattern on a printing plate.

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