Matches 1 - 50 out of 114 1 2 3 >


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US20090295041 PRINTING FORM PRECURSOR AND PROCESS FOR PREPARING A STAMP FROM THE PRECURSOR  
The invention pertains to a printing form precursor and a method for preparing a stamp from the precursor for use in soft lithographic applications. The printing form precursor includes a...
US20100248147 PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER PHOTORESIST SYSTEMS  
A photoresist composition and methods using the photoresist composition in multiple exposure/multiple layer processes. The photoresist composition includes a polymer comprising repeat units having...
US20090220888 Dyed photoresists and methods and articles of manufacture comprising same  
The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more...
US20080241751 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS  
A chemically amplified negative resist composition comprises a polymer comprising recurring hydroxystyrene units and recurring styrene units having electron withdrawing groups substituted thereon....
US20080032232 Novel resins and photoresist compositions comprising same  
Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise...
US20090239175 Stereolithographic Resins Containing Selected Oxetane Compounds  
A liquid radiation-curable composition that comprises (A) at least one cationically polymerizing organic substance;(B) at least one free-radical polymerizing organic substance;(C) at least one...
US20100261103 ORGANIC PIGMENT FINE PARTICLES AND METHOD OF PRODUCING THE SAME, PIGMENT-DISPERSION COMPOSITION, PHOTOCURABLE COMPOSITION AND INK-JET INK CONTAINING THE SAME, AND COLOR FILTER USING THE SAME AND METHOD OF PRODUCING THE SAME  
Organic pigment fine particles, having capability of self-dispersion, having an organic pigment and a polymer compound, the organic pigment fine particles of being nanometer-sized fine particles...
US20120262793 BLACK CURABLE COMPOSITION FOR WAFER - LEVEL LENS, AND WAFER - LEVEL LENS  
A black curable composition for a wafer-level lens including (A) a metal-containing inorganic pigment, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a cardo resin.
US20100295190 PHOTOSENSITIVE ADHESIVE COMPOSITION, FILM-LIKE ADHESIVE, ADHESIVE SHEET, METHOD FOR FORMING ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE  
A photosensitive adhesive composition comprising (A) an alkali-soluble polymer, (B) a thermosetting resin, (C) one or more radiation-polymerizable compounds and (D) a photoinitiator, wherein the...
US20080096133 PHOTOCURABLE AND THERMOSETTING RESIN COMPOSITION, CURED PRODUCT THEREOF AND PRINTED CIRCUIT BOARD OBTAINED USING THE SAME  
A photocurable and thermosetting resin composition comprising (A) a carboxyl-group containing resin, (B) an oxime ester-based photopolymerization initiator containing an oxime ester group, (C) an...
US20090004579 Clear and colorless three-dimensional articles made via stereolithography and method of making said articles  
The invention is a radiation curable liquid resin that can be used to make a clear and colorless, three-dimensional article by a stereolithography process. The clear and colorless...
US20110104454 COMPOSITION FOR FORMING LAYER TO BE PLATED, METHOD OF PRODUCING METAL PATTERN MATERIAL, AND METAL PATTERN MATERIAL  
The present invention provide a composition for forming a layer to be plated, including a solution in which from 1% by mass to 20% by mass of a polymer having a functional group that forms an...
US20090042148 Photoresist Composition for Deep UV and Process Thereof  
The present invention refers to a photoresist composition comprising (i) a polymer A comprising at least one acid labile group; (ii) at least one photoacid generator; (iii) at least one base; (iv)...
US20100068470 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD OF PRODUCING THE SAME  
The present invention provides a resin composition for laser engraving, containing at least an inorganic porous material, a binder polymer, a thermopolymerization initiator and a polymerizable...
US20100159392 PATTERNING PROCESS AND RESIST COMPOSITION  
A pattern is formed by coating a first positive resist composition comprising a copolymer comprising lactone-containing recurring units and acid labile group-containing recurring units onto a...
US20110039210 NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME  
Provided are new resins that comprise lactone units and photoresist compositions that comprise such resins.
US20100247867 RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE, AND METHOD FOR MANUFACTURING RELIEF PRINTING PLATE  
A resin composition for laser engraving is provided, which forms a film having good physical properties, imparts good printing durability to a printing plate having a relief forming layer made of...
US20090042133 Antireflective Coating Composition  
An antireflective coating composition which forms films with high n values is described.
US20090305163 NEGATIVE RESIST COMPOSITION  
A negative resist composition is used for either a first or second resist layer within a method of forming a resist pattern that includes the following steps (i) and (ii): (i) a step of forming...
US20100196824 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME  
An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a...
US20100062374 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS  
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer...
US20100009482 PHOTORESIST COMPOSITION, METHOD OF FORMING A METAL PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME  
A photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15 % by weight of a curing agent, and a remainder of...
US20090233230 Photosensitive Resin Composition and Laminates  
The present invention provides a photosensitive resin composition characterized by comprising: (a) 20 to 90% by mass of a thermoplastic copolymer comprising an α,β-unsaturated carboxyl group...
US20140212814 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN USING THE COMPOSITION, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE  
Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to...
US20100085518 PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX  
The present invention relates to a photosensitive resin composition for a black matrix, a black matrix produced by the composition and a liquid crystal display including the black matrix. The...
US20090035702 PROCESS FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP  
The present invention provides a process for producing a compound having a group represented by general formula (II): (wherein R1, R2, and R3 may be the same or different, and each represent a...
US20100203450 PHOTORESIST COMPOSITIONS AND METHODS OF USE  
A photoresist composition comprises a polymer capable of radiation induced main chain scission and acid-catalyzed deprotection, wherein the polymer is derived by free radical polymerization of two...
US20130164461 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF  
The invention relates to a positive photosensitive resin composition with good temporal stability. The invention also provides a method for manufacturing a thin-film transistor array substrate, a...
US20100062372 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS  
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer...
US20080311520 ON-PRESS DEVELOPABLE NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHODS OF USE  
A negative-working imageable element has an imageable layer that includes an initiator composition including an iodonium cation and a borate anion, an infrared radiation absorbing compound, a...
US20090191386 POSITIVE PHOTOSENSITIVE POLYMER COMPOSITION  
A positive photosensitive polymer composition of the invention contains: a copolymer obtained by the radical polymerization of monomers including a radical polymerizable monomer (a1) having a...
US20100047539 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN AND SEMICONDUCTOR DEVICE  
Disclosed are a positive photosensitive resin composition, a method of forming a pattern using the same, and a semiconductor device having a photoresist pattern obtained by the method. The...
US20100020274 COLORANT, COLOR FILTER, LCD DEVICE, COMPOSITION AND METHOD FOR PREPARING THE SAME  
The present invention relates to a colorant, a color filter, LCD device, a composition and a method for preparing the same. The colorant covers pigment particles by using the acrylic acid polymer...
US20080311509 Photopolymer Printing Plate Precursor  
A photopolymer printing plate precursor includes a photosensitive coating on a support, wherein the photosensitive coating includes a composition that is photopolymerizable upon absorption of...
US20100297439 PHOTOSENSITIVE ADHESIVE RESIN COMPOSITION, ADHESIVE FILM AND LIGHT-RECEIVING DEVICE  
A photosensitive adhesive resin composition includes (A) a compound having a hydroxyl group or a carboxyl group, and a (meth)acryloyl group, (B) a resin which cures with the compound (A) by...
US20100119975 COMPOSITION FOR FORMING MICROPATTERN AND METHOD FOR FORMING MICROPATTERN USING THE SAME  
The present invention provides a fine pattern-forming composition and a fine pattern-forming method. This fine pattern-forming composition enables a pattern of high aspect ratio to be made finer...
US20080131812 Resin for printing plate material and lithographic printing plate material by use thereof  
Disclosed is a lithographic printing plate material comprising on a support a light-sensitive layer comprising a binder resin, wherein the light sensitive layer comprises a resin containing a...
US20120040290 PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME  
The present invention relates to a photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizable compound having an ethylenically unsaturated bond and (C) a...
US20100218984 PHOTOSENSITIVE DRY FILM RESIST, PRINTED WIRING BOARD MAKING USE OF THE SAME, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD  
The present invention is to provide (i) a photosensitive dry film resist which allows water system development and which is excellent in resolution, flame retardancy, adhesiveness, moisture...
US20140106278 DRY FILM RESIST SHEET AND METHOD OF MANUFACTURING THE SAME  
There is provided a dry film resist sheet, including: a base film; a first dry film resist layer formed on the base film, the first dry film resist layer containing a binder polymer, a...
US20110212402 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION  
A photosensitive resin composition comprising: a photosensitive polyimide of formula (I); an acrylate monomer; anda photoinitiator, wherein A, B, D, J, m, and n are as defined in the specification.
US20100159691 PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE  
Disclosed is a photosensitive resin composition showing excellent contrast performance after exposure to light. Also disclosed is a photosensitive resin laminate using the composition. The...
US20100151389 Alkaline developable photosensitive materials  
Disclosed is a photosensitive resin composition suitable for forming barrier ribs for LCD pixels during a process for fabricating an LCD using an ink jet printing step. Also disclosed is a method...
US20130122425 METHOD FOR FORMING FINE PATTERN, AND COATING FORMING AGENT FOR PATTERN FINING  
A resist pattern formed by a method including forming a resist film by applying, on a substrate, a resist composition containing a base material having a solubility, in a developer liquid...
US20150301452 PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME  
A chemically amplified photoresist composition is provided which includes: a solute including a novolac resin with an acid decomposable protecting group, a photoacid generator, and an organic solvent.
US20100203452 RADIATION-SENSITIVE COMPOSITION  
A radiation-sensitive composition includes a polymer (A) which includes a repeating unit (1) shown by the following formula (1) and a repeating unit (2) shown by the following formula (2), and a...
US20080299489 ULTRAVIOLET CURABLE COATING FLUID FOR PRINTING SYSTEMS  
An ultraviolet curable coating fluid includes a polymerizable olefin monomer or monomer blend that undergoes self-photoinitiating polymerization when exposed to a predetermined ultraviolet...
US20120003585 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION  
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition comprises (A) any of the compounds of General Formula (I) below and (B) a resin that contains the residue (c)...
US20100075118 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RELIEF PRINTING PLATE AND METHOD OF PRODUCING THE SAME  
The present invention provides a resin composition for laser engraving, including at least a complex between a layered inorganic compound and a cationic organic compound, and a binder polymer that...
US20100062373 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS  
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer...

Matches 1 - 50 out of 114 1 2 3 >