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US20110217658 PHOTOPOLYMERISABLE LAYERED COMPOSITE FOR PRODUCING FLEXO PRINTING ELEMENTS  
Laminate comprising a) a photopolymerizable relief-forming layer, at least containing an elastomeric binder, ethylenically unsaturated monomers and a photoinitiator and optionally further...
US20120107743 LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR  
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a...
US20140193752 STABILIZED ACID AMPLIFIERS  
There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.
US20150030980 RADIATION-SENSITIVE COMPOSITION  
A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good...
US20070196761 Barrier rib and black top for plasma display panel and method of fabricating the same  
A method of fabricating barrier ribs and black tops for a plasma display panel including sequentially laminating a photosensitive barrier rib material and a photosensitive black top material on a...
US20130108964 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS  
A chemically amplified positive resist composition comprising (A) a triarylsulfonium salt of 2,3,3,3-tetrafluoro-2-(1,1,2,2,3,3,3-heptafluoropropoxy)prop ionic acid, (B) an acid generator, (C) a...
US20140087309 OLEFIN-TRIGGERED ACID AMPLIFIERS  
There are disclosed olefinic acid amplifier triggers and methods of using these compositions in, for example, photolithography.
US20130034813 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS  
A chemically amplified positive resist composition comprising (A) a sulfonium salt of 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylpropionic acid, (B) an acid generator, (C) a base resin, and (D) an...
US20130171561 ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME  
A resist additive represented by Formula 1 below and a resist composition including the additive are disclosed. The resist additive improves hydrophobicity of the surface of the resist film to...
US20150037735 MOLECULAR GLASS PHOTORESISTS CONTAINING BISPHENOL A FRAMEWORK AND METHOD FOR PREPARING THE SAME AND USE THEREOF  
The present invention provides a class of molecular glass photoresist (I and II) comprising bisphenol A as a main structure and their preparation. The molecular glass photoresist is formulated...
US20130224657 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS  
The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: To provide a novel acid...
US20120214099 PHOTORESIST COMPOSITIONS  
A composition. The composition includes a polymer and a photosensitive acid generator capable of generating a first amount of acid upon exposure to a first dose of radiation and a second amount of...
US20090176175 PHOTOACID GENERATORS FOR EXTREME ULTRAVIOLET LITHOGRAPHY  
A photoacid generator P+ A− comprises (a) an antenna group P+ comprising atoms with high EUV photoabsorption cross-sections according to FIG. 1 and A− anions; or (b) an antenna group P+ and A−...
US20090181320 FLUORINE-FREE HETEROAROMATIC PHOTOACID GENERATORS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME  
Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists....
US20120070782 SELF-FORMING TOP ANTI-REFLECTIVE COATING COMPOSITIONS AND, PHOTORESIST MIXTURES AND METHOD OF IMAGING USING SAME  
A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble...
US20150014029 PHOTOSENSITIVE COMPOSITION, HARDENED COATING FILMS THEREFROM, AND PRINTED WIRING BOARDS USING SAME  
Provided is a photosensitive composition, which comprises a carboxyl group-containing resin, a photopolymerization initiator, a photosensitive acrylate compound and a filler, wherein the filler...
US20100159371 PIGMENT DISPERSION SOLUTION, PIGMENT PHOTORESIST AND COLOR FILTER  
The present invention relates to a pigment dispersion solution, a pigment photoresist and a color filter. The pigment dispersion solution includes a colored pigment, a dispersant, a binder resin...
US20110086312 Positive-Working Photoimageable Bottom Antireflective Coating  
The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the...
US20150234272 METAL OXIDE NANOPARTICLES AND PHOTORESIST COMPOSITIONS  
The invention provides new nanoparticles that include a Group 4 metal oxide core and a coating surrounding the core, where the coating contains a ligand according to Formula (I), or a carboxylate...
US20090023094 PHOTOSENSITIVE LAMINATED ORIGINAL PRINTING PLATE FOR LETTERPRESS PRINTING AND PROCESS FOR PRODUCING LETTERPRESS PRINTING PLATE USING THE PHOTOSENSITIVE LAMINATED ORIGINAL PRINTING PLATE  
A photosensitive laminated original printing plate for letterpress printing that does not contaminate developers, being capable of suppressing a cost increase due to developer replacement and is...
US20120282550 RADIATION-SENSITIVE COMPOSITION  
A radiation-sensitive composition includes a polymer composition and a radiation-sensitive acid generator. The polymer composition includes a first polymer and a second polymer. The first polymer...
US20130308219 POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT  
The present invention relates to a polymerizable composition comprising at least one ethylenically unsaturated, polymerizable compound and at least one oxime sulfonate compound of the formula (I)...
US20130344438 PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE  
A photoacid generator has the formula (I): wherein R1, R2, R3, L1, L2, L3 X, Z+, a, b, c, d, p, q, and r, are defined herein. A photoresist comprises the photoacid generator, and a coated article...
US20120092632 DIFFRACTION UNLIMITED PHOTOLITHOGRAPHY  
Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern...
US20120070780 PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM SOLDER RESIST, AND CIRCUIT BOARD  
The present invention relates to a photosensitive resin composition including an acid modified oligomer, a photopolymerizable monomer, a thermosetting binder resin, a photoinitiator, and a...
US20140186767 ACID GENERATORS AND PHOTORESISTS COMPRISING SAME  
Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, photoresists are provided that comprise (i) a polymer; (ii) a...
US20080171288 Negative-acting photolithographic printing plate with improved pre-burn performance  
A negative-acting photolithographic printing plate precursor has a unique negative-acting photosensitive composition on a surface. The photosensitive composition contains an acetal polymer, an...
US20140170564 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESING COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM USING THE COMPOSITION, AND PATTERN FORMING METHOD  
There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the following formula (1-1); an actinic ray-sensitive or...
US20080254384 PHOTOSENSITIVE COMPOSITION, LITHOGRAPHIC PRINTING PLATE PRECURSOR, LITHOGRAPHIC PRINTING METHOD, AND NOVEL CYANINE DYES  
A photosensitive composition includes a cyanine dye that has, on a methine chain thereof, a substituent which is a cation moiety of an onium salt structure.
US20120208125 RESIST COMPOSITION AND PATTERNING PROCESS  
A resist composition comprising a complex of a β-diketone with a metal selected from magnesium, chromium, manganese, iron, cobalt, nickel, copper, zinc, silver, cadmium, indium, tin, antimony,...
US20080095950 Compositions Containing Phthalocyanine Dyes  
A composition containing (A) an alkali-soluble binder and (B) a phthalocyanine dye of formula (1), wherein Ri, R2, R3 and R4 are each independently of the other Ci-Ci2alkyl which may be...
US20090183647 IMAGEABLE ELEMENTS WITH COALESCING CORE-SHELL PARTICLES  
Single layer IR-sensitive negative-working imageable elements include thermally coalesceable core-shell particles without a polymeric binder in an imageable layer. Thermal imaging causes...
US20120164577 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS  
A positive resist composition includes at least: (A) a polymer containing a repeating unit (a1) and an acid labile repeating unit (a2), wherein the repeating unit (a1) generates an acid of a...
US20120129099 Method For Producing Pigments  
Process for preparing pigments of the formula (I) or tautomeric structures thereof and their hydrates, containing melamine or melamine derivatives as guest(s), characterized in that the...
US20100040976 HEAT-SENSITIVE IMAGING ELEMENT  
A heat-sensitive imaging element includes an IR dye, and more particularly a heat-sensitive lithographic printing plate precursor includes the IR dye. A method for making the lithographic printing...
US20130209921 PHOTORESIST COMPOSITION  
A low surface energy photoresist composition is described that comprises a silicone-polyether block copolymer, wherein the silicone block comprises 35 wt. % or more of said copolymer. When...
US20110165518 LITHOGRAPHIC PRINTING PLATE PRECURSOR  
A lithographic printing plate precursor includes a coating provided on a support having a hydrophilic surface, the coating containing thermoplastic polymer particles and an infrared radiation...
US20130130176 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME  
An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a...
US20120208127 RESIST COMPOSITION AND PATTERNING PROCESS  
A resist composition comprising a salt of a mono- to tetrafunctional carboxylic acid with a metal selected from magnesium, chromium, manganese, iron, cobalt, nickel, copper, zinc, silver, cadmium,...
US20150259321 FLUORENE-TYPE COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID FLUORENE-TYPE COMPOUND, AND PHOTOSENSITIVE COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR  
According to an embodiment of the present invention, there is provided a novel fluorene-based compound and a photopolymerization initiator using the fluorene-based compound. The fluorene-based...
US20140186592 PHOTO-SENSITIVE RESIN COMPOSITION FOR BEZEL OF TOUCH SCREEN MODULE AND BEZEL FOR TOUCH SCREEN MODULE USING THE SAME  
This invention relates to a photo-sensitive resin composition for a bezel of a touch screen module, including a colorant composed of surface-modified TiO2, a binder resin, a dispersing agent, a...
US20080227032 ENVIRONMENTAL FRIENDLY PHOTOACID GENERATORS (PAGs) WITH NO PERFLUOROOCTYL SULFONATES  
Novel classes of ionic photoacid generator (PAGs) compounds having relatively environmentally friendly anions with no perfluorooctyl sulfonate (no-PFOS) are provided and photoresist composition...
US20120015295 INFRARED-SENSITIVE COMPOSITION FOR PRINTING PLATE PRECURSORS  
A lithographic printing plate precursor has a substrate and an infrared radiation-sensitive composition comprising a polymeric binder, a free radical polymerizable system consisting of at least...
US20080182204 Photoresists comprising novolak resin blends  
Photoresist compositions are provided comprising a radiation sensitive component and at least two distinct novolak resins. In one aspect, photoresists of the invention exhibit notably high...
US20130105440 NANOCOMPOSITE NEGATIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF  
The present invention relates to a negative photosensitive composition suitable for image-wise exposure and development as a negative photoresist comprising a negative photoresist composition and...
US20090233227 NEGATIVE-WORKING IMAGEABLE ELEMENTS WITH IMPROVED ABRASION RESISTANCE  
Negative-working imageable elements are prepared with radiation-sensitive imageable layers that contain surface-modified silica particles such as fumed silica particles and sol-gel silica...
US20120264056 METHOD OF MAKING RADIATION-SENSITIVE SOL-GEL MATERIALS  
Radiation-sensitive sol-gel compositions are provided, along with methods of forming microelectronic structures and the structures thus formed. The compositions comprise a sol-gel compound and a...
US20090075199 Photosensitive element having reinforcing particles and method for preparing a printing form from the element  
The invention provides a photosensitive element and a method for preparing a printing form from the element. The photosensitive element includes a layer of a photosensitive composition containing...
US20140295332 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME  
An actinic ray-sensitive or radiation-sensitive resin composition, which is excellent in sensitivity, resolution, a pattern profile and a depth of focus (DOF), and, an actinic ray-sensitive or...
US20130022926 RADIATION-SENSITIVE RESIN COMPOSITION  
A radiation-sensitive resin composition includes a polymer and a photoacid generator. The polymer includes a first structural unit shown by a formula (a1), a second structural unit shown by a...