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US20050003297 Laser engraving methods and compositions, and articles having laser engraving thereon  
The invention provides a composition having laser engraving properties, comprising a host material and an effective amount of a laser enhancing additive. The laser enhancing additive comprises a...
US20080070156 STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF  
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer...
US20070207410 PLANAR INORGANIC DEVICE  
A method for making an inorganic structure including: (a) applying a photoreactive composition to a substrate, wherein the composition includes: a reactive species, a photoinitiator system, and a...
US20070054218 Radiation curable resin composition for making colored three dimensional objects  
A radiation curable resin composition suitable for making three dimensional objects comprising at least one epoxy compound, a cationic photoinitiator, wherein the resin composition has a first...
US20060199103 Process for producing an image using a first minimum bottom antireflective coating composition  
Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a...
US20060063105 Negative-working photoimageable bottom antireflective coating  
The present invention relates to novel negative-working, photoimageable, and aqueous developable antireflective coating compositions and their use in image processing by forming a thin layer of...
US20130266898 TRANSPARENT CONDUCTIVE FILMS, ARTICLES, AND METHODS  
Transparent conductive films, articles made from them, and methods of making them are disclosed. Some transparent conductive films include flexible glass substrates and conductive layers...
US20090295041 PRINTING FORM PRECURSOR AND PROCESS FOR PREPARING A STAMP FROM THE PRECURSOR  
The invention pertains to a printing form precursor and a method for preparing a stamp from the precursor for use in soft lithographic applications. The printing form precursor includes a...
US20060141391 Laser marking of documents of value  
Disclosed are laser markings on a document of value and methods of preparing the same which are based on the interaction of the laser radiation with the printing-ink employed.
US20060063107 Photoresist compositions comprising diamondoid derivatives  
Novel positive-working photoresist compositions are disclosed. The monomers of the base resin of the resist contain diamondoid-containing pendant groups higher than adamantane in the polymantane...
US20050026077 Photoimageable composition  
Disclosed are photoimageable compositions containing silsesquioxane binder polymers and photoactive compounds, methods of forming relief images using such compositions and methods of manufacturing...
US20130130175 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method  
A sulfonic acid onium salt represented by the following formula (1) useful as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a...
US20090123869 Compositions and processes for immersion lithography  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that can be substantially...
US20090035694 POLYMERIC DYES, OVERCOAT COMPOSITIONS AND THERMAL LITHOGRAPHIC PRINTING PLATES  
A thermal lithographic printing plate overcoat composition comprising (a) a water-soluble polymeric dye having an absorption band between about 300 and about 600 nm; and (b) micro-particles or...
US20080003522 Photoresist with metal oxide nanoparticles  
Nanoscale UV absorbing particles are described that have high UV absorption cross sections while being effectively transparent to visible light. These particles can be used to shield individuals...
US20050238996 Photosensitive resin laminate  
A photosensitive resin laminate comprising at least a support, a photosensitive resin layer and an IR ablation layer, wherein the IR ablation layer comprises an IR absorbent metal layer which is...
US20050058950 Method for reducing pattern dimension in photoresist layer  
The invention discloses improvements in the so-called coated thermal flow process for reducing the pattern dimension of a patterned resist layer on a substrate to accomplish increased fineness of...
US20070207406 ANTI-REFLECTIVE COATINGS USING VINYL ETHER CROSSLINKERS  
Novel, developer soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a polymer and/or oligomer having acid functional...
US20060057492 Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same  
A polymer having a polymerizable group and an alkyleneoxy groups on side chains thereof, and a polymerizable composition containing the polymer. The polymerizable composition preferably contains a...
US20050214674 Positive-working photoimageable bottom antireflective coating  
The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the...
US20100040971 PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSING SOLUTION USED IN THE PATTERN FORMING METHOD  
A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which...
US20150378255 COMPOSITIONS COMPRISING CARBOXY COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY  
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more block copolymers. Particularly...
US20110212401 RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD  
A radiation-sensitive resin composition includes a resin, a photoacid generator, a fluorine-containing resin, and a lactone compound. The resin does not include a first fluorine-containing...
US20100221660 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND A SUBSTRATE  
A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection...
US20070134592 PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE AND METHOD FOR MAKING A PRINTING PLATE  
A photosensitive lithographic printing plate includes a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of...
US20060257785 Method of forming a photoresist element  
A method of forming a photoresist element comprising the steps of: preparing a hot melt photoresist mixture; applying the photoimageable hot melt composition to a film substrate using a slot die...
US20150030972 PHOTO-SENSITIVE RESIN COMPOSITION FOR BEZEL OF TOUCH SCREEN MODULE AND BEZEL FOR TOUCH SCREEN MODULE USING THE SAME  
This invention relates to a photo-sensitive resin composition for a bezel of a touch screen module, including a colorant composed of surface-modified TiO2, a binder resin, a dispersing agent, a...
US20100248147 PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER PHOTORESIST SYSTEMS  
A photoresist composition and methods using the photoresist composition in multiple exposure/multiple layer processes. The photoresist composition includes a polymer comprising repeat units having...
US20090220888 Dyed photoresists and methods and articles of manufacture comprising same  
The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more...
US20080032232 Novel resins and photoresist compositions comprising same  
Provided are new resins that comprise carbocyclic aryl units with hetero substitution units and photoresists that contain such resins. Particularly preferred photoresists of the invention comprise...
US20150192852 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD  
By a lithographic printing plate precursor comprising a support having provided thereon an image-recording layer containing (A) a radical polymerization initiator, (B) a radical polymerizable...
US20110151379 BLACK MATRIX COMPOSITION WITH HIGH LIGHT-SHIELDING AND IMPROVED ADHESION PROPERTIES  
The present invention relates to a black matrix photosensitive resin composition having high light-shielding and improved adhesion properties and a black matrix for a liquid crystal display...
US20110136061 CROSSLINKED POLYIMIDE, COMPOSITION COMPRISING THE SAME AND PROCESS FOR PRODUCING THE SAME  
A novel polyimide which retains the characteristics of polyimides, that is, excellent heat resistance, electrical insulation and chemical resistance, of which dielectric constant is lower than...
US20090239175 Stereolithographic Resins Containing Selected Oxetane Compounds  
A liquid radiation-curable composition that comprises (A) at least one cationically polymerizing organic substance;(B) at least one free-radical polymerizing organic substance;(C) at least one...
US20090148789 Coating compositions for use with an overcoated photoresist  
In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties...
US20070292312 METHOD OF MANUFACTURE OF A PLATE OF RELEASABLE ELEMENTS AND ITS ASSEMBLY INTO A CASSETTE  
A plate manufactured to enable samples of cells, micro-organisms, proteins, DNA, biomolecules and other biological media to be positioned at specific locations or sites on the plate for the...
US20070122736 RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD  
The invention is a protective film material for immersion lithography that enables desirable immersion lithography, can be removed simultaneously with development of a photoresist layer, and has...
US20070003868 SYSTEMS AND METHODS FOR FABRICATING BLANKS FOR MICROSTRUCTURE MASTERS BY IMAGING A RADIATION SENSITIVE LAYER SANDWICHED BETWEEN OUTER LAYERS, AND BLANKS FOR MICROSTRUCTURE MASTERS FABRICATED THEREBY  
Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer sandwiched between a pair of outer layers, on an imaging platform, to define the...
US20050026078 Resist compositions including thermal crosslinking agents  
A method for forming a fine pattern in a semiconductor substrate, by coating a target layer to be etched on a semiconductor substrate with a resist composition including at least one compound...
US20130224653 CROSSLINKED POLYIMIDE, COMPOSITION COMPRISING THE SAME AND METHOD FOR PRODUCING THE SAME  
A novel polyimide which retains the characteristics of polyimides, that is, excellent heat resistance, electrical insulation and chemical resistance, of which dielectric constant is lower than...
US20120301825 LAYERED STRUCTURE AND PHOTOSENSITIVE DRY FILM TO BE USED THEREFOR  
In a layered structure having at least a substrate and a photosensitive resin layer or cured film layer formed on the substrate and containing an inorganic filler, the content of the inorganic...
US20110311914 RESIST COMPOSITION FOR NEGATIVE-TONE DEVELOPMENT AND PATTERN FORMING METHOD USING THE SAME  
Provided is a resist composition for negative-tone development, including: (A) a resin having an acid-decomposable repeating unit represented by the following general formula (1) and being capable...
US20110159238 PHOTOSENSITIVE ADHESIVE COMPOSITION, PHOTOSENSITIVE FILM ADHESIVE, ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE, SEMICONDUCTOR DEVICE AND ELECTRONIC COMPONENT  
A photosensitive adhesive composition that can form an adhesive layer on an adherend and allows an adhesive pattern to be formed by exposure treatment with radiation and developing treatment with...
US20110151195 PHOTOSENSITIVE ADHESIVE COMPOSITION, AND FILM ADHESIVE, ADHESIVE SHEET, ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER AND SEMICONDUCTOR DEVICE USING THE PHOTOSENSITIVE ADHESIVE COMPOSITION  
There is provided a photosensitive adhesive composition having a lowest melt viscosity at 20° C. to 200° C. after pattern formation of 30,000 Pa·s or lower.
US20070154840 Radiation curable resin composition and rapid prototyping process using the same  
The invention relates to a radiation curable composition comprising relative to the total weight of the composition (A) 0-29 wt % of a cationically curable component having a linking aliphatic...
US20070105040 Developable undercoating composition for thick photoresist layers  
The present invention relates to an undercoating composition for a photoresist comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, and...
US20130164680 PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF  
The present invention relates to a photoresist composition capable of negative development and a pattern forming method using the photoresist composition. The photoresist composition includes an...
US20130126472 SUBSTRATE WITH ADHESION PROMOTING LAYER, METHOD FOR PRODUCING MOLD, AND METHOD FOR PRODUCING MASTER MOLD  
Disclosed is a substrate with an adhesive auxiliary layer having an organic compound layer provided on a substrate, with an adhesive auxiliary layer to be interposed between the substrate and the...
US20100261103 ORGANIC PIGMENT FINE PARTICLES AND METHOD OF PRODUCING THE SAME, PIGMENT-DISPERSION COMPOSITION, PHOTOCURABLE COMPOSITION AND INK-JET INK CONTAINING THE SAME, AND COLOR FILTER USING THE SAME AND METHOD OF PRODUCING THE SAME  
Organic pigment fine particles, having capability of self-dispersion, having an organic pigment and a polymer compound, the organic pigment fine particles of being nanometer-sized fine particles...
US20080227027 Method for forming photoresist pattern and photoresist laminate  
A method for forming a photoresist pattern involves the steps of: depositing a photoresist film on a substrate, the photoresist film containing an acid-generating agent capable of generating an...