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US20070248898 TARGETS FOR ALIGNMENT OF SEMICONDUCTOR MASKS  
Alignment of mask layers in semiconductor manufacturing is carried out by using alignment lines having at least one row of diffractively reflecting or scattering features on the lines. The...
US20070258637 Overlay Mark Arrangement for Reducing Overlay Shift  
An overlay mark arrangement for reducing the asymmetric profile and an overlay shift during an integrated circuit manufacturing process is disclosed. In one embodiment, the overlay mark...
US20060263706 Overlay vernier and method for manufacturing semiconductor device using the same  
An overlay vernier comprises overlay vernier patterns having a layout identical to that of patterns disposed within a real cell. A lower overlay vernier pattern is formed within a scribe line...
US20070178391 Mask having balance pattern and method of patterning photoresist using the same  
A method and mask having balance patterns for reducing and/or preventing chemical flare from occurring in a photoresist between a first mask region and a second mask region. Balance patterns...
US20070238027 METHOD FOR GENERATING ALIGNMENT MARKS AND RELATED MASKS THEREOF  
A method for generating alignment marks on a substrate is disclosed. The method includes: providing a mask, the mask includes at least one alignment mark set, wherein the alignment mark set...
US20070099097 Multi-purpose measurement marks for semiconductor devices, and methods, systems and computer program products for using same  
A mark for use in measuring characteristics of a layer of the semiconductor device includes multiple staggered L-shaped patterns including adjacent vertices, and legs that include line segments...
US20070264585 PHOTOMASK HAVING HALF-TONE PHASE SHIFT PORTION  
A photomask has a half-tone phase shift portion in a reticle alignment mark portion instead of a light transmissive portion so as to reduce an exposure light transmittance and reduce an influence...
US20070292776 OVERLAY VERNIER KEY AND METHOD FOR FORMING CONTACT HOLES OF SEMICONDUCTOR DEVICE USING THE SAME  
A substrate includes an overlay vernier key structure that includes an outer pattern formed over one layer over a semiconductor substrate, as a reference for an overlay measurement, and an inner...
US20070054198 Photomask for double exposure and double exposure method using the same  
A photomask for double exposure, and a double exposure method using the same are disclosed. The photomask for double exposure comprises a mask substrate divided into first and second regions...
US20100055584 EXPOSURE DEVICE AND EXPOSURE METHOD  
An exposure device according to an embodiment includes an exposure light source for irradiating a reflective mask with an exposure light, an alignment light source for irradiating the reflective...
US20050164099 Method to overcome minimum photomask dimension rules  
A method for fabricating a semiconductor device comprising at least one component having photolithographic proximity-limited geometries (702). The method comprises the steps of dividing the...
US20060105249 Exposure mask and method of manufacturing the same  
A method of manufacturing an exposure mask, which has the steps of: obtaining the form data D1 of device exposure patterns by applying optical proximity effect correction to the form data D0 of...
US20080014511 PHOTOMASK WITH OVERLAY MARK AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE  
Provided are a photomask and a method of fabricating a semiconductor device. The photomask includes a photomask substrate including a chip region and a scribe lane region, with an overlay mark...
US20090176167 Alignment System and Alignment Marks for Use Therewith  
A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source...
US20060019183 Imprint alignment method, system, and template  
An improved lithographic alignment method, system, and template. The method includes creating, within a lithographic subfield, subsequent-layer features which are intentionally offset from their...
US20070031743 Alignment and alignment marks  
A lithographic substrate provided with an alignment mark, the alignment mark having a plurality of features spaced apart from one another, each feature being spaced apart from adjacent features by...
US20090035669 WORK POSITION INFORMATION OBTAINING METHOD AND APPARATUS  
A work position information obtaining apparatus capable of obtaining a position of a work with respect to a table with high accuracy. Moving a table with a work placed thereon relative to an...
US20070178389 Universal photomask  
A mask set for forming a semiconductor device includes a universal mask used multiple times in the fabrication process. The universal mask may include contact structures, interconnect structures...
US20090317732 PATTERN VERIFICATION-TEST METHOD, OPTICAL IMAGE INTENSITY DISTRIBUTION ACQUISITION METHOD, AND COMPUTER PROGRAM  
A pattern verification-test method according to an embodiment of the present invention includes: deriving an illumination condition at a verification-test subject position in a photomask surface...
US20070082277 Process margin using discrete assist features  
The subject invention provides a system and method for improving the process margin of a lithographic imaging system. The process margin improvement is achieved through the novel placement of...
US20080113283 SILOXANE EPOXY POLYMERS FOR REDISTRIBUTION LAYER APPLICATIONS  
Siloxane epoxy materials employed as redistribution layers in electronic packaging and coatings for imprinting lithography, and methods of fabrication are disclosed.
US20070148558 Double metal collimated photo masks, diffraction gratings, optics system, and method related thereto  
A photo mask having at least 2 mask pattern layers disposed to collimate light patterns passing through the mask. An improved optical photo lithographic system utilizing light collimating photo...
US20070160915 Phase shifting mask having a calibration feature and method therefor  
A phase shift mask that corresponds to a layer of at least one semiconductor die has a substrate. A method thereof includes overlying a phase shifter film over the substrate. A permanent light...
US20060033876 Liquid crystal displays with post spacers, and their manufacture  
A post spacer (25) for a liquid crystal cell (26) is formed using colour filter material. At least a portion (15a) of the post spacer (25) and a corresponding pixel colour filter (15b) are defined...
US20060134535 Lensed fiber array for sub-micron optical lithography patterning  
In accordance with various embodiments, there is an exposure system for writing a pattern on a photosensitive material. The exposure system can include a waveguide array and a light modulator. The...
US20070002293 Method measuring distortion using exposure equipment  
A method of measuring distortion for an exposure apparatus is disclosed and comprises; aligning a reticle comprising a plurality of measuring patterns over a first wafer, wherein the plurality of...
US20050255390 Photomask for the manufacturing of reflective bumps  
A photomask for manufacturing a reflective bump includes a plurality of patterns, each of which includes a light-transmitting portion meshed with a light-shielding portion, one of the...
US20070077503 Overlay key, method of forming the overlay key and method of measuring overlay accuracy using the overlay key  
In an overlay key used for measuring overlay accuracy between first and second layers on a substrate, a first mark may be formed in the first layer, and a second mark may be formed on the second...
US20080003508 Photomask and method for fabricating the same  
A photomask comprises a transparent substrate, a peripheral pattern formed on the transparent substrate along a contour of a target pattern to be transferred onto a wafer, and an assist pattern...
US20070009816 Method and system for photolithography  
A transparent optical element in a region between a photo mask and a light source of a photolithographic apparatus is provided having a plurality of attenuating elements being arranged in...
US20060105250 Test photomask and compensation method using the same  
A test photomask and a compensation method using the same are disclosed. The present invention employs several groups of parallel lines in the longitudinal direction and in the traverse direction...
US20070003878 Reduced pitch multiple exposure process  
A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined...
US20080145773 IMPRINT LITHOGRAPHY APPARATUS AND METHODS  
An imprint lithography apparatus including a service station.
US20060008712 Exposure method, mask fabrication method, fabrication method of semiconductor device, and exposure apparatus  
A pair of reflective masks is provided in a photolithography process, wherein pattern forming elements are divided into respective directions relative to a projection vector of an EUV ray, so that...
US20060035159 Method of providing alignment marks, method of aligning a substrate, device manufacturing method, computer program, and device  
In a method according to one embodiment, a first and second set of alignment marks are etched into a first side of the substrate. The first set of alignment marks are at location(s) such that they...
US20080268554 FABRICATION METHOD FOR SEMICONDUCTOR DEVICE, EXPOSURE METHOD, PATTERN CORRECTION METHOD AND SEMICONDUCTOR DEVICE  
Disclosed herein is a fabrication method for a semiconductor device, including a lithography step of connecting a plurality of mask patterns to each other to form a pattern image of an area...
US20090202925 PHOTOMASK DEFECT CORRECTION METHOD, PHOTOMASK MANUFACTURING METHOD, PHASE SHIFT MASK MANUFACTURING METHOD, PHOTOMASK, PHASE SHIFT MASK, PHOTOMASK SET, AND PATTERN TRANSFER METHOD  
A first photomask 1 has a first transfer pattern to be transferred onto an object and is adapted to be used in combination with a second photomask having a second transfer pattern to be...
US20050089773 System and method for measuring overlay errors  
A system and method for detecting overlay errors, the method includes (i) directing a primary electron beam to interact with an inspected object; whereas the inspected object comprises a first...
US20080220344 Drawing Method and Apparatus  
In a drawing method for drawing an image on a substrate by relatively moving a drawing head that forms, based on input drawing-point data, drawing points on the substrate with respect to the...
US20120244459 METHOD FOR EVALUATING OVERLAY ERROR AND MASK FOR THE SAME  
A mask for evaluating overlay error comprises a plurality of replicate device regions and an overlay mark. The plurality of replicate device regions are disposed uniformly on the mask, wherein...
US20060286490 Methods of making templates for use in imprint lithography and related structures  
A method of forming a template for use in imprint lithography. The method comprises providing an ultraviolet (“UV”) wavelength radiation transparent layer and forming a pattern in the UV...
US20070154824 METHOD AND PROGRAM FOR CALCULATING EXPOSURE DOSE AND FOCUS POSITION IN EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
A method for calculating an offset of an exposure dose and a focus position in an exposure apparatus that exposes a substrate via an original includes the steps of obtaining information of a shape...
US20060108541 Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method  
An alignment method capable of performing alignment without providing alignment marks on a mask and preventing a decline of exposure throughput and latent image contrast, an alignment substrate...
US20070224521 Photomask for forming a resist pattern and manufacturing method thereof, and resist-pattern forming method using the photomask  
A method includes; a step of setting square mask cells in rows and columns on a transparent mask-substrate surface by demarcating by orthogonal lines of equal intervals, each of which has one side...
US20070117409 Aligner and Semiconductor Device Manufacturing Method Using the Aligner  
A circuit pattern having a size finer than a half of a wavelength of an exposure beam is transferred on a semiconductor wafer plane with an excellent accuracy by means of a mask whereupon an...
US20070287081 METHOD FOR OBTAINING FORCE COMBINATIONS FOR TEMPLATE DEFORMATION USING NULLSPACE AND METHODS OPTIMIZATION TECHNIQUES  
The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern...
US20140072904 PHOTOMASK, PHOTOMASK SET, EXPOSURE APPARATUS AND EXPOSURE METHOD  
There is provided a photomask capable of improving alignment accuracy with respective photomasks disposed on the front and rear faces of a substrate. A photomask has a drawing pattern for exposure...
US20120015289 ALIGNMENT METHOD AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY  
An alignment method is disclosed, in which a distance between a substrate and a photomask is set at a predetermined exposure gap. The photomask is rectangular, and includes a first side, and a...
US20060268248 Lithographic projection apparatus and method of exposing a semiconductor wafer with a pattern from a mask  
A single through-the-focus exposure of a semiconductor wafer is achieved by a lithographic projection apparatus, which has the capability of generating an exposure profile comprising substantially...
US20070200276 Method for rapid printing of near-field and imprint lithographic features  
An apparatus, systems, and methods to print multiple fields on a substrate in parallel are provided. The apparatus incorporates a lithographic apparatus composed of two or more lithographic heads...

Matches 1 - 50 out of 78 1 2 >