Matches 1 - 22 out of 22


Match Document Document Title
US20060098978 Substrate processing apparatus and substrate processing method  
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An...
US20070253710 METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING APPARATUS  
In an exposure unit compatible with immersion exposure, a dummy substrate to be used for an alignment process for adjustment of an exposure position for a pattern image is transferred to a...
US20060147202 Substrate processing apparatus and substrate processing method  
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a washing/development processing block, and an interface...
US20060152694 Substrate processing apparatus  
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a washing processing block,...
US20070147832 METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING APPARATUS  
Immediately before or immediately after an alignment process for adjusting an exposure position of a pattern image in an exposure unit compatible with immersion exposure, a dummy substrate for use...
US20070274711 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD  
A cleaning substrate for use in the cleaning operation for a substrate stage in an exposure unit compatible with immersion exposure and a dummy substrate for use during the adjustment of an...
US20070098401 Substrate processing method and apparatus thereof  
A substrate processing method for performing development on an exposed resist on a processing target substrate, and an apparatus thereof. A developing solution is supplied to the processing target...
US20060098979 Substrate processing apparatus and substrate processing method  
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An...
US20070071439 SUBSTRATE PROCESSING APPARATUS  
The transporting process from cleaning and drying processing of a substrate in a cleaning/drying processing unit in a cleaning/drying processing group to post-exposure bake (PEB) of the substrate...
US20050036783 Pattern production system, exposure system, and exposure method  
In a pattern production system, resist coated on copper foil on the substrate is exposed to light, by direct drawing, on the basis of a width of a line forming a pattern designated by processing...
US20070172234 APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE  
A stage cleaning substrate for use in the operation of cleaning a substrate stage within an exposure unit compatible with immersion exposure and a dummy substrate for use during the adjustment of...
US20060147201 Substrate processing apparatus and substrate processing method  
An interface transport mechanism employs an upper hand during the transport of a substrate to an exposure device, and employs a lower hand during the transport of the substrate that has been...
US20050201747 Semiconductor wafer washing system and method of supplying chemicals to the washing tanks of the system  
A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer...
US20070147831 SUBSTRATE PROCESSING APPARATUS FOR PERFORMING EXPOSURE PROCESS  
A substrate processing apparatus for performing an exposure process by printing a pattern on a substrate coated with a photosensitive material includes an exposure part for performing an immersion...
US20070297794 PHOTOLITHOGRAPHY SYSTEM AND METHOD  
A photolithography system includes an application and development module, an exposure module, and an interface module interposed between the first two modules. Bake units for performing a...
US20080008973 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS  
The invention provides a method capable of preventing the occurrence of collapse of resist pattern accompanied by size reduction in pattern dimensions can be prevented when processing a resist...
US20070166030 Semiconductor device fabrication equipment and method of using the same  
Semiconductor device fabrication equipment and a method of using the same minimize the total time that a wafer spends being transferred through the equipment and the number of times the wafer is...
US20060159449 Substrate processing apparatus  
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a drying processing block,...
US20080031618 Co2 reaction reduction at developer surface  
In a system and process for developing an imaged plate by contacting the plate with an alkaline developer, contained in a developer tank having a cover spaced over the developer level, the space...
US20060018655 Photo processing apparatus  
The photo processing apparatus of the present invention, connected to a terminal via a network, includes: a data storage section for storing data; an order storage section for storing an order...
US20050249494 Photographic processor  
A photographic processor comprises a base member in which the material is located and two side channels for holding the processing solution. Spreading means spreads the solution from one channel...
US20050175337 Method for processing a color reversal photographic film  
The present invention relates to a method for processing a color reversal photographic film that enables the amount of silver and tin (II) ions present in the washing water to be reduced, in order...

Matches 1 - 22 out of 22