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US20140192365 |
SPATIAL SPLITTING-BASED OPTICAL MEMS INTERFEROMETERS
A spatial splitting-based optical Micro Electro-Mechanical Systems (MEMS) Interferometer includes a spatial splitter for spatially splitting an input beam into two interferometer beams and a... |
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US20110149298 |
SPATIAL WAVEFRONT ANALYSIS AND 3D MEASUREMENT
A method of wavefront (100) analysis including applying a transform to the wavefront, applying a plurality of different phase changes (110, 112, 114) to the transformed wavefront (108), obtaining... |
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US20120188556 |
IMAGING APPARATUS AND IMAGING METHOD
An imaging apparatus includes a diffraction grating configured to produce an interference pattern by diffracting diverging light from a light source, an absorption grating configured to block part... |
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US20100315648 |
NON-PERIODIC WAVEFRONT DIVIDING INTERFEROMETER
A non-periodic reflection beamsplitter or reflector for use in an interferometer. The interferometer employs non-periodic reflectors or a non-periodic beamsplitter in order to produce interference... |
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US20090213389 |
WAVEFRONT ABERRATION MEASURING METHOD, MASK, WAVEFRONT ABERRATION MEASURING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining... |
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US20120266937 |
DIFFRACTIVE OPTIC
A method for designing a diffractive optic includes identifying an initial performance metric for the diffractive optic, the diffractive optic including a substrate. A test cell is selected from... |
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US20100309481 |
Uncertainty of uncertainty
An approach to challenging the absolute nature attributed to the Heisenberg uncertainty principal in the context of data obtained from a double slit system, wherein the double slit system is... |
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US20080212105 |
APPARATUSES AND METHODS FOR EVALUATING PERFORMANCE OF OPTICAL SYSTEMS
A system for evaluation of optical quality of an optical device includes a light source configured to generate light, the generated light be received by an optical device. An interferometric lens... |
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US20100026977 |
METHOD FOR MEASURING WAVEFRONT ABERRATION
A method comprises determining a first processing center position to calculate a wavefront aberration of an optical system, determining a second processing center position to calculate a wavefront... |
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US20080316575 |
Aberration correction of optical traps
A method and system for correcting aberrations in a beam of light including correcting for effects from an undiffracted portion of an input beam. The method and system includes (1) a component for... |
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US20080117429 |
Interferometer Having a Mirror System for Measuring a Measured Object
An interferometric measuring device for measuring a measured object, in particular for thickness measurement of the measured object. A special-purpose objective having a mirror system is provided,... |
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US20080246972 |
Tomographic Imaging by an Interferometric Immersion Microscope
A device for the tomographic imaging of an object to be analyzed, the device comprising a light source that emits a light beam with a coherence length substantially equal to the thickness of a... |
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US20090201512 |
Compact achromatic optical interferometer of the three-wave lateral shearing type
A method and a system for analyzing the wavefront of a light beam, wherein a diffraction grating is arranged in a plane perpendicular to the light beam to be analyzed and optically conjugated to... |
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US20070177157 |
Optical readhead
Interferometry apparatus which comprises a measurement light beam (2a, 2b) and a reference light beam (2c, 2d) which interact with each other to cause a spatial fringe pattern (24). An optical... |
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US20110176144 |
Polarization Based Delay Line Interferometer
This invention provides a compact delay-line interferometer that can be used in Differential Phase Shift Keying (DPSK) and Differential Quardratic Phase Shift Keying (DQPSK) demodulators. The... |
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US20080123105 |
Segmented Grating Alignment Device
A grating alignment device performs alignment of two or more plane gratings so as to eliminate an angular misalignment and a phase misalignment which are caused between respective diffracted light... |
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US20090161115 |
Wavefront sensor
In a wavefront sensor, an optical wavefront to be measured that has entered an entrance pupil P is split into a first optical path L1 and a second optical path L2 by a semi-transparent mirror 3. A... |
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US20090073459 |
WAVEFRONT MEASURING APPARATUS FOR OPTICAL PICKUP
A wavefront measuring apparatus for optical pickup includes: a beam splitting section; a wavefront shaping section; a beam combining section that generate interference light; an interference... |
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US20090051927 |
OPTICAL SCATTERING DISK, USE THEREOF, AND WAVEFRONT MEASURING APPARATUS
Optical scattering disk, use and wavefront measuring apparatus. The optical scattering disk includes a transparent substrate (1) and a light scattering layer (2) adjoining a surface of the... |
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US20050275849 |
Method of calibrating an interferometer and method of manufacturing an optical element
A method of calibrating an interferometer for determining an optical property of the interferometer uses a calibrating optical arrangement. The calibrating optical arrangement comprises at least... |
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US20080218836 |
INTERFEROMETER AND DEMODULATOR
An interferometer of the present invention includes: a splitting element which splits an incident light beam into a first split beam and a second split beam; and a first phase compensator which is... |
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US20100243917 |
Method of improving probability of Knowing through which slit in a double slit system a particle or photon passes while still forming an interference pattern
A method of applying a double slit system to the end that both knowledge of an interference pattern formed on a screen located at one distance from the slits, and knowledge of improved probability... |
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US20050030551 |
Analysis and monitoring of stresses in embedded lines and vias integrated on substrates
Techniques and systems for applying analytical computations of stresses to layers with embedded line features to obtain stress information, to design microstructures, and to design and control... |
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US20100149549 |
WAVEFRONT ABERRATION MEASURING DEVICE AND METHOD AND WAVEFRONT ABERRATION ADJUSTING METHOD
A wavefront aberration measuring apparatus which measures an wavefront aberration of an optical system to be inspected includes a point light source which supplies a measuring light; a... |
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US20090109446 |
Zeroeth Order Imaging
A method of imaging critical dimensions by measuring the zeroeth order of diffracted light. The method involves providing a target, directing light onto the target so as to cause the target to... |
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US20060001890 |
Spatial light modulator as source module for DUV wavefront sensor
A wavefront measurement system with a source of electromagnetic radiation and an illumination system that directs the electromagnetic radiation to a spatial light modulator to produce a... |
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US20110058180 |
Compensated MEMS FTIR Spectrometer Architecture
A Micro Electro-Mechanical System (MEMS) spectrometer architecture compensates for verticality and dispersion problems using balancing interfaces. A MEMS spectrometer/interferometer includes a... |
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US20070201039 |
METHOD FOR OPTICAL CHARACTERIZATION AND EVALUATION OF OPTICALLY VARIABLE DEVICES AND MEDIA
Methods for evaluating an optically variable device (“OVD”) or optically variable media (“OVM”) are disclosed. The methods include the steps of applying light of a single wavelength from a... |
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US20090051928 |
Method for analyzing a wavefront through frequency difference multilateral interferometry
The method comprises positioning a diffraction grating with a two-dimensional meshing on the path of the beam to be analyzed and processing at least two interferograms of at least two different... |
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US20090185132 |
SYSTEMS AND METHODS OF PHASE DIVERSITY WAVEFRONT SENSING
A phase diversity wavefront sensor includes an optical system including at least one optical element for receiving a light beam; a diffractive optical element having a diffractive pattern defining... |
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US20120140237 |
Optical Device for Measuring Anemometer Parameters
The general field of the invention is that of optical devices designed for measuring anemometer parameters such as speed and temperature, the device being mounted on an aircraft and comprising an... |
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US20100002243 |
APPARATUSES AND METHODS USING MEASUREMENT OF A FLARE GENERATED IN AN OPTICAL SYSTEM
The present invention provides a method including measuring a wavefront aberration of the optical system to be measured on a measurement surface, measuring a pupil transmittance distribution of... |
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US20090268213 |
Apparatus for measurement of the axial length of an eye
An apparatus for measuring the axial length of a human eye, the apparatus comprising a low coherence light source; a beam splitter; a fast displacement module for rapidly varying the path length... |
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US20100245841 |
Cylindrical grating rotation sensor
Disclosed is a Rotation sensor with a light source, a light detector, an internal part having a first lateral surface, which is globally cylindrical and convex, and an external part having a... |
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US20140152993 |
INTERFEROMETER AND SPECTROMETER INCLUDING SAME
An optical path of measurement light emitted from a measurement light source is overlaid by a beam combiner on an optical path of reference light emitted from a reference light source. The... |
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US20090213388 |
MEASUREMENT METHOD AND MEASUREMENT RETICLE
The present invention provides a measurement method of measuring a wavefront aberration of an optical system to be measured, the method including arranging a measurement reticle on an object plane... |
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US20110109911 |
Multiple Path Interferometer and Method
The invention discloses an optical interferometer which can be used to provide simultaneous measurements over multiple path lengths and methods to employ such an interferometer as to achieve a... |
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US20090128830 |
INTERFEROMETER DEVICE AND METHOD
The present invention discloses an interferometer device and method. In embodiments, the device comprises an electromagnetic radiation source emitting radiation having a first mean wavelength λLE;... |
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US20070279642 |
System and method for printing interference patterns having a pitch in a lithography system
An interferometric lithography system produces a pattern having a sharp field edge and minimal optical path length difference. Light passes through a beamsplitter into an input prism. The two... |
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US20120249984 |
LITHOGRAPHY SYSTEM WITH DIFFERENTIAL INTERFEROMETER MODULE
The invention relates to a lithography system comprising an optical column, a moveable target carrier for displacing a target such as a wafer, and a differential interferometer module, wherein the... |
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US20080055606 |
APPARATUS AND METHOD FOR INSPECTING A PATTERN AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
An apparatus for inspecting a pattern, including: at least one of a first floodlight system for inspection by transmissive light and a second floodlight system for inspection by reflective light;... |
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US20090262364 |
METHOD, PHASE GRATING AND DEVICE FOR ANALYZING A WAVE SURFACE OF A LIGHT BEAM
The application relates to a method for analyzing the wave surface of a light beam from a source to the focus of a lens. The beam illuminates a sample on the analysis plane and having a defect. A... |
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US20090128829 |
METHOD AND APPARATUS FOR DETERMINING A DEVIATION OF AN ACTUAL SHAPE FROM A DESIRED SHAPE OF AN OPTICAL SURFACE
A method of determining a deviation of an actual shape from a desired shape of an optical surface (12; 103) includes: providing an incoming electromagnetic measuring wave (20; 113), providing two... |
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US20120099115 |
INTERFERENCE OBJECTIVE LENS UNIT AND LIGHT-INTERFERENCE MEASURING APPARATUS USING THEREOF
Disclosed is an interference objective lens unit, comprising: an objective lens; a beam splitter that splits the light transmitted through the objective lens into a reference optical path in which... |
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US20090040531 |
Optical Fly Height Measurement
An optical fly height measurement system includes a planar waveguide, a first diffraction grating for coupling an electromagnetic wave into the planar waveguide wherein the first diffraction... |
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US20090185195 |
INTERFERENCE OBJECTIVE FOR ANNULAR TEST SURFACES
An apparatus including: an interferometric objective comprising a beam splitter surface configured to separate input light into test light and reference light, and a reference surface configured... |
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US20130182264 |
Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure
A projection exposure tool for microlithography for exposing a substrate is disclosed. The tool includes a projection objective. The tool also includes an optical measuring apparatus for... |
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US20090279065 |
MEASUREMENT APPARATUS AND EXPOSURE APPARATUS
A measurement apparatus which measures spatial coherence in an illuminated plane illuminated by an illumination system, comprises a measurement mask which has at least three pinholes and is... |
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US20110205518 |
Substrate, a Method of Measuring a Property, an Inspection Apparatus and a Lithographic Apparatus
Scatterometry for measuring overlay. A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from... |
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US20130308130 |
INHALER ADAPTOR FOR A LASER DIFFRACTION APPARATUS AND METHOD FOR MEASURING PARTICLE SIZE DISTRIBUTION
The present disclosure relates to an improved device and methods for adapting to a laser diffraction apparatus used for measuring particle size distribution and density of the plume of a powder... |