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US20090231594 |
COMPONENT MOUNTING IN MOVEMENT-SENSITIVE EQUIPMENT
Movement-sensitive equipment (10), for example an electron beam lithography machine, is provided with an optical measuring system operable to measure the position of the equipment in a reference... |
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US20090323078 |
METHOD AND SYSTEM FOR STEP-AND-ALIGN INTERFERENCE LITHOGRAPHY
A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the... |
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US20050195406 |
Discharge arrangement with a measuring device
A discharge arrangement of an agricultural harvesting machine comprises a retaining arrangement, a housing removably mounted onto the retaining arrangement, and a measuring device mounted within... |
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US20090040530 |
COORDINATE MEASURING MACHINE AND A METHOD FOR CORRECTING NON-LINEARITIES OF THE INTERFEROMETERS OF A COORDINATE MEASURING MACHINE
A method and a coordinate measuring machine (1) are provided, wherein the non-linearities of an interferometer (24) can be corrected. A measuring stage (20) traversable in a plane (25a) is... |
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US20100020332 |
Interferometric device for position measurement and coordinate measuring machine
An interferometric device for position measurement of an element moveable in a plane is disclosed. A laser light source measures the position of the moveable element and emits the required... |
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US20080285051 |
Multiple-degree of freedom interferometer with compensation for gas effects
The disclosure features multiple degree-of-freedom interferometers (e.g., non-dispersive interferometers) for monitoring linear and angular (e.g., pitch and/or yaw) displacements of a measurement... |
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US20080094597 |
PROJECTION EXPOSURE APPARATUS, OPTICAL MEMBER, AND DEVICE MANUFACTURING METHOD
A projection exposure apparatus 100 projects the pattern of an original 6 onto a substrate 7 via a projection optical system PL. The projection exposure apparatus 100 includes an original stage 5... |
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US20100020331 |
Laser interferometer systems and methods with suppressed error and pattern generators having the same
An interferometer system for tracking a position of a movable object in a pattern generator is provided. The interferometer system includes an interferometer configured to generate an interference... |
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US20060262308 |
Stage apparatus and exposure apparatus
At least one exemplary embodiment is directed to a stage apparatus which comprises a movable stage, a mirror for reflecting light from an interferometer to measure the position of the stage, a... |
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US20090237674 |
Method for estimating distance between tracking type laser interferometer and target, and tracking type laser interferometer
In the tracking type laser interferometer including: a laser interferometer; an optical axis deviation detection sensor for detecting a deviation of an optical axis of the laser interferometer; a... |
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US20100073684 |
XY STAGE APPARATUS
An XY stage apparatus capable of reducing a measurement error due to air fluctuations is provided. The XY stage apparatus includes a stage that moves in the XY directions, a laser interferometer... |
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US20090073458 |
MEANS AND METHOD FOR DETERMINING THE SPATIAL POSITION OF MOVING ELEMENTS OF A COORDINATE MEASURING MACHINE
A means and a method for determining the spatial position of at least one moving element (9, 20) of a coordinate measuring machine (1) are disclosed. At least one laser interferometer (24) directs... |
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US20140204392 |
STAGE TRANSFERRING DEVICE AND POSITION MEASURING METHOD THEREOF
A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The... |
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US20080174782 |
METHOD OF SPECKLE SIZE AND DISTRIBUTION CONTROL AND THE OPTICAL SYSTEM USING THE SAME
A method of speckle size and distribution control and the optical system using the same are disclosed. The optical system is arranged inside a housing of a computer mouse that is primarily... |
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US20130342827 |
Linear Stage and Metrology Architecture for Reflective Electron Beam Lithography
A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the... |
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US20130016361 |
STAGE APPARATUS
The stage apparatus includes a stage having a range of movement on a stage base, an interferometer and a fixed mirror that are installed outside the stage on the stage base, and a first movable... |
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US20090273767 |
MOVABLE BODY APPARATUS, EXPOSURE APPARATUS AND PATTERN FORMATION APPARATUS, AND DEVICE MANUFACTURING METHOD
A movable body apparatus is equipped with a Y measuring system equipped with an encoder and an interferometer that measure the position of a stage in one axis (Y-axis) direction. The... |
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US20140268171 |
STAGE DEVICE AND DRIVING METHOD THEREOF
A stage device includes a stage configured to move in an X-axis direction and a Y-axis direction, an X-axis interference reflector spaced apart from the stage in the X-axis direction, a first... |
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US20080297807 |
High Precision Code Plates and Geophones
An apparatus and method are disclosed for imaging a diffraction grating with a very high depth of focus, using a highly accurate code plate position measurement system. Positions may be measured... |
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US20090002715 |
Coordinate measuring machine with vibration decoupling and method for vibration decoupling of a coordinate measuring machine
A coordinate measuring machine (1) with vibration decoupling is disclosed, and a method for vibration damping or decoupling is realized. There is provided a measurement table (20) movable in the... |
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US20120206732 |
COMPONENT-MOUNTING DEVICE, COMPONENT-MOUNTING SYSTEM, AND COMPONENT-MOUNTING METHOD
A challenge to be met by the present invention is to provide a component mounting device, a component mounting system, and a component mounting method that make it possible to correctly position a... |
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US20090109443 |
Method for determining positions of structures on a substrate
A system for determining positions of structures on a substrate is disclosed. The system includes a plurality of stations enclosed by a housing. At least one of the stations inside the housing is... |
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US20140185057 |
Optical Position-Measuring Device
An optical position-measuring device is adapted to detect the position of an object in several spatial degrees of freedom. The object is disposed in a manner allowing it to move at least along a... |
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US20080291464 |
INTERFEROMETRIC POSITION-MEASURING DEVICES AND METHODS
Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage... |
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US20070008548 |
Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
A reflecting member has: a first reflecting surface, which extends in a second direction that includes a first direction component; a second reflecting surface, which extends in a third direction... |
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US20090033508 |
System and method for determining positions of structures on a substrate
A system and a method for determining positions of structures on a substrate are disclosed. The system includes at least one measurement table (20) movable in the X-coordinate direction and in the... |
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US20130215433 |
HOVER CMM
It is a purpose of this invention to provide a Hover CMM to accurately measure an object. The Hover CMM comprises: a probe, an air vehicle and a localiser. The probe is mounted on the air vehicle.... |
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US20100220335 |
LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME
A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the... |
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US20120320382 |
Device for Determining the Position of at Least One Structure on an Object, Use of an Illumination Apparatus with the Device and Use of Protective Gas with the Device
A device for determining the position of a structure on an object in relation to a coordinate system is disclosed. The object is placed on a measuring table which is movable in one plane, wherein... |
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US20110149297 |
Maskless exposure apparatus and multi-head alignment method thereof
Example embodiments are directed to a mask-less exposure apparatus configured to expose a pattern on a substrate using a light modulation device and a multi-head alignment method thereof.... |
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US20110069319 |
TRACKING TYPE LASER GAUGE INTERFEROMETER
A tracking type laser gauge interferometer includes: a first recursive reflector configured to reflect light parallel to incident light; a second recursive reflector attached to a measurement... |