Matches 1 - 31 out of 31


Match Document Document Title
US20090231594 COMPONENT MOUNTING IN MOVEMENT-SENSITIVE EQUIPMENT  
Movement-sensitive equipment (10), for example an electron beam lithography machine, is provided with an optical measuring system operable to measure the position of the equipment in a reference...
US20090323078 METHOD AND SYSTEM FOR STEP-AND-ALIGN INTERFERENCE LITHOGRAPHY  
A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the...
US20050195406 Discharge arrangement with a measuring device  
A discharge arrangement of an agricultural harvesting machine comprises a retaining arrangement, a housing removably mounted onto the retaining arrangement, and a measuring device mounted within...
US20090040530 COORDINATE MEASURING MACHINE AND A METHOD FOR CORRECTING NON-LINEARITIES OF THE INTERFEROMETERS OF A COORDINATE MEASURING MACHINE  
A method and a coordinate measuring machine (1) are provided, wherein the non-linearities of an interferometer (24) can be corrected. A measuring stage (20) traversable in a plane (25a) is...
US20100020332 Interferometric device for position measurement and coordinate measuring machine  
An interferometric device for position measurement of an element moveable in a plane is disclosed. A laser light source measures the position of the moveable element and emits the required...
US20080285051 Multiple-degree of freedom interferometer with compensation for gas effects  
The disclosure features multiple degree-of-freedom interferometers (e.g., non-dispersive interferometers) for monitoring linear and angular (e.g., pitch and/or yaw) displacements of a measurement...
US20080094597 PROJECTION EXPOSURE APPARATUS, OPTICAL MEMBER, AND DEVICE MANUFACTURING METHOD  
A projection exposure apparatus 100 projects the pattern of an original 6 onto a substrate 7 via a projection optical system PL. The projection exposure apparatus 100 includes an original stage 5...
US20100020331 Laser interferometer systems and methods with suppressed error and pattern generators having the same  
An interferometer system for tracking a position of a movable object in a pattern generator is provided. The interferometer system includes an interferometer configured to generate an interference...
US20060262308 Stage apparatus and exposure apparatus  
At least one exemplary embodiment is directed to a stage apparatus which comprises a movable stage, a mirror for reflecting light from an interferometer to measure the position of the stage, a...
US20090237674 Method for estimating distance between tracking type laser interferometer and target, and tracking type laser interferometer  
In the tracking type laser interferometer including: a laser interferometer; an optical axis deviation detection sensor for detecting a deviation of an optical axis of the laser interferometer; a...
US20100073684 XY STAGE APPARATUS  
An XY stage apparatus capable of reducing a measurement error due to air fluctuations is provided. The XY stage apparatus includes a stage that moves in the XY directions, a laser interferometer...
US20090073458 MEANS AND METHOD FOR DETERMINING THE SPATIAL POSITION OF MOVING ELEMENTS OF A COORDINATE MEASURING MACHINE  
A means and a method for determining the spatial position of at least one moving element (9, 20) of a coordinate measuring machine (1) are disclosed. At least one laser interferometer (24) directs...
US20140204392 STAGE TRANSFERRING DEVICE AND POSITION MEASURING METHOD THEREOF  
A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The...
US20080174782 METHOD OF SPECKLE SIZE AND DISTRIBUTION CONTROL AND THE OPTICAL SYSTEM USING THE SAME  
A method of speckle size and distribution control and the optical system using the same are disclosed. The optical system is arranged inside a housing of a computer mouse that is primarily...
US20130342827 Linear Stage and Metrology Architecture for Reflective Electron Beam Lithography  
A stage metrology suitable for REBL includes an interferometer stage metrology system configured to measure the position and rotation of a short-stroke wafer scanning stage, wherein the...
US20130016361 STAGE APPARATUS  
The stage apparatus includes a stage having a range of movement on a stage base, an interferometer and a fixed mirror that are installed outside the stage on the stage base, and a first movable...
US20090273767 MOVABLE BODY APPARATUS, EXPOSURE APPARATUS AND PATTERN FORMATION APPARATUS, AND DEVICE MANUFACTURING METHOD  
A movable body apparatus is equipped with a Y measuring system equipped with an encoder and an interferometer that measure the position of a stage in one axis (Y-axis) direction. The...
US20140268171 STAGE DEVICE AND DRIVING METHOD THEREOF  
A stage device includes a stage configured to move in an X-axis direction and a Y-axis direction, an X-axis interference reflector spaced apart from the stage in the X-axis direction, a first...
US20080297807 High Precision Code Plates and Geophones  
An apparatus and method are disclosed for imaging a diffraction grating with a very high depth of focus, using a highly accurate code plate position measurement system. Positions may be measured...
US20090002715 Coordinate measuring machine with vibration decoupling and method for vibration decoupling of a coordinate measuring machine  
A coordinate measuring machine (1) with vibration decoupling is disclosed, and a method for vibration damping or decoupling is realized. There is provided a measurement table (20) movable in the...
US20120206732 COMPONENT-MOUNTING DEVICE, COMPONENT-MOUNTING SYSTEM, AND COMPONENT-MOUNTING METHOD  
A challenge to be met by the present invention is to provide a component mounting device, a component mounting system, and a component mounting method that make it possible to correctly position a...
US20090109443 Method for determining positions of structures on a substrate  
A system for determining positions of structures on a substrate is disclosed. The system includes a plurality of stations enclosed by a housing. At least one of the stations inside the housing is...
US20140185057 Optical Position-Measuring Device  
An optical position-measuring device is adapted to detect the position of an object in several spatial degrees of freedom. The object is disposed in a manner allowing it to move at least along a...
US20080291464 INTERFEROMETRIC POSITION-MEASURING DEVICES AND METHODS  
Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage...
US20070008548 Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method  
A reflecting member has: a first reflecting surface, which extends in a second direction that includes a first direction component; a second reflecting surface, which extends in a third direction...
US20090033508 System and method for determining positions of structures on a substrate  
A system and a method for determining positions of structures on a substrate are disclosed. The system includes at least one measurement table (20) movable in the X-coordinate direction and in the...
US20130215433 HOVER CMM  
It is a purpose of this invention to provide a Hover CMM to accurately measure an object. The Hover CMM comprises: a probe, an air vehicle and a localiser. The probe is mounted on the air vehicle....
US20100220335 LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME  
A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the...
US20120320382 Device for Determining the Position of at Least One Structure on an Object, Use of an Illumination Apparatus with the Device and Use of Protective Gas with the Device  
A device for determining the position of a structure on an object in relation to a coordinate system is disclosed. The object is placed on a measuring table which is movable in one plane, wherein...
US20110149297 Maskless exposure apparatus and multi-head alignment method thereof  
Example embodiments are directed to a mask-less exposure apparatus configured to expose a pattern on a substrate using a light modulation device and a multi-head alignment method thereof....
US20110069319 TRACKING TYPE LASER GAUGE INTERFEROMETER  
A tracking type laser gauge interferometer includes: a first recursive reflector configured to reflect light parallel to incident light; a second recursive reflector attached to a measurement...

Matches 1 - 31 out of 31