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US20170139333 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD  
In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a...
US20070247601 Cleanup method for optics in immersion lithography  
An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an...
US20110170075 DEVICE FOR CHEMICAL AND BIOCHEMICAL REACTIONS USING PHOTO-GENERATED REAGENTS  
This invention provides method and apparatus for performing chemical and biochemical reactions in solution using in situ generated photo-products as reagent or co-reagent. Specifically, the method...
US20080309894 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS  
A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space...
US20080252865 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device  
An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and...
US20070216893 Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method  
A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets...
US20070171390 Cleanup method for optics in immersion lithography  
A lens cleaning module is provided for a lithography system having an exposure apparatus including an objective lens. The system includes a scanning stage for supporting a wafer beneath the...
US20070146676 Method of adjusting lighting optical device, lighting optical device, exposure system, and exposure method  
An illumination optical apparatus is arranged to illuminate a surface to be illuminated, with light in a desired polarization state, without substantive influence of manufacturing error of an...
US20070070316 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS  
A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space...
US20060033899 Environmental system including vacuum scavenge for an immersion lithography apparatus  
An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near...
US20050237504 Exposure apparatus, exposure method, and method for producing device  
In an exposure apparatus, an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system (PL) and the substrate (P) with a liquid (50)...
US20050219488 Exposure apparatus and method for producing device  
An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P...
US20140313495 OPTICAL ELEMENT AND PROJECTION EXPOSURE APPARATUS BASED ON USE OF THE OPTICAL ELEMENT  
An optical element for use in an exposure apparatus configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical...
US20110031416 Liquid jet and recovery system for immersion lithography  
A photolithography tool for use in manufacturing semiconductor devices, includes a wafer stage, a lens, and a liquid dispensing assembly by which liquid is introduced between a surface of a...
US20100134772 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device  
An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and...
US20090109413 Maintenance method, exposure method and apparatus, and device manufacturing method  
A maintenance method for performing maintenance of an exposure apparatus including a liquid immersion space-forming member which forms a liquid-immersion area by supplying liquid in a space...
US20090015807 Exposure apparatus and device manufacturing method  
An immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, includes: a source emitting...
US20090002655 Exposure apparatus, exposure method, and method for producing device  
A liquid immersion exposure apparatus includes an optical member through which a substrate is exposed with an exposure beam, and a liquid supply system having a supply port from which a liquid is...
US20080094592 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method  
During the drive of a stage, positional information in a movement plane of a stage is measured by three encoders that include at least one each of an X encoder and a Y encoder of an encoder...
US20080049201 Lithographic apparatus and lithographic apparatus cleaning method  
An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic...
US20070103662 Environmental system including vacuum scavenge for an immersion lithography apparatus  
A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to hold a patterning device, the patterning device serving...
US20070030468 Optical element and projection exposure apparatus based on use of the optical element  
A liquid immersion exposure apparatus includes a projection optical system (PL) which projects an image of a pattern onto a substrate (W) and a unit (5) which supplies a liquid (7) between an...
US20060209285 Optical element and projection exposure apparatus based on use of the optical element  
A liquid immersion exposure apparatus includes a projection optical system (PL) which projects an image of a pattern onto a substrate (W) and a unit (5) which supplies a liquid (7) between an...
US20050225735 Exposure apparatus and method for producing device  
An exposure apparatus which performs an exposure while filling a space between a projection optical system and a substrate with liquid, and in which deterioration of a device caused by adherent...
US20160131980 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020;...
US20160062248 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD  
A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The...
US20130114056 METHOD FOR IMPROVING AN OPTICAL IMAGING PROPERTY OF A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure...
US20120008112 Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid  
An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is...
US20110222034 LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS CLEANING METHOD  
An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic...
US20090316132 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method  
There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made...
US20090061331 Exposure method and apparatus, maintenance method, and device manufacturing method  
An exposure method for exposing a substrate with an exposure light via an projection optical system and a liquid includes: a first step of optically observing a liquid contact portion which comes...
US20080304033 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the...
US20070222958 Exposure apparatus, exposure method, and method for producing device  
A lithographic projection apparatus projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the...
US20060285092 Exposure apparatus and device fabrication method  
An exposure apparatus for forming a predetermined pattern on a substrate by using exposure light, includes a stage apparatus which is movable with respect to an optical axis of the exposure light;...
US20060187431 Exposure method and exposure apparatus, stage unit, and device manufacturing method  
By an exposure method including a process where in parallel with an exposure operation performed on a wafer on one of the wafer stages, the other wafer stage is temporarily positioned under the...
US20060170901 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method  
There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made...
US20060164615 Exposure apparatus and device manufacturing method  
A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired...
US20060126045 Coupling apparatus, exposure apparatus, and device fabricating method  
An exposure apparatus is an exposure apparatus that exposes a substrate by filling a liquid between a projection optical system and the substrate, and projecting a pattern image onto the substrate...
US20060098178 Exposure apparatus, exposure method, and method for producing device  
A liquid immersion photolithography system has an exposure system that exposes an exposure area on a substrate with electromagnetic radiation and includes a projection optical system. In addition,...
US20050046819 Maskless lithography systems and methods utilizing spatial light modulator arrays  
A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern...
US20130301019 EXPOSURE METHOD AND APPARATUS, MAINTENANCE METHOD AND DEVICE MANUFACTURING METHOD  
An exposure apparatus exposes a substrate with an exposure light via a projection optical system and a liquid, and includes a flow channel forming member and a substrate stage. The flow channel...
US20120236285 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD  
An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an...
US20110063597 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MICROLITHOGRAPHIC EXPOSURE METHOD  
An optical system for a microlithographic projection exposure apparatus, and a microlithographic exposure method are disclosed. An optical system for a microlithographic projection exposure...
US20100134771 Coupling apparatus, exposure apparatus, and device fabricating method  
A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being...
US20090323041 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses  
A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical...
US20090147235 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses  
A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical...
US20090147233 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses  
A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical...
US20090079950 Exposure apparatus, exposure method, and method for producing device  
A liquid immersion exposure apparatus includes an optical member through which an exposure beam passes, a flow passage in which a liquid flows, the flow passage being in fluidic communication with...
US20070258063 Exposure apparatus, exposure method, and method for producing device  
In an exposure apparatus, an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system (PL) and the substrate (P) with a liquid (50)...
US20070052942 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method  
A substrate transport apparatus, which transports a substrate that has been exposed with an image of a pattern through a projection optical system and a liquid, comprises a substrate support...