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US20120140199 |
MECHANICAL FIXTURE OF PELLICLE TO LITHOGRAPHIC PHOTOMASK
A pellicle frame is mechanically attached to a reticle, without use of an adhesive. An embodiment includes mechanically attaching a pellicle frame to a front surface of a reticle, removing the... |
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US20130176549 |
Reticle Operation System
A system for operating EUV mask stored in reticle SMIF pod and/or dual pod is provided, wherein the reticle SMIF pod and Dual pod are for storing EUV mask. The system can be a sorter for EUV mask... |
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US20100328641 |
PELLICLE FRAME AND LITHOGRAPHIC PELLICLE
A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an... |
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US20110063601 |
PELLICLE FRAME, PELLICLE, LITHOGRAPHY APPARATUS, AND METHOD OF FABRICATING THE PELLICLE FRAME
A pellicle frame, including aluminum, aluminum oxide, and a transition metal. |
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US20060077361 |
Means of removing particles from a membrane mask in a vacuum
A method of removing particles from a membrane reticle by a laser beam or beams. The particles on the bottom of the reticle are knocked off and fall away and particles on the top are removed a... |
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US20150049323 |
Lithographic Apparatus
A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined... |
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US20120050711 |
CHUCK ASSEMBLY BACK SIDE RETICLE CLEANER
An improved technique for fixedly holding a reticle in a reticle chuck of the reticle simplifies the process of cleaning the back surface of the reticle by exposing the entire back surface. The... |
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US20110141450 |
Method and Apparatus for Overlay Measurement
A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a... |
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US20110235016 |
PELLICLE, MOUNTING METHOD THEREFOR, PELLICLE-EQUIPPED MASK, AND MASK
A pellicle is provided that includes a pellicle film, a pellicle frame having the pellicle film stretched over one end face thereof and having the other end face open, and a pressure-sensitive... |
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US20140141536 |
Method and System for Providing a Target Design Displaying High Sensitivity to Scanner Focus Change
A segmented mask includes a set of cell structures, wherein each cell structure includes a set of features having an unresolvable segmentation pitch along a first direction, wherein the... |
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US20080079927 |
Holder for carrying a photolithography mask in a flattened condition
A holder is described for carrying a photolithography mask in a flattened condition. The holder may include a mask chuck and may be able to flatten a mask for use in photolithography. In one... |
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US20060141209 |
Pellicle for photolithography and pellicle frame
There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface... |
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US20070247608 |
Tesselated Patterns in Imprint Lithography
The present invention is directed towards a choice of the shape of the patterned fields for Level 0 (patterned by imprint or photolithography or e-beam, etc.) and Level 1 (patterned by imprint)... |
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US20150009483 |
MASK CLAMPING APPARATUS AND METHOD OF MANUFACTURING MASK
A manufacturing method of a mask includes aligning a mask sheet including an effective area and a non-effective area, on a mask frame; applying a pressure to the non-effective area of the mask... |
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US20130065160 |
REMOVABLE TRANSPARENT MEMBRANE FOR A PELLICLE
According to one embodiment, a pellicle includes first and second frame members that are selectively removable from one another. The second frame member has an annular shape similar to and is... |
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US20070035715 |
Exposure apparatus for manufacturing semiconductors and method for inspecting pellicles
Example embodiments of the present invention relate to an apparatus for manufacturing semiconductors and a method of inspecting a pellicle. Other example embodiments of the present invention... |
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US20120026474 |
Reticle Cooling in a Lithographic Apparatus
An apparatus and method reduce temperature variation across a reticle so as to reduce the expansion variation of the reticle. One method for realizing reduced temperature variation is to fill an... |
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US20070211232 |
Thermophoretic Techniques for Protecting Reticles from Contaminants
Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a... |
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US20070146681 |
Reticle transport apparatus, exposure apparatus, reticle transport method, and reticle processing method
A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle... |
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US20100085554 |
ADAPTOR OF AN ALIGNER SYSTEM
An adapter is disclosed, comprising a frame including an inner edge with a first side, a second side, a third side and a fourth side, wherein the first side and the fourth side are opposite and... |
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US20080024751 |
Reticle holding member, reticle stage, exposure apparatus, projection-exposure method and device manufacturing method
Reticle-holding members are disclosed that prevent a reticle from falling from the reticle stage of an exposure device, even in event of a power failure, and that maintain flatness of the reticle... |
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US20100007869 |
Reticle Handler
The present invention provides an apparatus and method for handling a reticle during manufacturing processes of semiconductor devices in the fabrication line. The apparatus includes a holder for... |
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US20060061751 |
Stage assembly including a stage having increased vertical stroke
A stage assembly (220) includes a stage base (202) having a guide surface (203), a first stage (206), a second stage (208), and a first mover subassembly (216) including a first mover (231) and a... |
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US20050157288 |
Zero-force pellicle mount and method for manufacturing the same
Methods and apparatuses for mounting a pellicle to a reticle is provided. A multi-support point pellicle holder supports a pellicle, such as a fused silica pellicle, and a multi-support point... |
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US20080204694 |
Controlling shape of a reticle with low friction film coating at backside
In an embodiment of the invention, an apparatus includes a reticle having a frontside including a pattern to be imaged onto a semiconductor wafer, a thin film located over a backside of the... |
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US20050174551 |
Position control and heat dissipation for photolithography systems
A photolithography system that uses a variable reluctance linear motor (VRLM) to move a reticle or wafer stage is described. In addition to moving the stage, one or more of the surfaces of the... |
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US20060256305 |
Exposure apparatus and method for reducing thermal deformity of reticles
Disclosed is an exposure apparatus and method thereof able to prevent thermal deformity of reticles. The exposure apparatus may includes a reticle container including a plurality of reticles and a... |
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US20080204695 |
EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated Environment
A method for providing a vacuum isolated environment in a lithography system is disclosed. The method for dechucking a reticle includes providing a mask chamber having one or more vacuum valves... |
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US20070091292 |
System, medium, and method controlling operation according to instructional movement
A system, medium, and method for controlling an operation according to movement. A movement model can be generated based on at least one movement and stored corresponding to a predetermined... |
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US20150212419 |
Lithography System And Method For Haze Elimination
The present disclosure provides an apparatus in semiconductor manufacturing. The apparatus includes a mask, a pellicle frame attached to the mask, and a pellicle joined to the pellicle frame... |
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US20130293865 |
Linear Stage for Reflective Electron Beam Lithography
A linear stacked stage suitable for REBL may include a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast... |
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US20090262327 |
MASK TRANSPORT SYSTEM CONFIGURED TO TRANSPORT A MASK INTO AND OUT OF A LITHOGRAPHIC APPARATUS
A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a... |
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US20090033907 |
DEVICES AND METHODS FOR DECREASING RESIDUAL CHUCKING FORCES
Devices and methods are disclosed for holding a reticle or analogous object, particularly a planar object. An exemplary reticle-holding device includes a reticle chuck having a reticle-holding... |
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US20050151955 |
Method and apparatus for a reticle with purged pellicle-to-reticle gap
A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical... |
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US20100039635 |
Filter Device Disposed in Reticle Library of Lithography System
A filter device disposed in the reticle library of a lithography system, the lithography system comprising: a light emitting unit for providing a light source, a reticle library disposed with a... |
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US20060033905 |
Pellicle-reticle methods with reduced haze or wrinkle formation
Methods for using and/or storing a pellicle-reticle assembly that does not result in the formation of haze on the reticle and/or the formation of wrinkles on the pellicle. |
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US20090316129 |
LITHOGRAPHIC APPARATUS HAVING A FEED FORWARD PRESSURE PULSE COMPENSATION FOR THE METROLOGY FRAME
A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate; a metrology frame supported by a vibration isolation... |
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US20060038971 |
DUAL RETICLE DEVICE AND ASSEMBLING METHOD THEREOF
A dual reticle device comprising a ring structure, a first reticle and a second reticle is provided. Four positioning grooves parallel to the axis of the ring structure are formed on the external... |
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US20070268476 |
KINEMATIC CHUCKS FOR RETICLES AND OTHER PLANAR BODIES
Devices are disclosed for holding and moving a planar body such as a reticle as used, for example, in microlithography. An exemplary device includes a stage and a body chuck. The stage has a... |
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US20070229793 |
Filtered device container assembly with shield for a reticle
A device container assembly (30) for storing a reticle (26) includes a device container (246) and a shield assembly (250). The device container (246) encircles the reticle (26). Further, the... |
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US20070146680 |
Exposure apparatus, exposure method, and exposure mask
Disclosed is an exposure apparatus, an exposure method and an exposure mask, for improved optical lithography. Specifically, in accordance with one preferred form of the invention, the exposure... |
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US20060170902 |
Apparatus and method for a loading reticle
An apparatus and method to load a reticle, to check whether the reticle is loaded in a flat manner and to flatten the reticle when the reticle is not loaded in a flat manner. In one embodiment,... |
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US20060209289 |
Exposure apparatus, and device manufacturing method
Disclosed is an exposure apparatus for exposing a substrate through a reticle, wherein the apparatus includes a clamp having a circumferential protrusion and a pin disposed inside the... |
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US20070287074 |
Controlled ambient reticle frame
Embodiments provide a system and a method to control the gas ambient in a reticle frame system. The reticle frame system can include a first cross structure including a pellicle, a second cross... |
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US20080024749 |
Low mass six degree of freedom stage for lithography tools
A reticle or wafer stage mover with six degrees of freedom, a low mass coarse stage, and the ability to move an object in a scanning direction in a lithography tool. The mover includes a coarse... |
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US20100285399 |
WAFER EDGE EXPOSURE UNIT
A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common... |
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US20050162634 |
Cable tray assembly for precision drive stage
A cable tray assembly includes a wafer table placed on a precision drive stage of which motions along specified mutually perpendicular X- and Y-directions are independently controlled. A plurality... |
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US20090174874 |
Optical Projection System
An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and... |
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US20060215144 |
Stage drive method, stage apparatus, and exposure apparatus
A stage drive method for driving a stage on a surface of a surface plate along a guide part that extends in a first direction includes the step of rotating the guide part about an axis... |
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US20070273861 |
STAGE DEVICE, EXPOSURE APPARATUS, AND MICRODEVICE MANUFACTURING METHOD
A stage device including a base, a stage movable portion being movable along said base without contact thereto, an interferometer configured to measure a position of the stage movable portion, at... |