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US20060285092 Exposure apparatus and device fabrication method  
An exposure apparatus for forming a predetermined pattern on a substrate by using exposure light, includes a stage apparatus which is movable with respect to an optical axis of the exposure light;...
US20050128449 Utilities transfer system in a lithography system  
Techniques for transferring utilities to and from a reticle or wafer stage in a lithography system while minimizing physical disturbances that affect the stage are described. These techniques...
US20060146312 Holding apparatus, holding method, exposure apparatus and device manufacturing method  
A reticle holder has a first suction section facing a precision warrantable area having a predetermined surface precision, of a lower face of a reticle, a second suction section facing a precision...
US20070159615 Object transfer apparatus, exposure apparatus, object temperature control apparatus, object transfer method, and microdevice manufacturing method  
In order to reliably transfer an object whose temperature has been controlled to an appropriate temperature in a state in which the appropriate temperature is maintained, there are provided a...
US20070121091 Extreme ultraviolet reticle protection using gas flow thermophoresis  
Methods and apparatus for using a flow of a relatively cool gas to establish a temperature gradient between a reticle and a reticle shield to reduce particle contamination on the reticle are...
US20070117028 Mask handling method, and mask and device or apparatus comprising a gripper therefor, device manufacturing method and device manufactured thereby  
A mask for use in a lithographic projection apparatus comprises three brackets arranged on the circumference of the mask. The brackets are provided with grooves directed to a common imaginary...
US20080204693 Substrate Support Method  
The present invention includes a method for supporting a substrate that features a chuck body having a body surface with a pin extending therefrom having a contact surface lying in a plane, with...
US20060012771 System and method for manufacturing a flat panel display  
A system for manufacturing a flat panel display is provided including: a first mask loading/unloading part for loading at least one mask; a main mask-stage for disposing the mask; a first...
US20080024751 Reticle holding member, reticle stage, exposure apparatus, projection-exposure method and device manufacturing method  
Reticle-holding members are disclosed that prevent a reticle from falling from the reticle stage of an exposure device, even in event of a power failure, and that maintain flatness of the reticle...
US20070268476 KINEMATIC CHUCKS FOR RETICLES AND OTHER PLANAR BODIES  
Devices are disclosed for holding and moving a planar body such as a reticle as used, for example, in microlithography. An exemplary device includes a stage and a body chuck. The stage has a...
US20050270517 Supporting system in exposure apparatus  
Disclosed is a supporting system having a carrying member for carrying a workpiece thereon and a supporting mechanism for supporting the carrying member from a workpiece transfer position to a...
US20090219504 SUBSTRATE CONVEYOR APPARATUS, SUBSTRATE CONVEYANCE METHOD AND EXPOSURE APPARATUS  
A substrate conveyor apparatus carries a substrate on which patterns are formed, carries the substrate in a state protected by a protective cover when the substrate is not used, and carries a...
US20070097346 Lithographic apparatus and device manufacturing method  
An article support configured to support an article to be placed in a beam path of a radiation beam of a lithographic apparatus on the article support is disclosed, the article support having a...
US20120182538 Methods and Apparatus for Inspection Of Articles, EUV Lithography Reticles, Lithography Apparatus and Method of Manufacturing Devices  
An article such as an EUV lithography reticle is inspected to detect contaminant particles. The method comprises applying a fluorescent dye material to the article, illuminating the article with...
US20080285004 Monolithic, Non-Contact Six Degree-of-Freedom Stage Apparatus  
Methods and apparatus for controlling a stage assembly in up to six degrees of freedom using actuators which each allow for forces to be generated in a horizontal direction and a vertical...
US20070091292 System, medium, and method controlling operation according to instructional movement  
A system, medium, and method for controlling an operation according to movement. A movement model can be generated based on at least one movement and stored corresponding to a predetermined...
US20090033907 DEVICES AND METHODS FOR DECREASING RESIDUAL CHUCKING FORCES  
Devices and methods are disclosed for holding a reticle or analogous object, particularly a planar object. An exemplary reticle-holding device includes a reticle chuck having a reticle-holding...
US20060215144 Stage drive method, stage apparatus, and exposure apparatus  
A stage drive method for driving a stage on a surface of a surface plate along a guide part that extends in a first direction includes the step of rotating the guide part about an axis...
US20060126050 Substrate holding device, substrate holding method and substrate heating device  
A substrate holding device comprises a holding table for holding a substrate, heating means for heating the holding table, and attraction means for causing the substrate to be attracted onto the...
US20060164622 Illumination apparatus, projection exposure apparatus, and device fabricating method  
An exposure apparatus having an exposure mode that transfers a pattern on a reticle onto an object, and a standby mode that waits for exposure includes an optical system for introducing the...
US20120026474 Reticle Cooling in a Lithographic Apparatus  
An apparatus and method reduce temperature variation across a reticle so as to reduce the expansion variation of the reticle. One method for realizing reduced temperature variation is to fill an...
US20050140961 Anti-vibration system, method of controlling the same, exposure apparatus, and device manufacturing method  
Disclosed is an anti-vibration system, a method of controlling the same, and an exposure apparatus having the same. The anti-vibration system includes a gas spring, a valve provided in relation to...
US20050231706 Feedforward control with reduced learning time for lithographic system to improve throughput and accuracy  
Embodiments of the present invention are directed to a control system and method for controlling the trajectory and alignment of one or more stages by incorporating a grouping method in the...
US20070097340 Active damper with counter mass to compensate for structural vibrations of a lithographic system  
Methods and apparatus for actively damping vibrations associated with a optical assembly of a photolithographic system are disclosed. According to one aspect of the present invention, an assembly...
US20140036250 MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD  
The measuring apparatus of the present invention is a measuring apparatus that measures a position of an object based on a first phase signal and a second phase signal which are different in phase...
US20050275835 Method and apparatus for protecting an EUV reticle from particles  
Methods and apparatus for reducing particle contamination on a reticle used in an extreme ultraviolet (EUV) lithography process. According to one aspect of the present invention, an apparatus that...
US20070188732 Stage apparatus and exposure apparatus  
The position of a movable stage is detected without increasing cost or the size of apparatus. An apparatus comprises movable stages (WST, MST) that move along a plane of motion (12a); and a...
US20070035715 Exposure apparatus for manufacturing semiconductors and method for inspecting pellicles  
Example embodiments of the present invention relate to an apparatus for manufacturing semiconductors and a method of inspecting a pellicle. Other example embodiments of the present invention...
US20050151955 Method and apparatus for a reticle with purged pellicle-to-reticle gap  
A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical...
US20050157288 Zero-force pellicle mount and method for manufacturing the same  
Methods and apparatuses for mounting a pellicle to a reticle is provided. A multi-support point pellicle holder supports a pellicle, such as a fused silica pellicle, and a multi-support point...
US20080073982 Magnetic Guide Apparatus, Stage Apparatus, Exposure Apparatus, and Device Manufacturing Method  
A magnetic guide apparatus includes a guide member that has a guide plane provided along a first direction, and a moving body that has a facing plane facing the guide plane to be spaced apart from...
US20060077361 Means of removing particles from a membrane mask in a vacuum  
A method of removing particles from a membrane reticle by a laser beam or beams. The particles on the bottom of the reticle are knocked off and fall away and particles on the top are removed a...
US20060082755 Stage system, exposure apparatus, and device manufacturing method  
A stage system that can meet enlargement of a stroke and thus, particularly, that can be suitably incorporated into an electron beam exposure apparatus. The stage system includes a first fixed...
US20060256305 Exposure apparatus and method for reducing thermal deformity of reticles  
Disclosed is an exposure apparatus and method thereof able to prevent thermal deformity of reticles. The exposure apparatus may includes a reticle container including a plurality of reticles and a...
US20060061751 Stage assembly including a stage having increased vertical stroke  
A stage assembly (220) includes a stage base (202) having a guide surface (203), a first stage (206), a second stage (208), and a first mover subassembly (216) including a first mover (231) and a...
US20090253078 DOUBLE EXPOSURE LITHOGRAPHY USING LOW TEMPERATURE OXIDE AND UV CURE PROCESS  
A method of processing a substrate includes forming a first layer having a photosensitive response to incident radiation on the substrate, forming a first pattern in the first layer, and exposing...
US20110096306 STAGE APPARATUS, EXPOSURE APPARATUS, DRIVING METHOD, EXPOSING METHOD, AND DEVICE FABRICATING METHOD  
A stage apparatus includes a guide member that extends in first directions, that moves in second directions, which are substantially orthogonal to the first directions; two second moving bodies,...
US20070211232 Thermophoretic Techniques for Protecting Reticles from Contaminants  
Thermophoresis within lithography systems for protecting reticles from contaminants (e.g., floating particles). Generally, thermophoretic protection is implemented by maintaining the reticle at a...
US20100079736 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An apparatus that exposes a pattern of an original onto a plate through a projection optical system. The apparatus includes a reference base that holds the projection optical system, a supporting...
US20100007862 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An apparatus that projects a pattern of an original, onto a substrate held by a substrate stage having a top plate, to expose the substrate, comprises a cleaning unit, the cleaning unit including...
US20080068603 ANTI-VIBRATION APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
An anti-vibration apparatus includes a target object, a reference object, a measuring device which measures the position of the target object relative to the reference object, a driving mechanism...
US20060170902 Apparatus and method for a loading reticle  
An apparatus and method to load a reticle, to check whether the reticle is loaded in a flat manner and to flatten the reticle when the reticle is not loaded in a flat manner. In one embodiment,...
US20100007869 Reticle Handler  
The present invention provides an apparatus and method for handling a reticle during manufacturing processes of semiconductor devices in the fabrication line. The apparatus includes a holder for...
US20080024749 Low mass six degree of freedom stage for lithography tools  
A reticle or wafer stage mover with six degrees of freedom, a low mass coarse stage, and the ability to move an object in a scanning direction in a lithography tool. The mover includes a coarse...
US20110128523 STAGE APPARATUS, EXPOSURE APPARATUS, DRIVING METHOD, EXPOSING METHOD, AND DEVICE FABRICATING METHOD  
A drive system drives the moving body based on: measurement results of a first measuring system that measures the position of the moving body within an plane by radiating a measurement beam from...
US20080118876 Lithographic apparatus and method  
In an embodiment, a ring seal forming apparatus is disclosed, the apparatus including a substrate holder arranged to hold a substrate coated at least in part with resist, and a deep ultraviolet...
US20080204695 EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated Environment  
A method for providing a vacuum isolated environment in a lithography system is disclosed. The method for dechucking a reticle includes providing a mask chamber having one or more vacuum valves...
US20070115451 Lithographic System with Separated Isolation Structures  
Methods and apparatus for isolating or separating a reticle stage arrangement from a lens assembly are disclosed. According to one aspect of the present invention, an apparatus includes a reticle...
US20060038972 Lithographic system with separated isolation structures  
Methods and apparatus for isolating or separating a reticle stage arrangement from a lens assembly are disclosed. According to one aspect of the present invention, an apparatus includes a reticle...
US20060103833 Aligning apparatus and its control method, and exposure apparatus  
An aligning apparatus having a stage movable on a stage base, a table, which is provided on the stage and which is movable while holding an object to be aligned, an actuator to perform alignment...

Matches 1 - 50 out of 71 1 2 >