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US20070146676 Method of adjusting lighting optical device, lighting optical device, exposure system, and exposure method  
An illumination optical apparatus is arranged to illuminate a surface to be illuminated, with light in a desired polarization state, without substantive influence of manufacturing error of an...
US20090316132 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method  
There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made...
US20060170901 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method  
There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made...
US20120236285 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD  
An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an...
US20110063597 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MICROLITHOGRAPHIC EXPOSURE METHOD  
An optical system for a microlithographic projection exposure apparatus, and a microlithographic exposure method are disclosed. An optical system for a microlithographic projection exposure...
US20090323041 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses  
A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical...
US20090147235 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses  
A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical...
US20090147233 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses  
A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical...
US20110273698 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses  
A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical...
US20100149511 Illumination optical system, exposure apparatus, and exposure method  
An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an...
US20090147234 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses  
A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical...
US20090073404 Variable slit device, illumination device, exposure apparatus, exposure method, and device manufacturing method  
A variable slit device for forming illumination light having a slit shape extending in a longitudinal direction and a lateral direction. A first light intensity setting unit sets a first light...
US20140327898 MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM AND METHOD FOR MANUFACTURING A DEVICE  
In some embodiments, a catoptric microlithgraphy projection optical system includes a plurality of reflective optical elements arranged to image radiation from an object field in an object plane...
US20140300882 ARRANGEMENT FOR ACTUATING AN ELEMENT IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a...
US20100079741 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY  
A projection objective for use in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured...
US20060055909 Illumination system for a microlithographic projection exposure apparatus  
An illumination system for a microlithographic projection exposure apparatus has a first polarization manipulator, a second polarization manipulator and at least one optical element located...
US20050007573 Device manufacturing method  
A rectangular or bar-shaped, on-axis illumination mask with radiation polarized parallel to the length of the bar provides improved DOF and exposure latitude with less lens heating as compared to...
US20120206705 OPTICAL ELEMENT AND EXPOSURE APPARATUS  
An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a...
US20100225895 Illumination optical system, exposure apparatus, and exposure method  
An illumination optical system and method illuminates an irradiated surface based on linearly polarized light supplied from a light source. The illumination optical system includes a depolarizer...
US20080030708 DEVICE MANUFACTURING METHOD  
A rectangular or bar-shaped, on-axis illumination mask with radiation polarized parallel to the length of the bar provides improved DOF and exposure latitude with less lens heating as compared to...
US20060203221 Lithographic apparatus and a method for determining a polarization property  
A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is...
US20070019179 Polarization-modulating optical element  
The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of...
US20070127005 Illumination system  
A system and method are used to substantially homogenizing and removing at least some coherence from a beam of light.
US20110188019 POLARIZATION-MODULATING OPTICAL ELEMENT  
The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of...
US20100149512 SPECTRAL PURITY FILTER FOR MULTI-LAYER MIRROR, LITHOGRAPHIC APPARATUS INCLUDING SUCH MULTI-LAYER MIRROR, METHOD FOR ENLARGING THE RATIO OF DESIRED RADIATION AND UNDESIRED RADIATION, AND DEVICE MANUFACTURING METHOD  
A multi-layer mirror includes a multi-layer stack. The multi-layer stack includes a plurality of alternating layers with a multi-layer stack top layer and a spectral filter top layer arranged on...
US20090251677 ILLUMINATING OPTICAL UNIT AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY  
A projection exposure apparatus for microlithography has an illumination system with an EUV light source and an illumination optical unit to expose an object field in an object plane. A projection...
US20070139636 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system  
A polarization rotator and crystalline quartz plate for use with an optical imaging system. The system has several imaging optical components (L1-L16) sequentially arranged along an optical axis...
US20050030510 Projection exposure apparatus and device manufacturing method  
Disclosed is an exposure apparatus for illuminating a reflection type mask with light from a light source and for exposing a substrate with a pattern of the illuminated reflection type mask,...
US20140293256 MICROLITHOGRAPHY PROJECTION OBJECTIVE  
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
US20130242278 Projection objective of a microlithographic projection exposure apparatus designed for EUV and a method of optically adjusting a projection objective  
The invention concerns a projection objective of a microlithographic projection exposure apparatus designed for EUV, for imaging an object plane illuminated in operation of the projection exposure...
US20130115419 OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS INCLUDING SUCH OPTICAL ELEMENT AND DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY  
An optical element includes a top layer which is transmissive for EUV radiation with wavelength in the range of 5-20 nm, and a structure of the top layer is a structure having an rms roughness...
US20080239274 Illumination optical system, exposure apparatus, and exposure method  
An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the...
US20050134825 Polarization-optimized illumination system  
An illumination system for a projection exposure machine, operating with ultraviolet light, for microlithography has an angle-conserving light mixing device with at least one integrator rod that...
US20130010275 LITHOGRAPHIC APPARATUS AND SPECTRAL PURITY FILTER  
A reflector includes a multi layer mirror structure configured to reflect radiation at a first wavelength, and one or more additional layers. The absorbance and refractive index at a second...
US20090296066 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND DEPOLARIZER  
The disclosure relates to an exposure system of a microlithographic projection exposure apparatus that includes a light source which produces substantially linearly polarised light which is...
US20170146913 EXPOSURE METHOD AND APPARATUS, AND METHOD FOR FABRICATING DEVICE WITH LIGHT AMOUNT DISTRIBUTION HAVING LIGHT LARGER IN FOUR AREAS  
An exposure method and apparatus for illuminating a pattern with an illumination system to expose a substrate through a projection system. The pattern is illuminated with illumination light with a...
US20100033704 DEFORMABLE MIRROR, MIRROR APPARATUS, AND EXPOSURE APPARATUS  
A mirror apparatus includes a plurality of holes which are divided by partition wall portions on a back surface of a mirror, a plurality of thin film piezoelectric elements which are fixed to...
US20090097008 Alignment Method and Apparatus, Lithographic Apparatus, Metrology Apparatus and Device Manufacturing Method  
An alignment sensor includes a spatially coherent radiation source that supplies a radiation beam to an angle-resolved scatterometer. Alignment is performed by detecting beats in the scatter...
US20120147351 SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER  
A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation (λ<20 nm). The filter comprises a grid-like structure comprising a plurality of microscopic apertures...
US20110235015 ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY  
An illumination optics for EUV microlithography illuminates an object field with the aid of an EUV used radiation beam. Preset devices preset illumination parameters. An illumination correction...
US20100182582 Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool  
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein...
US20100149510 METHODS FOR PRODUCING AN ANTIREFLECTION SURFACE ON AN OPTICAL ELEMENT, OPTICAL ELEMENT AND ASSOCIATED OPTICAL ARRANGEMENT  
Methods for producing an antireflection surface (6) on an optical element (1) made of a material that is transparent at a useful-light wavelength λ in the UV region, preferably at 193 nm. A first...
US20120075611 DIAPHRAGM CHANGING DEVICE  
The invention relates to an optical imaging device, in particular an objective 1 for microlithography in the field of EUVL for producing semiconductor components, having a beam path 2, a plurality...
US20090115989 LIGHTING OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD  
There is disclosed an illumination optical apparatus which illuminates a surface to be illuminated on the basis of light from a light source, comprising, a first polarizing member arranged as...
US20080002172 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A microlithographic projection exposure apparatus comprises an illumination system for generating projection light, a projection lens for imaging a reticle onto a light-sensitive surface and an...
US20100045956 Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor Thereof  
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein...
US20090115986 Microlithography projection objective  
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
US20050237509 System and method for custom-polarized photolithography illumination  
In one embodiment, a system for custom-polarized photolithography illumination includes an illuminator operable to generate an illumination pattern of light, a polarizer unit operable to variably...
US20110170084 LIGHT EXPOSURE MASK AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME  
The present invention provides a light exposure mask which can form a photoresist layer in a semi-transmissive portion with uniform thickness, and a method for manufacturing a semiconductor device...
US20070146677 ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS USING THE SAME  
An illumination optical system for illuminating an illuminated surface using light from a light source includes a first diffraction optical element upon which the light from the light source is...

Matches 1 - 50 out of 150 1 2 3 >