Matches 1 - 35 out of 35


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US20100039634 EXPOSURE APPARATUS FOR DISPLAY AND EXPOSING METHOD USING THE SAME  
Provided is an exposure apparatus, including a plurality of exposure lamps and a luminance changing mechanism disposed between the exposure lamps and an exposure target. The luminance changing...
US20090316131 EXPOSURE APPARATUS THAT UTILIZES MULTIPLE MASKS  
An exposure apparatus (10) for transferring a first mask pattern (29A) from a first mask (26A) and a second mask pattern (29B) from a second mask (26B) to a substrate (28) includes a first mask...
US20120170014 Photolithography system using a solid state light source  
A photolithography system based on a solid-state light source having LEDs is provided. Solid-state photolithography using the solid state light source can achieve high quality patterns over a wide...
US20090268186 PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS  
A belt-like work (11) provided with a photosensitive layer is conveyed in a work conveying direction F at a work conveying speed V. An illuminating section (30) illuminates a photomask (29) in an...
US20090219501 OPTICAL UNIT USING OPTICAL ATTENUATOR AND PRINTING APPARATUS PROVIDED THEREWITH  
An optical unit for a printing apparatus, and a printing apparatus that uses the optical unit. The optical unit includes a plurality of light emitting elements, a lens that collects light from the...
US20120281195 Multi-Method and Device with an Advanced Acousto-Optic Deflector (AOD) and a Dense Brush of Flying Spots  
The technology disclosed relates to improved acousto-optic deflectors (AODs). In particular, it relates to compensation for subtle effects not previously addressed by AOD designers. A shifting...
US20100073660 SPECTRALLY CONTROLLED HIGH ENERGY DENSITY LIGHT SOURCE PHOTOPOLYMER EXPOSURE SYSTEM  
A system for forming printing features (10) on a printing plate includes a high energy density light source (20) that has an emission spectrum that includes actinic radiation and non-actinic...
US20110090480 DYNAMIC MASKING METHOD FOR MICRO-TRUSS FOAM FABRICATION  
A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material configured to at least one of initiate, polymerize, crosslink and dissociate...
US20080309906 Illumination of a Patterning Device Based on Interference for Use in a Maskless Lithography System  
A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the...
US20090257040 OPTICAL ELEMENT WITH MULTIPLE PRIMARY LIGHT SOURCES  
The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light...
US20090310113 SUB-SEGMENTED ALIGNMENT MARK ARRANGEMENT  
An alignment mark on a substrate includes a periodic structure of a plurality of first elements and a plurality of second elements. The elements are arranged in an alternating repetitive sequence...
US20140199636 SUB-DIFFRACTION-LIMITED PATTERNING AND IMAGING VIA MULTI-STEP PHOTOSWITCHING  
Sub-diffraction-limited patterning using a photoswitchable recording material is disclosed. A substrate can be provided with a photoresist in a first transition state. The photoresist can be...
US20080239272 Reduced lens heating methods, apparatus, and systems  
In one embodiment, a system is disclosed that includes an illuminator having a source that produces light waves having a first wavelength, and a mask. The mask includes at least one partly opaque...
US20060092617 Document illuminating apparatus, document reading apparatus and image forming apparatus permitting efficient cooling  
A document illumination apparatus includes a first light source configured to emit light. A first lower reflector is configured to reflect the light emitted from the first light source. A first...
US20090021718 Method, Computer Program, Apparatus and System Providing Printing for an Illumination Mask for Three-Dimensional Images  
A method able to provide illumination source parameters for illumination of a lithographic mask in order to project a three-dimensional image into a resist system. Source intensities of incident...
US20080218724 ILLUMINATION UNIT, IMAGE READ APPARATUS, IMAGE FORMATION APPARATUS  
An illumination unit for use in an image read apparatus is provided which illuminates a surface of an original document with illumination light, reads an image of the original document by a light...
US20100183984 MULTIPLEXING OF PULSED SOURCES  
A process and related apparatus for generating an output radiation through an output aperture, including generating pulsed radiations by a plurality of radiation sources, each source being...
US20090257038 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE  
An exposure apparatus (100) which exposes a substrate to light having a set light source shape via a mask (400) includes a plurality of light sources (201) arrayed two-dimensionally, and a light...
US20090091718 IMAGE PROJECTION DEVICE, IMAGE PROJECTION SCREEN AND IMAGE DISPLAY SYSTEM  
An image projector according to the present invention includes a first light source that emits visible light and a second light source that emits invisible light and projects the visible light and...
US20100045955 Particle Detection on an Object Surface  
Systems and methods are provided for inspecting an object surface. An illumination source illuminates the object surface. An optic intercepts scattered light from the illuminated object surface...
US20100220306 SOLID-STATE ARRAY FOR LITHOGRAPHY ILLUMINATION  
A method for providing an actinic illumination energizes solid-state light sources in an array, wherein each solid-state light source emits actinic light of a predetermined wavelength, directs the...
US20090170042 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An exposure apparatus comprises an illumination optical system which illuminates an original, a light intensity distribution along a scanning direction of the original formed by the illumination...
US20090244510 PROCESS AND APPARATUS FOR THE PRODUCTION OF COLLIMATED UV RAYS FOR PHOTOLITHOGRAPHIC TRANSFER  
The present invention provides an improved process and an apparatus for producing collimated UV radiation for exposing printed circuit boards. The process consists in shortening the optical length...
US20090257039 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An exposure apparatus which exposes a substrate coated with a photoresist to form a latent image to the photoresist, comprises an original holding unit configured to hold an original including a...
US20080160457 APPARATUS AND METHOD FOR REDUCING DEFECTS  
An embodiment relates generally to an apparatus for reducing defects. The apparatus includes a spindle adapted to hold a wafer; and at least two light sources configured to direct light to a...
US20150168702 STRUCTURED ILLUMINATION MICROSCOPY APPARATUS AND METHOD  
A microscope or endoscope, comprising a light condenser (such as an objective lens), and an array of micro-lenses (such as supported on a transparent plate), wherein the micro-lenses are arranged...
US20150227036 LITHOGRAPHY APPARATUS, AN APPARATUS FOR PROVIDING SETPOINT DATA, A DEVICE MANUFACTURING METHOD, A METHOD FOR PROVIDING SETPOINT DATA AND A COMPUTER PROGRAM  
An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose...
US20100178612 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD  
A lithographic apparatus includes a support constructed to support a patterning device for imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a...
US20100149504 ILLUMINATION DEVICE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND MICROLITHOGRAPHIC PROJECTION EXPOSURE METHOD  
Illumination devices of a microlithographic projection exposure apparatus, include a deflection device with which at least two light beams impinging on the deflection device can be variably...
US20100103397 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE  
A position of a chuck 10 is detected. The movements of the stages 5 and 7 are controlled according to a result of detecting the position of the chuck 10, so as to position the chuck 10. Further, a...
US20170075227 SURFACE POSITION DETECTION APPARATUS, EXPOSURE APPARATUS, AND EXPOSURE METHOD  
A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional...
US20140333916 METHOD AND APPARATUS FOR THE FORMATION OF CONDUCTIVE FILMS ON A SUBSTRATE  
Provided herein are a method and apparatus for the formation of conductive films on a substrate using precise sintering of a conductive film and thermal management of the substrate during...
US20120212724 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE  
An illumination optical system comprises plural rod integrators, a combining optical system and a light transmission unit. The rod integrators uniformize light intensity distributions of the light...
US20110313560 FOR RAPID PROTOTYPING APPARATUS  
A stereolithography apparatus and an exposure system for a stereolithography apparatus, wherein light emitting diodes are used as light sources. The invention relates to aligning light from the...
US20100321663 APPARATUS AND PROCESS FOR EXPOSING A PRINTING FORM HAVING A CYLINDRICAL SUPPORT  
The invention pertains to a method and apparatus for exposing a cylindrical print sleeve. The method and apparatus can accommodate exposing various cylindrical print sleeves having different...

Matches 1 - 35 out of 35