Matches 1 - 29 out of 29


Match Document Document Title
US20050200823 Scanning exposure method, scanning exposure apparatus and its making method, and device and its manufacturing method  
A control system adjusts the exposure of a wafer according to the transfer error of a pattern line width caused when a certain integrated exposure over the whole shot areas is made a desired value...
US20050094122 Exposure method and exposure apparatus, light source unit and adjustment method of light source unit, and device manufacturing method  
When scanning exposure is performed by illuminating an illumination area on a mask with a pulse light from a pulse light source, synchronously moving the mask and a photosensitive object, and...
US20050030508 Scanning exposure method, scanning exposure apparatus and its making method, and device and its manufacturing method  
A control system adjusts the exposure of a wafer according to the transfer error of a pattern line width caused when a certain integrated exposure over the whole shot areas is made a desired value...
US20080094598 Printing a Mask with Maximum Possible Process Window Through Adjustment of the Source Distribution  
A lithographic mask is illuminated with light from different directions such that intensities of a plurality of incident beams of light provide a largest possible integrated process window defined...
US20070182946 Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus  
A device manufacturing method includes using a patterning device to impart a beam of radiation with a pattern in its cross-section, projecting the patterned beam of radiation onto a plurality of...
US20080111983 Illumination System for a Microlithographic Projection Exposure Apparatus  
An illumination system (12) of a microlithographic exposure system comprises a plurality of light emitting elements (24) that have light exit facets that are positioned in or in close proximity to...
US20060087634 Dynamic illumination uniformity and shape control for lithography  
A subsystem for an exposure apparatus has at least one array of tilting mirrors placed in either an image reticle plane or a conjugate image plane to provide dynamic control of an illumination...
US20060126049 Illumination system for a microlithography projection exposure apparatus  
An illumination system for a microlithography projection exposure apparatus is designed for illuminating an illumination field with an illumination radiation with a predeterminable degree of...
US20050254035 Multi-photon lithography  
A system and method for patterned exposure of a photoactive medium is described wherein a pulsed optical beam with a high peak-power is stretched in the time domain to reduce the peak power while...
US20080036984 Method and apparatus for angular-resolved spectroscopic lithography characterization  
A combined alignment and overlay target to be applied to a substrate to enable measurement of the alignment of the substrate with respect to its surroundings, and measurement of the relative...
US20060139610 Lithographic apparatus and device manufacturing method  
Projection beam bandwidth contributes to optical proximity curve/Iso-Dense bias of a system, and can vary from one system to another. This can result in proximity mis-match between systems. The...
US20060139607 Lithographic apparatus and device manufacturing method  
Projection beam bandwidth contributes to optical proximity curve/Iso-Dense bias of a system, and can vary from one system to another. This can result in proximity mis-match between systems. The...
US20070211231 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD  
An exposure apparatus for exposing a pattern of a reticle onto a substrate includes an illumination optical system configured to illuminate the reticle on a target plane to be illuminated using...
US20060164620 Exposure apparatus and optical component for the same  
In an exposure apparatus, a light source emits ultraviolet light having a wavelength of 300 nm or less, a homogenizer reduces energy density inhomogeneity of the ultraviolet light in a plane...
US20060158636 Exposure apparatus and optical component for the same  
In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical...
US20070201013 Lithographic apparatus, device manufacturing method and energy sensor  
An energy sensor, e.g. as part of a transmission image sensor comprises: a radiation-sensitive detector arranged to receive a pulsed radiation beam and to generate a current in response thereto; a...
US20080316458 Light Quantity Adjustment Method, Image Recording Method, and Device  
According to test data supplied from a test data memory (80), a test pattern is formed on a substrate (F) and its line width is measured. Light source units (28a to 28j) are adjusted by a light...
US20090027647 EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD  
The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate a reticle including a pellicle with light from a light source, a projection...
US20060215140 Method of measuring the performance of an illumination system  
The performance of an illumination system in, for example, a lithographic projection apparatus can be measured accurately and reliably by means of a test object (55) comprising at least one...
US20080100816 Lithographic apparatus and method  
An illuminator for a lithographic apparatus is disclosed, the illuminator including an array of individually controllable reflective elements capable of changing the angular intensity distribution...
US20070296948 Dose transfer standard detector for a lithography tool  
A dose transfer standard detector measures radiation intensity and dose in a lithography tool. The lithography tool may be an Extreme Ultraviolet lithography (EUVL) tool. The dose transfer...
US20070291247 Apparatus for exposing an edge portion of a wafer  
In an apparatus for performing an edge exposure process on an edge portion of a photoresist film that is formed on a semiconductor wafer, light provided from a light source is formed to have a...
US20090251675 EXPOSURE DEVICE  
In an exposure device having tiny light emitting elements aligned, a space required for drive circuits and wires is secured without affecting the size or alignment of the light emitting elements...
US20070201014 LIGHT IRRADIATION APPARATUS, LIGHT IRRADIATION METHOD, CRYSTALLIZATION APPARATUS, CRYSTALLIZATION METHOD, SEMICONDUCTOR DEVICE, AND LIGHT MODULATION ELEMENT  
A light irradiation apparatus includes a light modulation element that modulates a phase of incident light to emit the modulated light therefrom, and an image forming optical system that is...
US20060072097 Method for characterization of the illuminator in a lithographic system  
Pupil intensity distribution of an imaging system is measured by exposing an image field of a radiation detector with a bright feature, positioning the detector at a distance away from the image...
US20070024835 Method for improving illumination uniformity in exposure process, and exposure apparatus  
A method for improving illumination uniformity in an exposure process is described, wherein a light source, a reticle and a projection system are used to expose a substrate in the exposure...
US20050286037 Semiconductor exposure apparatus and method for exposing semiconductor using the same  
A semiconductor exposure apparatus and a method for exposing a semiconductor using the same are disclosed, which can prevent differences in critical dimensions according to variations in slit...
US20070159614 Laser projection system  
A mask distance a is adjusted with magnification control unit and mask-shift servo-control unit, and a base plate distance b is adjusted with focus control unit, AFC control unit and table-shift...
US20100134776 HIGH REPETITION PULSE POWER SOURCE AND EXPOSURE DEVICE WITH HIGH REPETITION POWER SOURCE  
A pulse power source which can perform high repetition of pulse signals by enhancing the throughput of a pulse source is provided. The pulse power source includes: a charger; an initial-stage...

Matches 1 - 29 out of 29