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US20150168844 MIRROR ARRANGEMENT FOR A LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING THE SAME  
A method for producing a mirror arrangement for a lithography apparatus is proposed, which comprises the following steps: producing a mirror body having a cavity delimited by a front wall, a rear...
US20130070226 MARKER STRUCTURE AND METHOD OF FORMING THE SAME  
The invention relates to a marker structure for optical alignment of a substrate and provided thereon. The marker structure has a first reflecting surface at a first level and a second reflecting...
US20110300490 HIGH-RESOLUTION MICROSCOPY AND PHOTOLITHOGRAPHY DEVICES USING FOCUSING MICROMIRRORS  
The invention relates to large-field high-resolution microscopy and photolithography setups operating with polychromatic light. It includes the use of a plurality of focusing micromirrors.
US20110216299 ELECTROSTATIC LENS STRUCTURE  
An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first...
US20150092174 ILLUMINATION OPTICAL UNIT  
An illumination optical unit comprises a first faceted element and a second faceted element having a multiplicity of displaceable micromirrors which can be grouped flexibly to form facets.
US20120013881 Method and Apparatus for Determining an Overlay Error  
A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the...
US20150015862 ILLUMINATION OPTICAL UNIT FOR PROJECTION LITHOGRAPHY  
An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement...
US20130100428 MASK FOR EUV LITHOGRAPHY, EUV LITHOGRAPHY SYSTEM AND METHOD FOR OPTIMISING THE IMAGING OF A MASK  
A mask (105) for EUV lithography includes a substrate (107), a multi-layer coating (108) applied to the substrate (107) and a mask structure (109) which is applied to the multi-layer coating (108)...
US20150085264 ROTARY EUV COLLECTOR  
An EUV collector is rotated between or during operations of an EUV photolithography system. Rotating the EUV collector causes contamination to distribute more evenly over the collector's surface....
US20070109520 Modular illuminator for a scanning printer  
Disclosed herewith is a system and method for building an illuminator for a scanning printer. The design is modular enabling any of a number of different sources to be used with common partial...
US20120244477 PELLICLE FOR LITHOGRAPHY  
The invention provides a pellicle for lithography used in the photolithography, affording a wider range of transmissivity to inclinedly incident beams that can be used in a photolithographic...
US20150192860 ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY  
An illumination optical unit for EUV projection lithography has a first and second facet mirrors, each with a plurality of reflecting facets on a support. The facets of the first facet mirror can...
US20150098069 Extreme Ultraviolet Lithography Process and Mask  
A system of an extreme ultraviolet lithography (EUVL) is disclosed. The system includes an extreme ultraviolet (EUV) mask with three states. A reflection coefficient is r1, r2 and r3,...
US20140192339 COLLECTOR  
A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon...
US20110122385 Homogenizer  
A two-stage homogenizer comprising a first homogenizer stage and a second homogenizer stage. The first homogenizer stage includes a pair of microlens arrays and associated focusing optics. The...
US20140368803 ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY, AND OPTICAL SYSTEM COMPRISING SUCH AN ILLUMINATION OPTICAL UNIT  
An illumination optical unit for EUV projection lithography guides illumination light to an illumination field, in which a lithography mask can be arranged. A facet mirror with a plurality of...
US20100328638 LED LIGHT SOURCE, ITS MANUFACTURING METHOD, AND LED-BASED PHOTOLITHOGRAPHY APPARATUS AND METHOD  
This invention provides a structurally-simple LED light source that is capable of preventing temperature variations among its multiple LED elements arranged densely on its LED-mounting substrate...
US20120044473 OPTICAL ELEMENT FOR UV OR EUV LITHOGRAPHY  
To reduce deformations which may be caused by a functional coating on a substrate in an optical element for UV or EUV lithography, an optical element is suggested comprising a functional coating...
US20110019173 Diffraction Elements for Alignment Targets  
A patterning device, including alignment targets having alignment features formed from a plurality of diffractive elements, each diffractive element including an absorber stack and a multi-layered...
US20090231568 METHOD OF MEASURING WAVEFRONT ERROR, METHOD OF CORRECTING WAVEFRONT ERROR, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE  
A method of measuring a wavefront error of an exposure light that occurs when the exposure light passes through an optical system that is used in an exposure apparatus is proposed. The method...
US20140160455 PELLICLE FOR RETICLE AND MULTILAYER MIRROR  
A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
US20150022798 ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY  
A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster...
US20080212045 OPTICAL SYSTEM WITH AT LEAST A SEMICONDUCTOR LIGHT SOURCE AND A METHOD FOR REMOVING CONTAMINATIONS AND/OR HEATING THE SYSTEMS  
A method for removing contaminations from optical elements or parts thereof, especially from at least one surface of at least one optical element, with UV light. At least one semiconductor light...
US20080224251 Optimal Rasterization for Maskless Lithography  
A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern...
US20080148978 Assembly for blocking a beam of radiation and method of blocking a beam of radiation  
An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an...
US20090233189 DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE  
A method of obtaining exposure correction information includes adjusting intensity of light incident on a photomask so that intensity of light output from the photomask has a desired distribution,...
US20140199844 ARRAY DESCRIPTION SYSTEM FOR LARGE PATTERNS  
A method for describing an array of elements includes the steps of providing an array description system that includes a library of possible alternative designations; and describing the array of...
US20120314195 METHOD FOR DETERMINING ILLUMINATION SOURCE WITH OPTIMIZED DEPTH OF FOCUS  
A method for determining an illumination source with optimized depth of focus includes the following steps. First, a simulated optimal correlation and a simulated defocus correlation of each...
US20120099092 DETECTION OF CONTAMINATION IN EUV SYSTEMS  
A sensor for sensing contamination in an application system is disclosed. In one aspect, the sensor comprises a capping layer. The sensor is adapted to cause a first reflectivity change upon...
US20080285002 PROJECTION OBJECTIVE FOR SEMICONDUCTOR LITHOGRAPHY  
Objectives, such as projection objectives for semiconductor lithography, are disclosed. An objective generally has an optical axis and optical elements mounted in an objective housing. Projection...
US20120019796 ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY  
An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster...
US20110116067 Illumination Optimization  
A method of optimizing an illumination pupil shape for a lithographic process 1 comprises identifying a target pattern (206) to be imaged by said lithographic process. It further comprises...
US20090303454 EXPOSURE APPARATUS WITH A SCANNING ILLUMINATION BEAM  
An exposure apparatus (10) for transferring a mask pattern (358) from a mask (12) to a substrate (14) includes a mask retainer (44), a substrate stage assembly (24), and an illumination system...
US20080106719 Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the Same  
Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of...
US20150131069 MASK PROTECTION DEVICE, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE  
A reticle protection device capable of keeping a reticle therein is provided with an inner pod capable of keeping the reticle therein; an outer pod capable of keeping the inner pod therein; an...
US20140176923 Wynn-Dyson imaging system with reduced thermal distortion  
A Wynn-Dyson imaging system with reduced thermal distortion is disclosed, wherein the reticle and wafer prisms are made of glass material having a coefficient of thermal expansion of no greater...
US20080204688 Methodology For Implementing Enhanced Optical Lithography For Hole Patterning In Semiconductor Fabrication  
System and method for enhancing optical lithography methodology for hole patterning in semiconductor fabrication are described. In one embodiment, a photolithography system comprises an...
US20150146186 Lithography Mask Repairing Process  
A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The...
US20090091729 Lithography Systems and Methods of Manufacturing Using Thereof  
Lithography systems and methods of manufacturing semiconductor devices are disclosed. For example, a lithography system includes at least two reticle stages and a common projection lens system...
US20130250262 ILLUMINATION OPTICAL SYSTEM FOR PROJECTION LITHOGRAPHY  
An illumination optical system for projection lithography has an optical assembly for guiding illumination light to an object field to be illuminated in an object plane. The illumination optical...
US20120075605 Source Polarization Optimization  
A lithographic simulation process is described, where each source point in a preselected group of source points at a pupil plane of an illumination source is represented by one or more variable...
US20080018876 COLLECTOR FOR AN ILLUMINATION SYSTEM  
Collectors with mirror shells arranged inside each other, illumination systems equipped with such collectors, projection exposure apparatuses equipped with such illumination systems, methods of...
US20140211186 FAST ILLUMINATION SIMULATOR BASED ON A CALIBRATED FLEXIBLE POINT- SPREAD FUNCTION  
A way of predicting distribution of light in an illumination pupil, comprising: (a) identifying one or more component(s) of an illumination system having an illumination pupil, where the...
US20120212722 Fast Illumination Simulator Based on a Calibrated Flexible Point Spread Function  
A way of predicting distribution of light in an illumination pupil, comprising: (a) identifying one or more component(s) of an illumination system having an illumination pupil, where the...
US20110141445 ILLUMINATION OPTICAL UNIT FOR EUV MICROLITHOGRAPHY  
An illumination optical unit for EUV microlithography includes a first optical element having a plurality of first reflective facet elements and a second optical element having a plurality of...
US20120127440 OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY  
An optical assembly for projection lithography has an optical component to guide imaging or illumination light. The optical component has a reflective substrate that contains a fluorescent...
US20150009480 REFLECTIVE OPTICAL ELEMENT FOR GRAZING INCIDENCE IN THE EUV WAVELENGTH RANGE  
An optical element comprises a reflecting coating on a substrate. The reflecting coating contains boron and can have a thickness of more than 50 nm.
US20120154775 EUV Radiation Source and Method of Generating EUV Radiation  
An EUV radiation source comprising a fuel supply configured to deliver droplets of fuel to a plasma formation location, and a collector configured to collect EUV radiation emitted by a plasma at...
US20110014577 PELLICLE INSPECTION DEVICE, EXPOSURE APPARATUS USING SAME, AND DEVICE MANUFACTURING METHOD  
The pellicle inspection device of the present invention is a device that detects damage to a pellicle film disposed on an original. The pellicle inspection device includes a measuring unit...
US20070279611 Reflective loop system producing incoherent radiation  
A system and method are used to form incoherent beams from a coherent beam. A system comprises a source of radiation and a reflective loop system. The source of radiation produces a coherent or...