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US20070146676 Method of adjusting lighting optical device, lighting optical device, exposure system, and exposure method  
An illumination optical apparatus is arranged to illuminate a surface to be illuminated, with light in a desired polarization state, without substantive influence of manufacturing error of an...
US20140313495 OPTICAL ELEMENT AND PROJECTION EXPOSURE APPARATUS BASED ON USE OF THE OPTICAL ELEMENT  
An optical element for use in an exposure apparatus configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical...
US20080094592 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method  
During the drive of a stage, positional information in a movement plane of a stage is measured by three encoders that include at least one each of an X encoder and a Y encoder of an encoder...
US20060209285 Optical element and projection exposure apparatus based on use of the optical element  
A liquid immersion exposure apparatus includes a projection optical system (PL) which projects an image of a pattern onto a substrate (W) and a unit (5) which supplies a liquid (7) between an...
US20080304033 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the...
US20060170901 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method  
There is disclosed a polarization-modulating element for modulating a polarization state of incident light into a predetermined polarization state, the polarization-modulating element being made...
US20050046819 Maskless lithography systems and methods utilizing spatial light modulator arrays  
A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern...
US20060132747 Optical element for an illumination system  
There is provided an optical element for an illumination system for wavelengths of ≦193 nm. The illumination sytem includes a light source, a field plane, an exit pupil, and a plurality of facets....
US20090091730 SPATIAL LIGHT MODULATION UNIT, ILLUMINATION APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
A spatial light modulation unit can be arranged in an optical system and can be arranged along an optical axis of the optical system. The spatial light modulation unit includes a first folding...
US20080158536 OPTICAL SWITCHING IN LITHOGRAPHY SYSTEM  
A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the...
US20120176590 Exposure Method, Exposure Apparatus, Light Converging Pattern Formation Member, Mask, and Device Manufacturing Method  
An exposure method includes a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto a plate;...
US20110228246 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the...
US20110195237 SYSTEM AND RESIN FOR RAPID PROTOTYPING  
The present invention relates to a system and a resin relating to rapid prototyping. The System comprises:(a) an apparatus for producing a three-dimensional object from a light-sensitive material,...
US20100079741 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY  
A projection objective for use in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured...
US20070247606 Illumination system  
A system and method are used to substantially homogenize and remove at least some coherence from a beam of radiation.
US20050068511 Lithographic apparatus and device manufacturing method  
A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.
US20160041475 REPLACEMENT APPARATUS FOR AN OPTICAL ELEMENT  
A replacement apparatus for an optical element mounted between two adjacent optical elements in a lithography objective has a holder for the optical element to be replaced, which holder can be...
US20150212426 EXPOSURE METHOD, EXPOSURE APPARATUS, LIGHT CONVERGING PATTERN FORMATION MEMBER, MASK, AND DEVICE MANUFACTURING METHOD  
An exposure method includes a first exposure step of irradiating a mask (10), which is arranged near a plate (P), with exposure light and exposing a predetermined pattern formed on the mask onto a...
US20140211188 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics...
US20110051112 Exposure apparatus, exposure method, and method for producing device  
An exposure apparatus fills an optical path space of an exposure light beam with a liquid, and exposes a substrate by irradiating the substrate with the exposure light beam via a projection...
US20080291419 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY  
In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium...
US20050007573 Device manufacturing method  
A rectangular or bar-shaped, on-axis illumination mask with radiation polarized parallel to the length of the bar provides improved DOF and exposure latitude with less lens heating as compared to...
US20160004165 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY  
An imaging optical system includes a plurality of mirrors that image an object field in an object plane into an image field in an image plane. At least one of the mirrors is obscured, and thus has...
US20150234289 METHOD FOR OPERATING A PROJECTION EXPOSURE APPARATUS WITH CORRECTION OF IMAGING ABERRATIONS INDUCED BY THE MASK  
The disclosure relates to a method for adapting a projection exposure apparatus for microlithography to a mask having structures with different pitches and/or different structure widths in...
US20150227052 PROJECTION EXPOSURE METHOD, SYSTEM AND OBJECTIVE  
A projection exposure method includes exposing an exposure area of a radiation sensitive substrate with at least one image of a pattern of a mask in a scanning operation. The scanning operation...
US20120044474 OPTICAL MODULE FOR GUIDING A RADIATION BEAM  
An optical module is used to guide an EUV radiation beam. The optical module has a chamber that can be evacuated and at least one mirror accommodated in the chamber. The mirror has a plurality of...
US20110261342 OPTICAL UNIT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARTUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
An optical unit comprises a first optical path in which a spatial light modulator with a plurality of optical elements arranged two-dimensionally and controlled individually can be arranged; a...
US20100231879 Exposure apparatus, exposure method, and device manufacturing method  
An exposure apparatus includes: an optical system having an optical element on which a first exposure light and a second exposure light are incident, the first exposure light and the second...
US20090185154 OPTICAL UNIT, ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARTUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD  
An optical unit comprises a first optical path in which a spatial light modulator with a plurality of optical elements arranged two-dimensionally and controlled individually can be arranged; a...
US20090073407 EXPOSURE APPARATUS AND EXPOSURE METHOD  
An exposure apparatus illuminates a pattern on a first object with an illuminating beam to expose an area to be exposed on a second object with a pattern image. The exposure apparatus includes a...
US20080212045 OPTICAL SYSTEM WITH AT LEAST A SEMICONDUCTOR LIGHT SOURCE AND A METHOD FOR REMOVING CONTAMINATIONS AND/OR HEATING THE SYSTEMS  
A method for removing contaminations from optical elements or parts thereof, especially from at least one surface of at least one optical element, with UV light. At least one semiconductor light...
US20080158537 OPTICAL SWITCHING IN LITHOGRAPHY SYSTEM  
A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the...
US20060203221 Lithographic apparatus and a method for determining a polarization property  
A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is...
US20150185469 METHOD FOR REGULATING THE TILTING OF A MIRROR ELEMENT  
An optical component comprises a carrying structure, at least one mirror element which is mounted in a tiltable manner relative to the carrying structure by an actuator system and which comprises...
US20120274919 CATADIOPTRIC PROJECTION OBJECTIVE  
A reflection mirror assembly for use in a catadioptric imaging optical system includes two curved reflection mirrors, each including a reflection surface expressed by equation (a), where y...
US20090141258 Imaging Device in a Projection Exposure Machine  
An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the...
US20070153249 Lithographic apparatus and device manufacturing method using multiple exposures and multiple exposure types  
A lithographic apparatus and method in which a relatively high resolution exposure, for example of a repeating pattern, is trimmed using a relatively low resolution exposure. According, a...
US20070019179 Polarization-modulating optical element  
The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of...
US20050094122 Exposure method and exposure apparatus, light source unit and adjustment method of light source unit, and device manufacturing method  
When scanning exposure is performed by illuminating an illumination area on a mask with a pulse light from a pulse light source, synchronously moving the mask and a photosensitive object, and...
US20130120728 CATADIOPTRIC PROJECTION OBJECTIVE WITH MIRROR GROUP  
A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the...
US20070146674 Advanced Illumination System for Use in Microlithography  
A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives...
US20120212721 SUBSTRATES AND MIRRORS FOR EUV MICROLITHOGRAPHY, AND METHODS FOR PRODUCING THEM  
Mirrors having a reflecting coating for the EUV wavelength region and a substrate. A surface region of the substrate extends uniformly below the reflecting coating along this coating and, seen...
US20110188019 POLARIZATION-MODULATING OPTICAL ELEMENT  
The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of...
US20100259742 OBLIQUE MIRROR-TYPE NORMAL-INCIDENCE COLLECTOR SYSTEM FOR LIGHT SOURCES, PARTICULARLY EUV PLASMA DISCHARGE SOURCES  
There is provided a collector system. The collector system includes a first collector mirror and a second collector mirror. The first collector mirror receives EUV light from a light source at a...
US20100045952 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020;...
US20070139636 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system  
A polarization rotator and crystalline quartz plate for use with an optical imaging system. The system has several imaging optical components (L1-L16) sequentially arranged along an optical axis...
US20060098181 Advanced exposure techniques for programmable lithography  
Advanced techniques for programmable photolithography provide enhanced resolution and other aspects of a photolithography system. A combination of multiple exposures and movement of a substrate...
US20050030510 Projection exposure apparatus and device manufacturing method  
Disclosed is an exposure apparatus for illuminating a reflection type mask with light from a light source and for exposing a substrate with a pattern of the illuminated reflection type mask,...
US20050024617 Projection optical system and exposure apparatus having the projection optical system  
A projection optical system according to the present invention whose image side numerical aperture is greater than or equal to 0.75, and which forms an image of a first object upon a second object...
US20170031246 Inspection Apparatus, Inspection Method and Manufacturing Method  
An inspection apparatus is provided for measuring properties of a non-periodic product structure (500′). A radiation source (402) and an image detector (408) provide a spot (S) of radiation on the...

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