Matches 1 - 24 out of 24

AcclaimIP-ad

Match Document Document Title
US20100007866 METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS  
The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.
US20090073407 EXPOSURE APPARATUS AND EXPOSURE METHOD  
An exposure apparatus illuminates a pattern on a first object with an illuminating beam to expose an area to be exposed on a second object with a pattern image. The exposure apparatus includes a...
US20120274917 IMAGING OPTICS  
An imaging optics is provided for lithographic projection exposure for guiding a bundle of imaging light with a wavelength shorter than 193 nm via a plurality of mirrors for beam-splitter-free...
US20120229785 MULTILAYER MIRROR, LITHOGRAPIC APPARATUS, AND METHODS FOR MANUFACTURING A MULTILAYER MIRROR AND A PRODUCT  
A multilayer mirror is configured to reflect extreme ultraviolet (EUV) radiation while absorbing a second radiation having a wavelength substantially-longer than that of the EUV radiation. The...
US20100149504 ILLUMINATION DEVICE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND MICROLITHOGRAPHIC PROJECTION EXPOSURE METHOD  
Illumination devices of a microlithographic projection exposure apparatus, include a deflection device with which at least two light beams impinging on the deflection device can be variably...
US20080002172 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A microlithographic projection exposure apparatus comprises an illumination system for generating projection light, a projection lens for imaging a reticle onto a light-sensitive surface and an...
US20090115986 Microlithography projection objective  
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
US20080259303 PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY  
A projection exposure apparatus for microlithography is disclosed. The apparatus can include a radiation source to generate illumination radiation and a reticle holder to receive a reticle in an...
US20140253892 Extreme Ultraviolet Lithography Projection Optics System and Associated Methods  
The present disclosure provides an extreme ultraviolet lithography system. The extreme ultraviolet lithography system includes a projection optics system to image a pattern of a mask on a wafer....
US20080204685 EXPOSURE APPARATUS, EXPOSURE METHOD AND LITHOGRAPHY SYSTEM  
An exposure apparatus includes a first exposure apparatus used for exposing a peripheral portion of a wafer in maskless manner, the first exposure apparatus including a light source configured to...
US20090225296 PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS  
A projection objective of a microlithographic projection exposure apparatus has a plurality of optical elements, for example lenses or mirrors. The objective furthermore includes an actuator for...
US20080062397 Photolithography Apparatus Having Mirror for Correcting Aberrations in Optical Illumination System and Mirror Having Aberration Correcting Part  
A photolithography apparatus includes an optical illumination system. The optical illumination system includes a light source, an illumination system, a photomask, and a projection system. The...
US20090033903 ILLUMINATION SYSTEMS, EXPOSURE APPARATUS, AND MICRODEVICE-MANUFACTURING METHODS USING SAME  
Illumination systems are disclosed that illuminate a surface M for irradiation with illumination light emitted from a light source 5. An exemplary illumination system includes an incidence-side...
US20120127444 Reflection Mask For EUV Lithography, System For EUV Lithography, And Method Of Fixing The Reflection Mask For EUV Lithography  
Example embodiments of the inventive concepts relate to a reflection mask including an upper surface configured to reflect extreme ultraviolet EUV light, a lower surface opposite the upper...
US20080165820 Method and apparatus for producing grating, and DFB solid-state dye laser based on the grating  
To provide a DFB solid-state dye laser including a grating having Moire interference fringes. A DFB solid-state dye laser element includes: a laser medium containing an organic dye; and a...
US20100123883 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD  
An object is to provide a projection optical system, for example, capable of improving the throughput of scanning exposure in application to scanning exposure apparatus. A projection optical...
US20080252871 Projection exposure apparatus  
The present invention relates to a projection exposure apparatus that forms predetermined patterns onto a substrate. The projection exposure apparatus for forming patterns onto a substrate, which...
US20100103394 REFLECTION PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE  
A reflection projection optical system projects a pattern positioned on an object plane onto an image plane via a mirror. The system has bilateral telecentricity on a side of the object plane and...
US20090244505 POSITIONING UNIT OF OPTICAL ELEMENT, OPTICAL SYSTEM, EXPOSURE APPARATUS, ADJUSTMENT METHOD OF OPTICAL SYSTEM  
A positioning unit is configured to position an optical element in a barrel, and includes a holder configured to hold the optical element, a first intermediate plate mounted with the holder, a...
US20100085644 PROJECTION OBJECTIVE AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY  
A projection objective of a projection exposure apparatus for microlithography serves for imaging an object arranged in an object plane onto a light-sensitive wafer in an image plane. The...
US20090219497 OPTICAL DEVICE WITH STIFF HOUSING  
The disclosure relates to an optical device, such as for microlithography, that includes an optical module and a supporting structure. The disclosure also relates to an optical module that...
US20100165313 MIRROR SUBSTRATE, MIRROR, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND MIRROR MANUFACTURING METHOD  
In a light-transmitting mirror substrate having an axisymmetrical aspherical surface, a surface of the mirror substrate on a side opposite to the axisymmetrical aspherical surface is inclined with...
US20080160457 APPARATUS AND METHOD FOR REDUCING DEFECTS  
An embodiment relates generally to an apparatus for reducing defects. The apparatus includes a spindle adapted to hold a wafer; and at least two light sources configured to direct light to a...
US20100091257 Optical Imaging System and Method for Imaging Up to Four Reticles to a Single Imaging Location  
A catadioptric optical imaging system and method is provided, in which up to four (4) reticles are imaged to a single imaging location (e.g. for imaging substrates), in a manner designed to...
Matches 1 - 24 out of 24