Matches 1 - 14 out of 14


Match Document Document Title
US20080180646 IMPRINT REFERENCE TEMPLATE FOR MULTILAYER OR MULTIPATTERN REGISTRATION AND METHOD THEREFOR  
A method (and resultant structure) of forming a plurality of masks, includes creating a reference template, using imprint lithography to print at least one reference template alignment mark on all...
US20090033892 DOUBLE EXPOSURE OF A PHOTORESIST LAYER USING A SINGLE RETICLE  
A composite exposure image is formed on a photoresist layer by applying a light beam through a reticle to form a first exposure image thereon, and thereafter, while maintaining the position of the...
US20100060871 OFF-AXIS LIGHT SOURCE, LIGHT SCREEN PLATE, AND METHOD OF DEFINING DIFFERENT TYPES OF PATTERNS WITH SINGLE EXPOSURE  
An off-axis light source is described, including an X-dipole illumination pattern, a Y-dipole illumination pattern and a quadrupole illumination pattern at the illumination surface thereof,...
US20090009735 REFLECTIVE, REFRACTIVE AND PROJECTING OPTICAL SYSTEM; REFLECTIVE, REFRACTIVE AND PROJECTING DEVICE; SCANNING EXPOSURE DEVICE; AND METHOD OF MANUFACTURING MICRO DEVICE  
A scanning exposure apparatus of the present invention is one for transferring a pattern of a first object onto a second object while projecting an image of the first object placed on a first...
US20150077731 SYSTEMS AND METHODS FOR HIGH-THROUGHPUT AND SMALL-FOOTPRINT SCANNING EXPOSURE FOR LITHOGRAPHY  
The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure...
US20080246932 Exposure apparatus, device manufacturing method and exposure method  
An exposure apparatus has a first illumination system which illuminates a first mask, a second illumination system which illuminates a second mask located apart from the first mask along a first...
US20090128788 SYSTEM AND METHOD FOR MAKING PHOTOMASKS  
The present application is directed a method for determining the position of photomask patterns in a mask making process. The method comprises providing one or more mask rules defining the minimum...
US20090168034 Methods and Apparatus of Manufacturing a Semiconductor Device  
Methods and apparatus of manufacturing a semiconductor device are provided. Embodiments regard producing a first pattern in a first layer of a semiconductor substrate, producing a second pattern...
US20120224155 DIRECT WRITE LITHOGRAPHY SYSTEM  
The invention pertains to a direct write lithography system comprising: A converter comprising an array of light controllable electron sources, each field emitter being arranged for converting...
US20080239256 Exposure apparatus, exposing method, and device fabricating method  
An exposure apparatus performs a multiple exposure of a substrate and comprises: a first station that exposes the substrate; a second station that exposes the substrate that was exposed at the...
US20130293857 LITHOGRAPHY APPARATUS HAVING DUAL RETICLE EDGE MASKING ASSEMBLIES AND METHOD OF USE  
A lithography apparatus includes at least two reticle edge masking assemblies (REMAs). The lithography apparatus further includes a light source configured to emit a light beam having a wavelength...
US20080206679 Contrast Enhancing Exposure System and Method For Use In Semiconductor Fabrication  
Contrast enhancing exposure apparatus and method for use in semiconductor fabrication are described. In one embodiment, a method for forming a pattern on a substrate, wherein the substrate...
US20130120724 Method for splitting a pattern for use in a multi-beamlet lithography apparatus  
The invention relates to a method for splitting a pattern for use in a multi-beamlet lithography apparatus. The method comprises providing an input pattern to be exposed onto a target surface by...
US20140192334 Pixel Blending For Multiple Charged-Particle Beam Lithography  
System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer...

Matches 1 - 14 out of 14