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US20110123937 |
COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY
The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for... |
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US20120107743 |
LITHOGRAPHY USING PHOTORESIST WITH PHOTOINITIATOR AND PHOTOINHIBITOR
Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a... |
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US20120320348 |
REFLECTIVE MASK FOR EUV LITHOGRAPHY
To improve the mask of an EUV lithography apparatus in view of its high reflectivity, a reflective mask is suggested for EUV lithography having a reflective multilayer system on a substrate... |
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US20120320349 |
PHOTOLITHOGRAPHY SYSTEMS AND ASSOCIATED METHODS OF OVERLAY ERROR CORRECTION
Several embodiments of photolithography systems and associated methods of overlay error correction are disclosed herein. In one embodiment, a method for correcting overlay errors in a... |
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US20050221238 |
Use of a reticle absorber material in reducing aberrations
A lithographic apparatus comprising a patterning reticle which has an aluminium absorber layer which improves imaging by eliminating or at least minimising the formation of aberrations in a... |
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US20150212434 |
MONOLITHIC EUV TRANSPARENT MEMBRANE AND SUPPORT MESH AND METHOD OF MANUFACTURING SAME
The current application teaches embodiments of an EUV transparent support mesh and methods of manufacturing the same |
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US20130100424 |
Integrated monolithic optical bench containing 3-D curved optical elements and methods of its fabrication
An optical system, such as an integrated monolithic optical bench, includes a three-dimensional curved optical element etched in a substrate such that the optical axis of the optical system lies... |
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US20140232997 |
INDEX MATCHED GRATING INSCRIPTION
The disclosed embodiments provide systems and methods for mitigating lensing and scattering as an optical fiber is being inscribed with a grating. The disclosed systems and methods mitigate the... |
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US20120196230 |
LAYOUT DECOMPOSITION METHOD AND APPARATUS FOR MULTIPLE PATTERNING LITHOGRAPHY
An initial layout of at least a portion of a given layer of an integrated circuit design is decomposed into multiple sub-layouts by splitting each of a plurality of shapes of the initial layout... |
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US20090122281 |
SILICA GLASS CONTAINING TIO2 AND PROCESS FOR ITS PRODUCTION
A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100°... |
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US20140191372 |
SPACER ASSISTED PITCH DIVISION LITHOGRAPHY
Spacer-based pitch division lithography techniques are disclosed that realize pitches with both variable line widths and variable space widths, using a single spacer deposition. The resulting... |
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US20060017910 |
Composite printing
Systems and techniques for printing substrates. In one implementation, a method includes patterning a substrate with a substantially arbitrary arrangement of features by introducing irregularity... |
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US20130044299 |
PROJECTION-TYPE PHOTOLITHOGRAPHY SYSTEM USING COMPOSITE PHOTON SIEVE
The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting... |
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US20060003240 |
Methods for adjusting light intensity for photolithography and related systems
Correcting light intensity for photolithography may include irradiating light having a first light intensity distribution through a photo mask having a mask pattern to a photosensitive layer on a... |
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US20100248159 |
PATTERNING VIA OPTICAL-SATURABLE TRANSISIONS
An optical material system for nanopatterning is provided that includes one or more material systems having spectrally selective reversible and irreversible transitions by saturating one of the... |
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US20080030693 |
IMMERSION PHOTOLITHOGRAPHY MONITORING
A method and apparatus are provided for monitoring an immersion photolithography process, the method including supplying an immersion fluid having an initial refractive index, performing... |
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US20120026473 |
HIGHLY REFLECTIVE, HARDENED SILICA TITANIA ARTICLE AND METHOD OF MAKING
The present disclosure is directed to improved silica-titania glass articles intended for use in EUV or other high energy reflective optic systems, and to a process for producing such improved... |
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US20050088633 |
Composite optical lithography method for patterning lines of unequal width
A composite patterning technique may include two lithography processes. A first lithography process may use interference lithography to form an interference pattern of lines of substantially equal... |
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US20090117489 |
Compositons and processes for immersion lithography
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be... |
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US20050275814 |
Maskless vortex phase shift optical direct write lithography
The present invention provides methods and apparatus for accomplishing a optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is... |
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US20150205197 |
METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS
A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then... |
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US20050007567 |
Contact or proximity printing using a magnified mask image
Improvements in the fabrication of integrated circuits are driven by the decrease of the size of the features printed on the wafers. Current lithography techniques limits have been extended... |
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US20130340637 |
METHOD AND APPARATUS FOR LOADING AND UNLOADING FLEXOGRAPHIC PLATES FOR COMPUTER-TO-PLATE IMAGING INCLUDING SEPARATE LOADING AND UNLOADING AREAS
An apparatus for and a method of loading and unloading of plates to and from an imager. The apparatus includes a loading area holding one single or a plurality of plates and an unloading area... |
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US20080138623 |
Substrate comprising a mark
A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one further region formed by a... |
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US20050058948 |
Systems and methods for mastering microstructures through a substrate using negative photoresist and microstructure masters so produced
Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate.... |
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US20070013883 |
SEMICONDUCTOR MANUFACTURING DEVICE AND PARTICLE MONITORING METHOD
An embodiment of a semiconductor manufacturing device includes a chamber to perform a predetermined semiconductor process, a light source to emit light into the chamber, a light receiver to sense... |
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US20140205934 |
SINGLE RETICLE APPROACH FOR MULTIPLE PATTERNING TECHNOLOGY
A reticle for multiple patterning a layer of an integrated circuit die includes a first portion with a first layout pattern for multiple patterning the layer of the integrated circuit die, and a... |
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US20120236272 |
COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT
The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is... |
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US20140312500 |
COMBINING CUT MASK LITHOGRAPHY AND CONVENTIONAL LITHOGRAPHY TO ACHIEVE SUB-THRESHOLD PATTERN FEATURES
Features are fabricated on a semiconductor chip. The features are smaller than the threshold of the lithography used to create the chip. A method includes patterning a first portion of a feature... |
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US20100239822 |
APERIODIC MULTILAYER STRUCTURES
An aperiodic multilayer structure (2, 2′) comprising a plurality of alternating layers of a first (4, 4′) and a second (6, 6′) material and a capping layer (10, 10′) covering these alternating... |
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US20060134535 |
Lensed fiber array for sub-micron optical lithography patterning
In accordance with various embodiments, there is an exposure system for writing a pattern on a photosensitive material. The exposure system can include a waveguide array and a light modulator. The... |
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US20070026325 |
Substrate distortion measurement
A distortion measurement apparatus comprising a detector arranged to measure distortion of a substrate, and a processor arranged to receive distortion data indicating the measured distortion of... |
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US20150138526 |
INSTANT FILM PRINTER INCORPORATING OPTICAL COLLIMATION LAYER
Disclosed is a printing device comprising a collimation layer disposed between a display screen and a sheet of instant film. The printing device quickly and compactly prints the display screen... |
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US20100283978 |
LED-based UV illuminators and lithography systems using same
An LED-based UV illuminator is disclosed that includes a plurality of LED light sources that emit UV light, and a plurality of dichroic mirrors. The dichroic mirrors are arranged relative to the... |
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US20050147920 |
Method and system for immersion lithography
A system (100) and method for immersion lithography is disclosed in which an immersion medium (112) interfaces with a proximal lens (110) that focuses a patterned light beam on a light sensitive... |
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US20090219494 |
EVALUATION METHOD, EVALUATION APPARATUS, AND EXPOSURE APPARATUS
An evaluation method of evaluating an optical characteristic of an optical system to be evaluated using an interferometer, comprises a first acquisition step of acquiring a first interference... |
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US20120293779 |
REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE
A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element... |
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US20110228237 |
REFLECTIVE OPTICAL ELEMENT AND EUV LITHOGRAPHY APPLIANCE
A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element... |
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US20060194130 |
Run to run control for lens aberrations
An exposure tool includes an illumination source, a blazed phase grating reticle, a reticle stage holding the blazed phase grating reticle, a lens system including at least one adjustable lens... |
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US20060001846 |
Exposure system and method for manufacturing semiconductor device
An exposure system includes a simulator speculating first and second calculated doses to project first and second reference marks onto first and second resist films, respectively, an exposure tool... |
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US20060227305 |
Multi-functional product having a releasing mechanism to activate the opening of a cover relative to a main body
A multi-functional product is provided. Such a multi-functional product comprises a main body, a cover on which at least one hook is formed and to which an elastic force is applied in a direction... |
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US20090115876 |
SOLID-STATE IMAGING APPARATUS, DRIVING METHOD THEREOF, CAMERA, AND COPIER
A solid-state imaging apparatus includes a plurality of unit cells, each including a plurality of pixels having mutually different color components and a first selecting unit outputting one of the... |
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US20140233031 |
Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing Method
A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large... |
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US20130059240 |
Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing Method
A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large... |
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US20060019204 |
Exposure system, exposure method and method for fabricating semiconductor device
An exposure system includes an exposure part for irradiating a resist film formed on a substrate with exposing light through a mask with a liquid provided on the resist film; and a liquid supply... |
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US20050287483 |
CONTACT HOLE PRINTING METHOD AND APPARATUS WITH SINGLE MASK, MULTIPLE EXPOSURES, AND OPTIMIZED PUPIL FILTERING
The present invention provides a lithographic method and apparatus (e.g., for printing contact holes on a wafer) that use a single mask, multiple exposures, and optimized pupil filtering. The... |
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US20140072904 |
PHOTOMASK, PHOTOMASK SET, EXPOSURE APPARATUS AND EXPOSURE METHOD
There is provided a photomask capable of improving alignment accuracy with respective photomasks disposed on the front and rear faces of a substrate. A photomask has a drawing pattern for exposure... |
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US20090185148 |
SUPPORT FOR AN OPTICAL ELEMENT
The disclosure relates to a support structure for an optical element and an optical element module including such a support structure. The disclosure also relates to a method of supporting an... |
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US20060134536 |
Method and system for determining post exposure bake endpoint
A method of detecting post exposure bake endpoint during processing of a semiconductor substrate. The method includes providing a radiation source coupled to a post exposure bake station and... |
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US20070279604 |
Lithography systems and processes
An exemplary lithography process may include: receiving a substrate having a photo-sensitive layer; providing a light source capable of causing an exposure of a portion of the photo-sensitive... |