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US20110031416 |
Liquid jet and recovery system for immersion lithography
A photolithography tool for use in manufacturing semiconductor devices, includes a wafer stage, a lens, and a liquid dispensing assembly by which liquid is introduced between a surface of a... |
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US20090114850 |
APPARATUS AND METHOD FOR MODIFYING AN OBJECT
A method and apparatus includes positioning a reactant on a surface in specific location and then directing an energy source from a device at the reactant such that it modifies the surface to... |
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US20060138349 |
Lithographic apparatus and device manufacturing method
A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The... |
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US20050253092 |
Radiation source, lithographic apparatus, and device manufacturing method
A radiation source unit is provided that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a space between said anode and cathode and to form... |
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US20080135774 |
Scatterometer, a lithographic apparatus and a focus analysis method
To detect whether a substrate is in a focal plane of a scatterometer, a cross-sectional area of radiation above a certain intensity value is detected both in front of and behind a back focal plane... |
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US20060273263 |
Apparatus and method for enhanced critical dimension scatterometry
Scatterometers and methods of using scatterometry to determine several parameters of periodic microstructures, pseudo-periodic structures, and other very small structures having features sizes as... |
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US20050181584 |
Ion implantation
This invention relates to a method of implanting ions in a substrate using an ion beam where instabilities in the ion beam may be present and to an ion implanter for use with such a method. This... |
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US20090194690 |
Inspection Method And Inspection System Using Charged Particle Beam
An electron beam system includes a sample holder to hold a sample, electron optics to obtain an image of the sample, an electrode to control a charged state of the sample, a monitor to determine a... |
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US20090181553 |
APPARATUS AND METHOD OF ALIGNING AND POSITIONING A COLD SUBSTRATE ON A HOT SURFACE
Embodiments of the invention contemplate a method, apparatus and system that are used to support and position a substrate on a surface that is at a different temperature than the initial, or... |
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US20120223062 |
Minimization of Surface Reflectivity
Apparatuses and methods are provided for processing a surface of a substrate. The substrate may have a surface pattern that exhibits directionally and/or orientationally different reflectivities... |
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US20100055881 |
HEAT TREATMENT METHOD FOR COMPOUND SEMICONDUCTOR AND APPARATUS THEREFOR
A heat treatment method for compound semiconductors includes a step for placing an object to be treated on a stage in a process chamber, and a step for irradiating the surface of the object with... |
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US20080029823 |
Semiconductor Device Having a Dual Stress Liner and Light Exposure Apparatus for Forming the Dual Stress Liner
In a semiconductor device having a dual stress liner for improving electron mobility, the dual stress liner includes a first liner portion formed on a PMOSFET and a second liner portion formed on... |
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US20100006776 |
SEMICONDUCTOR THIN FILM FORMING SYSTEM
A thin film processing method for processing the thin film by irradiating the optical beam to the thin film, wherein one set of irradiation includes the first optical pulse irradiation to the thin... |
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US20090286383 |
TREATMENT OF WHISKERS
A photo-curing or photosintering process is utilized to modify, reduce or eliminate whiskers or nanowires growing on a material surface. |
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US20110079350 |
LASER IRRADIATION SYSTEM AND LASER IRRADIATION METHOD
A laser irradiation system includes a laser beam generator to generate laser beams, a laser beam irradiator to radiate the laser beams onto a target, a laser beam guide to detect whether one of... |
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US20110291022 |
Post Implant Wafer Heating Using Light
An ion implantation system, method, and apparatus for abating condensation in a cold ion implant is provided. An ion implantation apparatus is configured to provide ions to a workpiece positioned... |
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US20080067429 |
STATIC ELECTRICITY DEFLECTING DEVICE, ELECTRON BEAM IRRADIATING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND METHOD OF MANUFACTURING SUBSTRATE
A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing... |
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US20060076509 |
Electron beam irradiating method and manufacturing method of magnetic recording medium
The present invention is to make it possible to form a fine pattern, and improve a recording density on a magnetic recording medium and increase signal intensity. There is provided an electron... |
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US20090039475 |
Apparatus and Method for Manufacturing Semiconductor
To provide a semiconductor manufacturing apparatus which is able to improve insulation film. An irradiating device comprises irradiating means for irradiating light with a wavelength longer than... |
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US20130068970 |
UV Irradiation Apparatus Having UV Lamp-Shared Multiple Process Stations
A UV irradiation apparatus for treating substrates includes: at least two process stations each provided with a UV transmissive window; at least one electric UV lamp using two electrodes in a gas... |
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US20070131877 |
Pattern inspection method and system therefor
Conventionally, defect data outputted by an inspection system comprised only characteristic quantitative data, such as coordinate data, area, and projected length, and only the coordinate data for... |
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US20090045357 |
Contamination barrier and lithographic apparatus comprising same
A rotatable contamination barrier is disclosed that has a plurality of closely packed blades configured to trap contaminant material coming from a radiation source. The blades are radially... |
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US20050224722 |
Method and apparatus for reducing charge density on a dielectric coated substrate after exposure to large area electron beam
Embodiments in accordance with the present invention relate to a number of techniques, which may be applied alone or in combination, to reduce charge damage of substrates exposed to electron beam... |
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US20100236089 |
UV IRRADIATION APPARATUS AND UV IRRADIATION METHOD
A UV irradiating portion 12 is provided with multiple UV light emitting diodes 21 arranged on a base plate 20 which is in a position corresponding to a semiconductor wafer attached with a... |
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US20090212213 |
PROJECTION ELECTRON BEAM APPARATUS AND DEFECT INSPECTION SYSTEM USING THE APPARATUS
A sample is evaluated at a high throughput by reducing axial chromatic aberration and increasing the transmittance of secondary electrons. Electron beams emitted from an electron gun 1 are... |
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US20100151696 |
MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE AND HEAT TREATMENT APPARATUS
A manufacturing method for a semiconductor device, includes, forming an element region on a front surface of a semiconductor substrate, performing a first heat treatment by irradiating first... |
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US20090093135 |
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR CURING MATERIAL WITH UV LIGHT
Low dielectric constant materials are cured in a process chamber during semiconductor processing. The low dielectric constant materials are cured by irradiation with UV light. The atmosphere in... |
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US20080315126 |
Laser light source apparatus, exposure method, and exposure apparatus
Information on the side of the body of an exposure apparatus is effectively used on the side of the laser light source apparatus. There is provided a laser light source apparatus which supplies a... |
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US20090286173 |
ELECTRONIC COMPONENT FORMING APPARATUS, ELECTRONIC COMPONENT FORMED WITH IT AND FORMING METHOD THEREOF
An electronic component forming apparatus for forming an electronic component by radiating light to a photosensitive conductive resin provided on a forming work material, comprising radiation... |
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US20080299490 |
WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS
A charged particle beam writing apparatus includes a stage on which a first mask substrate and a second mask substrate are arranged side by side, and a writing unit to write a first pattern on the... |
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US20080105879 |
PROCESS AND SYSTEM FOR LASER ANNEALING AND LASER-ANNEALED SEMICONDUCTOR FILM
In a laser annealing process for transforming a noncrystalline semiconductor film into a laterally-crystallized film: irradiation of a region with laser light and a shift of the position of the... |
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US20060289796 |
UV-C sensitive composition and dosimeter
The invention is a UV sensitive composition that undergoes a color change upon exposure to a predetermined dosage of UV-C radiation. The UV-C sensitive composition comprises a halogenated polymer,... |
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US20090242805 |
SYSTEMS AND METHODS FOR UNIFORM SEQUENTIAL LATERAL SOLIDIFICATION OF THIN FILMS USING HIGH FREQUENCY LASERS
Under one aspect, a method for processing a thin film includes generating a first set of shaped beamlets from a first laser beam pulse, each of the beamlets of the first set of beamlets having a... |
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US20080164819 |
Semiconductor apparatus using ion beam
Provided is a semiconductor apparatus using an ion beam. The semiconductor apparatus may include a first grid to which a voltage applied. The voltage applied to the first grid may have the same... |
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US20080299493 |
SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING DEVICE
An apparatus according to the present invention includes a vacuum chamber (5) and processes a substrate (4) in the vacuum chamber (5). The apparatus includes pumps (8A, 8B; 9A, 9B) which exhaust... |
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US20080230722 |
INTEGRATED CIRCUIT AND METHOD INCLUDING A PATTERNING METHOD
A method of making an integrated circuit including a patterning method using chemically amplified photoresists and exposure apparatus is disclosed. One embodiment provides a photoresist layer... |
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US20080023639 |
Ultraviolet Irradiation Apparatus
A semiconductor wafer is taken as an object to be irradiated, to which a protection sheet S is stuck via an ultraviolet cured adhesive layer, and an ultraviolet irradiation part 12 is disposed... |
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US20060141370 |
Photomasks and methods of manufacturing the same
A photomask may include a reflection layer including a material capable of reflecting electromagnetic radiation, and at least one ion region. The ion region may be formed by implanting ions of an... |
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US20050254035 |
Multi-photon lithography
A system and method for patterned exposure of a photoactive medium is described wherein a pulsed optical beam with a high peak-power is stretched in the time domain to reduce the peak power while... |
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US20120138823 |
Dislocation Engineering Using a Scanned Laser
A method for generating patterned strained regions in a semiconductor device is provided. The method includes directing a light-emitting beam locally onto a surface portion of a semiconductor... |
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US20110177674 |
PROCESSING OF MULTILAYER SEMICONDUCTOR WAFERS
A method and apparatus for machining, or forming a feature in, a patterned silicon wafer includes removing portions of surface layers on the wafer using a first pulsed laser (4) beam with a pulse... |
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US20110086315 |
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
A first driving section and a second driving section apply a drive farce in an X-axis direction, a Y-axis direction, a Z-axis direction, and a θx direction, respectively, with respect to one end... |
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US20110049393 |
Lithography Machine and Substrate Handling Arrangement
An arrangement comprising a plurality of charged particle lithography apparatuses, each charged particle lithography apparatus having a vacuum chamber. The arrangement further comprises a common... |
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US20090146081 |
Surface Plasmon Enhanced Radiation Methods and Apparatus
Methods and apparatus in which a plurality of independently controllable surface emitting lasers (SELs) are controlled to generate radiation that irradiates a plurality of surface plasmon enhanced... |
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US20080078948 |
PROCESSING TERMINATION DETECTION METHOD AND APPARATUS
A processing termination detection method capable of accurately performing changeover of etch rates when a residual film thickness of a to-be-processed layer decreases to a predetermined value. A... |
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US20080073572 |
Systems and methods of measuring power in lithography systems
Systems and methods of measuring power in lithography systems are disclosed. A preferred embodiment comprises a metrology method that includes providing a lithography system and measuring an... |
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US20050242301 |
Targeted radiation treatment using a spectrally selective radiation emitter
Radiation from a spectrally broad radiation source is reduced to radiation of limited spectral range with high efficiency by an emitter that includes a radiation source and a multilayer optical... |
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US20110294071 |
ELECTRON GUN, LITHOGRAPHY APPARATUS, METHOD OF MANUFACTURING ARTICLE, AND ELECTRON BEAM APPARATUS
An electron gun includes a cathode, a bias electrode, and an anode disposed along a common axis in order thereof. In the electron gun, an electron emitting surface of the cathode has such a shape... |
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US20100136799 |
Method of manufacturing semiconductor device, Exposure device, and recording medium
A method of manufacturing a semiconductor device includes a first absorption step, a releasing step, a second absorption step, and an exposure step. In the first absorption step, a wafer chuck of... |
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US20070023694 |
Method of removing particles on an object, apparatus for performing the removing method, method of measuring particles on an object and apparatus for performing the measuring method
In a method of removing particles on an object, a fluid is injected into a spacer where the object is placed to remove foreign substances in the space. A first light is irradiated to the object to... |