Matches 1 - 15 out of 15


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US20120132620 Secure check code scanner  
A device and method for secure check processing in a paper check scanning device that scans the identification encoding characters on the surface of a paper check, creating an electronically...
US20070228012 METHOD FOR MAKING A SATIN FINISH SURFACE  
The invention concerns a method of making a satin finish surface on a part made of a material with a Vickers hardness greater than 1000 HV including at least one polished surface, mainly including...
US20150185170 X-ray fluorescence analysis of thin-film coverage defects  
X-ray fluorescence (XRF) monitoring of characteristic peaks while etching thin-film layers can reveal coverage defects and thickness nonuniformity in the top film. To measure coverage and...
US20090032497 System and method for controlling the application of acid etchers or cleaners by means of color-changing dye  
An acidic etcher solution for etching a substrate's surface. The acidic etcher solution includes an acid and a pH indicator, the pH indicator having at least one color transition at a pH below 7....
US20090065478 MEASURING ETCHING RATES USING LOW COHERENCE INTERFEROMETRY  
Measuring thickness and the rate of change of thickness of a material having a surface while the material is being etched, comprising: illuminating the material with low coherence light, a portion...
US20080099430 Method for connecting array of optical waveguides to an array of optical fibers with very small pitch  
A method and apparatus are provided to decrease the diameter of the end of an optical fiber in order to make it possible to arrange optical fibers in an array with very high pitch. Also provided...
US20100025374 METHOD FOR MEASURING THE ACTIVE KOH CONCENTRATION IN A KOH ETCHING PROCESS  
The invention relates to a method for in-line measuring the active KOH concentration in a KOH etching process in which process silicon hydroxide is produced by a reduction reaction according to...
US20060144823 Etching solution for D-defect evaluation in silicon wafer and evaluation method using the same  
The present invention relates to an etching solution for evaluating crystal defects of silicon wafers, and more particularly to an etching solution comprising KMnO4 and HF. The etching solution...
US20140190937 System and Method for Cleaning Semiconductor Fabrication Equipment Parts  
An exemplary embodiment discloses a process for cleaning semiconductor fabrication equipment parts with non-metallic surfaces. The process optionally includes providing a semiconductor fabrication...
US20130334172 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER READABLE STORAGE MEDIUM STORING SUBSTRATE PROCESSING PROGRAM  
Disclosed is a liquid processing apparatus capable of accurately determining a holding state of a substrate without being influenced by, for example, material or surface condition of a substrate....
US20160199944 METHOD AND SYSTEM FOR SCRIBING BRITTLE MATERIAL FOLLOWED BY CHEMICAL ETCHING  
Very fine closed form structures can be scribed via filamentation in the transparent substrate very quickly, the modified zone can be etched via dry or wet chemical etching to release the closed...
US20160089688 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATMENT METHOD FOR DISCHARGING TREATMENT SOLUTION FROM NOZZLE TO SUBSTRATE  
An upper treatment solution nozzle discharges a treatment solution at a treatment position above a substrate. A reference image and a test image are cut out from an image captured after the upper...
US20140124479 METHOD OF REMOVING COATING FILM OF SUBSTRATE PERIPHERAL PORTION, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY STORAGE MEDIUM  
A method of removing a coating film of a substrate peripheral portion, is provided with holding and supporting a circular substrate by allowing a transfer body to transfer a rear surface of the...
US20140061159 COMPOSITE CHARGED PARTICLE BEAM APPARATUS AND THIN SAMPLE PROCESSING METHOD  
A composite charged particle beam apparatus includes: a FIB column irradiating a thin sample with FIB; a GIB column irradiating the thin sample with GIB; a sample stage on which the thin sample is...
US20130206726 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM  
A substrate holding unit of a liquid processing apparatus holds a circular substrate horizontally and rotates the substrate about a vertical axis, and a chemical liquid nozzle supplies a chemical...

Matches 1 - 15 out of 15