Matches 1 - 21 out of 21


Match Document Document Title
US20110108416 MAGNETRON SPUTTER  
A magnetron sputter comprises a carrier, a magnet assembly, at least a middle magnetic ring, a target and at least a conducting magnetic ring. The magnet assembly is disposed on a carrying surface...
US20060065524 Non-bonded rotatable targets for sputtering  
A rotatable target for sputtering is described. This target can include a target backing tube having an exterior surface; a backing layer in contact with the exterior surface of the target backing...
US20060076234 Non-planar sputter targets having crystallographic orientations promoting uniform deposition  
A non-planar sputter target having differing crystallographic orientations in portions of the sputter target surface (25) that promote more desirable deposition and density patterns of material...
US20130168242 MAGNETIC CORE FOR CYLINDRICAL MAGNETRON SPUTTERING TARGET  
A magnetic core for cylindrical magnetron sputtering target includes a housing and a magnet array. The housing includes a mounting plate and a base. The magnet array is mounted in the mounting...
US20110062022 ROTATABLE SPUTTERING MAGNETRON WITH HIGH STIFFNESS  
A sputtering magnetron (300) insertable in a rotatable target is described. The magnetron is designed around a single piece, multiwalled tube (102, 202) with compartments (316, 316′, 318, 318′)...
US20050224343 Power coupling for high-power sputtering  
A system and method for coating a substrate is described. One embodiment includes a high-power sputtering system with a power coupler configured to deliver power to a rotatable target. The power...
US20050279630 Tubular sputtering targets and methods of flowforming the same  
Described herein are sputtering target tubes and methods of making sputtering target tubes. The methods include a step of forming a metal hollow preform and flowforming the metal hollow preform to...
US20060000705 Cylindrical target with oscillating magnet for magnetron sputtering  
In some embodiments, the invention includes a cylindrical cathode target assembly for use in sputtering target material onto a substrate that comprises a generally cylindrical target, means for...
US20050224342 Target support assembly  
The invention relates to a target support assembly (1) comprising a support (2), on which a target lining is arranged. In order to simplify the production of the target lining or of the target...
US20060076231 Method for magnetron sputter deposition  
A method for depositing a coating on an interior surface of a hollowed workpiece. The method comprises providing the hollowed workpiece in a vacuum chamber, the hollowed workpiece comprising an...
US20050145488 Tube magnetron  
A tube magnetron for a vacuum coating applications such as plasma sputtering is provided with a hollow rotating tube target arrangement and a magnet system. The hollow rotating tube target...
US20050252768 Coater with a large-area assembly of rotatable magnetrons  
This invention relates to a coater for the coating, in particular, of large-area substrates by means of cathode sputtering, the coater having a coating chamber and, provided therein, a cathode...
US20100200395 Techniques for depositing transparent conductive oxide coatings using dual C-MAG sputter apparatuses  
Certain example embodiments relate to techniques for depositing transparent conductive oxide (TCO) coatings using dual C-MAG sputtering apparatuses. Certain example embodiments provide a...
US20060032737 Magnetron sputtering device, a cylindrical cathode and a method of coating thin multicomponent films on a substrate  
The invention relates to a magnetron sputtering device particularly comprising at least one vacuum chamber and being intended for the coating of multicomponent films on a substrate by means of...
US20050178662 Rotating tubular cathode  
The invention relates to a rotatable tube cathode (2) for sputter installations, in which, for example, window panes are coated. This tube cathode (2) comprises in conventional manner a fluid...
US20060049043 Magnetron assembly  
A rotating magnetron assembly having a structure to reduce bearing degradation by substantially preventing the flow of current through the bearing using non-conductive materials or providing a low...
US20050034981 Cathodic sputtering apparatus  
The invention relates to a cathodic sputtering apparatus (8) for coating substrates (17) in a vacuum, comprising an essentially tubular support for the material to be sputtered (2) which is...
US20050109616 Sputtering apparatus  
A sputtering apparatus for applying a thin film coating to a substrate containing, in a vacuum chamber, at least two cylindrical targets and at least two magnets each juxtaposed to one of the...
US20100181191 SPUTTERING APPARATUS  
It is an object of the present invention to provide a sputtering apparatus capable of suppressing local consumption of axial end portions of a rotatable cylindrical target to make uniform an...
US20130043121 Method and Apparatus for Sputtering with a Plasma Lens  
A plasma lens for enhancing the quality and rate of sputter deposition onto a substrate is described herein. The plasma lens serves to focus positively charged ions onto the substrate while...
US20160013034 Online Adjustable Magnet Bar  
An end-block for rotatably carrying a sputtering target tube and for rotatably restraining a magnet bar inside the sputtering target tube includes a receptacle for receiving a magnet bar fitting....

Matches 1 - 21 out of 21