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US20100215643 |
ANTI-INFECTIVE FUNCTIONALIZED SURFACES AND METHODS OF MAKING SAME
Devices are provided which are functionalized to include surface regions having anti-infective agents. Methods are provided for functionalizing various material surfaces to include active surface... |
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US20150185184 |
METHODS AND COMPOSITIONS FOR SEPARATING OR ENRICHING BLOOD CELLS
The present invention provides a filtration chamber comprising a microfabricated filter enclosed in a housing, wherein the surface of said filter and/or the inner surface of said housing are... |
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US20110091817 |
SENSOR WITH LAYERED ELECTRODES
A thin film sensor, such as a glucose sensor, is provided for transcutaneous placement at a selected site within the body of a patient. The sensor includes several sensor layers that include... |
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US20110081542 |
SUBSTRATE WITH ANTIMICROBIAL PROPERTIES
A process for the production of a substrate having antimicrobial properties is described. It comprises a step consisting of the déposition of a métal non-gelling layer comprising an inorganic... |
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US20100139851 |
Carbon nanotube heater
A method for making a heater is provided. A carbon nanotube structure is made, and a first electrode and a second electrode are provided. The first and second electrodes are electrically connected... |
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US20120325650 |
SPUTTERING TARGET, METHOD FOR MANUFACTURING SPUTTERING TARGET, AND METHOD FOR FORMING THIN FILM
There have been cases where transistors formed using oxide semiconductors are inferior in reliability to transistors formed using amorphous silicon. Thus, in the present invention, a semiconductor... |
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US20090229857 |
ELECTRODE AND METHOD OF FORMING THE ELECTRODE
An electrode for forming an electrochemical cell with a substrate and a method of forming said electrode. The electrode comprises a carrier (1) provided with an insulating layer (7) which is... |
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US20120043198 |
FILM FORMATION APPARATUS AND FILM FORMATION METHOD
There have been cases where transistors using oxide semiconductors are inferior in reliability to transistors using amorphous silicon. There have also been cases where transistors using oxide... |
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US20090229855 |
ELECTRODE AND METHOD OF FORMING THE MASTER ELECTRODE
An electrode for forming an electrochemical cell with a substrate and a method of forming said electrode. The electrode comprises a carrier (1) provided with an insulating layer (7) which is... |
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US20060078747 |
Transparent substrate coated with a silver layer
A transparent substrate carrying a coating stack which has undergone a bending or tempering type of heat treatment and a method of manufacturing this product, the coating stack comprising at least... |
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US20130287931 |
METHODS OF MAKING DEVICES
The method of making devices is disclosed herein. More particularly, a method of manufacturing a device, comprises: vacuum depositing a device-forming metal onto an unpatterned, exterior surface... |
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US20130277203 |
PROCESS KIT SHIELD AND PHYSICAL VAPOR DEPOSITION CHAMBER HAVING SAME
Embodiments of process kit shields and physical vapor deposition (PVD) chambers incorporating same are provided herein. In some embodiments, a process kit shield for use in depositing a first... |
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US20110303277 |
TRANSPARENT, WEATHERING-RESISTANT BARRIER FILM, PRODUCTION BY LAMINATION, EXTRUSION LAMINATION OR EXTRUSION COATING
The invention relates to a barrier film, in which a backing film (4) containing an inorganic barrier (3) (SiOx or AlOx) is combined with a weather-resistant protective layer (1) using lamination... |
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US20100285272 |
MULTI-LENGTH SCALE TEXTURED GLASS SUBSTRATES FOR ANTI-FINGERPRINTING
A glass substrate having at least one surface with engineered properties that include hydrophobicity, oleophobicity, anti-stick or adherence of particulate or liquid matter, durability, and... |
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US20090159566 |
METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE
A pedestal assembly and method for controlling temperature of a substrate during processing is provided. In one embodiment, method for controlling a substrate temperature during processing... |
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US20070261951 |
REACTIVE SPUTTERING ZINC OXIDE TRANSPARENT CONDUCTIVE OXIDES ONTO LARGE AREA SUBSTRATES
The present invention generally comprises one or more cooled anodes shadowing one or more gas introduction tubes where both the cooled anodes and the gas introduction tubes span a processing space... |
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US20050150757 |
Heated and cooled vacuum chamber shield
The invention is directed to method for processing substrates and chamber for the same. In one embodiment, a method for processing substrates includes transferring a substrate to a substrate... |
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US20140264321 |
Method of Fabricating IGZO by Sputtering in Oxidizing Gas
In some embodiments, oxidants such as ozone (O3) and/or nitrous oxide (N2O) are used during the reactive sputtering of metal-based semiconductor layers used in TFT devices. The O3 and N2O gases... |
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US20130271248 |
RARE EARTH SINTERED MAGNET AND MAKING METHOD
A rare earth sintered magnet as an anisotropic sintered body comprising Nd2Fe14B crystal phase as primary phase and having the composition R1aTbMcSidBe wherein R1 is a rare earth element inclusive... |
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US20120255855 |
METHOD OF CONTROLLING LITHIUM UNIFORMITY
A method and apparatus for providing uniform coatings of lithium on a substrate are provided. In one aspect of the present invention is a method of selectively controlling the uniformity and/or... |
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US20120045360 |
CU-GA ALLOY SPUTTERING TARGET AND MANUFACTURING METHOD THEREOF
Disclosed is a Cu—Ga alloy sputtering target which enables the formation of a Cu—Ga sputtering film having excellent uniformity in film component composition (film uniformity), enables the... |
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US20120107558 |
TRANSPARENT SUBSTRATE HAVING DURABLE HYDROPHOBIC/OLEOPHOBIC SURFACE
A substrate having a durable hydrophobic and/or oleophobic surface. The durable hydrophobic and/or oleophobic surface includes a first layer that is disposed on the substrate and comprises... |
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US20050166850 |
Combinatorial synthesis of material chips
Systems and methods for providing in situ, controllably variable concentrations of one, two or more chemical components on a substrate to produce an integrated materials chip. The component... |
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US20130015054 |
METHOD OF CONTROLLING LITHIUM UNIFORMITY
A method and apparatus for providing uniform coatings of lithium on a substrate are provided. In one aspect of the present invention is a method of selectively controlling the uniformity and/or... |
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US20100090371 |
Method of patterning conductive layers, method of manufacturing polarizers, and polarizers manufactured using the same
Disclosed is a method of patterning a conductive layer, a method of manufacturing a polarizer using the method and a polarizer manufactured using the same, and a display device having the... |
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US20090056991 |
Methods of Treating a Surface to Promote Binding of Molecule(s) of Interest, Coatings and Devices Formed Therefrom
The present invention generally relates to methods of treating a surface of a substrate, and to the use of the method and resulting films, coatings and devices formed therefrom in various... |
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US20080038582 |
High-temperature coatings with pt metal modified y-Ni+y'-Ni3Al alloy compositions
An alloy including a Pt-group metal, Ni and Al in relative concentration to provide a γ-Ni+γ′-Ni3Al phase constitution, and a coating including the alloy. |
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US20070295598 |
Backing plate assembly
In certain embodiments, the invention comprises a backing plate for accommodating large area sputtering targets is disclosed. The backing plate assembly has cavities carved into the back surface... |
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US20070074969 |
Very long cylindrical sputtering target and method for manufacturing
The present invention includes a long cylindrical sputtering target assembly and a method for manufacturing the assembly. The long cylindrical sputtering target assembly comprises a cylindrical... |
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US20060275612 |
Dielectric-layer-coated substrate and installation for production thereof
The invention relates to a substrate (1), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and... |
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US20130341180 |
SPUTTERING TARGET AND METHOD FOR USING THE SAME
To form an oxide film with a high degree of crystallinity, which includes a plurality of metal elements. Further, to provide a sputtering target which enables the oxide film to be formed and a... |
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US20120080309 |
SYSTEMS AND METHODS FOR FORMING A LAYER OF SPUTTERED MATERIAL
The present disclosure describes a method of coating a substrate, the method including forming a layer of sputtered material on the substrate. Forming the layer of sputtered material may include:... |
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US20110011632 |
ELECTRIC CONDUCTOR AND PROCESS FOR ITS PRODUCTION
An electric conductor having good electric conductivity and excellent heat resistance, and a process for its production are provided. An electric conductor comprising a substrate 10 and at least... |
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US20090305455 |
Formation of CIGS Absorber Layers on Foil Substrates
An absorber layer of a photovoltaic device may be formed on an aluminum or metallized polymer foil substrate. A nascent absorber layer containing one or more elements of group IB and one or more... |
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US20160004359 |
CAPACITIVE TOUCH PANEL AND METHOD OF FORMING THE SAME
A capacitive touch panel and a touch display panel using the same are provided. The capacitive touch panel includes a substrate, a plurality of sensing structures and a metal oxide. Each sensing... |
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US20150258502 |
COATING OF A POROUS SUBSTRATE FOR DISPOSITION OF GRAPHENE AND OTHER TWO-DIMENSIONAL MATERIALS THEREON
Composite membranes of the present disclosure can include a porous supporting substrate having a coating thereon, and one or more two-dimensional materials disposed on the coating. The coating... |
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US20110079418 |
CERAMIC WIRING BOARD AND METHOD OF MANUFACTURING THEREOF
A ceramic wiring board comprises a ceramic substrate and a copper layer formed on the ceramic substrate. The average copper grain radius in the copper layer is approximately equal to or larger... |
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US20080283387 |
METHODS AND APPARATUS FOR TRANSFERRING CONDUCTIVE PIECES DURING SEMICONDUCTOR DEVICE FABRICATION
In a first aspect, a programmable transfer device is provided for transferring conductive pieces to electrode pads of a target substrate. The programmable transfer device includes (1) a transfer... |
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US20080213496 |
Method of coating semiconductor processing apparatus with protective yttrium-containing coatings
Methods of applying specialty ceramic materials to semiconductor processing apparatus, where the specialty ceramic materials are resistant to halogen-comprising plasmas. The specialty ceramic... |
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US20070209926 |
Sputter Deposition System and Methods of Use
The present invention relates a physical vapor deposition (PVD) system. e.g. a planetary system, for forming one or more layers of a coating material on a substrate and for treating, or modifying,... |
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US20070095652 |
Dendritic fiber material
A thermal interface includes nanofibrils. The nanofibrils may be attached to a flat base or membrane, or may be attached to the tip portions of larger diameter fibers. The nanofibrils have a... |
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US20070089983 |
CATHODE INCORPORATING FIXED OR ROTATING TARGET IN COMBINATION WITH A MOVING MAGNET ASSEMBLY AND APPLICATIONS THEREOF
A sputtering cathode apparatus having a hollow cylindrical sputter target that is fixed or rotatable about its central axis and an internal magnet assembly that is rotated axially within the... |
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US20070059529 |
Wear-resistant coating and process for producing it
The present invention relates to a process for producing a wear-resistant coating and to a wear-resistant coating on predetermined surfaces (2) of machine or engine parts (1) consisting of a... |
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US20120235161 |
GROUP III NITRIDE TEMPLATES AND RELATED HETEROSTRUCTURES, DEVICES, AND METHODS FOR MAKING THEM
A templated substrate includes a base layer, and a template layer is disposed on the base layer and having a composition including a single-crystal Group III nitride. The template layer includes a... |
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US20110135915 |
Methods of Coating Substrate With Plasma Resistant Coatings and Related Coated Substrates
The invention includes a method of coating a substrate with a plasma etch-resistant layer that exhibits reduced particulation comprising applying an coating layer to a substrate wherein coating... |
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US20100200285 |
HIGH-DIELECTRIC SHEET, A PRINTED CIRCUIT BOARD HAVING THE HIGH-DIELECTRIC SHEET AND PRODUCTION METHODS THEREOF
A method of producing a capacitor for a printed circuit board includes producing high-dielectric sheets and selecting ones of the high-dielectric sheets, which are substantially free from a defect... |
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US20090280600 |
AMORPHOUS OXIDE AND THIN FILM TRANSISTOR
The present invention relates to an amorphous oxide and a thin film transistor using the amorphous oxide. In particular, the present invention provides an amorphous oxide having an electron... |
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US20090239148 |
HIGH VOLTAGE CATHODE COMPOSITIONS
Cathode compositions for lithium-ion electrochemical cells are provided that have excellent stability at high voltages. These materials include a plurality of particles having an outer surface and... |
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US20140342497 |
SODIUM/MOLYBDENUM COMPOSITE METAL POWDERS, PRODUCTS THEREOF, AND METHODS FOR PRODUCING PHOTOVOLTAIC CELLS
A method for producing a metal article may include: Producing a supply of a composite metal powder by: providing a supply of molybdenum metal powder; providing a supply of a sodium compound;... |
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US20120189842 |
ELECTRONIC DEVICE HOUSING AND METHOD FOR MAKING THE SAME
An electronic device includes a substrate, a metallic coating formed on the substrate by vacuum sputtering or vacuum vapor deposition and a top paint coating formed on the metallic coating. The... |