Matches 1 - 50 out of 64 1 2 >


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US20090120467 Commercial dish washer equipped with an auxiliary rinsing water pipe and rinsing step  
A dish washer for commercial use is provided. The dishwasher according to current application is used for restaurants, hospital, school and military camp, etc. The dish washer of the current...
US20090038651 NO CONTACT CARWASH SYSTEM  
A no contact carwash system has a plurality of holding tanks which are connected to a dosing pump, one to each product to be mixed. The dosing pumps measuring quantities for each product. Water...
US20110226285 WASHING MACHINE  
This invention concerns a washing machine, particularly for washing out the cages and tanks used in animal laboratories, comprising a wash chamber into which a load of the items to be washed can...
US20090101182 Dishwasher, in Particular Domestic Dishwasher  
A dishwasher is provided that includes a washing space in which the soiled articles can be positioned for cleaning and an operating device that operates during the cleaning operation and is...
US20100051063 Ware Rinsing Apparatus  
A ware rinse and/or dishwashing device includes an enclosure with a support adapted to support a dish tray in a working chamber. A rotatable rinse arm assembly is disposed in the enclosure below...
US20050045215 Three rack dishwasher with door mounted silverware basket  
A dishwasher is provided with three racks mounted in the cabinet for movement between extended and retracted positions, and utensil baskets removably mounted on the door. The door include hooks...
US20130192642 DISHWASHER AND OZONE GENERATOR  
A dishwasher comprising a tub at least partially defining a treating chamber in which liquid may be sprayed from at least one sprayer for the treating of dishes within the treating chamber. A...
US20120298133 ANTI-SMUDGING, BETTER GRIPPING, BETTER SHELF-LIFE OF PRODUCTS AND SURFACES  
A device to provide improved anti-smudging, better gripping and longer shelf-life to products and surfaces includes an electric superheated steam generator and an electric low-ion plasma generator...
US20150083163 DISHWASHER WITH TREATMENT-FLUID GENERATOR, AND METHOD OF OPERATING SUCH A DISHWASHER  
A dishwasher for crockery or utensils, which is designed as a box-type dishwasher or as a conveyor dishwasher, wherein the dishwasher (1) has at least one wash tank (12), for accommodating a...
US20080202565 Dish Washing Machine  
To provide a dishwasher for which the washing water distribution pipe provided with the washing nozzles and the rinsing water distribution pipe provided with the rinsing nozzles can be easily...
US20150101286 Beverage Jug Cleaning System and Method  
A system and method are provided for washing, sanitizing, drying, and refilling beverage bottles, such as beer growlers. The sanitizing system is either built into a counter or may be built into a...
US20090133721 METHOD AND APPARATUS FOR TOUCHLESS CLEANING OF A CHANDELIER  
A chandelier cleaning apparatus includes a tent-like enclosure made of a transparent plastic. In a first embodiment, the enclosure includes a main body having a flat top panel and a flat,...
US20100089421 SYSTEM AND METHOD FOR LOW TEMPERATURE HYDRATION OF FOOD SOILS  
A system and method for low temperature hydration of food soils allows for hydration of food soils between washing cycles in a dishwasher. A user selects a hydration button to actuate a hydration...
US20090255556 WAREWASHER INCLUDING HEAT RECOVERY SYSTEM WITH HOT WATER SUPPLEMENT  
A warewasher for washing wares includes a housing defining an internal space with at least one spray zone for washing wares. A liquid delivery system provides a spray of liquid within the spray...
US20050126600 Method and system for cleaning of working utensils, in particular in the food processing industry  
For cleaning of work utensils in the form of elongated objects (31) of water-permeable material and having an inner cavity in connection with an opening at one end of the object, particularly...
US20060027253 Pressure washer control system and method  
A self-contained mobile cleaning system including a storage subsystem for providing a cleaning fluid, a chemical injection subsystem for injecting a chemical into the cleaning fluid, a fluid...
US20110139188 WAFER CLEANING DEVCIE AND METHOD THEREOF  
A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first...
US20140216506 SUBSTRATE PROCESSING APPARATUS  
There is provided a substrate processing apparatus including: a substrate holder configured to hold a substrate on which a resist pattern is formed; a rinse solution supply unit configured to...
US20150060407 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS  
A substrate processing method includes an SPM supplying step of supplying SPM having high temperature to an upper surface of a substrate, a DIW supplying step of supplying, after the SPM supplying...
US20110073142 On-board optical sensor cover and on-board optical apparatus  
An on-board optical sensor apparatus includes an optical sensor, an optical sensor cover, and a controller. The optical sensor has a lens. The optical sensor cover includes a holder and a washer...
US20100170537 WASTE CONTAINER WASHING VEHICLE  
With the waste container washing system described herein, the waste container can be moved into a washing compartment of the washing vehicle for washing thereof; in a first washing phase, the...
US20060157091 Device for treating pieces of a substrate at high pressure with a supercritical or near-critical treatment medium, piece by piece or in batches  
A device for treating pieces of a substrate at high pressure, piece by piece or in batches, with a treatment medium in the supercritical or near-critical state, includes a first pressure chamber,...
US20090014028 METHOD OF CLEANING SUBSTRATES AND SUBSTRATE CLEANER  
There is provided a method of efficiently cleaning substrates without damaging a fine pattern formed thereon. It is a method of cleaning one or more substrates in a system processing one or more...
US20100108102 DISHWASHER WITH MIST CLEANING  
A dishwasher having a liquid spraying system operable in a first mode to spray a focused stream of liquid within the wash chamber, and operable in a second mode to spray a diffused stream of...
US20080099058 Instantaneous mixing device in particular for injection/extraction cleaning machines with a pre-spray function  
The present invention relates to an instantaneous mixing device for injection/extraction cleaning machines and in particular to an instantaneous mixing device with a pre-spray functionality of the...
US20130104938 Methods For Mixed Acid Cleaning Of Showerhead Electrodes  
In one embodiment, a method for cleaning a showerhead electrode my include sealing a showerhead electrode within a cleaning assembly such that a first cleaning volume is formed on a first side of...
US20140352735 ZERO LAG DISPENSE APPARATUS  
A wafer cleaning method includes dispensing liquid chemicals at two flow rates to start a chemical reaction, with the second flow rate being lower than the first. The method also includes...
US20100024847 SEMICONDUCTOR WAFER CLEANING WITH DILUTE ACIDS  
In a method for cleaning wafers using ultra-dilute acids, the wafers are placed into a rotor in a process chamber. As the rotor spins, the wafers are with de-ionized water and ultra-dilute...
US20090084412 NOZZLE ARRAY CONFIGURATION TO FACILITATE DEFLUX PROCESS IMPROVEMENT IN CHIP ATTACH PROCESS  
Systems and methods for treating workpieces are described. One embodiment relates to a deflux system including at least one array of nozzles, the nozzles adapted to transmit a fluid outward...
US20080236627 METHOD FOR CLEANING WEB-LIKE OBJECT TO BE CLEANED AND APPARATUS USING THE SAME  
A method for cleaning a web-like object to be cleaned, comprising the steps of: a cleaning solution spraying step for spraying a cleaning solution to a surface of a fed web-like object to be...
US20090205686 WAFER CLEANING APPARATUS  
A wafer cleaning apparatus used for cleaning a first uncleaned surface of a wafer is provided. The wafer cleaning apparatus includes a case, a spin device, a cover, at least one first spray bar,...
US20090255555 Advanced cleaning process using integrated momentum transfer and controlled cavitation  
A method and apparatus for cleaning a workpiece are disclosed. A gas and cleaning solution are supplied to an atomizing nozzle which atomizes the cleaning solution and sprays the top surface of a...
US20070039631 System and method for removing particles in semiconductor manufacturing  
A system for semiconductor wafer manufacturing, comprises a chamber process path for processing the wafer, and a device operable to remove particles from the wafer by electrostatic and...
US20100043843 CLEANING DEVICE  
An apparatus to clean a continuously running conveyor belt for a machine to produce or refine paper, cardboard or other layers of fibrous material including a cleaning device and at least one...
US20100313918 Apparatus for Cleaning Contaminants from Substrate  
A substrate holder is defined to support a substrate. A rotating mechanism is defined to rotate the substrate holder. An applicator is defined to extend over the substrate holder to dispense a...
US20090288679 Apparatus and method for cleaning surfaces  
The apparatus for cleaning surfaces of the present invention such as for cleaning solar collectors preferably alternates different fluids and gas decompression to create a cleansing fluid...
US20060231125 Apparatus and method for cleaning a semiconductor wafer  
A cleaning apparatus is provided comprising a process chamber defining a work space, a supporter apparatus for rotating a wafer, the supporter apparatus being located in the work space and the...
US20140311531 GAS-LIQUID TWO-PHASE ATOMIZING CLEANING DEVICE AND CLEANING METHOD  
The present invention provides a gas-liquid two-phase atomizing cleaning device. The cleaning device comprises a gas-liquid two-phase atomizing spray head. The spray head is a double jacket...
US20150200087 APPARATUS AND METHOD FOR PROCESSING SUBSTRATE WITH FILM HAVING POROUS STRUCTURE (POROUS FILM) FORMED ON SURFACE LAYER THEREOF  
A method for processing a substrate with a porous film having a porous structure formed on a surface layer thereof includes the following a) and b) steps. The a) step is a step of mixing a first...
US20130068260 METHOD OF CLEANING ELECTRONIC MATERIAL AND CLEANING SYSTEM  
An electronic material cleaning system includes a chemical cleaning means, a wet cleaning means and a single-wafer cleaning apparatus. The chemical cleaning means comprises a functional chemical...
US20090255558 CLEANING APPARATUS FOR SEMICONDUCTOR WAFER AND CLEANING METHOD FOR SEMICONDUCTOR WAFER  
A cleaning apparatus for a semiconductor wafer includes: a gas jet device including a gas nozzle which jets a first gas onto the surface of a semiconductor wafer to thin the thickness of a...
US20070107253 SUBSTRATE DRYING DEVICE AND SUBSTRATE PROCESSING METHOD  
A substrate drying device according to an embodiment of the present invention includes: a nozzle ejecting a fluid to a substrate to be processed, wherein the substrate is moved relative to the...
US20150128994 SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY MEDIUM  
A method for cleaning a substrate includes supplying to a substrate a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile...
US20150040947 Method and Systems for Cleaning A Substrate  
An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and...
US20120118334 EXHAUST GAS TREATMENT DEVICE AND METHOD AND SEMICONDUCTOR MANUFACTURING SYSTEM  
Certain embodiments provide an exhaust gas treatment device, comprising a scrubber unit having a vessel and a sprayer spraying water into the vessel, a first pipe through which a first gas...
US20080236634 SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE CLEANING APPARATUS  
A substrate processing system that enables foreign matter adhered to a rear surface or a periphery of a substrate to be completely removed. A substrate processing apparatus performs predetermined...
US20070044823 Substrate cleaning device and substrate cleaning method  
A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops...
US20050236018 Substrate treating method and apparatus  
A substrate treating method for performing a predetermined treatment of substrates. The method includes a step of performing chemical treatment of the substrates with a chemical, and a step of...
US20050045208 Apparatus and method for cleaning semiconductor substrates  
A method of and apparatus for cleaning semiconductor substrates prevents the drying fluid used to dry the substrates from condensing. The apparatus has a chamber having an exhaust port that...
US20170125267 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS  
A manufacturing method of a semiconductor device according to the present invention comprises cleaning a semiconductor substrate. A first chemical liquid for forming a water-repellent protection...

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