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US20110073138 CLEANING SYSTEM UTILIZING AN ORGANIC CLEANING SOLVENT AND A PRESSURIZED FLUID SOLVENT  
A cleaning system that utilizes an organic cleaning solvent and pressurized fluid solvent is disclosed. The system has no conventional evaporative hot air drying cycle. Instead, the system...
US20060260653 Apparatus for cleaning and drying substrates  
A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of...
US20060231125 Apparatus and method for cleaning a semiconductor wafer  
A cleaning apparatus is provided comprising a process chamber defining a work space, a supporter apparatus for rotating a wafer, the supporter apparatus being located in the work space and the...
US20150020850 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD  
A substrate processing apparatus comprises: a liquid film former which forms a liquid film by supplying a liquid on an upper surface of the substrate W held horizontally; a cooling gas discharge...
US20150090297 SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD  
A substrate processing device 10 has a water removing unit 110 and, when a solvent supply unit 58 supplies a volatile solvent to a surface of a substrate W, the water removing unit 110 supplies a...
US20140010727 Service and Maintenance Station for Handheld Drug Delivery Device  
The present invention relates to a service and maintenance station for a handheld drug delivery device of pen-injector type, comprising: a receptacle section to receive at least a portion of the...
US20090078292 SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING AN INERT GAS AIR-KNIFE  
In one aspect, an apparatus is provided. The apparatus comprises a chamber; a plurality of rollers adapted to support a wafer in a vertical orientation within a chamber; a pair of brushes adapted...
US20150090296 SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD  
A substrate processing device 100 includes a solvent replacing unit (organic solvent supply unit 15 and solvent supply unit 34) replacing a cleaning liquid with a volatile solvent of a low...
US20070295365 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS  
After rinsing, while rotating a substrate, a front layer part of a rinsing liquid (DIW) adhering to a substrate surface is drained and removed from the substrate surface. This is followed by...
US20150273535 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD  
According to one embodiment, a substrate processing apparatus includes a first processor and a second processor. The first processor causes an amount of a solvent at a front surface of a substrate...
US20150206773 SUBSTRATE PROCESSING METHOD AND APPARATUS THEREFOR  
In accordance with a substrate processing method according to the present embodiment, ultrapure water is supplied to a surface of a substrate. A fluoroalcohol-containing solvent is supplied to the...
US20090014028 METHOD OF CLEANING SUBSTRATES AND SUBSTRATE CLEANER  
There is provided a method of efficiently cleaning substrates without damaging a fine pattern formed thereon. It is a method of cleaning one or more substrates in a system processing one or more...
US20090283119 Post-Processing System For Solid Freeform Fabrication Parts  
A post-processing system is provided for cleaning and/or curing a part produced by solid freeform fabrication (SFF). The post-processing systems include a housing, a part retaining device to...
US20120080061 Apparatus For Drying Substrate  
Example embodiments relate to an apparatus for drying a substrate. The apparatus may include a housing including first barrier walls having a first height, a rotary chuck that is disposed within...
US20070119486 System for rinsing and drying semiconductor substrates  
A system for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to...
US20060086373 Apparatus and method for drying substrates used to manufacture semiconductor devices  
A wafer drying apparatus may include a porous member for absorbing alcohol. The alcohol may have a higher vapor pressure than water remaining on a wafer. The porous member may migrate from the...
US20090126760 SYSTEM FOR CLEANING A SURFACE USING CROGENIC AEROSOL AND FLUID REACTANT  
An apparatus and method are provided to treat for example a semiconductor wafer substrate wherein a delivery means for heat, a cryogen, and a fluid chemical reactant, is disposed in a chamber in...
US20060237033 CLEANING APPARATUS AND METHOD  
In an embodiment, a cleaning apparatus and method can prevent adsorption of nano-size particles by wafers. The apparatus includes a cleaning chamber for filling with a cleaning solution for...
US20060201532 Semiconductor substrate cleaning system  
In a first aspect, a method is provided for cleaning a substrate without scrubbing the substrate. Two different megasonic frequencies are applied to the substrate. Preferably two different fluids,...
US20150090298 SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD  
In a substrate processing device 10, a magnetic field forming unit is added to a solvent supply unit 58. The magnetic field forming unit 100 applies a magnetic field to a surface of a substrate W...
US20090056764 Liquid processing apparatus, liquid processing method, and storage medium  
A liquid processing apparatus 1 comprises a casing 5, a substrate holding mechanism 20 that holds a wafer (substrate to be processed) W, a process-liquid supplying mechanism 30 that supplies a...
US20090050181 Inlet Device for Disinfection Apparatus and Method for Liquid Transfer  
The present invention relates to a liquid disinfection apparatus for cleaning of objects, such as health care objects, which disinfection apparatus comprises; a chamber (3) which is arranged to...
US20140251386 PROCESSING APPARATUS AND PROCESSING METHOD  
According to one embodiment, a processing apparatus includes a rinsing section configured to rinse a processing liquid on a surface of a workpiece with a rinse liquid and a drying section...
US20140174482 SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE  
In one embodiment, after rinsing a semiconductor substrate having a fine pattern formed thereon with pure water, the pure water staying on the semiconductor substrate is substituted with a water...
US20120211026 Apparatus and Methods for Cleaning Reagent Dispensing Tips of a Screening Unit  
A plurality of reagent dispensing tips (15) are inserted through frustoconical openings (28) in a cover (16) of a cleaning chamber in the form of intersecting axial bores (14) and sprayed with...
US20090223536 CLEANING APPARATUS, CLEANING TANK, CLEANING METHOD, AND METHOD FOR MANUFACTURING ARTICLE  
Ultrasonic generating unit of a cleaning tank in a cleaning apparatus applies ultrasonic waves to cleaning fluid supplied into the cleaning tank from a supply port and fluid jetting unit having...
US20090165819 METHOD FOR TREATING FINE STRUCTURE, SYSTEM FOR TREATING FINE STRUCTURE, AND METHOD FOR PRODUCING ELECTRONIC DEVICE  
A method for treating a fine structure, includes supplying a liquid to a surface of the fine structure having protrusions on the surface thereof; and thereby treating the surface of the fine...
US20140116476 Systems for Surface Treatment of Semiconductor Substrates using Sequential Chemical Applications  
Systems for removing post etch polymer residue from etched surface includes a first proximity head to introduce a first cleaning chemistry as a first meniscus to a portion of the surface of the...
US20100269865 LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD  
Disclosed is a liquid processing apparatus which can more securely prevent convex portions from collapsing and also can increase the processing efficiency of a substrate. The liquid processing...
US20080210268 Shopping Cart Washer and Sanitizer  
A shopping cart washer and sanitizer includes an enclosure fitted with components that facilitate the entry and exit of rolling shopping carts. Within the apparatus, the carts are washed, rinsed,...
US20120312334 RESIST REMOVAL APPARATUS AND RESIST REMOVAL METHOD  
A resist removal apparatus and method are effective in removing a resist without oxidizing the substrate material other than the resist. The resist removal apparatus, which removes resist from a...
US20100206337 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, PROGRAM, STORAGE MEDIUM, AND SUBSTITUTE AGENT  
There is provided a substrate processing method with the use of plural kinds of liquids, capable of, after a process to a substrate by using a process liquid, rapidly and more reliably...
US20080092929 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD  
A substrate processing apparatus includes a substrate holding unit for holding a substrate to be processed substantially horizontally, a process liquid nozzle for supplying a process liquid to a...
US20050139240 Rinsing and drying apparatus having rotatable nozzles and methods of rinsing and drying semiconductor wafers using the same  
Rinsing and drying apparatus having rotatable drying source nozzles and methods of rinsing and drying semiconductor wafers are provided. The apparatus includes a bath for storing liquid and...
US20080066783 SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD  
A substrate treatment apparatus according to the present invention includes: a plate to be positioned in spaced opposed relation to one surface of a substrate and having a plurality of outlet...
US20080149147 PROXIMITY HEAD WITH CONFIGURABLE DELIVERY  
An apparatus for processing a substrate is disclosed. The apparatus includes a proximity head having a surface that can be interfaced in proximity to a surface of a substrate. The proximity head...
US20140137893 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM  
In example embodiments, a supply flow rate of a clean gas can be reduced without decreasing process performance. A flow rate of a clean gas 78, having a low humidity, supplied from a clean gas...
US20160113478 BATCH DISHWASHER AND METHOD FOR OPERATING A BATCH DISHWASHER  
The invention relates to a commercial dishwasher (1) which is in the form of a batch dishwasher and has a treatment chamber (2) for accommodating washware which is to be cleaned and also has a...
US20080110861 Substrate Processing Apparatus and Method  
The substrate processing apparatus has substrate holding mechanisms (14) for holding the substrate (W) under a holding force which is changed according to a rotational speed of the substrate...
US20140299157 Cleaning Method and Device for Ejection Head of Alignment Film Printer  
The present invention provides a cleaning method for an electing head of an alignment film printer, which is used automatically to clean up the ejection head of the alignment film printer,...
US20060112973 Method and apparatus for substrate processing  
A substrate processing apparatus admits nitrogen gas into a casing, while immersing a substrate in deionized water stored in a processing tank. Oxygen and water vapor within the casing are...
US20100258143 SCRUBBER CLEAN BEFORE OXIDE CHEMICAL MECHANICAL POLISH (CMP) FOR REDUCED MICROSCRATCHES AND IMPROVED YIELDS  
A method for fabricating semiconductors is provided that includes an oxide chemical mechanical polish (CMP) step. Prior to performing the CMP of an integrated circuit semiconductor silicon wafer,...
US20060162748 Wafer guide and semiconductor wafer drying apparatus using the same  
A wafer guide and a semiconductor wafer drying apparatus using the same are disclosed. The wafer guide includes a body and supporters formed on the body. The supporters present a plurality of...
US20130255724 APPARATUS FOR TREATING SUBSTRATE  
A substrate treating apparatus is provided which includes a treatment container which provides a space in which a substrate is washed; a substrate support member which is included in the space and...
US20050224102 Apparatus and method of rinsing and drying semiconductor wafers  
An apparatus for rinsing and drying semiconductor wafers includes a rinsing bath, a drying bath and a drying chamber. The rinsing bath and drying bath are connected by a tunnel unit which prevents...
US20070157957 Substrate transfer robot and apparatus having the substrate transfer robot for cleaning a substrate  
In a substrate transfer robot and a substrate cleaning apparatus, the substrate transfer robot transfers substrates between a container supported by a load port and a processing module for...
US20070107253 SUBSTRATE DRYING DEVICE AND SUBSTRATE PROCESSING METHOD  
A substrate drying device according to an embodiment of the present invention includes: a nozzle ejecting a fluid to a substrate to be processed, wherein the substrate is moved relative to the...
US20100206338 DEVICE AND METHOD FOR REMOVING LIQUID FROM A SURFACE OF A DISC-LIKE ARTICLE  
A method for removing liquid from a surface of a disc includes, rotating the disc article about an axis perpendicular to the disc's main surface, supplying liquid from a supply port, moved across...
US20150190850 SYSTEM FOR CLEANING PHOTOMASKS  
A system for cleaning a photomask with a target surface includes a retaining device for retaining the photomask, a cleansing device, an elevating platform and a drying device. The cleansing device...
US20100218790 DEVICE FOR CLEANING OPTICAL MEASUREMENT BODIES THAT HAVE AN AREA FOR CONTACT WITH THE SURFACE OF THE EYE  
A device for cleaning optic gauges (6), which have an eye surface contact area, and in particular applanation tonometer gauges or ophthalmic contact lenses for diagnostic purposes or laser...

Matches 1 - 50 out of 84 1 2 >