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US20110073138 |
CLEANING SYSTEM UTILIZING AN ORGANIC CLEANING SOLVENT AND A PRESSURIZED FLUID SOLVENT
A cleaning system that utilizes an organic cleaning solvent and pressurized fluid solvent is disclosed. The system has no conventional evaporative hot air drying cycle. Instead, the system... |
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US20060260653 |
Apparatus for cleaning and drying substrates
A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of... |
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US20060231125 |
Apparatus and method for cleaning a semiconductor wafer
A cleaning apparatus is provided comprising a process chamber defining a work space, a supporter apparatus for rotating a wafer, the supporter apparatus being located in the work space and the... |
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US20150020850 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus comprises: a liquid film former which forms a liquid film by supplying a liquid on an upper surface of the substrate W held horizontally; a cooling gas discharge... |
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US20150090297 |
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
A substrate processing device 10 has a water removing unit 110 and, when a solvent supply unit 58 supplies a volatile solvent to a surface of a substrate W, the water removing unit 110 supplies a... |
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US20140010727 |
Service and Maintenance Station for Handheld Drug Delivery Device
The present invention relates to a service and maintenance station for a handheld drug delivery device of pen-injector type, comprising: a receptacle section to receive at least a portion of the... |
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US20090078292 |
SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING AN INERT GAS AIR-KNIFE
In one aspect, an apparatus is provided. The apparatus comprises a chamber; a plurality of rollers adapted to support a wafer in a vertical orientation within a chamber; a pair of brushes adapted... |
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US20150090296 |
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
A substrate processing device 100 includes a solvent replacing unit (organic solvent supply unit 15 and solvent supply unit 34) replacing a cleaning liquid with a volatile solvent of a low... |
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US20070295365 |
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
After rinsing, while rotating a substrate, a front layer part of a rinsing liquid (DIW) adhering to a substrate surface is drained and removed from the substrate surface. This is followed by... |
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US20150273535 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
According to one embodiment, a substrate processing apparatus includes a first processor and a second processor. The first processor causes an amount of a solvent at a front surface of a substrate... |
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US20150206773 |
SUBSTRATE PROCESSING METHOD AND APPARATUS THEREFOR
In accordance with a substrate processing method according to the present embodiment, ultrapure water is supplied to a surface of a substrate. A fluoroalcohol-containing solvent is supplied to the... |
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US20090014028 |
METHOD OF CLEANING SUBSTRATES AND SUBSTRATE CLEANER
There is provided a method of efficiently cleaning substrates without damaging a fine pattern formed thereon. It is a method of cleaning one or more substrates in a system processing one or more... |
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US20090283119 |
Post-Processing System For Solid Freeform Fabrication Parts
A post-processing system is provided for cleaning and/or curing a part produced by solid freeform fabrication (SFF). The post-processing systems include a housing, a part retaining device to... |
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US20120080061 |
Apparatus For Drying Substrate
Example embodiments relate to an apparatus for drying a substrate. The apparatus may include a housing including first barrier walls having a first height, a rotary chuck that is disposed within... |
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US20070119486 |
System for rinsing and drying semiconductor substrates
A system for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to... |
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US20060086373 |
Apparatus and method for drying substrates used to manufacture semiconductor devices
A wafer drying apparatus may include a porous member for absorbing alcohol. The alcohol may have a higher vapor pressure than water remaining on a wafer. The porous member may migrate from the... |
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US20090126760 |
SYSTEM FOR CLEANING A SURFACE USING CROGENIC AEROSOL AND FLUID REACTANT
An apparatus and method are provided to treat for example a semiconductor wafer substrate wherein a delivery means for heat, a cryogen, and a fluid chemical reactant, is disposed in a chamber in... |
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US20060237033 |
CLEANING APPARATUS AND METHOD
In an embodiment, a cleaning apparatus and method can prevent adsorption of nano-size particles by wafers. The apparatus includes a cleaning chamber for filling with a cleaning solution for... |
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US20060201532 |
Semiconductor substrate cleaning system
In a first aspect, a method is provided for cleaning a substrate without scrubbing the substrate. Two different megasonic frequencies are applied to the substrate. Preferably two different fluids,... |
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US20150090298 |
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
In a substrate processing device 10, a magnetic field forming unit is added to a solvent supply unit 58. The magnetic field forming unit 100 applies a magnetic field to a surface of a substrate W... |
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US20090056764 |
Liquid processing apparatus, liquid processing method, and storage medium
A liquid processing apparatus 1 comprises a casing 5, a substrate holding mechanism 20 that holds a wafer (substrate to be processed) W, a process-liquid supplying mechanism 30 that supplies a... |
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US20090050181 |
Inlet Device for Disinfection Apparatus and Method for Liquid Transfer
The present invention relates to a liquid disinfection apparatus for cleaning of objects, such as health care objects, which disinfection apparatus comprises; a chamber (3) which is arranged to... |
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US20140251386 |
PROCESSING APPARATUS AND PROCESSING METHOD
According to one embodiment, a processing apparatus includes a rinsing section configured to rinse a processing liquid on a surface of a workpiece with a rinse liquid and a drying section... |
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US20140174482 |
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE
In one embodiment, after rinsing a semiconductor substrate having a fine pattern formed thereon with pure water, the pure water staying on the semiconductor substrate is substituted with a water... |
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US20120211026 |
Apparatus and Methods for Cleaning Reagent Dispensing Tips of a Screening Unit
A plurality of reagent dispensing tips (15) are inserted through frustoconical openings (28) in a cover (16) of a cleaning chamber in the form of intersecting axial bores (14) and sprayed with... |
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US20090223536 |
CLEANING APPARATUS, CLEANING TANK, CLEANING METHOD, AND METHOD FOR MANUFACTURING ARTICLE
Ultrasonic generating unit of a cleaning tank in a cleaning apparatus applies ultrasonic waves to cleaning fluid supplied into the cleaning tank from a supply port and fluid jetting unit having... |
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US20090165819 |
METHOD FOR TREATING FINE STRUCTURE, SYSTEM FOR TREATING FINE STRUCTURE, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
A method for treating a fine structure, includes supplying a liquid to a surface of the fine structure having protrusions on the surface thereof; and thereby treating the surface of the fine... |
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US20140116476 |
Systems for Surface Treatment of Semiconductor Substrates using Sequential Chemical Applications
Systems for removing post etch polymer residue from etched surface includes a first proximity head to introduce a first cleaning chemistry as a first meniscus to a portion of the surface of the... |
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US20100269865 |
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
Disclosed is a liquid processing apparatus which can more securely prevent convex portions from collapsing and also can increase the processing efficiency of a substrate. The liquid processing... |
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US20080210268 |
Shopping Cart Washer and Sanitizer
A shopping cart washer and sanitizer includes an enclosure fitted with components that facilitate the entry and exit of rolling shopping carts. Within the apparatus, the carts are washed, rinsed,... |
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US20120312334 |
RESIST REMOVAL APPARATUS AND RESIST REMOVAL METHOD
A resist removal apparatus and method are effective in removing a resist without oxidizing the substrate material other than the resist. The resist removal apparatus, which removes resist from a... |
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US20100206337 |
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, PROGRAM, STORAGE MEDIUM, AND SUBSTITUTE AGENT
There is provided a substrate processing method with the use of plural kinds of liquids, capable of, after a process to a substrate by using a process liquid, rapidly and more reliably... |
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US20080092929 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus includes a substrate holding unit for holding a substrate to be processed substantially horizontally, a process liquid nozzle for supplying a process liquid to a... |
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US20050139240 |
Rinsing and drying apparatus having rotatable nozzles and methods of rinsing and drying semiconductor wafers using the same
Rinsing and drying apparatus having rotatable drying source nozzles and methods of rinsing and drying semiconductor wafers are provided. The apparatus includes a bath for storing liquid and... |
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US20080066783 |
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
A substrate treatment apparatus according to the present invention includes: a plate to be positioned in spaced opposed relation to one surface of a substrate and having a plurality of outlet... |
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US20080149147 |
PROXIMITY HEAD WITH CONFIGURABLE DELIVERY
An apparatus for processing a substrate is disclosed. The apparatus includes a proximity head having a surface that can be interfaced in proximity to a surface of a substrate. The proximity head... |
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US20140137893 |
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM
In example embodiments, a supply flow rate of a clean gas can be reduced without decreasing process performance. A flow rate of a clean gas 78, having a low humidity, supplied from a clean gas... |
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US20160113478 |
BATCH DISHWASHER AND METHOD FOR OPERATING A BATCH DISHWASHER
The invention relates to a commercial dishwasher (1) which is in the form of a batch dishwasher and has a treatment chamber (2) for accommodating washware which is to be cleaned and also has a... |
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US20080110861 |
Substrate Processing Apparatus and Method
The substrate processing apparatus has substrate holding mechanisms (14) for holding the substrate (W) under a holding force which is changed according to a rotational speed of the substrate... |
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US20140299157 |
Cleaning Method and Device for Ejection Head of Alignment Film Printer
The present invention provides a cleaning method for an electing head of an alignment film printer, which is used automatically to clean up the ejection head of the alignment film printer,... |
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US20060112973 |
Method and apparatus for substrate processing
A substrate processing apparatus admits nitrogen gas into a casing, while immersing a substrate in deionized water stored in a processing tank. Oxygen and water vapor within the casing are... |
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US20100258143 |
SCRUBBER CLEAN BEFORE OXIDE CHEMICAL MECHANICAL POLISH (CMP) FOR REDUCED MICROSCRATCHES AND IMPROVED YIELDS
A method for fabricating semiconductors is provided that includes an oxide chemical mechanical polish (CMP) step. Prior to performing the CMP of an integrated circuit semiconductor silicon wafer,... |
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US20060162748 |
Wafer guide and semiconductor wafer drying apparatus using the same
A wafer guide and a semiconductor wafer drying apparatus using the same are disclosed. The wafer guide includes a body and supporters formed on the body. The supporters present a plurality of... |
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US20130255724 |
APPARATUS FOR TREATING SUBSTRATE
A substrate treating apparatus is provided which includes a treatment container which provides a space in which a substrate is washed; a substrate support member which is included in the space and... |
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US20050224102 |
Apparatus and method of rinsing and drying semiconductor wafers
An apparatus for rinsing and drying semiconductor wafers includes a rinsing bath, a drying bath and a drying chamber. The rinsing bath and drying bath are connected by a tunnel unit which prevents... |
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US20070157957 |
Substrate transfer robot and apparatus having the substrate transfer robot for cleaning a substrate
In a substrate transfer robot and a substrate cleaning apparatus, the substrate transfer robot transfers substrates between a container supported by a load port and a processing module for... |
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US20070107253 |
SUBSTRATE DRYING DEVICE AND SUBSTRATE PROCESSING METHOD
A substrate drying device according to an embodiment of the present invention includes: a nozzle ejecting a fluid to a substrate to be processed, wherein the substrate is moved relative to the... |
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US20100206338 |
DEVICE AND METHOD FOR REMOVING LIQUID FROM A SURFACE OF A DISC-LIKE ARTICLE
A method for removing liquid from a surface of a disc includes, rotating the disc article about an axis perpendicular to the disc's main surface, supplying liquid from a supply port, moved across... |
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US20150190850 |
SYSTEM FOR CLEANING PHOTOMASKS
A system for cleaning a photomask with a target surface includes a retaining device for retaining the photomask, a cleansing device, an elevating platform and a drying device. The cleansing device... |
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US20100218790 |
DEVICE FOR CLEANING OPTICAL MEASUREMENT BODIES THAT HAVE AN AREA FOR CONTACT WITH THE SURFACE OF THE EYE
A device for cleaning optic gauges (6), which have an eye surface contact area, and in particular applanation tonometer gauges or ophthalmic contact lenses for diagnostic purposes or laser... |