Matches 1 - 50 out of 160 1 2 3 4 >

AcclaimIP-ad

Match Document Document Title
US20050072446 Process and apparatus for treating a workpiece  
A novel chemistry, system and application technique reduces contamination of semiconductor wafers and similar substrates and enhances and expedites processing. A stream of liquid chemical is...
US20060260661 Method and apparatus for wafer cleaning  
An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a...
US20050028845 Cleaning composition and apparatus for removing biofilm and debris from lines and tubing and method therefor  
Biofilm and debris can be removed from the interior and exterior surfaces of small bore tubing by passing an aqueous cleaning solution of water, one or more surfactants and preferably a source of...
US20060260653 Apparatus for cleaning and drying substrates  
A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of...
US20120145202 Cleaning Compound and Method and System for Using the Cleaning Compound  
A cleaning compound is provided. The cleaning compound includes about 0.1 weight percent to about 10 weight percent of a fatty acid dispersed in water. The cleaning compound includes an amount of...
US20070204885 Substrate processing apparatus for resist film removal  
Semiconductor wafers are cleaned by placing the semiconductor wafers in a processing vessel, forming a pure water film on the surfaces of the wafers, forming an ozonic water film by dissolving...
US20060060232 Liquid treatment device and liquid treatment method  
A plurality of process liquid supply nozzles 10 are arranged at different levels on right and left sides of a semiconductor wafer W in a process bath 1. A discharge port of each of the nozzles 10...
US20120255586 APPARATUS AND METHODS FOR CLEANING AND DRYING OF WAFERS  
An first example method and apparatus for etching and cleaning a substrate comprises device with a first manifold and a second manifold. The first manifold has a plurality of nozzles for...
US20100326476 METHOD FOR PROCESSING A SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME  
An apparatus for processing substrate includes a spin chuck, a first nozzle and a second nozzle. The spin chuck fixes and spins the substrate on which a photoresist layer is formed. The first...
US20070125405 Substrate cleaning method and substrate cleaning apparatus  
A substrate cleaning method, including a step of supplying a two-fluid spray made up of a liquid and a gas to the front surface of a substrate, is provided; wherein the supplying of the two-fluid...
US20120291816 DISHWASHER USING OZONE  
A dishwasher is provided that allows oxygenating gases, especially ozone, to be effectively used at least for cleaning and disinfecting. An oxygenating gas is added to the rinsing liquor or the...
US20070240740 Cleaning of contaminated articles by aqueous supercritical oxidation  
Method for removing contaminant material from a contaminated article comprising contacting the contaminated article with a reactive cleaning fluid comprising water and an oxidant material at a...
US20110259376 WET PROCESSING OF MICROELECTRONIC SUBSTRATES WITH CONTROLLED MIXING OF FLUIDS PROXIMAL TO SUBSTRATE SURFACES  
The present invention provides methods and apparatuses for controlling the transition between first and second treatment fluids during processing of microelectronic devices using spray processor tools
US20120103371 METHOD AND APPARATUS FOR DRYING A SEMICONDUCTOR WAFER  
A method and apparatus for drying semiconductor wafers uses hot isopropyl alcohol in liquid form at temperatures above 60° C. and below 82° C. The use of hot IPA better avoids pattern collapse and...
US20080006302 SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS  
The substrate treatment method includes a deionized water supply step of supplying deionized water on a surface of a substrate; a resistivity reducing gas supply step of supplying a resistivity...
US20060118132 Cleaning with electrically charged aerosols  
In a method for cleaning a wafer, the wafer is placed a processing chamber. A layer or film of liquid is provided on the wafer. Electrically charged aerosol droplets of a liquid are formed and...
US20060107976 Apparatus for treating a substrate with an ozone-solvent solution  
A system for treating a substrate with an ozone-solvent solution has an ozone-solvent solution supply. The supply has a supply outlet, and the ozone solvent solution supply is capable of...
US20110180112 METHOD OF REMOVING/PREVENTING REDEPOSITION OF PROTEIN SOILS  
A method and composition is provided for removing protein soil and preventing redeposition of soils onto a surface. The method includes introducing a protein-removing/anti-redeposition agent...
US20070227556 METHODS FOR REMOVING PHOTORESIST  
In a method for removing an organic film such as photoresist from a wafer, the wafer is placed into a chamber. A liquid including an acid, such as sulfuric acid is applied to the surface of the...
US20060151015 Chemical liquid processing apparatus for processing a substrate and the method thereof  
In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further,...
US20120073599 APPARATUS FOR AND METHOD OF PROCESSING SUBSTRATE  
A rinsing liquid adheres to a substrate subjected to a cleaning process. The rinsing liquid on the substrate is first replaced with IPA liquid. While the substrate covered with the IPA liquid is...
US20070295365 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS  
After rinsing, while rotating a substrate, a front layer part of a rinsing liquid (DIW) adhering to a substrate surface is drained and removed from the substrate surface. This is followed by...
US20050056306 Apparatus and method for treating surfaces of semiconductor wafers using ozone  
An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create...
US20110011425 SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, RECORDING MEDIUM AND SOFTWARE  
A substrate processing system 1 comprises: a processing tank 3 for processing substrates W with a processing liquid; a drying unit 6 disposed above the processing tank 3; and a carrying mechanism...
US20050252538 Device and system for improved cleaning in a washing machine  
A washing system for cleaning within a washing zone comprising at least one inlet capable of fluid communication with a feed water; at least one treatment zone in fluid communication with the at...
US20070107755 Apparatus for washing and disinfecting endoscope  
There is provided an apparatus for washing and disinfecting an endoscope equipped with an insertion tube through which a duct is formed and a base portion integrated with the insertion tube. The...
US20120012134 METHOD FOR CLEANING ELECTRONIC MATERIAL AND DEVICE FOR CLEANING ELECTRONIC MATERIAL  
A resist on an electronic material is surely separated and removed in a short time. The electronic material is cleaned with a sulfuric acid solution containing persulfuric acid to separate and...
US20070119486 System for rinsing and drying semiconductor substrates  
A system for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to...
US20130014785 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS  
A substrate processing method includes a removing step of removing unwanted matter from a substrate and a vaporizing step performed in parallel to the removing step. In the removing step, an HF...
US20120048304 SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING SYSTEM  
According to an embodiment, a supercritical drying method includes: introducing a semiconductor substrate of which a surface is wet with a supercritical displacement solvent into a chamber;...
US20080295871 Chemical Supply System  
A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply...
US20050252526 Single wafer cleaning apparatus and cleaning method thereof  
A single wafer cleaning method and a cleaning apparatus thereof are provided in which the transition to rinse treatment is swiftly performed without being influenced by a chemical liquid...
US20080047589 APPARATUS AND METHODS OF CLEANING SUBSTRATES  
An apparatus for wafer cleaning includes an enclosure. A stage is within the enclosure. At least one first wall is within the enclosure, around the stage. A plate is within the enclosure and above...
US20070199579 Substrate treatment method, substrate treatment apparatus, and semiconductor device manufacturing method  
According to an aspect of the invention, there is provided a substrate treatment method including performing a treatment including intermittently supplying a cleaning fluid to a central area of a...
US20060086373 Apparatus and method for drying substrates used to manufacture semiconductor devices  
A wafer drying apparatus may include a porous member for absorbing alcohol. The alcohol may have a higher vapor pressure than water remaining on a wafer. The porous member may migrate from the...
US20120064727 SUBSTRATE TREATMENT EQUIPMENT AND METHOD OF TREATING SUBSTRATE USING THE SAME  
Substrate treatment equipment includes a wet treatment apparatus for treating a substrate with a solution (liquid), a drying (treatment) apparatus discrete from the wet treatment apparatus and for...
US20110030735 CLEANING METHOD OF USED PAPER RECYCLING APPARATUS, CLEANING SYSTEM, AND USED PAPER RECYCLING APPARATUS  
The present invention presents a cleaning technology in a used paper recycling apparatus capable of assuring a stable used paper recycling operation all the time, by removing and cleaning securely...
US20060076040 Semiconductive substrate cleaning systems  
In one aspect, the invention includes a method of treating a surface of a substrate. A mixture which comprises at least a frozen first material and liquid second material is provided on the...
US20060027253 Pressure washer control system and method  
A self-contained mobile cleaning system including a storage subsystem for providing a cleaning fluid, a chemical injection subsystem for injecting a chemical into the cleaning fluid, a fluid...
US20060081269 Method and apparatus for cleaning and drying wafers  
The present invention is directed to a method and an apparatus for cleaning and drying wafers. The apparatus includes an injection unit having first and second injection ports configured for...
US20090159102 PARTS WASHER  
A parts cleaner for use in a process whereby solvent is preferred to always be available and is preferred to be as clean or pure as possible for use, comprising two containers respectively for...
US20080078423 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS  
Holes having a variety of shapes exist on a surface of a substrate. When pure water is supplied on the substrate in a rinsing process, part of the pure water enters the holes. The pure water which...
US20050211279 Cleaning apparatus of a high density plasma chemical vapor deposition chamber and cleaning thereof  
A cleaning apparatus of a high-density plasma chemical vapor deposition chamber, and a cleaning method thereof, uniformly and sufficiently supplies a cleaning gas into a chamber to uniformly clean...
US20120186606 Cleaning of Nozzle Plate  
A method of cleaning an outer surface of a fluid ejector includes dispensing a cleaning fluid onto the outer surface of the fluid ejector, drying a region of the outer surface of the fluid...
US20060201532 Semiconductor substrate cleaning system  
In a first aspect, a method is provided for cleaning a substrate without scrubbing the substrate. Two different megasonic frequencies are applied to the substrate. Preferably two different fluids,...
US20130312789 ULTRASONIC CLEANING METHOD AND ULTRASONIC CLEANING APPARATUS  
An ultrasonic cleaning method for cleaning an object in a liquid in which a gas is dissolved includes preparing the liquid in which the gas is dissolved and cleaning the object while irradiating...
US20060249182 Cleaning method and cleaning apparatus  
A cleaning apparatus of this invention includes a cleaning water supply portion which supplies alkaline cleaning water, a high-pressure supply portion which supplies high-pressure air, and a...
US20060102208 System for removing a residue from a substrate using supercritical carbon dioxide processing  
A film removal system for cleaning a substrate containing a micro-feature having a residue thereon. The film removal system includes a supercritical fluid processing system configured for treating...
US20060266389 Method and apparatus for wafer cleaning  
A single wafer cleaning apparatus that includes a rotatable bracket that can hold a wafer, a rinse fluid having a first surface tension, a second fluid having a second surface tension lower than...
US20060162739 Cleaning chuck in situ  
Embodiments of the invention provide a method and an apparatus for in situ chuck cleaning, which advantageously reduces downtime to restore flatness. In one embodiment, a method of cleaning a...
Matches 1 - 50 out of 160 1 2 3 4 >