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US20080029130 |
Surface active bleach and dynamic pH
The present invention provides methods and compositions for dynamic pH control, particularly in detergent applications. In particularly preferred embodiments, the detergent compositions find use... |
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US20110030730 |
SYSTEM FOR PRODUCING AND DISTRIBUTING AN OZONATED FLUID
A system for producing and distributing an ozonated fluid is described. The system includes a tank for a fluid. A skid is in fluidic communication with the tank to receive the fluid from the tank.... |
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US20140109939 |
NOZZLE APPARATUS AND METHODS FOR TREATING WORKPIECES
Nozzle apparatus and methods for treating workpieces are disclosed. An example apparatus includes a nozzle module and a first nozzle chamber disposed within the nozzle module. The first nozzle... |
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US20110180114 |
LIQUID AEROSOL PARTICLE REMOVAL METHOD
Particles are removed from a surface of a substrate by a method comprising causing liquid aerosol droplets comprising water and a tensioactive compound to contact the surface with sufficient force... |
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US20130098407 |
INSTRUMENT REPROCESSORS, SYSTEMS, AND METHODS
An instrument reprocessor is disclosed. The instrument reprocessor includes a basin having a rim located in an inclined plane forming an acute angle with respect to a horizontal plane. At least... |
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US20080308132 |
SEMICONDUCTOR SUBSTRATE CLEANING METHOD USING BUBBLE/CHEMICAL MIXED CLEANING LIQUID
A method has been disclosed which cleans a semiconductor substrate using a cleaning liquid produced by mixing bubbles of a gas into an acid solution in which the gas has been dissolved to the... |
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US20050183740 |
Process and apparatus for removing residues from semiconductor substrates
The present invention generally relates to a system for cleaning substrates. More particularly, the present invention relates to process(es) for effecting chemical removal of residues from... |
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US20120291818 |
NON-PHOSPHATE DETERGENTS AND NON-PHOSPHORIC ACIDS IN AN ALTERNATING ALKALI/ACID SYSTEM FOR WAREWASHING
A method of warewashing for the optimization of cleaning is obtained, excess detergent usage is minimized and further where deposit of film on ware is reduced in an alternating acidic and alkaline... |
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US20120227770 |
TWO-FLUID NOZZLE, SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM FOR STORING SUBSTRATE LIQUID PROCESSING METHOD
There are provided a two-fluid nozzle for effectively performing a liquid process on a substrate while suppressing a damage on the substrate, and a substrate liquid processing apparatus, a... |
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US20110088731 |
SEMICONDUCTOR SUBSTRATE CLEANING METHOD USING BUBBLE/CHEMICAL MIXED CLEANING LIQUID
A method has been disclosed which cleans a semiconductor substrate using a cleaning liquid produced by mixing bubbles of a gas into an acid solution in which the gas has been dissolved to the... |
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US20150325458 |
METHOD AND SYSTEM TO IMPROVE DRYING OF FLEXIBLE NANO-STRUCTURES
Disclosed herein are methods and systems for processing of nano-structures. In particular, disclosed herein are methods for processing nano-structures during semiconductor manufacturing, including... |
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US20090120460 |
SOFT FLOOR PRE-SPRAY UNIT UTILIZING ELECTROCHEMICALLY-ACTIVATED WATER AND METHOD OF CLEANING SOFT FLOORS
A method is provided, which includes applying electrochemically activated acid and alkaline water to a surface as a pre-spray, allowing the electrochemically activated acid and alkaline water to... |
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US20050133066 |
Substrate treating method and apparatus
In a substrate treating apparatus for performing cleaning treatment by what is called QDR method for substrates immersed in a treating tank, CO2-dissolved water having carbon dioxide dissolved in... |
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US20140230848 |
METHOD OF CLEANING SUBSTRATE
The present invention is a method of cleaning a substrate, comprising cleaning at least one surface of a substrate located in a liquid by injecting pressurized cleaning liquid containing bubbles... |
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US20100313915 |
SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS
The substrate cleaning method of and the substrate cleaning apparatus for removing contaminants such as particles adhering to a surface of a substrate attain a high throughput and effectively... |
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US20130284213 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
The present disclosure provides a substrate processing method and a substrate processing apparatus. The substrate processing method includes: generating an SPM liquid of a first temperature that... |
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US20090165821 |
Detergents
Disclosed are combination products comprising a packaging means and two separate liquid detergents A and B located in said packaging means. Detergent A contains 10 to 75 percent by weight of... |
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US20160047284 |
Apparatus and Method for Preventing and Removing Carbon Deposits
Oxyhydrogen (HHO) generated by an HHO generator hydrogenates solid carbon to liquid and gaseous hydrocarbons in the exhaust system of an internal combustion engine, such as in the particulate... |
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US20110120505 |
APPARATUS AND METHOD FOR FRONT SIDE PROTECTION DURING BACKSIDE CLEANING
Embodiments of the present invention provide apparatus and method for front side protection while processing side and backside of a substrate. One embodiment of the present invention provides a... |
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US20080314418 |
Method and System for Furnace Cleaning
The present invention provides a method and a system for cleaning furnace, including the steps of introducing a nitrogen gas flow into a cleaning agent tank to carry the cleaning agent,... |
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US20130186435 |
Gas Turbine Compressor Water Wash System
The present application provides a water wash system for use with a compressor of a gas turbine engine. The water wash system may include a number of spray nozzles in communication with the... |
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US20050183741 |
Methods of cleaning and cutting using jetted fluids
Methods of cleaning a surface comprising the step of jetting against a surface to be cleaned, a cleaning fluid comprising a liquid base fluid and degradable particles wherein the degradable... |
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US20050139240 |
Rinsing and drying apparatus having rotatable nozzles and methods of rinsing and drying semiconductor wafers using the same
Rinsing and drying apparatus having rotatable drying source nozzles and methods of rinsing and drying semiconductor wafers are provided. The apparatus includes a bath for storing liquid and... |
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US20150273537 |
SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS
A method includes: a liquid film forming step of supplying first liquid to a first major surface of the substrate and forming a first liquid film; and a cleaning step of a cleaning step of... |
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US20130000684 |
CLEANING METHOD AND CLEANING APPARATUS
A cleaning method of cleaning a joint surface of a processing target substrate separated from a superposed substrate, while the processing target substrate is placed inside an annular frame and... |
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US20080230092 |
METHOD AND APPARATUS FOR SINGLE-SUBSTRATE CLEANING
A single-substrate cleaning apparatus and method of use are described. In an embodiment of the present invention, a liquid cleaning solution is dispensed in small volumes to form a substantially... |
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US20120125368 |
LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE MEDIUM STORING PROGRAM FOR PERFORMING LIQUID PROCESSING METHOD
There are provided a liquid processing method and a liquid processing apparatus capable of removing a resist film without removing an underlying film when removing the resist film from a substrate... |
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US20140332034 |
PROCESS COMPRISING WATER VAPOR FOR HAZE ELIMINATION AND RESIDUE REMOVAL
A method of treating a substrate comprises removing material from a substrate using a treatment protocol to provide a treated substrate followed by a rinsing step. In the rinsing step at least one... |
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US20130087175 |
Aircraft Washing System
A vehicle maintenance system is disclosed having a power unit, a pump, a foam generator, an air compressor, first and second fluid tanks, a hose reel assembly, a wash gun assembly and a support... |
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US20140154406 |
WET ACTIVATION OF RUTHENIUM CONTAINING LINER/BARRIER
Methods and systems are provided for preparing a ruthenium containing liner/barrier for metal deposition, and are useful in the manufacture of integrated circuits. In accordance with one... |
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US20080314419 |
EQUIPMENT FOR CLEANING CYCLES OR MOTORCYCLES
An equipment (1) to wash cycles or motorcycles (3) comprising: a positioning base (2) for at least one cycle or motorcycle (3); a frame (6) associated with that base (2) and defining, in... |
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US20090241995 |
SUBSTRATE CLEANING METHOD AND APPARATUS
In a method of removing a film residue from a wafer in a substrate processing system, a surface of the wafer is exposed to a processing liquid to thereby lift a first portion of the film residue... |
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US20060137723 |
Workpiece processing using ozone gas and solvents
In systems and methods for cleaning a wafer having metal areas, a non-aqueous polar solvent solution is applied onto the wafer, while the wafer is also contacted by ozone gas. The solvent helps to... |
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US20170018423 |
Apparatus and Method for Processing the Surface of a Workpiece Comprised of Sensitive Materials with an Ozone and Carbon Dioxide Treating Fluid
An process including supplying a mixture of a treatment liquid, ozone, carbon dioxide and optional agents for treatment of a non-diced or diced workpiece comprised of chemically sensitive... |
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US20090139545 |
CHEMICAL INJECTION FOR VEHICLE WASH SYSTEM AND METHOD
An apparatus includes an application pump that pumps water through a water application line. Fast-acting valves control a flow of different chemical concentrates into the water application line,... |
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US20140224282 |
METHOD AND APPARATUS FOR WASHING A VEHICLE
A method for washing a vehicle is provided, wherein the body of the vehicle is sprayed with pressurized washing liquid via an outlet nozzle of a washing tool and the rims of the vehicle are... |
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US20130306113 |
CLEANING APPARATUS AND METHOD
An apparatus and method for cleaning a surface comprising a gas dispensing conduit having a first end connectable to a source of pressurized gas and an open second end such that a stream of... |
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US20120291819 |
CLEANING APPARATUS AND CLEANING METHOD FOR COATING GUN
A rotary atomizing head (125, 226) is rotatably provided on a leading end of a coating gun (115, 215). The rotary atomizing head (125, 226) is provided with a central paint discharge opening (141,... |
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US20060266383 |
Systems and methods for removing wafer edge residue and debris using a wafer clean solution
A system (500) for removing wafer edge residue from a target wafer (508) is disclosed. A wafer holding mechanism (502) holds and optionally rotates the target wafer (508). A solution dispenser... |
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US20060237031 |
APPARATUS AND METHOD FOR TREATING SUBSTRATE
In an embodiment, an apparatus and method for cleaning a wafer include a container containing deionized water, and a cover opening/closing an opened upper portion of the container. A nozzle is... |
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US20150343497 |
CLEANING APPARATUS AND METHOD
An apparatus and method for cleaning a surface comprising a gas dispensing conduit having a first end connectable to a source of pressurized gas and an open second end such that a stream of... |
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US20120216840 |
ELECTRONIC COMPONENT CLEANING DEVICE AND CLEANING METHOD
A plurality of spray units spray a cleaning liquid to a plurality of spray-target regions between which a site to be cleaned is interposed. The plurality of spray-target regions are linearly... |
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US20150068556 |
DEVICE FOR THE REMOVAL OF A COVERING FROM A SUBSTRATE AND A METHOD PERTAINING THERETO
A device (1) for removing a coating, particularly a photoresist, from a substrate (10) in at least one area of the substrate (10), comprises a nozzle (11) suitable for applying a jet of a solution... |
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US20090217950 |
Method and apparatus for foam-assisted wafer cleaning
A foam-assisted wafer-cleaning and drying method and apparatus based on forming a funnel-shaped space between the base plate of the apparatus and the wafer to be cleaned and supplying a foam... |
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US20140251388 |
CLEANING SYSTEM AND METHOD OF CLEANING
A method of supplying oxygenated water is performed on a water tank, in which oxygenated water is received. The method lets the water tank supply a constant amount of the oxygenated water once,... |
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US20130152980 |
Apparatus, Process, and System for Cleaning Paint Roller Covers
Apparatuses, systems, and methods to clean a paint roller are disclosed. Such apparatuses and systems include a housing with an outlet; a handle connected to housing; an adapter disposed on an end... |
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US20120273012 |
System and Method of Cleaning and Sanitizing a Tea Brewing/Dispensing System
A technique for cleaning a tea concentrate brewing mechanism including heat exchanger tubing and concentrate receptacles employs a safe and effective aqueous chlorine dioxide solution. A chemical... |
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US20060237043 |
Method and apparatus for cleaning semiconductor substrates
According to one aspect of the present invention, a method and apparatus for cleaning a semiconductor substrate are provided. The apparatus may include a chamber wall defining a processing chamber... |
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US20080053491 |
WAFER PROTECTION SYSTEM EMPLOYED IN CHEMICAL STATIONS
Semiconductor wafers have ashed photoresist residue and/or post-etch residue thereon to be cleaned through the chemical wet station, and a pattern of exposed metal layer. Post-etch residue... |
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US20120160272 |
CLEANING METHOD OF SEMICONDUCTOR PROCESS
The present invention is to provide a cleaning method to a process for fabricating a semiconductor. The method comprises steps as follows: A semiconductor substrate is first provided. An atomized... |