Matches 1 - 50 out of 188 1 2 3 4 >


Match Document Document Title
US20130276823 Hyperbaric CNX for Post-Wafer-Saw Integrated Clean, De-Glue, and Dry Apparatus & Process  
Silicon plates can be cleaned, rinsed and dried by hyperbaric superheated liquid and superheated steam. The superheated liquid can be used to clean and rinse the silicon plates after being saw...
US20130228195 SYSTEM AND METHOD FOR CLEANING PANEL  
Disclosed are a cleaning system for a panel, which includes a steam sprayer for spraying steam on the panel and a cooling water sprayer for spraying cooling water on the panel, and a cleaning...
US20090275785 Distillation Method For The Purification Of Sevoflurane And The Maintenance Of Certain Equipment That May Be Used In The Distillation Process  
Processes for preparing commercial quantities of a stable, pharmaceutically acceptable sevoflurane substantially tree of impurities are claimed. In another embodiment, a process for removing...
US20110197929 PROCESS FOR REMOVING CARBONACEOUS DEPOSITS ON SURFACES OF CATALYSTS AND PLANT PARTS  
A process for removing carbonaceous deposits on surfaces of catalysts and plant parts by treating the deposits with a superheated stream of steam admixed at least temporarily with an oxygenous...
US20050061358 Machine for washing carts and bins  
A washing machine is disclosed that comprises an enclosure for receiving a cart to be washed. A main shuttle assembly is movable vertically on vertical guides and carries a fan for passing drying...
US20110124201 CHEMICAL VAPORIZER FOR MATERIAL DEPOSITION SYSTEMS AND ASSOCIATED METHODS  
System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the...
US20150090293 METHODS AND SYSTEMS FOR USE IN WASHING BULK CONTAINERS  
A method of washing a bulk container is provided. The method includes receiving the bulk container on a support surface and rotating the support surface and at least one washer arm relative to one...
US20080289660 Semiconductor Manufacture Employing Isopropanol Drying  
This invention is directed to an improvement in a wet chemical process for producing electronic precursors. In such process a silicon surface is treated with a wet chemical and the wet chemical...
US20070261715 Washing Machine and Method Thereof  
A laundry device and a method thereof are disclosed. The laundry device includes a body, a drum provided in the body, thereon a circumferential surface a plurality of holes having each diameter of...
US20120260607 METHOD OF REDUCING FRICTION BETWEEN SYRINGE COMPONENTS  
A method of making a syringe assembly includes providing a first syringe component defining a first sliding surface that is substantially free of lubricant. The first sliding surface is contacted...
US20100024842 GENERATOR FOR FOAM TO CLEAN SUBSTRATE  
In an example embodiment, a device for generating a cleaning foam includes a female housing and a male plug. The plug includes an aperture into which a fluid flows from another component of the...
US20130139855 METHOD FOR COMPLETING A CHEMICAL POWER PLANT CLEANING  
A method is provided for cleaning at least a part of a water-steam circuit of a power plant. The method includes introducing a cleaning solution into the part requiring to be cleaned and...
US20070196069 OPTICAL CONNECTOR CLEANING METHOD, CLEANING FIXTURE, CLEANING FIXTURE UNIT AND OPTICAL CONNECTOR  
There is provided an optical connector cleaning method for cleaning a ferrule of an optical connector, having a spraying step of spraying cleaning solvent on the ferrule and a removing step of...
US20090155437 CONTINUOUS SYSTEM FOR PROCESSING PARTICLES  
A method for removing contaminants from a material (39), such as resin particles, includes the steps of providing a vessel (50), directing a cleaning fluid (41) into the vessel (50), transferring...
US20140227442 THIN FILM DEPOSITION DEVICE INCLUDING DEPOSITION-PREVENTING UNIT AND METHOD OF REMOVING DEPOSITS THEREOF  
Provided is a thin film deposition device including a deposition-preventing unit and a method of removing deposits thereof. The method includes: separating a deposition-preventing unit including...
US20090229637 METHOD OF PREVENTING PATTERN COLLAPSE DURING RINSING AND DRYING  
A system and method for preventing a pattern formed on a substrate from collapsing during a rinsing and drying phase of a fabrication operation includes determining a plurality of process...
US20090084413 VAPOR DRYER HAVING HYDROPHILIC END EFFECTOR  
Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip...
US20100139705 SOLID DISHMACHINE DETERGENT NOT REQUIRING A SEPARATE RINSE ADDITIVE  
New solid detergent compositions and methods of forming and using those compositions are provided. The compositions for forming the solid detergents comprise a copolymer, scale inhibiting agent,...
US20100288301 REMOVING CONTAMINANTS FROM AN ELECTROLESS NICKEL PLATED SURFACE  
Removing contaminants from an electroless nickel (EN) plated surface. A surface of an EN plated object is washed in a first deionized water to remove a first portion of surface contaminants. The...
US20090100616 Decontamination Of Flakes  
A method and device for cleaning and decontaminating contaminated plastics, such as, for example, RPET or similar polymers, which have been crushed to flakes, where an ionized gas flows around the...
US20150159122 CLEANING SOLUTION AND METHODS OF CLEANING A TURBINE ENGINE  
A cleaning solution for a turbine engine is provided. The cleaning solution includes a reagent composition including water within a range between about 25 percent and about 70 percent by volume of...
US20090165819 METHOD FOR TREATING FINE STRUCTURE, SYSTEM FOR TREATING FINE STRUCTURE, AND METHOD FOR PRODUCING ELECTRONIC DEVICE  
A method for treating a fine structure, includes supplying a liquid to a surface of the fine structure having protrusions on the surface thereof; and thereby treating the surface of the fine...
US20080142053 In-situ reclaim of volatile components  
Methods, apparatus, and systems are provided for efficiently reclaiming solvents used to clean surfaces of semiconductor wafers, etc. More particularly, embodiments of the present invention...
US20060219258 METHODS FOR RINSING MICROELECTRONIC SUBSTRATES UTILIZING COOL RINSE FLUID WITHIN A GAS ENVIROMENT INCLUDING A DRYING ENHANCEMENT SUBSTANCE  
Rinsing and drying a surface of a microelectronic device and the enhanced removal of rinse fluid from the surface of the microelectronic device while the microelectronic device is rotated is...
US20080190459 Wet Surface Treatment By Usage of a Liquid Bath Containing Energy Limited Bubbles  
An upwardly directed gradient of dropping temperatures is controllably and sustainably created in a wet treatment tank between a cooled and face down workpiece (e.g., an in-process semiconductor...
US20140224281 METHODS AND APPARATUS FOR CLEANING FLIP CHIP ASSEMBLIES  
An apparatus for cleaning flip chip assemblies is provided. The apparatus comprises: a chuck assembly; a motor coupled to the chuck assembly by a spindle; at least one carrier for holding flip...
US20090199875 Bubble enhanced cleaning method and chemistry  
A method of cleaning equipment such as heat exchangers, evaporators, tanks and other industrial equipment using clean-in-place procedures comprising applying a pre-treatment solution prior to the...
US20090014028 METHOD OF CLEANING SUBSTRATES AND SUBSTRATE CLEANER  
There is provided a method of efficiently cleaning substrates without damaging a fine pattern formed thereon. It is a method of cleaning one or more substrates in a system processing one or more...
US20130233355 WASHING APPARATUS AND METHOD WITH SPIRAL AIR FLOW FOR DRYING  
An apparatus and method for washing and drying objects includes a rotating washing fluid sprayer having several nozzles to direct washing fluid, e.g., water, at an object being washed in a...
US20080092928 Method and Apparatus for Treating Biofilm in an Appliance  
A method of sanitizing a washing machine, including the removal of a bio film from the wash chamber of a clothes washer.
US20090120465 DISHWASHER WITH A LATENT HEAT ACCUMULATOR  
A cleaning appliance is provided for cleaning washware, which cleaning appliance is designed to subject the washware to the action of at least one cleaning fluid in at least one cleaning chamber....
US20050000550 METHOD FOR BACKFLUSHING INJECTOR NEEDLES  
A method for cleaning a plurality of injector needles is disclosed. The method comprises exposing the plurality of injector needles to a cleaning solution, removing the plurality of injector...
US20080202564 PROCESSING SYSTEM WITH IN-SITU CHEMICAL SOLUTION GENERATION  
A system for processing a workpiece includes a dry process chamber, such as a plasma etching chamber, and a wet process chamber, such as a spin/spray chamber. Gas supply lines supply gases to the...
US20100071726 METHOD AND SYSTEM OF DRYING A MICROELECTRONIC TOPOGRAPHY  
Drying a microelectronic topography. At least some of the illustrative embodiments are methods that include placing a microelectronic topography inside a process chamber, providing a non-aqueous...
US20140007905 WAFER CLEANING SYSTEM AND METHOD USING ELECTROLYTIC GAS FOR BACK-END PURGE  
A wafer cleaning system includes a platform, a plurality of wafer holding units over the platform, a front-end rinse nozzle, and a back-end purge unit. The plurality of wafer holding units is set...
US20150179431 SUBSTRATE PROCESSING METHOD  
A hydrophobizing agent vapor is supplied to a substrate and a surface of the substrate including a pattern is hydrophobized. Thereafter, the substrate is dried by vaporizing the hydrophobizing...
US20100051064 METHOD OF CLEANING AND AFTER TREATMENT OF OPTICAL SURFACES IN AN IRRADIATION UNIT  
The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source (1, 31) emitting...
US20120180821 Bicycle Chain Cleaner and Lubrication Apparatus  
A bicycle sprocket chain cleaning and lubrication apparatus allows a sprocket chain (3) to be cleaned while still mounted on the bicycle. The apparatus includes a includes a housing (10) for...
US20080236627 METHOD FOR CLEANING WEB-LIKE OBJECT TO BE CLEANED AND APPARATUS USING THE SAME  
A method for cleaning a web-like object to be cleaned, comprising the steps of: a cleaning solution spraying step for spraying a cleaning solution to a surface of a fed web-like object to be...
US20150090694 SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD  
A substrate processing apparatus and method includes, a plate that has a size equal to or larger than a principal face of the substrate, and has a horizontal and flat liquid holding face opposing...
US20100290015 EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT  
A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an...
US20130104940 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM  
A liquid processing apparatus of the present disclosure includes a rotatable substrate holder that holds a wafer from above, and a top plate nozzle that supplies at least rinse liquid to the wafer...
US20050034744 Rinse solution and methods for forming and cleaning a semiconductor device  
In a method of cleaning a substrate, a photoresist pattern on a substrate is ashed. A remaining photoresist pattern on the substrate is stripped using an organic stripper. The substrate is rinsed...
US20080142054 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS  
A substrate processing method includes a cleaning processing step, a mixed organic solvent supplying step, and a fluorine organic solvent supplying step. The cleaning processing step is a step of...
US20050000549 Wafer processing using gaseous antistatic agent during drying phase to control charge build-up  
Described are methods of processing one or more semiconductor wafers wherein the one or more wafers are processed in the presence of a gaseous antistatic agent. The method generally comprises...
US20110203611 MASK CLEANING METHOD, MASK CLEANING APPARATUS, AND PELLICLE  
Embodiments disclose a method for cleaning a mask having a mask film that is of a surface to which a foreign substance containing silicon oxide adheres. In the method, the mask is retained in a...
US20070039630 Wet clean and drying method and apparatus  
Systems and techniques for cleaning, including a reservoir with a first portion and a second portion. The first portion is configured to contain fluid under a receiving surface of the fluid. The...
US20140174465 Cleaning Agent for Silicon Wafer  
A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an...
US20130199578 Substrate Treating Apparatus And Substrate Treating Method  
A substrate processing apparatus and a substrate processing method are capable of restraining or preventing the generation of streaky particles on a substrate surface by excellent removal of a...
US20120312333 Substrate Treating Apparatus And Substrate Treating Method  
A substrate processing apparatus and a substrate processing method are capable of restraining or preventing the generation of streaky particles on a substrate surface by excellent removal of a...

Matches 1 - 50 out of 188 1 2 3 4 >