Matches 1 - 43 out of 43


Match Document Document Title
US20130276823 Hyperbaric CNX for Post-Wafer-Saw Integrated Clean, De-Glue, and Dry Apparatus & Process  
Silicon plates can be cleaned, rinsed and dried by hyperbaric superheated liquid and superheated steam. The superheated liquid can be used to clean and rinse the silicon plates after being saw...
US20050022846 Contact lens rinsing and placement process  
The invention involves the process of using a lens placement instrument to hold a contact lens while rinsing visible debris from the lens which resulted from finger contact with the contact lens...
US20080128002 CAPSULE DE-DUSTER AND POWDER RECLAMATION APPARATUS  
The present invention relates to apparatus and methods for removing powder from the exterior of capsules. An exemplary capsule removal apparatus includes an input for receiving the one or more...
US20100037918 Container and process for cleaning and inspecting parts  
The present invention is drawn to a wire container comprising a plurality of spring-like wires having wave patterns forming a part support that minimize contact points between the container and...
US20130072970 Using Supercritical Carbon Dioxide to Remove Residual EtO from Sutures  
Treating absorbable sutures that have been sterilized using ethylene oxide with carbon dioxide at or near its supercritical pressure and temperature conditions to remove any residual ethylene oxide.
US20130061880 Continual Flow Pin Washer  
A multi-chambered deposition pin wash station is provided. The wash station includes a lower chamber and an upper drain basin connected by a plurality of wash tubes. Cleaning fluid is provided to...
US20100275955 METHOD AND DEVICE FOR STERILIZING AND WASHING CAP  
A chute type sterilizing and washing device for a cap, in which deformation of a cap is prevented by relaxing integral pressure acting on a synthetic resin cap in the chute, and sterilization and...
US20080121253 CLEANSING BIN  
A bin for use in a dishwasher machine is described. The bin comprises a pair of opposing side panels, a rear panel connected to each of the pair of opposing side panels, a front panel connected to...
US20050279389 Wet cleaning apparatus including a cover for removing impurities thereon  
An apparatus is provided for performing a wet process to a substrate. The apparatus comprises a bath, having a top portion which defines an opening, for storing a liquid for wet processing the...
US20050051196 Developer dispensing apparatus with adjustable knife ring  
A developer dispensing apparatus for dispensing developer solution onto a semiconductor wafer substrate which has a vertically-adjustable knife ring. The knife ring is vertically actuated in the...
US20050067002 Processing chamber including a circulation loop integrally formed in a chamber housing  
An apparatus for and method of processing an object with a processing fluid. The apparatus comprises a processing chamber formed within a chamber housing and a fluid circulation loop integrally...
US20060124152 Method and apparatus for washing solid substrate with ultrasonic wave after hybridization reaction  
A method and apparatus for washing solid substrate with ultrasonic wave after hybridization reaction are provided. The method includes (1) putting the solid substrate into a container having a...
US20060225769 Isothermal control of a process chamber  
An apparatus for use in providing a fluid at a predetermined temperature is disclosed. The apparatus comprises: means for supplying a first quantity of a fluid at a first temperature; means for...
US20100071726 METHOD AND SYSTEM OF DRYING A MICROELECTRONIC TOPOGRAPHY  
Drying a microelectronic topography. At least some of the illustrative embodiments are methods that include placing a microelectronic topography inside a process chamber, providing a non-aqueous...
US20050045205 Apparatus and method for cleaning printed circuit boards  
A highly compact yet fast operating washing and drying system, principally for use in cleaning and drying printed circuit boards after soldering. The system includes a bi-directional conveyor and...
US20090178695 LIQUID CLEANING APPARATUS FOR CLEANING PRINTED CIRCUIT BOARDS  
A method and apparatus for cleaning printed circuit boards are provided. The method includes providing a cleaning apparatus with a housing having a conveyance mechanism for carrying printed...
US20100024847 SEMICONDUCTOR WAFER CLEANING WITH DILUTE ACIDS  
In a method for cleaning wafers using ultra-dilute acids, the wafers are placed into a rotor in a process chamber. As the rotor spins, the wafers are with de-ionized water and ultra-dilute...
US20050045206 Post-etch clean process for porous low dielectric constant materials  
Standard post-etch photoresist clean procedures for porous dielectric materials manufacturing may involve wet cleans in which a solvent is used for polymer residue removal. In many cases, the...
US20140194586 METHOD FOR TREATMENT OF SYNTHETIC RUBBER PRODUCTS, A SYSTEM FOR TREATMENT, THE RESULTING RUBBER PRODUCTS, AND USE OF A METHOD TO REDUCE TYPE IV ALLERGENICITY OF RUBBER PRODUCTS  
The present invention relates to a method of reducing type IV rubber allergy of synthetic rubber latex products caused by chemical residues remaining after manufacture of the synthetic rubber...
US20050000549 Wafer processing using gaseous antistatic agent during drying phase to control charge build-up  
Described are methods of processing one or more semiconductor wafers wherein the one or more wafers are processed in the presence of a gaseous antistatic agent. The method generally comprises...
US20070062561 Method And Apparatus For Testing Particulate Contamination In Wafer Carriers  
Wafer carriers in an integrated circuit fab are tested for residual particle contamination by replacing the standard carrier door by a test cover having a gas inlet and outlet, counting the number...
US20070000523 Cleaning composition and related methods  
A cleaning composition is disclosed. The cleaning composition comprises about 80 to 99.8999 percent by weight of an ammonium fluoride aqueous solution, about 0.1 to 5 percent by weight of a...
US20060174913 Apparatus for and method of wet processing semiconductor substrates  
A wet processing apparatus includes a bath in which a plurality of semiconductor substrates are to be seated, and which bath has drain valves defining drain openings between a bottom wall and the...
US20130252427 METHOD FOR CLEANING TEXTURED SILICON WAFERS  
Substrates for solar cells are prepared by the reverse of the standard RCA clean. The substrates are first cleaned in RCA-2 solution and then in RCA-1 solution. A pyramids rounding step using...
US20090090392 METHOD OF CLEANING A SEMICONDUCTOR WAFER  
The invention provides a method of cleaning the surface (3) of a wafer (1), comprising a hot rinse step in which the wafer (1) is at a temperature that is at least 100C higher than room...
US20050039775 Process and system for cleaning surfaces of semiconductor wafers  
A process for cleaning the surface of a semiconductor wafer. The process has the following steps: a) conveying a component selected from the group consisting of a dense gas component, a liquid...
US20100300491 WAFER CLEANING WITH IMMERSED STREAM OR SPRAY NOZZLE  
Several methods of removing contaminant particles from a surface of a substrate are disclosed herein. In one embodiment, the method includes directing an incompressible fluid spray onto a surface...
US20090246968 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD  
A substrate treating apparatus for performing treatment of substrates with a treating liquid. The apparatus includes a treating tank for storing the treating liquid and performing a predetermined...
US20090084403 SUBSTRATE CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE CLEANING METHOD, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM  
A deposit adhered to a rear surface peripheral portion of a substrate is easily and reliably removed, and a cycle of maintenance such as an exchange or a cleaning of a member required for removing...
US20080223411 Substrate processing apparatus and substrate processing method  
A substrate processing apparatus of a simplified structure, which is capable of decreasing an amount of a process liquid to be used, and of restraining change in temperature of the process liquid...
US20050178402 Methods and apparatus for cleaning and drying a work piece  
Methods and apparatus are provided for the cleaning and drying of a work piece. The apparatus comprises a carrier configured to carry a work piece that has a surface. The apparatus further...
US20130048027 Package Assembly Cleaning Process Using Vaporized Solvent  
A method includes generating a solvent-containing vapor that contains a solvent. The solvent-containing vapor is conducted to a package assembly to clean the package assembly. The...
US20060185692 Method and apparatus for cleaning articles used in the production of semiconductors  
An apparatus and a method serve for cleaning articles used in the production of semiconductors, such as wafers, containers for transporting wafers (known as FOUPs), LCD substrates and photomasks....
US20050205111 Method and apparatus for processing a microfeature workpiece with multiple fluid streams  
Methods and apparatuses for processing microfeature workpieces are disclosed herein. In one embodiment, a workpiece support carries a workpiece in a processing volume of a processing chamber. A...
US20050051191 [CLEANING METHOD USED IN INTERCONNECT PROCESS]  
A cleaning method used in the fabrication of metallic interconnects is provided. A substrate having a conductive layer and a dielectric layer on the conductive layer is provided. An opening is...
US20050045208 Apparatus and method for cleaning semiconductor substrates  
A method of and apparatus for cleaning semiconductor substrates prevents the drying fluid used to dry the substrates from condensing. The apparatus has a chamber having an exhaust port that...
US20170182521 SYSTEMS, METHODS AND APPARATUS FOR LEVITATING A METALLIC TRAY  
A system for processing solar cells is disclosed which includes a separation module for separating a processing frame from solar cells that are fed along a conveyance line. The processing frame...
US20170151587 Horizontal Rotating Spineboard Washer  
A rotating spine board washer which utilizes a rotisserie style racking system that allows multiple spine boards to be configured into a tube shape. The tube shaped rack is connected to a motor...
US20160332202 INTERCHANGEABLE BASKET TREATMENT SYSTEM  
An interchangeable basket treatment system receives a removable agitation basket preloaded with articles through a first door. Once positioned within the chamber and the chamber is sealed, the...
US20160221045 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD  
A substrate processing apparatus includes a transferring unit disposed in a connecting part of a washing processing cell and an indexer cell. The transferring unit includes an inverting support...
US20160199979 BASE PLATE ASSEMBLY TRANSFER MECHANISM AND METHODS  
This invention relates to an apparatus for processing a baseplate assembly and more specifically to a transfer mechanism and a parts washer for processing baseplate assemblies. The transfer...
US20150004741 WAFER SEPARATION METHOD, WAFER SEPARATION AND TRANSFER METHOD, AND SOLAR CELL WAFER SEPARATION AND TRANSFER METHOD  
A wafer separation apparatus improves wafer separation performance in separation and transfer and suppresses the occurrence of wafer breakage in separation and transfer, while remaining...
US20120042910 LIFTING AND DRYING DEVICE AND METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM SUBSTRATE OR MAGNETIC RECORDING MEDIUM USING THE SAME  
Provided is a lifting and drying device for cleaning substrates by immersing one or more disk-like substrates with a central hole into a cleaning liquid disposed in a cleaning tank and lifting and...

Matches 1 - 43 out of 43