Matches 1 - 50 out of 99 1 2 >


Match Document Document Title
US20050039785 Paint roller cleaning and conditioning tool  
A tool for facilitating the cleaning of paint roller covers by providing a quick and convenient connection between the roller cover to be cleaned and an ordinary hand-held electric drill. The...
US20120111056 ENHANCED STRENGTHENING OF GLASS  
Apparatus, systems and methods for improving chemical strengthening of glass are disclosed. In one embodiment, a mechanical stress can be induced on a glass article while undergoing chemical...
US20050183756 Car wash with variable entrance/exit orientation  
A car wash includes a supporting mechanism and a washing mechanism. The supporting mechanism includes a fixed base and a supporting disc rotatably mounted to the fixed base. The supporting disc...
US20080302399 Dishwasher Comprising a Variable Device For Placing Objects That Are to Be Washed  
A dishwasher includes a device for disposing pieces of silverware such that objects that are to be washed are, when placed in the washing receptacle of the dishwasher, disposed in a careful and...
US20130133708 CUP AND SUBSTRATE PROCESSING APPARATUS  
A cup intermediate portion and a cup lower portion surround a substrate. The cup intermediate portion is arranged above an upper surface of the cup lower portion. A sidewall surrounds the cup...
US20090014040 FLEXIBLE OBJECT CLEANING AID  
A rotative cleaning system includes a flexible member mounted in a stationary location and having an object engagement edge that contacts an exterior surface or region of an object as is rotates...
US20090090467 Spin head  
Provided is a spin head for supporting and rotating a substrate. The spin head includes a body, chuck pins disposed at the body and movable between supporting positions and rest positions, and a...
US20090093123 Spin head, chuck pin used in the spin head, and method for treating a substrate with the spin head  
Provided is a spin head for supporting a substrate. The spin head includes a rotatable body, and chuck pins protruding upward from the body and configured to support an edge of a substrate placed...
US20120103374 WASHING DEVICE AND BRAKE MECHANISM THEREOF  
A washing device and brake mechanism thereof includes a casing and a bucket received in the casing. The bucket has a plurality of through holes and orifices defined therein. A brake mechanism is...
US20050016570 Machines for washing mops and integrated devices having a pulsator and a water removal barrel thereof  
The invention provides a machine for washing a mop, which includes a housing, a driving mechanism, a controlling mechanism, a pulsator, a water tank, a water removal barrel, a draining mechanism,...
US20120312338 ROTARY DINNERWARE WASHING APPARATUS  
A rotary dinnerware washing apparatus includes a housing defining therein a washing chamber, a washing mechanism mounted in the housing for spaying hot water over the washing chamber, and a...
US20090241987 ENDOSCOPE CLEANER AND CLEANING METHOD  
An endoscope cleaner includes a cleaning chamber for containing an endoscope. A vibration plate is disposed in a lower portion of the cleaning chamber. A basket portion is disposed substantially...
US20140256143 Method for Hard Mask Loop with Defect Reduction  
The present disclosure provides one embodiment of a method of fabricating an integrated circuit. The method includes forming a patterned hard mask on a substrate; performing a fabrication process...
US20100258148 Roller Cover Cleaning System and Method  
A roller cover cleaning system comprises a handle and a roller cover frame. The handle comprises a gripping portion, an attachment member, a connecting member, and an axle extending from the...
US20140109941 RETENTION DEVICE AND RETENTION METHOD  
A holding device including a first sucking section for sucking a wafer (substrate) from a side on which a dicing tape (supporting film) is adhered; a structure that supports a dicing frame (frame...
US20080314413 Cyclone cleaning device and method  
A process vessel cleaning tool comprises a metal tube which can be introduced through an insertion port and sealing assembly into a high temperature process vessel. The metal tube supplies liquid...
US20140352738 ZERO LAG DISPENSE APPARATUS  
A liquid dispenser for a wafer processing system includes a supply tube with an inlet at one end and an outlet at the other end. Attached to the supply tube at the outlet end is a liquid...
US20120085374 DEVICE AND METHOD FOR WET TREATING PLATE-LIKE-ARTICLES  
A method for wet treatment of plate-like articles includes, a chuck for holding a single plate-like article having an upwardly facing surface for receiving liquid running off a plate-like article...
US20070277855 Apparatus and method for cleaning, drying and sanitizing produce  
A produce cleaning machine provides baskets for holding large and small produce items and water sprayers for directing water jets onto the produce from above and below. One basket is motorized to...
US20060102210 Substrate processing container  
A substrate processing vessel has a vessel body 100 and a cover 130 hermetically joined to the vessel body 100. The vessel body 100 is provided with a plurality of substrate support rods 102. Each...
US20100180816 PAINTING APPARATUS  
A painting apparatus comprising a paint module, an applicator assembly having an applicator surface, and a pump, the paint module having a container receiving section, the applicator assembly...
US20130068264 WAFER SCRUBBER APPARATUS  
A wafer scrubber apparatus is disclosed, including a chamber, and holder connecting to a spindle disposed in the chamber, wherein the holder supports a wafer, and a gas purge pipe disposed at the...
US20100300494 FILTER CARTRIDGE, AND DEVICE AND METHOD FOR CLEANING A FILTER CARTRIDGE  
A reusable filter cartridge having a symmetrical structure, the reusable filter cartridge comprising a tubular outer pipe having perforations arranged therein. A tubular inner pipe having...
US20060157095 Systems and methods for spinning semiconductor wafers  
Systems and methods are disclosed to process first and second sides of a wafer. The system includes a platform adapted to receive and rotate said wafer; and first and second heads coupled to the...
US20070199578 Cleaning apparatus, cleaning method and product manufacturing method  
A cleaning apparatus is provided with a plurality of cleaning mechanisms such as a blast unit, a vibration brush unit and a pulse spraying unit. Cleaning of objects with the blast unit and...
US20090120472 SUBSTRATE CLEANING AND PROCESSING APPARATUS WITH MAGNETICALLY CONTROLLED SPIN CHUCK HOLDING PINS  
When a substrate is subjected to bevel cleaning processing, a first magnet plate is arranged at a lower position, and a second magnet plate is arranged at an upper position. In this case, each of...
US20140311534 CLEANING METHOD AND CLEANING DEVICE FOR SEALING MASK, AND PRODUCTION METHOD FOR HONEYCOMB STRUCTURE  
A sealing mask has a pair of principal surfaces opposed to each other and a plurality of through-holes opening in the pair of principal surfaces and is used for sealing predetermined cells out of...
US20120298149 METHOD AND APPARATUS FOR LIQUID TREATMENT OF WAFER SHAPED ARTICLES  
An apparatus for treating a wafer-shaped article, comprises a spin chuck for holding a wafer-shaped article in a predetermined orientation, at least one upper nozzle for dispensing a treatment...
US20130263898 ROTATING DRUM TYPE WORK WASHING APPARATUS  
In a rotating drum (4) of a rotating drum type workpiece washing apparatus (1), a first cylindrical body section (21), in which a liquid impassable part (21a) that follows the circumferential...
US20120042911 CLEANING DEVICE AND CLEANING METHOD USING SAME  
A cleaning device includes a rotary platform and a cleaning assembly. The rotary platform is used for rotating a workpiece. The cleaning assembly faces the rotary platform and is used for spraying...
US20050252524 PERMEABLE MEMBRANE CLEAN STATION  
Disclosed in a cleaning apparatus (e.g., clean station) used during the production of semiconductor wafers. The clean station includes a holder for holding and rotating a semiconductor wafer, a...
US20120160277 Liquid Processing Apparatus and Liquid Processing Method  
Disclosed are a liquid processing apparatus and a liquid processing method that can improve substitutability of an atmosphere in a processing chamber to prevent an atmosphere with, for example, a...
US20120125376 WET PROCESSING APPARATUS AND WET PROCESSING METHOD  
A wet processing apparatus holds on a stage a substrate to be processed and carries out a wet treatment by rotating the stage. The substrate is held by the stage, with the center of the substrate...
US20110226291 FILTER CLEANING DEVICE  
A device has a housing with a spindle installed therein. A carrier can be rotated around this spindle while moving along it. There are two nozzles installed in the cylinder wall of the device,...
US20060201541 Cleaning-drying apparatus and cleaning-drying method  
It is an object to provide a semiconductor manufacturing apparatus provided with an apparatus performing a cleaning-drying process without a defect due to static electricity or the like, in a...
US20060137713 Apparatus for cleaning wafer and method of pre-cleaning wafer for gate oxide formation  
An apparatus and a method for cleaning a wafer are described. A wafer is inserted into a bath by a loader, is supported by a guide in the bath, and is rotated by a roller. A cleaning solution such...
US20090107519 METHOD AND SYSTEM FOR CHEMICALLY ENHANCED LASER TRIMMING OF SUBSTRATE EDGES  
An apparatus for processing a peripheral portion of a substrate includes a housing and a spin chuck mounted within the housing and configured to support the substrate in a substantially horizontal...
US20100116297 SYSTEM AND METHOD FOR COMPONENT RECOVERY  
A component recovery system, configured to refurbish components, includes a fluid feed tank, a refurbishment compartment having a fluid delivery element, a waste tank, fluid lines connecting the...
US20130233349 Systems and Methods to Clean Gas Turbine Fuel Chamber Components  
According to one embodiment, there is disclosed a method for cleaning deposits that have accumulated in a quaternary annulus chamber in a forward combustion can of a gas turbine. The method may...
US20140332036 DEVICE AND METHOD FOR TREATING SUBSTRATE SURFACES  
A device and method for treatment of a substrate treatment surface of a substrate with a fluid by immersion of the substrate treatment surface into the fluid, The device includes: receiving means...
US20130269737 LIQUID PROCESSING APPARATUS  
A liquid processing apparatus according to the present disclosure includes: a substrate holding unit configured to horizontally hold a substrate; a rotation driving unit configured to rotate the...
US20110240067 SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD  
A substrate treatment apparatus includes: substrate holding unit which horizontally holds a substrate; a rotating unit which rotates the substrate held by the substrate holding unit about a...
US20110168214 SUBSTRATE HOLDING ROTATING MECHANISM, AND SUBSTRATE PROCESSING APPARATUS  
A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three...
US20070181164 Apparatus for and method of cleaning substrates  
An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device...
US20150068562 PROCESS AND APPARATUS FOR PERFORMING FORCED IMMERSION OSCILLATORY CLEANING  
An open top tank assembly for performing forced immersion oscillatory cleaning of products, parts, assemblies or other materials with or without non-line of sight (NLOS) features, wherein the...
US20100126539 SPIN HEAD, APPARATUS FOR TREATING SUBSTRATE, AND METHOD FOR TREATING SUBSTRATE  
Provided is a spin head supporting a substrate and rotating the substrate. The spin head includes a body, chuck pins installed on the body and moving between supporting positions where a substrate...
US20150083171 METHOD AND APPARATUS FOR TREATING AT LEAST ONE SUBSTRATE IN A LIQUID MEDIUM  
A method for treating at least one substrate (15), particularly wafers, in a liquid medium (3). In a first step, the substrate (15) is lifted in the liquid medium (3) until the substrate (15) is...
US20080142050 Process and apparatus for surface-finishing  
A processing apparatus is provided to surface-finish or otherwise process features of a workpiece, such as a lumen of a stent. The fluid jet apparatus can have a nozzle system and a holder for...
US20140290701 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD  
A substrate processing apparatus includes: a storage tank configured to store a liquid; a substrate support unit 10 configured to rotatably, horizontally support a substrate W; and a plate driving...
US20140202503 METHOD AND SYSTEM FOR UNIFORMLY APPLYING A MULTI-PHASE CLEANING SOLUTION TO A SUBSTRATE  
A system for cleaning a substrate includes a carrier and a cleaning station. The carrier is capable of holding the substrate and is movably coupled to a pair of guide tracks extending a length of...

Matches 1 - 50 out of 99 1 2 >