Matches 1 - 50 out of 100 1 2 >


Match Document Document Title
US20120132234 APPARATUS FOR PARTICLE REMOVAL BY SINGLE-PHASE AND TWO-PHASE MEDIA  
A cleaning system for removing contaminants on a surface of a patterned substrate for defining integrated circuit devices is provided. The system includes a substrate carrier for supporting edges...
US20070267047 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS  
The invention provides a method capable of suppressing liquid splash at the circumferential edge of a substrate, and preventing liquid droplets due to liquid splash from adhering to the substrate...
US20050150530 Substrate cleaning apparatus  
A substrate cleaning apparatus comprises an outer shell constructed such that the outer shell is selectively openable or hermetically closable to form a sealed space, an inner shell enclosed...
US20070017548 System and method for cleaning or sanitizing items intended for re-use  
A system and method for sanitizing an item, such as a grocery store shopping cart or a child stroller, for re-use utilizes a passageway having an entrance and an exit and a source of ozinated...
US20060118132 Cleaning with electrically charged aerosols  
In a method for cleaning a wafer, the wafer is placed a processing chamber. A layer or film of liquid is provided on the wafer. Electrically charged aerosol droplets of a liquid are formed and...
US20070227556 METHODS FOR REMOVING PHOTORESIST  
In a method for removing an organic film such as photoresist from a wafer, the wafer is placed into a chamber. A liquid including an acid, such as sulfuric acid is applied to the surface of the...
US20060151015 Chemical liquid processing apparatus for processing a substrate and the method thereof  
In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further,...
US20120024317 CLEANING APPARATUS AND CLEANING METHOD  
According to one embodiment, a cleaning apparatus includes a removing unit whose tip portion is harder than a constituent material of a surface layer on a back surface side of a semiconductor...
US20070295365 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS  
After rinsing, while rotating a substrate, a front layer part of a rinsing liquid (DIW) adhering to a substrate surface is drained and removed from the substrate surface. This is followed by...
US20050056306 Apparatus and method for treating surfaces of semiconductor wafers using ozone  
An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create...
US20070017560 Substrate carrier  
The present invention includes a plurality of carrier arms provided close to each other, each of the carrier arms for supporting a substrate and carrying the substrate in the horizontal direction....
US20060042670 Toy for washing a rotatable object  
A toy is presented for washing an object by rotating the object in a chamber of liquid. The toy comprises a chamber partially filled with liquid and includes a mount to rotationally fix an object...
US20080156351 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD  
A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side...
US20110041881 CLEANING PLANT  
In order to produce a cleaning plant for cleaning work pieces which comprises at least one cleaning station in which the workpiece is subjected to a cleaning process in such a manner that the...
US20070199579 Substrate treatment method, substrate treatment apparatus, and semiconductor device manufacturing method  
According to an aspect of the invention, there is provided a substrate treatment method including performing a treatment including intermittently supplying a cleaning fluid to a central area of a...
US20060086373 Apparatus and method for drying substrates used to manufacture semiconductor devices  
A wafer drying apparatus may include a porous member for absorbing alcohol. The alcohol may have a higher vapor pressure than water remaining on a wafer. The porous member may migrate from the...
US20060081269 Method and apparatus for cleaning and drying wafers  
The present invention is directed to a method and an apparatus for cleaning and drying wafers. The apparatus includes an injection unit having first and second injection ports configured for...
US20130276840 SELF-CLEANING SUBMERGED INSTRUMENTATION  
Techniques and apparatus inhibit, limit, or remove biofouling and certain inorganic accumulations, to increase the longevity of accurate in-situ oceanographic and other underwater measurements and...
US20120305036 DEVICE FOR TREATING SURFACES OF WAFER-SHAPED ARTICLES  
A device for liquid treatment of a wafer-shaped article comprises a closed process chamber, and a ring chuck located within the closed process chamber. The ring chuck is adapted to be driven...
US20090038657 DISHWASHER RACK AND COMPACT TYPE DISHWASHER HAVING THE SAME  
Disclosed is the compact type dishwasher, including: a washing space for accommodating dishes therein, a lower rack disposed inside the washing space, an upper rack disposed above the lower rack,...
US20070175502 Apparatus and method for delivering acoustic energy through a liquid stream to a target object for disruptive surface cleaning or treating effects  
Apparatus is provided for performing acoustically aided treatment or cleaning of workpieces or subjects. In a first embodiment, acoustic energy contributed by one or more emitted streams is summed...
US20110094546 SYSTEM AND METHOD FOR WAFER CARRIER VIBRATION REDUCTION  
An aspect of the present invention provides a system and method for controlling a wafer cleaning system having a wafer carrier and a driving portion. The wafer carrier can move along a path in a...
US20090038658 DISHWASHER  
A dishwasher is disclosed which is suitable for mounting within a cavity under a bench. The dishwasher is chassis less and includes no outer wrapper or cabinet and as such is mounted directly to...
US20070261717 Panel washing machine and washing method  
In a panel washing device for conveying a panel on a surface plate using an endless belt, spraying washing liquid from a wash nozzle, and washing and removing foreign substances from a surface of...
US20090320887 DISHWASHER  
A dishwasher is disclosed which is suitable for mounting within a cavity under a bench. The dishwasher is chassis less and includes no outer wrapper or cabinet and as such is mounted directly to...
US20050034745 Processing a workpiece with ozone and a halogenated additive  
In a process for removing an anti-reflective coating, a workpiece such as a semiconductor wafer is placed in a support in a process chamber. A heated liquid including a halogenated additive is...
US20070051393 Apparatus for cleaning a wafer  
An apparatus for cleaning a wafer includes a rotary chuck for supporting and rotating a wafer, a cleaning solution supply unit for supplying a cleaning solution onto the wafer, a bowl spaced apart...
US20060260648 Apparatus and method of automatically cleaning a pick-up head  
Apparatus and method of automatically cleaning a pick-up head is disclosed. After picking up and placing down the dies many times, the pick-up head is placed on a glue-tape to attract...
US20080156358 DISHWASHER AND RACK ASSEMBLY THEREFOR  
A dish washer capable of washing dishes of various sizes is provided. The dishwasher includes a rack assembly having a plurality of dish holders into which dishes may be inserted and by which the...
US20070144556 Reciprocating megasonic probe  
A method of cleaning a substrate comprises placing the substrate on a rotating fixture, placing a liquid on at least one side of the substrate, and creating a standing wave of megasonic energy...
US20060243309 Cylindrical element cleaning assemblies and related methods  
A portable cleaning assembly for cleaning cylindrical elements such as paint roller covers and pool and spa cartridge filters. The portable cleaning includes a housing structure for fully...
US20080099055 Silverware Washing Appliance  
The portable, compact, silverware-only washing apparatus is disclosed. The apparatus is manufactured so as to easily mount on top of a kitchen countertop or to be easily portable to other locales....
US20050039777 Device and method for washing items in a dishwasher  
A device and a method enable items disposed in at least one dish rack of a dishwasher and having different degrees of dirtiness or soiling to be cleaned in an optimum manner, according to the...
US20110214698 PARTS WASHER  
The present disclosure provides a cleaning machine that submerges devices to be cleaned in a cleaning fluid and moves the devices in a reciprocating motion to provide cleaning agitation. In one...
US20080053488 SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD  
A substrate treatment apparatus according to the present invention includes: a substrate holding unit which holds a substrate; a push-pull plate to be positioned in spaced opposed relation to one...
US20060151017 Systems and methods for surface pasteurization of produce  
A method of transporting produce on a conveyor and rotating the produce substantially continuously during the transport. While the produce is being transported, steam is applied to an outer...
US20080006290 Fluidized bed apparatus and filter washing method for fluidized bed apparatus  
A cartridge filter 7 is vertically movably placed in a processing vessel 1 having a cylindrical profile. An ultrasonic washer 55 is fitted to the lateral wall 3a of the spray casing of the...
US20060213543 Conveyor-type dishwasher and method for it  
Conveyor-type dishwasher comprising a conveying apparatus having compartments which extend transverse to the conveying direction and serve to hold items to be washed. A rinse zone has at least one...
US20060213537 Vertical wafer platform systems and methods for fast wafer cleaning and measurement  
A multi-axis positioning system in a vertical wafer platform includes a measurement module in a semiconductor processing chamber, the measurement module having a focus position to collect data...
US20060137714 Apparatus for removing edge bead in plating process for fabricating semiconductor device  
An apparatus for removing an edge bead in, e.g., a plating process for fabricating a semiconductor device is provided, by which a wafer surface may be prevented from being oxidized by a chemical...
US20070095367 Apparatus and method for atomic layer cleaning and polishing  
The present invention generally provides an apparatus and method of processing substrates to uniformly remove any residual contamination from the surface of a substrate by use of an appropriate...
US20050028842 Method of cleaning a substrate and an apparatus thereof  
In one embodiment, an apparatus includes a cleaning bath for containing a cleaning solution, one or more substrate holders configured to support the substrate in the cleaning solution, means for...
US20070137672 Spin cleaning apparatus and wafer cleaning method  
To provide a wafer cleaning method capable of restricting breakage of fine structures disposed on a wafer, and a spin cleaning apparatus enabling such cleaning. The spin cleaning apparatus injects...
US20130292867 WASHING APPARATUS, AND PROCESS FOR PRODUCING POROUS MEMBRANE  
The present invention relates to a method of producing a porous membrane, including a coagulation step of coagulating a membrane-forming raw material solution to form a porous membrane; a washing...
US20120266923 Device Having a Renewable Blade Surface For Treating a Target Surface  
A device for treating a target surface, such as occurs when cleaning a window. The device has a squeegee blade or other member to apply pressure to the target surface. A sheet movably covers the...
US20080035186 DISHWASHER  
A dishwasher includes a housing, a dish rack movably disposed in the housing, and a first and a second roller respectively disposed on opposite sides of the dish rack. The first and second rollers...
US20050183754 Apparatus for and method of cleaning substrate  
A substrate cleaning apparatus includes two cleaning brushes driven independently of each other. A first cleaning brush makes a cycling movement including an outward movement progressing in a...
US20080035185 Apparatus for cleaning paint rollers  
An apparatus for cleaning a paint roller includes a container having a top with an insertion opening for introducing a paint-carrying surface of the paint roller into the container and a bottom...
US20050241673 Resist removing apparatus and method of removing resist  
In a resist removing apparatus of the present invention, a distance between a surface of a substrate (10) and an ultraviolet rays transmission plate (3) is adjusted to a predetermined distance by...
US20050211267 Rinse nozzle and method  
A method and apparatus for rinsing and drying a substrate (100) of a semiconductor wafer (102), has a first nozzle (110) dispensing rinsing fluid against the substrate (100); and a second nozzle...

Matches 1 - 50 out of 100 1 2 >