Matches 1 - 43 out of 43

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US20050241684 Single wafer dryer and drying methods  
In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating...
US20140109939 NOZZLE APPARATUS AND METHODS FOR TREATING WORKPIECES  
Nozzle apparatus and methods for treating workpieces are disclosed. An example apparatus includes a nozzle module and a first nozzle chamber disposed within the nozzle module. The first nozzle...
US20150357213 SUBSTRATE ATTACHING/DETACHING UNIT FOR SUBSTRATE HOLDER, WET-TYPE SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, SUBSTRATE HOLDER CONVEYING METHOD, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE CONVEYING METHOD  
A substrate attaching/detaching unit includes a stocker accommodating a plurality of substrate holders 80 and adapted so that the substrate holders 80 are aligned in a vertical direction with one...
US20070125405 Substrate cleaning method and substrate cleaning apparatus  
A substrate cleaning method, including a step of supplying a two-fluid spray made up of a liquid and a gas to the front surface of a substrate, is provided; wherein the supplying of the two-fluid...
US20130255728 APPARATUS AND METHOD TREATING SUBSTRATE  
A substrate treating apparatus is provided which includes a housing which provides a space in which a process is performed; a spin head which supports and rotates a substrate; and a spray unit...
US20060151015 Chemical liquid processing apparatus for processing a substrate and the method thereof  
In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further,...
US20150273659 SUBSTRATE POLISHING APPARATUS  
To provide a substrate polishing apparatus capable of effectively trapping a harmful substance suspended in a polishing chamber. The substrate polishing apparatus includes a polishing portion...
US20100163078 SPINNER AND METHOD OF CLEANING SUBSTRATE USING THE SPINNER  
A method includes spinning a semiconductor wafer about an axis normal to a major surface of the wafer. The wafer is translated in a direction parallel to the major surface with an oscillatory...
US20100095981 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD  
Disclosed are a substrate processing apparatus and a substrate processing method to efficiently remove a resist residue of a substrate surface by using sulfuric acid without hydrogen peroxide...
US20090126760 SYSTEM FOR CLEANING A SURFACE USING CROGENIC AEROSOL AND FLUID REACTANT  
An apparatus and method are provided to treat for example a semiconductor wafer substrate wherein a delivery means for heat, a cryogen, and a fluid chemical reactant, is disposed in a chamber in...
US20150336136 APPARATUS AND METHOD FOR WASHING CONTAMINATED MATERIAL, AND GLASS CULLET PRODUCED THEREBY  
Apparatus for cleaning contaminated aggregate comprising: at least one channel arranged in use to receive a liquid containing contaminated aggregate; and first and second banks or groups of at...
US20140182632 SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD  
A substrate cleaning apparatus cleans a surface of a substrate such as a semiconductor wafer in a non-contact state by using two-fluid jet cleaning. The substrate cleaning apparatus includes a...
US20150239016 Parts Washer  
A parts washer comprising an upper portion and a lower portion, in which the part may be washed in the upper portion and the lower portion includes a drum for containing the aqueous cleaning...
US20150136185 APPARATUS OF CLEANING SUBSTRATE  
Provided is a substrate cleaning apparatus of cleaning a substrate. The substrate cleaning apparatus includes a cleaning chamber, a first cleaning nozzle, a cover member, an air flow generation...
US20080135070 METHOD AND APPARATUS FOR ACTIVE PARTICLE AND CONTAMINANT REMOVAL IN WET CLEAN PROCESSES IN SEMICONDUCTOR MANUFACTURING  
An apparatus and a method for cleaning a wafer are described. A chamber has a substrate support. A nozzle is disposed above the substrate support to spray de-ionized water droplets. The nozzle is...
US20100132750 REVERSE OSMOSIS WITH TEMPERATURE CONTROL  
A water treatment device is provided, which has a reverse osmosis device with a raw water supply line, with a pure water discharge line and with a concentrate outflow. The raw water supply line is...
US20070006904 Substrate cleaning system and substrate cleaning method  
A substrate cleaning system that cleans a glass substrate by supplying liquid and gas to spray nozzles and by spraying fluid, where the liquid and the gas are mixed in the spray nozzles, onto the...
US20070163627 Nozzle for substrate treatment apparatus  
Provided are a nozzle and a related substrate treatment apparatus. The substrate treatment apparatus includes a process chamber, a supporting member disposed in the process chamber to support...
US20070084481 System and method of cleaning substrates using a subambient process solution  
A system and method of cleaning a substrate utilizing sonic energy and a film of subambient gasified process solution that assists in reducing damage to the substrate. In one aspect, the invention...
US20060213543 Conveyor-type dishwasher and method for it  
Conveyor-type dishwasher comprising a conveying apparatus having compartments which extend transverse to the conveying direction and serve to hold items to be washed. A rinse zone has at least one...
US20120167927 DISHWASHER  
A dishwasher is disclosed. The dishwasher includes a tub to provide a washing space, a dish rack positioned in the washing space, to receive washing objects therein, a spraying arm to spray...
US20080110476 CONTAINER CLEANING SYSTEM USING NOZZLES  
A mobile or stationary waste container cleaning system used for residential, commercial and industrial waste, garbage, trash, storage or operations containers or receptacles. Other applications...
US20120234363 PHOTOMASK CLEANING APPARATUS  
Provided is a photomask cleaning apparatus. The apparatus may include a photomask chuck, a cleaning arm and a nozzle set. The nozzle set may be installed in an end portion of the cleaning arm. The...
US20070193607 METHODS AND APPARATUS FOR CLEANING EDGES OF A SUBSTRATE  
In methods and apparatus for cleaning a wafer, a cleaning liquid is sprayed or jetted in a direction generally tangent to the circular edge of a spinning wafer. This enhances removal of...
US20150292799 PART DRYING DEVICE AND PART WASHING DEVICE USING SUCH DRYING DEVICE  
A part drying device, includes a processing chamber having a side wall closed at both ends by a bottom and an upper wall to form an enclosure, the interior of the enclosure being accessible by an...
US20130199581 EQUIPMENT DISINFECTING AND DRYING UNIT  
A unit for cleaning, drying and disinfecting equipment. The unit comprises a cabinet, a baffle disposed in the cabinet spaced apart from a rear wall of the cabinet, a plurality of adjustable...
US20150090292 DRILL CUTTING WASHING APPARATUS  
A portable apparatus for sieving, washing, and drying particle samples onsite that are generated from well drill cutting. The apparatus comprises a sievewash chamber to initially remove...
US20070056613 Dishwasher comprising a circulating pump  
A dishwasher includes a circulating jump, a spraying system and a spray nozzle enabling device. The spraying system is disposed in a spray chamber and includes a first and a second group of spray...
US20060124154 System and method for washing a vehicle  
A washing system configured for use in the interior storage area of a vehicle includes one or more guide rails disposed on an interior portion of the storage area of the vehicle. A washing unit is...
US20050211280 Multifunction vehicular surface cleaning system  
The present invention provides a multifunction vehicular surface cleaning system comprised of pipe, soap box and switcher; wherein, said soap box is located on the outside of said pipe at the...
US20080271751 APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR WAFER  
An apparatus and a method for cleaning a semiconductor wafer including performing a first cleaning process for removing particles from the semiconductor wafer by injecting a cleaning gas in the...
US20160165947 Fruit and Vegetable Washer  
A fruit and vegetable washer that can contain a washer similar to a dishwasher spray, a dispenser and reservoir to hold a several cups of cleaning fluid to dispense the appropriate amount...
US20070246086 Circuit board cleaning apparatus, burn-in board cleaning apparatus, methods of cleaning a circuit board, and methods of cleaning a burn-in board  
This invention includes a circuit board cleaning apparatus comprising a circuit board support structure configured to receive a circuit board for cleaning. A plurality of spray openings is...
US20070006901 Dishwasher and method of controlling the same  
A dishwasher is provided. The dishwasher includes a tub defining a washing chamber, a lower nozzle formed in the tube to spray washing nozzle, an upper nozzle formed in the tube above the lower...
US20070175498 Method of washing wheels of a vehicle and apparatus therefor  
A method of washing a vehicle and apparatus therefore is disclosed. In one aspect, a wheel washing apparatus is pivotable about a vertical axis. In another aspect, wheels of the vehicle are...
US20070181170 Apparatus including an improved nozzle unit  
An apparatus for supplying a solution to a substrate includes a nozzle unit. The nozzle unit may include at least one nozzle having a variable structure in which lateral portions of the at least...
US20060237043 Method and apparatus for cleaning semiconductor substrates  
According to one aspect of the present invention, a method and apparatus for cleaning a semiconductor substrate are provided. The apparatus may include a chamber wall defining a processing chamber...
US20130152975 MULTI-ENGINE WASH HARNESS SYSTEMS AND METHODS  
A turbine engine cleaning system includes a source of cleaning fluid, a source of rinse fluid, a pump configured to deliver the cleaning fluid and rinse fluid under pressure, and a wash harness....
US20080135071 Foam system  
The present invention is directed to the creation and delivery of foam to displace the vapor space of an enclosed structure of residual material suspended in the vapor space to the outside. The...
US20140116477 SELECTABLE SPRAY WASHING SYSTEM  
A selectable washing system, particularly useful for washing of dogs and other pets, is provided. The selectable washing system specifically relates to an improved, multi-port, multi-valve...
US20130291895 DISHWASHING APPLIANCE WITH PH CONTROLLED CYCLES  
A dishwashing appliance is provided that adjusts the pH during the cleaning process so as to allow for cleaning with both alkaline and acidic wash fluids. Alkali and acidic additives are used to...
US20060191561 Undercarriage washer for self-serve car wash bay  
An undercarriage carwash system for use in a self-serve carwash bay includes a housing, a conduit with a plurality of nozzles, and a control. The bay has a support surface at which a vehicle is...
US20070215189 Cleaning apparatus  
An apparatus is provided for cleaning products such as squid and having a support frame with a start end and a finish end. The frame also has a top member and a base and includes start posts that...
Matches 1 - 43 out of 43