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US20080041414 Pump Cleaning  
The invention relates to the cleaning of a pump used to evacuate a semiconductor process tool. During use of the pump, a reactant such as NF3 is introduced into a foreline extending between the...
US20080178906 Bare aluminum baffles for resist stripping chambers  
Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new...
US20140318575 PROTECTIVE COVER FOR ELECTROSTATIC CHUCK  
A protective cover for an electrostatic chuck may include a conductive wafer and a plasma resistant ceramic layer on at least one surface of the conductive wafer. The plasma resistant ceramic...
US20120031426 Methods For Preventing Corrosion of Plasma-Exposed Yttria-Coated Constituents  
In accordance with one embodiment of the present disclosure, a method for preventing corrosion of a plasma-exposed yttria-coated constituent from ambient acidic hydrolysis wherein the...
US20130061871 PLASMA PURGING AN IDLE CHAMBER TO REDUCE PARTICLES  
During each idle period in which a plasma processing tool is not used in succession, upon lapse of a selected period of inactivity by the plasma production tool of between 10 and 60 minutes, a...
US20110079242 PLASMA CLEANING OF WIRE STRANDS  
Methods and apparatus for cleaning impurities, such as oxides, from wire stands using a plasma gas.
US20110265815 METHOD OF CLEANING SUPPORT PLATE  
The present invention achieves a method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at...
US20060144520 Viewing window cleaning apparatus  
A viewing port for a processing chamber is provided that includes a viewing window cleaning apparatus, a viewing window, and a mounting, where the viewing window cleaning apparatus is coupled to...
US20140182619 HIGH DOSE IMPLANTATION STRIP (HDIS) IN H2 BASE CHEMISTRY  
Plasma is generated using elemental hydrogen, a weak oxidizing agent, and a fluorine containing gas. An inert gas is introduced to the plasma downstream of the plasma source and upstream of a...
US20060054184 Plasma treatment for purifying copper or nickel  
A method for treating electronic components made of copper, nickel or alloys thereof or with materials such as brass or plated therewith and includes the steps of arranging the components in a...
US20120213941 ION-ASSISTED PLASMA TREATMENT OF A THREE-DIMENSIONAL STRUCTURE  
A boundary between a plasma and a plasma sheath is controlled such that a portion of the shape is not parallel to a plane defined by a front surface of the workpiece facing the plasma. Ions in the...
US20090188524 AUTOMATIC INSITU POST PROCESS CLEANING FOR PROCESSING SYSTEMS HAVING TURBO PUMPS  
An automatic method (100) of in-situ cleaning a processing system (211) including a process chamber (213) pumped by a roughing pump (219) and a turbomolecular pump (217) includes the steps of...
US20110017231 METHOD OF CLEANING SUPPORT PLATE  
The present invention achieves a method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at...
US20070006893 Free radical initiator in remote plasma chamber clean  
This invention relates to an improvement in the remote plasma cleaning of CVD process chambers and equipment from unwanted deposition byproducts formed on the walls, surfaces, etc. of such...
US20080214007 METHOD FOR REMOVING DIAMOND LIKE CARBON RESIDUE FROM A DEPOSITION/ETCH CHAMBER USING A PLASMA CLEAN  
Provided is a method for removing diamond like carbon residue from a deposition chamber. This method, in one embodiment, may include subjecting a deposition chamber including diamond like carbon...
US20090260654 METHOD AND DEVICE FOR REPLACING OBJECTIVE PARTS  
A method and a device for replacing objective parts, especially of a projection or illumination objective for microlithography in which an objective having an objective interior and objective...
US20150096268 Preparing a Sealing Surface of a Container  
A method of preparing a sealing surface of a container for application of a seal. A lip of the container may be heated, rinsed, and dried to establish the sealing surface. Then the seal may be...
US20080066778 METHOD OF CLEANING UV IRRADIATION CHAMBER  
A method of cleaning a UV irradiation chamber includes steps of: (i) after completion of irradiating a substrate with UV light transmitted through an optical transmitted window provided in the UV...
US20100301012 DEVICE AND METHOD FOR PRODUCING MICROWAVE PLASMA WITH A HIGH PLASMA DENSITY  
A device for producing microwave plasma with a high plasma density. The device comprises at least one microwave supply that is surrounded by an outer dielectric tube. The microwave supply is...
US20120211023 Method for Removing Deposits  
A method for removing a silicon hydride from the surface of a solid body which comprises treating the silicon hydride with a gas comprising molecular fluorine or reactive species generated from...
US20120298133 ANTI-SMUDGING, BETTER GRIPPING, BETTER SHELF-LIFE OF PRODUCTS AND SURFACES  
A device to provide improved anti-smudging, better gripping and longer shelf-life to products and surfaces includes an electric superheated steam generator and an electric low-ion plasma generator...
US20100059085 PLASMA GENERATOR AND METHOD FOR CLEANING AN OBJECT  
The invention relates to a plasma generator (1) for cleaning an object. The plasma generator (1) comprises a plasma chamber (2) and a support structure (6) arranged in the plasma chamber for...
US20120080052 DEVICES FOR METHODOLOGIES FOR HANDLING WAFERS  
Disclosed are systems, devices and methodologies for handling wafers in wafer processing operations such as solvent and plasma cleaning. In an example situation, a wafer that has been separated...
US20070051387 Method of cleaning plasma applicator in situ and plasma applicator employing the same  
A method of cleaning a plasma generating area of a plasma applicator in situ is disclosed and comprises; supplying a by-product cleaning gas to the plasma generating area, and generating a plasma...
US20110206833 EXTENSION ELECTRODE OF PLASMA BEVEL ETCHING APPARATUS AND METHOD OF MANUFACTURE THEREOF  
An extension electrode with enhanced durability and etching rate for plasma bevel etchers. The extension electrode comprises a plasma exposed truncated conical surface on an annular aluminum body....
US20090161719 LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICATIONS OF ELECTRON SOURCES  
An evaporation apparatus for evaporating a material to be deposited is described. The evaporation apparatus includes at least one evaporation crucible having a body with an area for receiving the...
US20090068844 Etching Process  
Mixtures of fluorine and inert gases like nitrogen and/or argon can be used for etching of semiconductors, solar panels and flat panels (TFTs and LCDs), and for cleaning of semiconductor surfaces...
US20080190449 Method and Device for Descaling Metal Strip  
The invention concerns a method and a device for descaling a metal strip (1), especially a hot-rolled strip of normal steel or a hot-rolled or cold-rolled strip of austenitic or ferritic stainless...
US20090165815 AVOIDING ELECTRICAL SHORTS IN PACKAGING  
A plasma clean tool that includes a cleaning chamber for cleaning an article by plasma cleaning and a charge shield for surrounding an article to be cleaned is presented. The charge shield...
US20060175014 Specimen surface treatment system  
In accordance with one embodiment of the present invention, a specimen surface treatment system is provided comprising a vacuum chamber, a plasma chamber, a specimen holder port, and a specimen...
US20110214687 CONFIGURABLE BEVEL ETCHER  
A device for cleaning a bevel edge of a semiconductor substrate. The device includes: a lower support having a cylindrical top portion; a lower plasma-exclusion-zone (PEZ) ring surrounding the...
US20060144820 Remote chamber methods for removing surface deposits  
The present invention relates to an improved remote plasma cleaning method for removing surface deposits from a surface, such as the interior of a deposition chamber that is used in fabricating...
US20080063576 Micro Plasma Jet Generator  
The present invention provides a microplasma jet generator capable of stably generating a microplasma jet in a microspace at atmospheric pressure with low electric power. The microplasma jet...
US20140060571 IN-SITU GENERATION OF THE MOLECULAR ETCHER CARBONYL FLUORIDE OR ANY OF ITS VARIANTS AND ITS USE  
The molecular etcher carbonyl fluoride (COF2) or any of its variants, are provided for, according to the present invention, to increase the efficiency of etching and/or cleaning and/or removal of...
US20100304146 ENHANCING PLASMA SURFACE MODIFICATION USING HIGH INTENSITY AND HIGH POWER ULTRASONIC ACOUSTIC WAVES  
This invention relates to a plasma surface modification process (and a corresponding a system) of a solid object (100) comprising creating plasma (104) by a plasma source (106), application of the...
US20090100616 Decontamination Of Flakes  
A method and device for cleaning and decontaminating contaminated plastics, such as, for example, RPET or similar polymers, which have been crushed to flakes, where an ionized gas flows around the...
US20070028943 Method of using sulfur fluoride for removing surface deposits  
The present invention relates to an improved remote plasma cleaning method for removing surface deposits from a surface, such as the interior of a process chamber that is used in fabricating...
US20110056513 METHOD FOR TREATING SURFACES, LAMP FOR SAID METHOD, AND IRRADIATION SYSTEM HAVING SAID LAMP  
The invention relates to a method for treating, particularly cleaning, modifying, and/or activating surfaces, using UV/VUV irradiation of a UV/VUV lamp and additional gas discharge. A dielectric...
US20060017043 Method for enhancing fluorine utilization  
A process for enhancing the fluorine utilization of a process gas that is used in the removal of an undesired substance from a substrate is disclosed herein. In one embodiment, there is provided a...
US20110126852 ELECTROSTATIC CHUCK WITH AN ANGLED SIDEWALL  
A substrate support for a plasma processing chamber has an angled sidewall at an upper periphery thereof. The substrate is surrounded by an edge ring which underlies a substrate supported on an...
US20120024314 PLASMA MEDIATED ASHING PROCESSES  
Plasma mediated ashing processes for removing organic material from a substrate generally includes exposing the substrate to the plasma to selectively remove photoresist, implanted photoresist,...
US20110139175 ENHANCED PASSIVATION PROCESS TO PROTECT SILICON PRIOR TO HIGH DOSE IMPLANT STRIP  
Improved methods and apparatus for stripping photoresist and removing ion implant related residues from a work piece surface are provided. According to various embodiments, the workpiece is...
US20090173359 PHOTON INDUCED CLEANING OF A REACTION CHAMBER  
The present invention provides a method for in-situ cleaning of walls of a reaction chamber, e.g. reactive ion etching chamber, to remove contamination, e.g. copper comprising contamination from...
US20140020708 EDGE EXCLUSION CONTROL WITH ADJUSTABLE PLASMA EXCLUSION ZONE RING  
Systems and methods for edge exclusion control are described. One of the systems includes a plasma chamber. The plasma processing chamber includes a lower electrode having a surface for supporting...
US20110108059 PLASMA PROCESS AND REACTOR FOR TREATING METALLIC PIECES  
The plasma reactor defines a reaction chamber provided with a support for the metallic pieces and an anode-cathode system, and a heating means is mounted externally to said plasma reactor. The...
US20120222700 TEMPLATE SUBSTRATE PROCESSING APPARATUS AND TEMPLATE SUBSTRATE PROCESSING METHOD  
According to one embodiment, a template substrate processing apparatus used in imprint lithography, includes a stage which has a convex portion that engages with a concave portion formed at an...
US20060175291 Control of process gases in specimen surface treatment system  
A method of removing hydrocarbon contaminants from a surface of a specimen is provided. The method comprises the steps of: positioning a specimen within a vacuum chamber; maintaining the vacuum...
US20110262870 PURGE RING WITH SPLIT BAFFLES FOR PHOTONIC THERMAL PROCESSING SYSTEMS  
A purge ring for a photonic temperature processing system includes a first layer, a second layer, and a third layer. The first layer, the second layer and the third layer define an inner region....
US20120227762 PLASMA ASHING COMPOUNDS AND METHODS OF USE  
Disclosed are compounds for plasma ashing photoresist layers on a substrate and methods of using the same. The plasma ashing compounds induce limited to no damage to the underlying layer, such as...
US20090314310 DEPOSIT REMOVAL METHOD  
A deposit removal method including a first process of stripping at least part of a deposit that has deposited on inner walls of a reaction chamber and/or a surface of components located inside the...

Matches 1 - 50 out of 441 1 2 3 4 5 6 7 8 9 >