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US20080268143 Device For Providing Vapors Of A Solid Precursor To A Processing Device  
The present invention relates to a device for providing vapors of at least one solid precursor intended to supply a physico-chemical processing device, comprising an enclosure capable of...
US20080202418 ENTRY LOCK SYSTEM, WEB PROCESSING INSTALLATION, AND METHOD FOR USING THE SAME  
An entry lock system for feeding web from a web supply to a web processing installation, the entry lock system comprising a first chamber having an inlet port and an outlet port, a second chamber...
US20120180663 VACUUM TRAP LABYRINTH  
Embodiments of the present invention provide a vacuum trap labyrinth with improved trapping characteristics. The vacuum trap labyrinth comprised of an inner part and an outer part that fit...
US20090017218 Manufacturing Method for Producing Wick Structures of a Vapor Chamber by Using a Powder Thermal Spray Gun  
Simplifying a manufacturing method for producing wick structures of a vapor chamber includes providing a metal lid, providing a powder thermal spray gun to generate a high temperature blaze to...
US20070231485 Silane process chamber with double door seal  
A process chamber for the coating of substrates with silanes with a double door seal. The double door seal may have a cavity between the seals which may be evacuated or pressurized, including with...
US20090272324 SLIT VALVE HAVING INCREASED FLOW UNIFORMITY  
Methods and apparatus for increasing flow uniformity are provided herein. In some embodiments, a slit valve having increased flow uniformity may be provided, the slit valve may include a housing...
US20080099146 SUSPENSION FOR SHOWERHEAD IN PROCESS CHAMBER  
Stress within a suspension wall for suspending a showerhead in a process chamber is ameliorated by one or more of: (1) Openings in the suspension wall that reduce exposure of the suspension wall...
US20080315141 Slit Valve Door  
The present invention provides a slit valve for sealing an opening in a chamber, wherein the slit valve includes a door having an interior and an exterior surface. A sealing member is disposed on...
US20060236942 Sealing lock for an in vacuo line for deposition on a flat product  
The invention relates to a sealing lock, for an in vacuo chamber for deposition on a, preferably metallic, endless strip, characterised in that: the metal rollers are mounted on brackets, fixed to...
US20080236499 Vent groove modified sputter target assembly and apparatus containing same  
A sputter target assembly including vent grooves having a certain configuration so as to reduce target arcing during the physical vapor deposition of a film.
US20080210170 SEMICONDUCTOR MANUFACTURING EQUIPMENT AND MANUFACTURING METHOD OF THE SAME  
A semiconductor manufacturing equipment includes a first chamber that has a first connection hole, a second chamber that has a second connection hole connected to the first connection hole of the...
US20090096349 CROSS FLOW CVD REACTOR  
A cross flow chemical vapor deposition chamber can comprise an inlet duct having a generally rectangular cross-section and an outlet duct having a generally rectangular cross-section. The...
US20080087222 ROTATING PRESSURE DISTRIBUTOR AND CAROUSEL-TYPE MACHINE FOR TREATING HOLLOW BODIES WHICH IS EQUIPPED THEREWITH  
Rotating pressure distributor (1) for a carousel-type machine for treating hollow bodies in a plurality of identical treatment stations, comprising two rings, (2) fixed and (3) rotating, in...
US20140060435 DOORS FOR HIGH VOLUME, LOW COST SYSTEM FOR EPITAXIAL SILICON DEPOSITION  
Apparatus for use in an inline substrate processing tool are provided herein. In some embodiments, a door for use in an inline substrate processing tool between a first and a second substrate...
US20070175395 Semiconductor device manufacturing equipment including a vacuum apparatus and a method of operating the same  
A vacuum apparatus includes a first isolation chamber, a second isolation chamber, a vacuum source configured to extract air from the first and second isolation chambers, and an isolation valve...
US20120231628 REDUCTION OF A PROCESS VOLUME OF A PROCESSING CHAMBER USING A NESTED DYNAMIC INERT VOLUME  
A substrate processing chamber includes a lift actuator that moves a pedestal between a substrate loading position and a substrate processing position. An adjustable seal defines an expandable...
US20130068165 MICROFLUIDIC DEVICE AND METHOD USING DOUBLE ANODIC BONDING  
A microfluidic device for use with a microfluidic delivery system, such as an organic vapor jet printing device, includes a glass layer that is directly bonded to a microfabricated die and a metal...
US20110155049 MODERN HYDRIDE VAPOR-PHASE EPITAXY SYSTEM & METHODS  
Hydride vapor-phase deposition (HVPE) systems are disclosed. An HVPE hydride vapor-phase deposition system may include a reactant source chamber and a growth chamber containing a susceptor coupled...
US20140373785 BELLOWS-FREE RETRACTABLE VACUUM DEPOSITION SOURCES  
Systems are provided that include one or more retractable deposition source assemblies that eliminate the need for a bellows, but do not require breaking the ultra-high vacuum of a growth module...
US20100050945 SUBSTRATE PROCESSING APPARATUS  
When a quartz part is placed on a floor, the inside of a furnace is not polluted by contaminants attached from the floor to a seal surface of the quartz part and entering the inside of the...
US20050193946 Apparatus and method for preventing corrosion of a vacuum gauge  
A vacuum process apparatus for preventing corrosion of a vacuum gauge is disclosed. The apparatus includes a process chamber used to proceed a vacuum process reaction. A vacuum gauge is connected...
US20060283391 Gravity-fed in-line continuous processing system and method  
A gravity-fed in-line continuous processing system includes at least one processing chamber disposed between a first load lock and a second load lock. The second load lock is disposed lower than...
US20050279455 Plasma reactor for surface modification of objects  
A plasma reactor is configured for rapid, simple and selective cleaning of plasma sources and adjacent areas of the processing chamber. The plasma reactor includes a processing chamber having a...
US20070012251 Seal arrangement with corrosion barrier and method  
A guard barrier arrangement is used in an O-ring seal arrangement to limit reactive species in coming into contact with an O-ring. The arrangement is supported in a chamber passage for exposure to...
US20130133580 HIGH PRODUCTIVITY VAPOR PROCESSING SYSTEM  
A processing chamber is provided. The processing chamber includes a lid having a plurality of valves affixed thereto, the plurality of valves operable to enable process gases to flow into the...
US20080171147 FORMING THIN FILMS USING A RESEALABLE VIAL CARRIER OF AMPHIPHILIC MOLECULES  
A method of forming a thin film of amphiphilic molecules on a substrate by using a resealable vial carrier is provided. The method includes placing the substrate in a vacuum chamber. A resealable...
US20110255950 System and Method for Sealing a Vapor Deposition Source  
A system and method for movably sealing a vapor deposition source is described. One embodiment includes a system for coating a substrate, the system comprising a deposition chamber; a vapor pocket...
US20060278162 Vacuum treatment apparatus and vapor deposition apparatus  
It has been found that an organic component is emitted from a member such as a crucible or a gasket constituting an apparatus for vacuum treatment and an element is contaminated with said organic...
US20070186851 Vacuum chamber system for semiconductor processing  
A vacuum chamber system for semiconductor processing includes at least two evacuable vacuum chambers (1a, 1b) which are provided for receiving semiconductor elements (5) to be processed and which...
US20140225232 REDUCING CONTAMINATION DURING ATOMIC LAYER DEPOSITION  
Atomic layer deposition (ALD) techniques typically involve briefly exposing the surface of a substrate to a precursor within an atomic layer deposition chamber, and purging the chamber with a...
US20050051102 Apparatus for processing substrate in chamber and maintenance method therefor  
A thermal processing apparatus (1) comprises a chamber body (6) having an upper opening (60), a transparent plate attached to the upper opening (60) to close the upper opening (60), a holding part...
US20070212484 Exhaust apparatus configured to reduce particle contamination in a deposition system  
A method and system for vapor deposition on a substrate that disposes a substrate in a process space of a processing system that is isolated from a transfer space of the processing system,...
US20080011232 Device for depositing a coating on an internal surface of a container  
Device for depositing a coating on an internal surface of a container (10), of the type in which the deposition is carried out by means of a low-pressure plasma created inside the container (10)...
US20100062182 Method for Repairing Display Device and Apparatus for Same  
An object of the present invention is to provide a method for repairing a display device according to which a wide variety of regions can be repaired in various ways using various materials, as...
US20070137570 Semiconductor manufacturing apparatus and semiconductor manufacturing method using the same  
A semiconductor manufacturing apparatus comprising: a plurality of vacuum chambers corresponding to a plurality of processing sections necessary for manufacturing a semiconductor device; an...
US20080317956 Device and Method for Continuous Chemical Vapour Deposition Under Atmospheric Pressure and Use Thereof  
The invention relates to a device and a method for continuous chemical vapour deposition under atmospheric pressure on substrates. The device is hereby based on a reaction chamber, along the open...
US20130052346 CVD REACTOR WITH GAS FLOW VIRTUAL WALLS  
A chemical vapor deposition reactor has one or more deposition zones bounded by gas flow virtual walls, within a housing having closed walls. Each deposition zone supports chemical vapor...
US20060118049 Vacuum-generating apparatus and thin film processing apparatus having the same  
A vacuum-generating apparatus includes a vacuum-generating unit and a stabilizing module. The vacuum-generating unit exhausts a fluid from a processing area to generate a vacuum pressure in the...
US20130333621 APPARATUS FOR THE DEPOSITION OF HIGH DIELECTRIC CONSTANT FILMS  
An integrated deposition system is described that is capable of vaporizing low vapor pressure liquid precursors and conveying the vapor to a processing region to fabricate advanced integrated...
US20140335287 ATOMIC LAYER DEPOSITION APPARATUS AND ATOMIC LAYER DEPOSITION METHOD  
Provided is an atomic layer deposition apparatus including: a sealable deposition chamber; a holding portion configured to hold a substrate including a deposition surface in the deposition...
US20110274837 ALD REACTOR, METHOD FOR LOADING ALD REACTOR, AND PRODUCTION LINE  
An ALD reactor for treating one or more substrates is provided. The ALD reactor includes at least one reaction chamber which has a front plate including gas connections for introducing starting...
US20110236569 SYSTEMS AND METHODS FOR PREVENTING OR REDUCING CONTAMINATION ENHANCED LASER INDUCED DAMAGE (C-LID) TO OPTICAL COMPONENTS USING GAS PHASE ADDITIVES  
Systems and methods for preventing or reducing contamination enhanced laser induced damage (C-LID) to optical components are provided including a housing enclosing an optical component, a...
US20080121184 IN-SITU METHOD OF CLEANING VAPORIZER DURING DIELECTRIC LAYER DEPOSITION PROCESS  
Provided is an in-situ method of cleaning a vaporizer of an atomic layer deposition apparatus during a dielectric layer deposition process, to prevent nozzle blocking in the vaporizer and an...
US20100024872 SEMICONDUCTOR LAYER MANUFACTURING METHOD, SEMICONDUCTOR LAYER MANUFACTURING APPARATUS, AND SEMICONDUCTOR DEVICE MANUFACTURED USING SUCH METHOD AND APPARATUS  
Provided are a semiconductor layer manufacturing method and a semiconductor manufacturing apparatus capable of forming a high quality semiconductor layer even by a single chamber system, with a...
US20120118231 SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM, AND SUBSTRATE PROCESSING APPARATUS  
A method of processing a substrate by a substrate processing apparatus is disclosed. The substrate processing apparatus includes a processing container including a first space where a first...
US20090056631 APPARATUS FOR MANUFACTURING SEMICONDUCTOR LAYER  
An apparatus for manufacturing a semiconductor layer on a substrate typically includes a reaction chamber, a first feed pipe, and a second feed pipe. The reaction chamber is configured for...
US20100122659 METERING AND VAPORIZING PARTICULATE MATERIAL  
Apparatus for metering and vaporizing a particulate material, includes: a metering device for metering particulate material having: a reservoir for receiving particulate material; a housing having...
US20090205563 TEMPERATURE-CONTROLLED PURGE GATE VALVE FOR CHEMICAL VAPOR DEPOSITION CHAMBER  
The present invention relates to methods and apparatus that are optimized for producing Group III-N (nitrogen) compound semiconductor wafers and specifically for producing GaN wafers....
US20080014350 Apparatus and Methods for Chemical Vapor Deposition  
Methods and apparatus are disclosed for the formation of vaporizing liquid precursor materials. The methods or apparatus can be used as part of a chemical vapor deposition apparatus or system, for...
US20090120368 ROTATING TEMPERATURE CONTROLLED SUBSTRATE PEDESTAL FOR FILM UNIFORMITY  
Substrate processing systems are described. The systems may include a processing chamber, and a substrate support assembly at least partially disposed within the chamber. The substrate support...

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