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US20140349012 METHOD AND DEVICE FOR DRYING, MODELLING AND/OR THERMALLY MODIFYING WOODEN PARTS  
The invention relates to a method for drying, modelling and/or thermally modifying wooden parts, comprising the steps of: a) arranging the wooden parts in a bath; b) filling the bath with a...
US20140352620 GUIDING ASSEMBLY AND COATING DEVICE USING SAME  
A guiding assembly is used in a coating device. The coating device includes a target and an umbrella stand. The guiding assembly is located between the target and the umbrella stand, and includes...
US20130059132 Laminate Having a One-Dimensional Composite Structure  
A laminate includes two substrates that are connected by means of a bonding layer, the bonding layer enabling a one-dimensional composite structure. This enables a purely inorganic compound of...
US20140220298 SIC CRYSTAL WITH LOW DISLOCATION DENSITY  
A method of forming an SiC crystal, the method including: placing a SiC seed in a growth vessel, heating the growth vessel, and evacuating the growth vessel, wherein the seed is levitated as a...
US20130269615 VERTICAL WAFER BOAT  
A wafer boat for holding a plurality of semiconductor wafers in a spaced apart relationship during processing, comprising at least one support member defining a plurality of sets of at least two...
US20150128863 MECHANISMS FOR FURNACE APPARATUS AND WAFER BOAT  
Embodiments of mechanisms of a furnace apparatus having a wafer boat are provided. The wafer boat includes a base plate and a support rod extended from the base plate. The wafer boat also includes...
US20150011025 ENHANCED SELENIUM SUPPLY IN COPPER INDIUM GALLIUM SELENIDE PROCESSES  
A system for depositing selenium on a substrate comprises includes a substrate carrier including a body, means for holding the substrate, and a plurality of selenium vapor outlets formed in the...
US20120118235 FILM COATING DEVICE  
A film coating device includes a film coating holder, a film coating cover, and a filter plate. The film coating holder includes a number of through holes defined therein for receiving workpieces...
US20140082916 APPARATUS FOR ATTACHING SEED  
Disclosed is an apparatus for attaching a seed. The apparatus for attaching the seed includes a holder fixing part to fix a seed holder; a pressing part to apply a pressure to the seed holder; and...
US20050150462 Lift pin for used in semiconductor manufacturing facilities and method of manufacturing the same  
Provided are a lift pin capable of preventing aluminum from depositing on the lift pin when depositing a metallic layer on a wafer through chemical vapor deposition. a system using the lift pin,...
US20140272346 METHOD OF GROWING ALUMINUM OXIDE ONTO SUBSTRATES BY USE OF AN ALUMINUM SOURCE IN AN OXYGEN ENVIRONMENT TO CREATE TRANSPARENT, SCRATCH RESISTANT WINDOWS  
A system and process for inter alia coating a substrate such as glass with a layer of aluminum oxide to create a scratch-resistant and shatter-resistant matrix comprised of a thin...
US20130263785 Crucible for Growing Crystals  
A crucible is used for allowing a seed crystal to grow via the source of materials. The crucible includes a growth chamber, a holder, a reflecting device, and a plurality of gas guiding devices....
US20150211148 WAFER CARRIER HAVING RETENTION POCKETS WITH COMPOUND RADII FOR CHEMICAL VAPOR DESPOSITION SYSTEMS  
A wafer carrier for use in a chemical vapor deposition (CVD) system includes a plurality of wafer retention pockets, each having a peripheral wall surface surrounding a floor surface and defining...
US20120021126 Vacuum Vapor Coating Device for Coating a Substrate  
A vacuum vapor coating device for coating a substrate with a coating material, the vacuum vapor coating device comprising a chamber (1) into which vacuum can be created, the chamber (1) comprises:...
US20060016554 Substrate holder having electrostatic chuck and method of fabricating the same  
Provided is a substrate holder including a susceptor having edge protrusion formed on edge thereof and an electrostatic chuck mounted inside the edge protrusion and on the susceptor. The...
US20050000451 Clamping jig for semiconductor laser bars  
A clamping jig for mounting semiconductor laser bars includes: multiple supporting bars for holding laser bars therebetween; a pair of supporting plates each of which has a mounting face for...
US20150191819 SOURCE REAGENT-BASED DELIVERY OF FLUID WITH HIGH MATERIAL FLUX FOR BATCH DEPOSITION  
Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior...
US20150259827 SUSCEPTOR  
A susceptor, comprises: a bottom structure comprising atop surface; and a top structure detachably attached to the bottom structure comprising: a central part; and a peripheral part surrounding...
US20140366807 APPARATUS FOR FABRICATING INGOT AND METHOD OF FABRICATING INGOT  
Disclosed is an apparatus for fabricating an ingot, and a method of fabricating the ingot. The apparatus includes a crucible to receive a raw material, and a holder to fix a seed positioned on the...
US20060185600 Multi-zone chuck  
A multi-zone electrical chuck (100) comprises at least two electrically distinct zones or regions. Each zone is electrically isolated from each other zone, and each zone is capable of being set to...
US20140158042 APPARATUS FOR FABRICATING INGOT  
An apparatus for fabricating an ingot according to the embodiment comprises a crucible for receiving a raw material; and a seed holder for fixing a seed disposed over the raw material, wherein a...
US20090038541 PRODUCTION OF BULK SILICON CARBIDE WITH HOT-FILAMENT CHEMICAL VAPOR DEPOSITION  
A method to grow a boule of silicon carbide is described. The method may include flowing a silicon-containing precursor and a carbon-containing precursor proximate to a heated filament array and...
US20080092821 Quartz Jig and Semiconductor Manufacturing Apparatus  
A quartz jig of this invention is such as being provided inside a semiconductor manufacturing apparatus allowing therein growth of an epitaxial layer on a main surface of a semiconductor wafer,...
US20120192792 PLASMA, UV AND ION/NEUTRAL ASSISTED ALD OR CVD IN A BATCH TOOL  
CVD and ALD methods of using a batch processing chamber to process substrates are described. A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of...
US20060150906 Wafer boat for reduced shadow marks  
Wafer boats include three or more boat rods having recesses ground into them to support wafers. Recess heights are increased relative to conventional boats in order to reduce shadow marks in...
US20150068446 METHOD AND APPARATUS FOR PRODUCING BULK SILICON CARBIDE USING A SILICON CARBIDE SEED  
A method of producing silicon carbide is disclosed. The method comprises the steps of providing a sublimation furnace comprising a furnace shell, at least one heating element positioned outside...
US20050022744 Susceptor for Semiconductor Manufacturing Equipment, and Semiconductor Manufacturing Equipment in Which the Susceptor Is Installed  
Enhances the durability of electrodes for supplying electricity to electroconductive components formed in the interior and/or on the surface of a susceptor ceramic heater-block, affords for...
US20050000450 Treatment subject elevating mechanism, and treating device using the same  
A lift mechanism for an object-to-be-processed is provided which can minimize displacement of an object-to-be-processed by quickly discharging the gas in the space on the side of the backside...
US20050000452 Electromagnetic rotation of platter  
A method of rotation of a material formation platter and a rotating platter wherein the platter is subjected to a first magnetic field and a second magnetic field at an angle to the first magnetic...
US20150236566 Integrated Two-Axis Lift-Rotation Motor Center Pedestal In Multi-Wafer Carousel ALD  
Apparatus and methods for processing a semiconductor wafer including a two-axis lift-rotation motor center pedestal with vacuum capabilities. Wafers are subjected to a pressure differential...
US20140073135 METHOD FOR DEPOSITING TUNGSTEN FILM WITH LOW ROUGHNESS AND LOW RESISTIVITY  
Methods of producing low resistivity tungsten bulk layers having low roughness and associated apparatus are provided. According to various embodiments, the methods involve CVD deposition of...
US20090107403 BRAZED CVD SHOWER HEAD  
A shower head for a chemical vapor deposition chamber can have a housing, a plurality of bosses formed upon the housing, and an inside cover. The bosses can have bores formed therethrough. The...
US20090013933 SEMICONDUCTOR MANUFACTURING DEVICE  
The present invention relates to a semiconductor manufacturing device that a maintenance or a repairing is easy so that an efficiency of manufacturing can be enhanced because a high temperature of...
US20080314320 Chamber Mount for High Temperature Application of AIN Heaters  
A susceptor for high temperature semiconductor processing is provided. The susceptor includes a substrate support joined to a hollow shaft having a pair of ports to allow an inert gas to be purged...
US20100071625 SHUTTER DISK HAVING A TUNED COEFFICIENT OF THERMAL EXPANSION  
A shutter disk having a tuned coefficient of thermal expansion is provided herein. In some embodiments, a shutter disk having a tuned coefficient of thermal expansion may include a body formed...
US20090120464 MULTI-PORT PUMPING SYSTEM FOR SUBSTRATE PROCESSING CHAMBERS  
An exhaust foreline for purging fluids from a semiconductor fabrication chamber is described. The foreline may include a first, second and third ports independently coupled to the chamber. A...
US20090274835 DIFFUSER/SHUTTER DESIGN FOR VAPOR PHASE LUBRICATION PROCESS  
This invention relates to an apparatus for vapor lubrication comprising a chamber, a diffuser plate having an array of orifices, a shutter plate having substantially the same pattern of orifices...
US20110045206 IN-SITU DEPOSITION OF BATTERY ACTIVE LITHIUM MATERIALS BY PLASMA SPRAYING  
A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A precursor mixture comprising precursor particles dispersed in a carrying medium is activated in an...
US20100015333 SPRAY COATING PROCESS WITH REDUCED GAS TURBULENCE  
A spray coating apparatus in which gas turbulence is reduced to provide a better controlled spray coating process. The spray coating apparatus comprises a coating chamber, a spray nozzle, and an...
US20130206070 DEPOSITION RING  
A deposition ring is used on thin film deposition equipment which includes a chuck to hold a wafer. The deposition ring is arranged on the circumferential wall of the chuck and includes an inner...
US20150206785 SUSCEPTOR, CRYSTAL GROWTH APPARATUS, AND CRYSTAL GROWTH METHOD  
A growth layer is uniformly grown on a substrate which is mounted on a susceptor. With a lower plate of the susceptor, at the outer periphery of a substrate mounting part, an outer periphery...
US20120285383 MOUNTING FOR FIXING A REACTOR IN A VACUUM CHAMBER  
The present invention provides a mounting, configured for fixing a reactor, in particular a PECVD reactor, in a vacuum chamber (1), the mounting (10) comprising a framework of at least two outer...
US20060156988 Pin set for a reactor  
A pin set is provided for a reactor, and the pin set has a lift pin, a pin guide and a pin weight. The pin guide is configured in the reactor and has a guide hole for the lift pin to move through....
US20100307416 Chemical Vapor Deposition Apparatus  
A chemical vapor deposition apparatus is disclosed, which is capable of improving the yield by an extension of a cleaning cycle, the chemical vapor deposition apparatus comprising a chamber with a...
US20130180447 SUSCEPTOR AND METHOD FOR MANUFACTURING EPITAXIAL WAFER  
A susceptor is disclosed that can increase a heat capacity of a susceptor outer peripheral portion by enlarging the thickness of the susceptor and equalize thermal conditions for an outer...
US20150136027 TRAP ASSEMBLY IN FILM FORMING APPARATUS  
A trap mechanism for trapping exhaust gas from a process chamber. The trap assembly includes a housing containing a plurality of trap units. The plurality of trap units are arranged successively...
US20110126766 COATING APPARATUS  
A coating apparatus includes a deposition case, a reaction assembly, two precursors, a target, and a driving assembly. The deposition case includes a housing defining a cavity for receiving...
US20100294200 VAPOR CHAMBER AND METHOD FOR MANUFACTURING THE SAME  
A vapor chamber includes a sealed flattened casing containing working liquid therein, a wick structure arranged on an inner face of the casing, a supporting plate received in the casing and a...
US20060156987 LIFT PIN MECHANISM AND SUBSTRATE CARRYING DEVICE OF A PROCESS CHAMBER  
A lift pin mechanism is applied to a process chamber for carrying a substrate and moving the substrate upward or downward. The mechanism includes a plurality of lift pins positioned in a plurality...
US20050051099 Susceptor provided with indentations and an epitaxial reactor which uses the same  
The disc susceptor (1) for epitaxial growth reactors is of the type adapted to be heated by induction and is provided with an upper side (11) and with a lower side (12); at least one recess (2)...